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A SiC Epitaxial Growth Doping Concentration Prediction Model Based on Multi-Scale Feature Enhancement and Temporal Transformer
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Zhongyi ZHANG1, 2, Lang WANG1, 2, 3, Weili LU1, 2, 3, Shuai LI1, 2, 3, Jianye YANG1, 2, 3, Nan GAO1, 2, 3, Bo WANG1, 2, 3, Guoping PAN1, 2, 3, Yulong FANG1, 2, 3
Journal of the Chinese Ceramic Society | 2026, 54(1) : 35 - 48
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Journal of the Chinese Ceramic Society | 2026, 54(1): 35-48
• Special Issue on AI for Materials—Research Articles •
A SiC Epitaxial Growth Doping Concentration Prediction Model Based on Multi-Scale Feature Enhancement and Temporal Transformer
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Zhongyi ZHANG1, 2, Lang WANG1, 2, 3, Weili LU1, 2, 3, Shuai LI1, 2, 3, Jianye YANG1, 2, 3, Nan GAO1, 2, 3, Bo WANG1, 2, 3, Guoping PAN1, 2, 3, Yulong FANG1, 2, 3
Affiliations
  • 1.The 13th Research Institute, CETC, Shijiazhuang 050051, China
  • 2.Hebei Province Semiconductor Intelligent Manufacturing Innovation Center, Shijiazhuang 050051, China
  • 3.Shijiazhuang Key Laboratory of Semiconductor Artificial Intelligence Technology, Shijiazhuang 050051, China
  • ZHANG Zhongyi (2000-), male, Assistant Engineer. E-mail:

    WANG Lang (1989-), male, Engineer. E-mail:

About Author:

ZHANG Zhongyi (2000-), male, Assistant Engineer. E-mail:

WANG Lang (1989-), male, Engineer. E-mail:

Published: 2026-01-20 doi: 10.14062/j.issn.0454-5648.20250794
Outline
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Introduction

Silicon carbide (SiC), as a representative third-generation wide-bandgap semiconductor material, exhibits superior performance over traditional silicon-based devices in high-voltage, high-power, and high-frequency applications. The doping concentration of the SiC epitaxial layer critically determines the performance of power devices. However, current doping control heavily relies on manual experience and offline testing, which incurs high costs and significant time delays. This study aims to address these limitations by proposing a data-driven model for accurate and real-time prediction of doping concentration in both in-situ and next-batch scenarios.

Methods

This paper proposes a Multi-scale Feature-enhanced Temporal Transformer Network (MFT-NET) for predicting the core-layer doping concentration during SiC epitaxial growth. The model integrates four key modules:

Multi-scale Convolution Module: Employs parallel convolutional branches with kernel sizes of [3,3], [9,3], and [21,5] to capture parameter dynamics across millisecond-to-hour scales.

Squeeze-and-Excitation (SE) Module: Enhances feature channels correlated with doping concentration and suppresses noise via channel-wise attention.

Transformer Module: Models global coupling relationships among all 75 process parameters using multi-head self-attention.

Gated Recurrent Unit (GRU) Module: Captures cross-batch state dependencies to account for residual dopant and equipment state drift between consecutive epitaxial runs.

The model was trained and evaluated on a dataset comprising 1200 epitaxial runs from a commercial SiC epitaxial reactor. Data preprocessing included Pearson correlation-based feature selection and min-max normalization. A weighted mean squared error loss function was adopted to prioritize mainstream process samples.

Results and Discussion

Experimental results demonstrate that MFT-NET significantly outperforms traditional models including Ridge Regression, Support Vector Regression (SVR), CNN, CNN+LSTM, Transformer, and CNN+Transformer. In the in-situ prediction scenario, MFT-NET achieved a mean absolute percentage error (MAPE) of 1.35%, a root mean square error (RMSE) of 2.81×1014 cm-3, and a coefficient of determination (R²) of 0.89. For next-batch prediction, it attained a MAPE of 1.66%, RMSE of 3.42×1014cm-3, and R² of 0.87.

Ablation studies confirmed the contribution of each module: the multi-scale convolution and SE modules improved feature extraction and selection; the Transformer enabled global parameter interaction modeling; and the GRU was crucial for capturing cross-batch state transfer, reducing next-batch prediction RMSE by 20.8% compared to the model without GRU.

Hyperparameter analysis revealed that a 3-layer Transformer, the proposed multi-scale kernel combination, and a Dropout ratio of 0.2 yielded optimal performance.

Conclusions

The MFT-NET model effectively addresses the multi-scale dynamics, global parameter coupling, and cross-batch state transfer challenges in SiC epitaxial growth. It provides highly accurate doping concentration predictions for both in-situ monitoring and next-batch forecasting, with the potential to reduce offline testing costs by 30% and improve process stability by 15%. This work offers a robust data-driven framework for intelligent optimization of SiC epitaxial processes.

silicon carbide epitaxial growth  /  core-layer doping concentration  /  multi-scale convolution  /  Transformer  /  process parameter prediction  /  deep learning
张忠义, 王朗, 芦伟立, 李帅, 杨建业, 高楠, 王波, 潘国平, 房玉龙. 基于多尺度特征增强和时序Transformer的SiC外延生长浓度预测模型. 硅酸盐学报, 2026 , 54 (1) : 35 -48 . DOI: 10.14062/j.issn.0454-5648.20250794
Zhongyi ZHANG, Lang WANG, Weili LU, Shuai LI, Jianye YANG, Nan GAO, Bo WANG, Guoping PAN, Yulong FANG. A SiC Epitaxial Growth Doping Concentration Prediction Model Based on Multi-Scale Feature Enhancement and Temporal Transformer[J]. Journal of the Chinese Ceramic Society, 2026 , 54 (1) : 35 -48 . DOI: 10.14062/j.issn.0454-5648.20250794
Year 2026 volume 54 Issue 1
36
5
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Article Info
doi: 10.14062/j.issn.0454-5648.20250794
  • Receive Date:2025-11-02
  • Online Date:2026-10-27
  • Published:2026-01-20
Article Data
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History
  • Received:2025-11-02
  • Revised:2025-11-28
Funding
Affiliations
    1.The 13th Research Institute, CETC, Shijiazhuang 050051, China
    2.Hebei Province Semiconductor Intelligent Manufacturing Innovation Center, Shijiazhuang 050051, China
    3.Shijiazhuang Key Laboratory of Semiconductor Artificial Intelligence Technology, Shijiazhuang 050051, China

Corresponding:

FANG Yulong (1986-), male, Ph.D., Professor. E-mail:
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