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Preparation, Microstructure and Mechanical Properties of Hydrogenated Tetrahedral Amorphous Carbon Films
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Shipeng XU1, 2, Faqi ZHAN1, Yuehong ZHENG1, Weiqian CHEN1, 2, Peiqing LA1
Journal of the Chinese Ceramic Society | 2022, 50(10) : 2651 - 2656
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Journal of the Chinese Ceramic Society | 2022, 50(10): 2651-2656
• Research Articles •
Preparation, Microstructure and Mechanical Properties of Hydrogenated Tetrahedral Amorphous Carbon Films
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Shipeng XU1, 2, Faqi ZHAN1, Yuehong ZHENG1, Weiqian CHEN1, 2, Peiqing LA1
Affiliations
  • 1.State Key Laboratory of Advanced Processing and Recycling of Nonferrous Metals, Lanzhou University of Technology, Lanzhou 730050, China
  • 2.Key Laboratory of Solar Power System Engineering, Gansu Province, Jiuquan Vocational and Technical College, Jiuquan 735000, Gansu, China

    • XU Shipeng (1987-), male, Doctoral candidate, Associate Professor. E-mail:

About Author:

XU Shipeng (1987-), male, Doctoral candidate, Associate Professor. E-mail:

Published: 2022-10-20 doi: 10.14062/j.issn.0454-5648.20220173
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Preparation of hydrogenated tetrahedral amorphous carbon (ta-C:H) films with good mechanical properties by plasma-enhanced chemical vapor deposition (PECVD) is expected to meet requirement in industrial application. This paper reported the microstructure and mechanical properties of (ta-C:H) films prepared by a self-designed PECVD technique. As the bias voltage varies from -200 V to -500 V, the hardness and elastic modulus first decrease and then increase, reaching the maximum values of 34.0 GPa and 282.0 GPa respectively. The evolution of compressive stress with bias voltage shows a similar trend. In this case, the hardness and elastic modulus of films prepared by the self-designed PECVD technique both are improved, compared with those by the conventional PECVD methods. The mole fraction of sp3 hybridized bond is greater than 62.3% when the bias voltage changes from -200 V to -500 V. Carbon films were deposited using the self-designed PECVD technique, showing the typical characteristics of ta-C:H films. This can be attributed to the increased ion bombardment and ionization due to the incorporation of a water-cooled radio frequency double helix electrode and a plate electrode resulting in an enhanced sp3 content. This paper provides a promising technology to fabricate ta-C:H films with high hardness and elastic modulus for industrial applications.

hydrogenated tetrahedral amorphous carbon films  /  mechanical properties  /  plasma-enhanced chemical vapor deposition  /  microstructure
许世鹏, 占发琦, 郑月红, 陈维铅, 喇培清. 含氢四面体非晶碳膜的制备与结构及力学性能. 硅酸盐学报, 2022 , 50 (10) : 2651 -2656 . DOI: 10.14062/j.issn.0454-5648.20220173
Shipeng XU, Faqi ZHAN, Yuehong ZHENG, Weiqian CHEN, Peiqing LA. Preparation, Microstructure and Mechanical Properties of Hydrogenated Tetrahedral Amorphous Carbon Films[J]. Journal of the Chinese Ceramic Society, 2022 , 50 (10) : 2651 -2656 . DOI: 10.14062/j.issn.0454-5648.20220173
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Year 2022 volume 50 Issue 10
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Article Info
doi: 10.14062/j.issn.0454-5648.20220173
  • Receive Date：2022-03-13
  • Online Date：2026-10-20
  • Published：2022-10-20
Article Data
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History
  • Received：2022-03-13
  • Revised：2022-04-12
Funding
Affiliations
    1.State Key Laboratory of Advanced Processing and Recycling of Nonferrous Metals, Lanzhou University of Technology, Lanzhou 730050, China
    2.Key Laboratory of Solar Power System Engineering, Gansu Province, Jiuquan Vocational and Technical College, Jiuquan 735000, Gansu, China

Corresponding:

LA Peiqing (1971-), female, Ph.D., Professor. E-mail:
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表12种不同金属材料的力学参数
科
Family		 属数
Number of
genus		 种数
Number of
species		 占总种数比例
Percentage of
total species (%)		 属
Genus		 种数
Number of
species		 占总种数比例
Percentage of total
species (%)
鹅膏菌科Amanitaceae 2 11 5.26 鹅膏菌属 Amanita 10 4.78
小菇科 Mycenaceae 2 12 5.74 丝盖伞属 Inocybe 5 2.39
多孔菌科 Polyporaceae 8 14 6.70 蜡蘑属 Laccaria 5 2.39
红菇科 Russulaceae 3 23 11.00 小皮伞属 Marasmius 6 2.87
小菇属 Mycena 11 5.26
光柄菇属 Pluteus 5 2.39
红菇属 Russula 17 8.13
栓菌属 Trametes 5 2.39
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