Electron beam lithography plays an irreplaceable role in applications such as high precision mask manufacturing, prototype device research and development, small volume production and fundamental scientific research. So breakthrough in advanced domestic electron beam lithography system is an urgent task in the context of foreign embargo. In this review, we introduce the development process of electron beam lithography systems, list the main manufacturers and latest system parameters of three most popular kinds of system in scientific research and industry, and summarize the progress of electron beam lithography system in China. In comparison with the technical parameters of foreign electron beam lithography systems, the key issues that need to be solved in domestic development are summarized. Among them, the challenges of realizing advanced domestic Gaussian electron beam lithography system are emphatically described, including thermal field emission electron gun, high acceleration voltage, high frequency pattern generator, high precision laser interferometer detection technology, and high precision electron beam deflection compensation technology. This review may provide a technical route reference for advanced domestic electron beam lithography system.

electron beam lithography systems  /  micro and nano-fabrication  /  Gaussian beam  /  variable shaped beam  /  multi-beam