Wearable electronics serve as critical tools for human health monitoring and equipment operation assessment. A fundamental prerequisite for their stable performance is the ability to attach flexibly and reliably to the surfaces of human bodies or equipment. However, existing adhesion methods for wearable devices face substantial challenges in simultaneously achieving high-strength reversible bonding and environmental adaptability across diverse conditions, hindering the practical applications in complex and variable environments. Here, inspired by the excellent adhesion behaviors of geckos and octopuses, we designed a dual bioinspired adhesive microstructure consisting of an annular stalk, a microdome, and an annular tip. The large-area precise formation of this complex 3-dimensional microstructure is achieved via simple imprinting and photolithography. The fabricated adhesive demonstrated reversible and superior normal adhesion in complex environments including vacuum (120 kPa), dry (201 kPa), moist (173 kPa), and underwater (165 kPa). In situ observations of the contact splitting reveal that its extraordinary performance derives from the unique crack reentry phenomenon across various environments, which effectively inhibits crack propagation and improves the adhesion forces. Simulations further clarify the causes of crack nucleation and the underlying adhesion mechanisms. Demonstrations of the adhesive in skin-attachable electronics across multiple environments highlight its potential for applications in wearable electronics operating under diverse and complex conditions, promoting rapid development of wearable flexible electronics.
| 1. | Photoresist imprinting. The photoresist was uniformly spin coated (500 rpm for 9 s and 700 rpm for 40 s) on a Cr-plated glass substrate with a 10-nm-thick Cr layer. The uncured photoresist was imprinted using a uniform rolling press with a flexible template, i.e., the hexagonal arrangement annular-hole patch based on polydimethylsiloxane (PDMS) with a height of 30 μm and inner and outer diameters of 30 and 50 μm, respectively [Fig. 1D(i)]. Here, PDMS was selected as the template material due to its flexibility, chemical stability, low surface energy, and good air permeability. These properties enable high-fidelity replication of microstructures without reacting with the photoresist, facilitate easy demolding, and allow solvent evaporation during thermal curing without swelling. The photoresist quickly fills the interconnected channels between the microholes when pressing down the template, while, at the same time, the photoresist is trapped and partly fills the blind microholes, forming dome-like shapes by wrapping the air remaining in the holes (Fig. S6). Since the initial photoresist layer obtained via spin coating has a uniform thickness and the mechanical pressure applied during imprinting is both uniform and constant, the amount of photoresist trapped in the blind microholes is highly reproducible. Consequently, the volume of trapped air remains consistent, ensuring uniform dome morphology. Throughout the entire imprinting process, a critical aspect is ensuring that the substrate surface is smooth and that the process is free from dust contamination. A rough substrate directly leads to nonuniform imprinted structures, while dust contamination may cause local structural defects. Both factors affect the microdome morphology. To evaluate the morphological uniformity of the microdomes fabricated by our technique, we prepared 3 batches of samples and randomly selected microdomes to measure their characteristic dimensions. The results showed that the average radius was 8.99 μm (standard deviation, 0.13 μm), and the average height was 11.73 μm (standard deviation, 0.19 μm). Figure S8 presents cross-sectional scanning electron microscopy (SEM) images of the 3 batches, revealing uniform microdome dimensions across all batches. These results demonstrate that the microdomes fabricated by our process exhibit excellent morphological uniformity and good batch-to-batch consistency, providing a structural foundation for stable adhesion performance. |
| 2. | Fixation of the imprinted geometric morphology. The sample was placed in an oven at 95 °C for 100 min [Fig. 1D(ii)]; the photoresist was solidified and tightly bonded to the glass substrate as a consequence of the volatilization of the organic solvent under heating. |
| 3. | Lithography to generate the latent image of the thin-plate tip [Fig. 1D(iii)]. After removing the flexible template, a structured photoresist pattern was obtained. On this basis, we performed a full-area maskless exposure from the backside of the sample to expose the bottom layer of the photoresist, with the thickness of the exposed layer determined by the exposure time. |
| 4. | Development of the latent image of the thin-plate tip [Fig. 1D(iv)]. The sample was fully immersed in the developer and subjected to vacuum treatment to fill the annular holes with the developer, allowing the developer to reach the exposed bottom photoresist layer through the annular holes. The developer gradually dissolved the exposed photoresist from both sides of the circular openings. Due to the isotropic nature of the photoresist development process, an inner and outer annular brim-like pattern was eventually formed, with the size of the brims controllable by the development time. |
| 5. | Molding [Fig. 1D(v)]. The PDMS base and curing agent were mixed at a 10:1 weight ratio and homogenized for 5 min under stirring to ensure uniform dispersion. The PDMS prepolymer was subsequently poured into the photoresist reverse mold of the Geckus structure and cured at 100 °C for 12 h to achieve full cross-linking. Since the photoresist is soluble in acetone, the reverse photoresist mold with the cured Geckus patch was immersed in acetone under ultrasonic agitation for 20 min. After the photoresist template was totally soluble and removed, the Geckus adhesive was completely demolded without constraints of the template. This method can ensure the damage-free demolding of this complex 3D structure. |
| 科 Family | 属数 Number of genus | 种数 Number of species | 占总种数比例 Percentage of total species (%) | 属 Genus | 种数 Number of species | 占总种数比例 Percentage of total species (%) |
|---|---|---|---|---|---|---|
| 鹅膏菌科Amanitaceae | 2 | 11 | 5.26 | 鹅膏菌属 Amanita | 10 | 4.78 |
| 小菇科 Mycenaceae | 2 | 12 | 5.74 | 丝盖伞属 Inocybe | 5 | 2.39 |
| 多孔菌科 Polyporaceae | 8 | 14 | 6.70 | 蜡蘑属 Laccaria | 5 | 2.39 |
| 红菇科 Russulaceae | 3 | 23 | 11.00 | 小皮伞属 Marasmius | 6 | 2.87 |
| 小菇属 Mycena | 11 | 5.26 | ||||
| 光柄菇属 Pluteus | 5 | 2.39 | ||||
| 红菇属 Russula | 17 | 8.13 | ||||
| 栓菌属 Trametes | 5 | 2.39 |