Conventional infrared reflective layers often struggle with thermal instability at high temperatures or insufficient infrared reflectivity, limiting their practical applications. In this study, we employed a microalloying approach to enhance film performance by incorporating tantalum （Ta） into silver （Ag） films via magnetron sputtering. The reflective spectra, crystal structure, and surface morphology of the films were systematically analyzed. The results indicate that Ta doping effectively inhibites the preferred growth of the Ag（111） crystal plane. Furthermore, high-vacuum thermal stability tests at 600 ℃ confirm that the AgTa infrared reflective coatings retain excellent optical and structural stability, even under elevated temperatures.

microalloying  /  Ag  /  thermal stability  /  IR reflective layer  /  reflectance  /  magnetron sputtering