Asymmetric Diffusion Metasurface-Based Lensless Monitoring and Uniform Illumination Systems for Optical Lithography
1School of Electronics and Information Technology, Sun Yat-Sen University, Guangzhou 510275, China.
2Peng Cheng Laboratory, Shenzhen 518055, China.
3Department of Electronic and Information Engineering, Harbin Institute of Technology (Shenzhen), Shenzhen 518055, China.
4National Laboratory of Solid State Microstructures, School of Physics, and Collaborative Innovation, Center of Advanced Microstructures, Nanjing University, Nanjing 210093, China.
5Key Laboratory of Photoelectronic Imaging Technology and System of Ministry of Education of China, School of Optics and Photonics, Beijing Institute of Technology, Beijing 100081, China.
6College of Integrated Circuits, ZJ U-Hangzhou Global Scientific and Technological Innovation Center, Zhejiang University, Hangzhou 310027, China.
7Shanghai Institute for Advanced Study, Zhejiang University, Shanghai, China.
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