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Technical analysis of photosensitive polyimide patents applied in China
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Fei YANG1, Yan GUO1, Weikang YUAN1, Jianfeng XU1, Ying HUANG1, Kai ZHAO1, Lei ZHAI2, Lin FAN2
Insulating Materials | 2024, 57(10) : 98 - 105
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Insulating Materials | 2024, 57(10): 98-105
• Special Issue on High Performance Polyimide Materials •
Technical analysis of photosensitive polyimide patents applied in China
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Fei YANG1, Yan GUO1, Weikang YUAN1, Jianfeng XU1, Ying HUANG1, Kai ZHAO1, Lei ZHAI2, Lin FAN2
Affiliations
  • 1China National Intellectual Property Administration, Beijing 100081, China
  • 2Institute of Chemistry, Chinese Academy of Sciences, Beijing 100190, China
Published: 2024-10-20 doi: 10.16790/j.cnki.1009-9239.im.2024.10.013
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Photosensitive polyimide (PSPI) is a kind of high-performance polyimide with special structures, which is widely used in semiconductor packaging, integrated circuits, optical display, and other fields due to its excellent heat resistance, mechanical properties, insulating properties, and lithographic processability. In this paper, the PSPI patents applied in China were taken as object, the overall situation of these patents, including changes in the number of patent applications, applicants, and their source countries was analyzed systematically. Especially, the patent applicants inside and outside China and the patent subject distribution since 2011 were discussed. The difference of patent technology and protection priorities of enterprise applicants inside and outside China was compared in detail. The patent technology characteristics and development trends of PSPI were explored.

photosensitive polyimide  /  patent  /  foreign applicant  /  technical topics  /  development trend
Fei YANG, Yan GUO, Weikang YUAN, Jianfeng XU, Ying HUANG, Kai ZHAO, Lei ZHAI, Lin FAN. Technical analysis of photosensitive polyimide patents applied in China[J]. Insulating Materials, 2024 , 57 (10) : 98 -105 . DOI: 10.16790/j.cnki.1009-9239.im.2024.10.013
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Year 2024 volume 57 Issue 10
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Article Info
doi: 10.16790/j.cnki.1009-9239.im.2024.10.013
  • Receive Date：2024-05-28
  • Online Date：2025-12-24
  • Published：2024-10-20
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  • Received：2024-05-28
  • Revised：2024-07-10
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    1China National Intellectual Property Administration, Beijing 100081, China
    2Institute of Chemistry, Chinese Academy of Sciences, Beijing 100190, China
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https://castjournals.cast.org.cn/joweb/jycl/EN/10.16790/j.cnki.1009-9239.im.2024.10.013
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光柄菇属 Pluteus 5 2.39
红菇属 Russula 17 8.13
栓菌属 Trametes 5 2.39
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