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Preparation of highly preferred (110) optical-grade diamond films under CO2 atmosphere
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Ao YANG, Yuchen LIU, Zhijian GUO, Liangxian CHEN, Jinlong LIU, Junjun WEI, Chengming LI
Journal of Materials Engineering | 2026, 54(2) : 285 - 293
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Journal of Materials Engineering | 2026, 54(2): 285-293
• RESEARCH ARTICLE •
Preparation of highly preferred (110) optical-grade diamond films under CO2 atmosphere
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Ao YANG, Yuchen LIU, Zhijian GUO, Liangxian CHEN, Jinlong LIU, Junjun WEI, Chengming LI
Affiliations
  • Institute for Advanced Materials and Technology,University of Science and Technology Beijing,Beijing 100083,China
Published: 2026-02-20 doi: 10.11868/j.issn.1001-4381.2025.000133
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Diamond films prepared by conventional microwave plasma chemical vapor deposition (MPCVD) often face issues such as low growth rates,disordered grain orientations,and non-diamond phase defects,which limit further enhancement of their optical properties. This study introduces CO₂ as an auxiliary gas to deposit high-quality diamond films using the MPCVD method. Diamond film deposition is conducted by introducing different flow rates of CO₂, and the optical emission characteristics of the plasma under varying CO₂ flow rates are measured using optical emission spectroscopy (OES). The crystallinity quality, grain orientation, surface morphology, and growth rate of the diamond films are characterized by XRD, Raman, and SEM. The results indicate that adding a certain amount of CO₂ (flow ratio of CO₂/CH₄=2/6) is conducive to obtaining diamond films with a high (110) preferred orientation (I₂₂₀/I₁₁₁=18.19). An excessively high CO₂/CH₄ flow ratio intensifies the etching effect of oxygen-containing groups, reducing the degree of preferential grain orientation. The addition of an appropriate amount of CO₂ significantly improves the crystalline quality of the diamond, with the full width at half maximum (FWHM) of the diamond characteristic peak decreasing from 12.68 cm-1 to 8.26 cm-1. Furthermore, the addition of a suitable amount of CO₂ promotes diamond growth to some extent. Under the optimized flow ratio condition of CO₂/CH₄=2/6, this study successfully prepares a high (110) orientation (I₂₂₀/I₁₁₁=18.19) diamond film with a growth rate of 4 μm/h. After polishing, the self-standing diamond film achieves a transmittance of 71% at the 10.6 μm wavelength. Its transmittance in the long-wave infrared band approaches the theoretical value, meeting the requirements for applications such as long-wave infrared optical windows and extreme ultraviolet lithography machine windows.

diamond  /  MPCVD  /  (110) preferred orientation  /  CO2 auxiliary
杨鏊, 刘宇晨, 郭之健, 陈良贤, 刘金龙, 魏俊俊, 李成明. CO2气氛下高择优取向(110)光学级金刚石膜的制备. 材料工程, 2026 , 54 (2) : 285 -293 . DOI: 10.11868/j.issn.1001-4381.2025.000133
Ao YANG, Yuchen LIU, Zhijian GUO, Liangxian CHEN, Jinlong LIU, Junjun WEI, Chengming LI. Preparation of highly preferred (110) optical-grade diamond films under CO2 atmosphere[J]. Journal of Materials Engineering, 2026 , 54 (2) : 285 -293 . DOI: 10.11868/j.issn.1001-4381.2025.000133
Year 2026 volume 54 Issue 2
71
34
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Article Info
doi: 10.11868/j.issn.1001-4381.2025.000133
  • Receive Date:2025-03-12
  • Online Date:2026-10-27
  • Published:2026-02-20
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  • Received:2025-03-12
  • Accepted:2025-04-16
Affiliations
    Institute for Advanced Materials and Technology,University of Science and Technology Beijing,Beijing 100083,China
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表12种不同金属材料的力学参数
科
Family
属数
Number of
genus
种数
Number of
species
占总种数比例
Percentage of
total species (%)
属
Genus
种数
Number of
species
占总种数比例
Percentage of total
species (%)
鹅膏菌科Amanitaceae 2 11 5.26 鹅膏菌属 Amanita 10 4.78
小菇科 Mycenaceae 2 12 5.74 丝盖伞属 Inocybe 5 2.39
多孔菌科 Polyporaceae 8 14 6.70 蜡蘑属 Laccaria 5 2.39
红菇科 Russulaceae 3 23 11.00 小皮伞属 Marasmius 6 2.87
小菇属 Mycena 11 5.26
光柄菇属 Pluteus 5 2.39
红菇属 Russula 17 8.13
栓菌属 Trametes 5 2.39
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