One-step constructing advanced N-doped carbon@metal nitride as ultra-stable electrocatalysts via urea plasma under room temperature
a Institute of Fundamental and Frontier Science, University of Electronic Science and Technology of China, Chengdu 611731, China
b Department of Materials Science and Engineering, Zhejiang University, Hangzhou 310027, China
c College of Materials Science & Engineering, Zhejiang University of Technology, Hangzhou 310014, China
d School of Chemistry and Materials Engineering, Changshu Institute of Technology, Changshu 215500, China
e State Key Laboratory of Electronic Thin Film and Integrated Devices, University of Electronic Science and Technology of China, Chengdu 611731, China
f Department of Engineering Technology, Huzhou College, Huzhou 313000, China
g Key Laboratory of Engineering Dielectric and Applications (Ministry of Education), School of Electrical and Electronic Engineering, Harbin University of Science and Technology, Harbin 150080, China
h State Key Laboratory of Photocatalysis on Energy and Environment, Fuzhou University, Fuzhou 350116, China
i State Key Laboratory of New Textile Materials and Advanced Processing Technologies, Wuhan Textile University, Wuhan 430200, China
收起