Fig. 3 shows the morphologies of Si/C/Si/C-500 and Si/C/Si/C-800 samples. SEM and TEM images demonstrate that two samples have a hollow spherical structure. However, the microstructure of shell layers changes after annealing at different temperature. As observed in
Fig. 3a, the Si/C/Si/C-800 exhibits a spherical shape with a smooth surface and without massive or agglomerated Si nanoparticles observed. TEM images (
Fig. 3b) show the detailed microstructure of the Si/C/Si/C-800. The shell layer becomes more compact. Inset image in
Fig. 3b exhibits that homogeneous element with same light intensity are concentrated in the shell. The linear distributions can reflect the content change of different elements, so it can be used as an indicator of structure. Fig. S4 (Supporting information) exhibits the corresponding linear distributions of Si/C/Si/C-800 sample along with the hollow shell. It can be seen that the intensity of Si element (green line) only has one peak when the line scanning gets through the hollow shell. Besides, the intensity of carbon has no obvious change. These results reveal that the Si/C/Si/C sandwiched structure disappears. This is due to the reduction of defects (including pores and amorphous regions) after high-temperature annealing [
31]. It is also confirmed by the ordered lattice fringe in the high-resolution transmission electron microscopy (HRTEM) image (
Fig. 3c) and the selected area electron diffraction (SAED) result (inset image in
Fig. 3c) [
24]. The interplanar distances are measured to be 0.31 nm, which corresponds to the (111) crystal planes of the cubic Si [
32]. In comparison, the Si/C/Si/C-500 samples also have a typical spherical morphology (
Fig. 3d), but the outer surface becomes much rougher which is comprised of large amount of tiny Si nanoparticles (Fig. S5 in Supporting information). Significantly, TEM images in
Fig. 3e show the microstructure of Si/C/Si/C-500. Inset image in
Fig. 3e exhibits the clear Si-C interface with Si/C/Si/C multi shells. The thin Si shell can shorten the diffusion path of Li
+ during lithiation. Moreover, double carbon shell encapsulates Si nanoparticles and provides sufficient physical contact points, which can largely enhance the conductivity of the composites. The ambiguous lattice fringes of shell in the HRTEM image (
Fig. 3f) indicate the appearance of a-Si. SAED (the inset of
Fig. 3f) of Si/C/Si/C-500 is circular rings, also indicating the polycrystalline nature [
33]. The porous, amorphous regions can effectively buffer the volume variation during lithiation/delithiation, inhibiting the material pulverization and enhancing the structure stability. To confirm the constituents of the shell, the element mapping and the linear distribution are also conducted along the hollow shell (
Fig. 3g). The element mapping (
Figs. 3g1 and
g2) confirms the existence of Si (
Fig. 3g1) and carbon (
Fig. 3g2). The corresponding linear distribution (
Fig. 3h) reflects the content change of silicon and carbon. The intensity of Si appears two peaks along the scanning line. It is worth noting that the intensity of carbon slightly increases between two peaks of Si. Both sides of shell, the signal intensity of carbon has no significant change. It indicates the outer carbon layer is a uniform coating. In brief, the above results demonstrate the matryoshka-type hollow structure of Si/C/Si/C-500, in which pores and amorphous phases are preserved in silicon layers. The formation of different Si structures is typically driven by chemical potential differences associated with curvature effects on the particle interfacial energies [
34]. At elevated temperature, the thermally activated processes (
e.g., crystallite rotation and alignment) become dominant. The rearrangement of atom contributes to the transformation from amorphous to crystalline Si. And pores tend to coalesce and disappear. However, at low temperature, the threshold for crystallite intergrowth or diffusional mass transport is severely limited.