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Promote the domestication of the third-generation semiconductor equipment to embrace the dawn of semiconductors and consolidate the new infrastructure
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Science & Technology Review | 2021, 39(14) : 83 - 91
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Science & Technology Review | 2021, 39(14): 83-91
Exclusive: Innovation and development of the third generation semiconductor
Promote the domestication of the third-generation semiconductor equipment to embrace the dawn of semiconductors and consolidate the new infrastructure
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WANG Zhiyue1, GONG Xiaoliang1,2, FU Binglei3
Affiliations
    1. The CETC Electronic Equipment Group Co., Ltd., Beijing 100070, China;
    2. The 48 th Institute of CETC, Changsha 410111, China;
    3. Huajin Holding Group Co., Ltd., Beijing 100000, China
Published: 2021-07-28 doi: 10.3981/j.issn.1000-7857.2021.14.008
Outline
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The third-generation semiconductors, with the SiC and the GaN as the representatives, are widely used in the new infrastructure like the 5G base station and the EV charging point. The manufacturing process of the third-generation semiconductor requires high temperature, high energy and low damage, and the related equipment thus has to be modified. The requirements of the process and the related equipment for the third-generation semiconductor are presented. This paper also reviews the domestication of the third-generation semiconductor equipment and offer suggestions for the future, such as we should take the enterprise as the main body and make the collaborative innovation in production, teaching, research and application; focus on equipping the technology in common uses and cultivating the independent part supporting system; strengthen the cultivation of the innovative talents and enhance the potential of the industrial development.
third-generation semiconductor  /  equipment  /  semiconductor industry
WANG Zhiyue, GONG Xiaoliang, FU Binglei. Promote the domestication of the third-generation semiconductor equipment to embrace the dawn of semiconductors and consolidate the new infrastructure[J]. Science & Technology Review, 2021 , 39 (14) : 83 -91 . DOI: 10.3981/j.issn.1000-7857.2021.14.008
Year 2021 volume 39 Issue 14
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doi: 10.3981/j.issn.1000-7857.2021.14.008
  • Receive Date:2020-08-10
  • Online Date:2021-09-07
  • Published:2021-07-28
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  • Received:2020-08-10
  • Revised:2021-02-04
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https://castjournals.cast.org.cn/joweb/kjdb/EN/10.3981/j.issn.1000-7857.2021.14.008
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表12种不同金属材料的力学参数

Family
属数
Number of
genus
种数
Number of
species
占总种数比例
Percentage of
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Genus
种数
Number of
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占总种数比例
Percentage of total
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鹅膏菌科Amanitaceae 2 11 5.26 鹅膏菌属 Amanita 10 4.78
小菇科 Mycenaceae 2 12 5.74 丝盖伞属 Inocybe 5 2.39
多孔菌科 Polyporaceae 8 14 6.70 蜡蘑属 Laccaria 5 2.39
红菇科 Russulaceae 3 23 11.00 小皮伞属 Marasmius 6 2.87
小菇属 Mycena 11 5.26
光柄菇属 Pluteus 5 2.39
红菇属 Russula 17 8.13
栓菌属 Trametes 5 2.39
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