Fast actuation with nanoprecision over a large range has been a challenge in advanced intelligent manufacturing like lithography mask aligner. Traditional stacked stage method works effectively only in a local, limited range, and vibration coupling is also challenging. Here, we design a dual mechanism multimodal linear actuator (DMMLA) consisted of piezoelectric and electromagnetic costator and coslider for producing macro-, micro-, and nanomotion, respectively. A DMMLA prototype is fabricated, and each working mode is validated separately, confirming its fast motion (0~50 mm/s) in macromotion mode, micromotion (0~135 μm/s) and nanomotion (minimum step: 0~2 nm) in piezoelectric step and servomotion modes. The proposed dual mechanism design and multimodal motion method pave the way for next generation high-precision actuator development.
| (1) | Initial state: both stacks and and stacks and are at initial state without strain because of zero electric potential (; ) |
| (2) | Both stacks and B are at an elongated state in direction, while stacks and are in a reverse shear state in direction because of the high electric potential (; , ) |
| (3) | The stack keeps its elongated state to hold the coslider, while the stack is at its shorten state to be off the coslider by applying a small negative potential |
| (4) | The stacks and produce opposite shear displacement in direction; however, the stack keeps touching the coslider while the stack is off; therefore, the slide is driven to move one step in direction |
| (5) | The stack elongates to touch with the coslider, while the stacks and keep in a reverse shear state |
| (6) | The stack shortens to be off the coslider, while the stack keeps touching with the coslider |
| (7) | The stacks and produce opposite shear displacement in direction; however, stack keeps touching the coslider while the stack is off; therefore, the slide is again driven to move one more step in direction. |
| (1) | Local step servomotion: two stacks and synchronistically drive the coslider moving in nanostep in a given range but with a double output force |
| (2) | Continual step servomotion: two stacks and alternately drive the coslider moving in nanostep in a whole traveling range but with a half load ability |
| (3) | Local linear servomotion: two stacks and synchronistically drive the coslider moving linearly in a given range but with a double output force |
| (4) | Continual linear servomotion: two stacks and alternately drive the coslider moving linearly in a whole traveling range but with a half load ability |
| 科 Family | 属数 Number of genus | 种数 Number of species | 占总种数比例 Percentage of total species (%) | 属 Genus | 种数 Number of species | 占总种数比例 Percentage of total species (%) |
|---|---|---|---|---|---|---|
| 鹅膏菌科Amanitaceae | 2 | 11 | 5.26 | 鹅膏菌属 Amanita | 10 | 4.78 |
| 小菇科 Mycenaceae | 2 | 12 | 5.74 | 丝盖伞属 Inocybe | 5 | 2.39 |
| 多孔菌科 Polyporaceae | 8 | 14 | 6.70 | 蜡蘑属 Laccaria | 5 | 2.39 |
| 红菇科 Russulaceae | 3 | 23 | 11.00 | 小皮伞属 Marasmius | 6 | 2.87 |
| 小菇属 Mycena | 11 | 5.26 | ||||
| 光柄菇属 Pluteus | 5 | 2.39 | ||||
| 红菇属 Russula | 17 | 8.13 | ||||
| 栓菌属 Trametes | 5 | 2.39 |