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Brim Effect of Negative Bias-Enhanced Nucleation of Diamond Film on Silicon Substrate
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Chuan-Xin WANG1, 2, Jian-Hua WANG2, Zhi-Bin MA2, Wei-Dong MAN1, 2, Sheng-Gao WANG1, 2, Zhi-Cheng KANG1
Chinese Journal of High Pressure Physics | 2003, 17(2) : 145 - 149
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Chinese Journal of High Pressure Physics | 2003, 17(2): 145-149
Brim Effect of Negative Bias-Enhanced Nucleation of Diamond Film on Silicon Substrate
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Chuan-Xin WANG1, 2, Jian-Hua WANG2, Zhi-Bin MA2, Wei-Dong MAN1, 2, Sheng-Gao WANG1, 2, Zhi-Cheng KANG1
Affiliations
  • 1.Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031, China
  • 2.Department of Material Science and Engineering, Wuhan Institute of Chemical Technology, Wuhan 430073, China
Published: 2003-06-05
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Diamond nucleation improved by negative bias-enhanced technology on Si (100) substrate has been investigated on a microwave plasma enhanced chemical vapor deposition (MPCVD) apparatus using a gas mixture of methane and hydrogen. The results show that the bias voltage has a significant effect on the uniformity of the nucleation density and the concentration of the methane mainly relevant to the nucleation time. There is an obvious brim effect of the nucleation when the size of the silicon substrate is less than that of the Mo substrate holder. The nucleation density of the side is higher than that of the center on the substrate when the bias voltage is lower than -150 V. The nucleation density of the side decrease significantly with the bias voltage when the bias voltage is lower than -150 V. There are nearly no nuclei on the side of silicon when the bias voltage is -200 V. This effect may be contributed to the electron emission of the diamond on Mo substrate holder. The concentration of the methane has little effect on the nucleation density at a fixed bias voltage. Increasing the methane concentration is useful for decreasing the nucleation time.

MPCVD  /  nucleation density  /  diamond film  /  brim effect
王传新, 汪建华, 马志斌, 满卫东, 王升高, 康志成. 金刚石薄膜负偏压形核的边缘效应. 高压物理学报, 2003 , 17 (2) : 145 -149 .
Chuan-Xin WANG, Jian-Hua WANG, Zhi-Bin MA, Wei-Dong MAN, Sheng-Gao WANG, Zhi-Cheng KANG. Brim Effect of Negative Bias-Enhanced Nucleation of Diamond Film on Silicon Substrate[J]. Chinese Journal of High Pressure Physics, 2003 , 17 (2) : 145 -149 .
Year 2003 volume 17 Issue 2
33
7
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Article Info
  • Receive Date:2002-09-10
  • Online Date:2026-10-31
  • Published:2003-06-05
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History
  • Received:2002-09-10
  • Revised:2002-11-26
Affiliations
    1.Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031, China
    2.Department of Material Science and Engineering, Wuhan Institute of Chemical Technology, Wuhan 430073, China
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表12种不同金属材料的力学参数
科
Family
属数
Number of
genus
种数
Number of
species
占总种数比例
Percentage of
total species (%)
属
Genus
种数
Number of
species
占总种数比例
Percentage of total
species (%)
鹅膏菌科Amanitaceae 2 11 5.26 鹅膏菌属 Amanita 10 4.78
小菇科 Mycenaceae 2 12 5.74 丝盖伞属 Inocybe 5 2.39
多孔菌科 Polyporaceae 8 14 6.70 蜡蘑属 Laccaria 5 2.39
红菇科 Russulaceae 3 23 11.00 小皮伞属 Marasmius 6 2.87
小菇属 Mycena 11 5.26
光柄菇属 Pluteus 5 2.39
红菇属 Russula 17 8.13
栓菌属 Trametes 5 2.39
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