In recent years, with continuous improvement of chip manufacturing technology, the development of lithography technology is facing some difficulties, which also affect the development of chip industry and the sustainability of Moore's Law. However, current mainstream extreme ultraviolet lithography technology is close to the manufacturing limit, and more advanced technology is needed to break through the technical bottleneck. In this paper, the concept of lithography based on dual-beam super-resolution technology is reviewed, and its advantages and potential are analyzed. At the same time, the challenges and possible solutions of this technology are proposed. This new lithography technology is expected to play an important role in the field of micro-nano manufacturing.

chip manufacturing  /  lithography technology  /  double beam  /  super-resolution