Ice lithography (IL) is an emerging micro/nanofabrication technique based on electron beam interaction with cryogenic materials, which enables direct writing and transfer of nanoscale patterns through localized electron beam irradiation on solid ice resists formed by gas condensation on cryogenic substrates. Since its inception, this technology has rapidly evolved with distinctive advantages: Firstly, the low electron sensitivity of ice resists permits in situ observation during processing, facilitating high-precision overlay alignment. Secondly, ice films demonstrate exceptional conformal coverage on non-planar substrates, overcoming the planarization constraints inherent to conventional lithography. Thirdly, the solvent-free removal of ice resists via thermal desorption establishes an environmentally benign process, particularly advantageous for processing sensitive and fragile materials. This review systematically examines the historical development of IL, comprehensively summarizes key advancements in technical characteristics, fabrication accuracy, equipment evolution, and process applications, while providing prospects for future directions. It aims to stimulate interdisciplinary research and explore the application potential of this novel technology in emerging fields including three-dimensional optoelectronic devices, biosensing platforms, and flexible electronics.