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Metallization and sealing technology of quartz vacuum window film
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Qing Tang1, Luwei Liu1, 3, Wei Li1, Qiang Yu1, Wentong Sun1, Kai Wang2
High Power Laser and Particle Beams | 2026, 38(4) : 041003-1 - 041003-6
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High Power Laser and Particle Beams | 2026, 38(4): 041003-1-041003-6
High Power Laser Physics and Technology
Metallization and sealing technology of quartz vacuum window film
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Qing Tang1, Luwei Liu1, 3, Wei Li1, Qiang Yu1, Wentong Sun1, Kai Wang2
Affiliations
  • 1School of Integrated Circuits, Anhui Polytechnic University, Wuhu 241000, China
  • 2Key Laboratory of Electronic Restriction Technology, School of Electronic Warfare, National University of Defense Technology, Hefei 230037, China
  • 3School of Electronic Science and Engineering, University of Electronic Science and Technology of China, Chengdu 611731, China
Published: 2026-04-15 doi: 10.11884/HPLPB202638.250270
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Background

Although quartz exhibits excellent light transmittance, the significant difference in thermal expansion coefficients between quartz and metal sealing materials has long been a critical technical bottleneck, leading to interface stress concentration and vacuum sealing failures in low-leakage quartz windows.

Purpose

This study addresses the urgent demand for ultra-high vacuum precision optical systems by conducting systematic research on sealing technologies for high-performance quartz vacuum windows.

Methods

To overcome this challenge, this paper innovatively proposes using magnetron sputtering technology to sequentially deposit a Ti/Mo/Cu/Ag multilayer film system on the quartz welding surface, thereby creating a gradient functional metallization layer with thermal stress buffering capability that achieves effective surface metallization.

Results

Scanning electron microscopy observations revealed continuous, dense, and structurally uniform film layers. Nanoindentation experiments further demonstrated a bonding strength of approximately 3.83 N between the metallized layer and quartz substrate, indicating robust adhesion. Experimental results show that vacuum window components fabricated using this metallization scheme achieve leakage rates below 1012 Pa·L/s.

Conclusions

This achievement has broad applications in synchrotron radiation, quantum measurement, and space exploration, providing crucial technical support for the development of high-performance vacuum devices.

quartz glass  /  vacuum brazing  /  magnetron sputtering  /  vacuum window  /  optoelectronic devices
Qing Tang, Luwei Liu, Wei Li, Qiang Yu, Wentong Sun, Kai Wang. Metallization and sealing technology of quartz vacuum window film[J]. High Power Laser and Particle Beams, 2026 , 38 (4) : 041003-1 -041003-6 . DOI: 10.11884/HPLPB202638.250270
Year 2026 volume 38 Issue 4
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Article Info
doi: 10.11884/HPLPB202638.250270
  • Receive Date:2025-08-26
  • Online Date:2026-05-27
  • Published:2026-04-15
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History
  • Received:2025-08-26
  • Revised:2026-01-04
  • Accepted:2026-01-04
Affiliations
    1School of Integrated Circuits, Anhui Polytechnic University, Wuhu 241000, China
    2Key Laboratory of Electronic Restriction Technology, School of Electronic Warfare, National University of Defense Technology, Hefei 230037, China
    3School of Electronic Science and Engineering, University of Electronic Science and Technology of China, Chengdu 611731, China
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表12种不同金属材料的力学参数

Family
属数
Number of
genus
种数
Number of
species
占总种数比例
Percentage of
total species (%)

Genus
种数
Number of
species
占总种数比例
Percentage of total
species (%)
鹅膏菌科Amanitaceae 2 11 5.26 鹅膏菌属 Amanita 10 4.78
小菇科 Mycenaceae 2 12 5.74 丝盖伞属 Inocybe 5 2.39
多孔菌科 Polyporaceae 8 14 6.70 蜡蘑属 Laccaria 5 2.39
红菇科 Russulaceae 3 23 11.00 小皮伞属 Marasmius 6 2.87
小菇属 Mycena 11 5.26
光柄菇属 Pluteus 5 2.39
红菇属 Russula 17 8.13
栓菌属 Trametes 5 2.39
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