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Since hafnium-oxide-based ferroelectric tunnel junctions are compatible with the standard CMOS process，they have great application potential in the field of random access memory. The tunneling electroresistance effect in TiN/HZO/Pt ferroelectric tunnel junctions was rigorously analyzed using the Airy function. The theoretical results indicate that: when the bias voltage is high，the tunneling conductance and Tunneling Electroresistance Ratio（TER）will oscillate with both the bias voltage and the thickness of tunneling layer. Physically，the oscillations originate from the interference between the incident and reflected electron waves in the tunneling layer. The theoretical analysis indicates the physical mechanism underlying the experiments in hafnium oxide-based ferroelectric tunnel junctions. In addition，when the bias voltage is applied to the Pt electrode，there exists negative TER. This phenomenon indicates that the tunneling conductance is not only related to the average height of the barrier，but also associated with the potential structure of the tunneling layer. The present work provides a theoretical method for calculating the tunneling electroresistance effect in hafnium oxide-based ferroelectric tunnel junctions，and lays a theoretical foundation for the applications of hafnium oxide-based ferroelectric tunnel junctions in the field of random access memory.
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| 科 Family | 属数 Number of genus | 种数 Number of species | 占总种数比例 Percentage of total species (%) | 属 Genus | 种数 Number of species | 占总种数比例 Percentage of total species (%) |
|---|---|---|---|---|---|---|
| 鹅膏菌科Amanitaceae | 2 | 11 | 5.26 | 鹅膏菌属 Amanita | 10 | 4.78 |
| 小菇科 Mycenaceae | 2 | 12 | 5.74 | 丝盖伞属 Inocybe | 5 | 2.39 |
| 多孔菌科 Polyporaceae | 8 | 14 | 6.70 | 蜡蘑属 Laccaria | 5 | 2.39 |
| 红菇科 Russulaceae | 3 | 23 | 11.00 | 小皮伞属 Marasmius | 6 | 2.87 |
| 小菇属 Mycena | 11 | 5.26 | ||||
| 光柄菇属 Pluteus | 5 | 2.39 | ||||
| 红菇属 Russula | 17 | 8.13 | ||||
| 栓菌属 Trametes | 5 | 2.39 |
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