X-ray diffraction (XRD) was used to investigate the crystalline information of PrGOFs/Si, TrGOFs/Si, and GOFs/Si samples.
Fig. 4a shows the detected peaks at 28.4°, 47.3°, and 56.1°, which correspond to the crystal planes of Si (111), (220), and (311) (JCPDS No. 77–2108), respectively. This indicates the successful incorporation of SiNPs into PrGOFs/Si, TrGOFs/Si, and GOF/Si samples. After both thermal reduction and plasma-enhanced reduction treatment, the reflection peak at 10.9°, attributed to GO (JCPDS No. 82–2261), vanished and is replaced by a new diffraction peak at about 24°−26° (which can be ascribed to the graphene (002) crystal plane), indicating that GO had been successfully reduced. Compared with the TrGOFs/Si, the graphene peak of the PrGOFs/Si shifts from 26° to 24°, meaning the interlayer distance of graphene increases after plasma treatment [
23]. The nitrogen adsorption isotherms of both samples exhibit a typical Type IV curve (Figs. S6a and b in Supporting information), with a sharp capillary condensation step occurring at a relative pressure (
P/
P0) of 0.4 to 0.6, indicating the presence of a mesoporous structure. As illustrated in Figs. S6c and d (Supporting information), the pore size distribution of both PrGOFs/Si and TrGOFs/Si samples is similar, about 3.4 nm. But the specific surface area of PrGOFs/Si is about 152.4 m
2/g, higher than the TrGOFs/Si sample (107.4 m
2/g), attributed to the rapid reduction process by plasma treatment, which can cause rapid escape of small molecules within the graphene oxide, thereby generating a richer porous structure. FTIR spectra of PrGOFs/Si, TrGOFs/Si and GOFs/Si are shown in
Fig. 4b. The characteristic peaks at about 3223, 1725, 1617, 1368, 1224, and 1048 cm
−1 in GOFs/Si are attributed to O—H stretching, C=O stretching, aromatic C=C stretching, O—H deformation, epoxy C—O stretching, and alkoxy C—O stretching vibrations, respectively [
40]. Generally speaking, these oxygen-containing functional groups should include -COOH and C=O located at the sheet edge, -OH and epoxy C—O on the basal planes of the GO sheets, which can seriously affect the electrochemical performance of the electrode by reacting with the electrolyte and resulting in irreversible lithiation and de-lithiation processes [
42]. Although both plasma-enhanced and thermal reduction methods can remove oxygen-containing functional groups, the plasma-enhanced method is more thorough. Moreover, the existing C=C peak at about 1617 cm
−1 in the spectra of PrGOFs/Si and TrGOFs/Si samples suggested that the sp
2 structure of carbon atoms remained.
Fig. 4c depicts the Raman spectroscopy of PrGOFs/Si, TrGOFs/Si and GOFs/Si. The characteristic peak of Si at 510 cm
−1 is observed, which is consistent with the XRD results and indicates successful Si recombination. Additionally, the D and G bands provide significant information about the geometrical structure. Compared to GOFs/Si and TrGOFs/Si, a higher
ID/
IG ratio and intensified G band in PrGOFs/Si suggest that plasma-enhanced reduction effectively increases carbonaceous material graphitization (the
ID/
IG ratio of PrGOFs/Si, TrGOFs/Si and GOFs/Si is listed in Table S4 in Supporting information). XPS is generally adopted to survey the chemical compositional vibration of samples in detail. The high-resolution C 1s XPS spectra of PrGOFs/Si, TrGOFs/Si, and GOFs/Si samples are shown in
Figs. 4d-
f. The spectrum of the GOFs/Si sample presented five deconvolution peaks, corresponding to the C=C (284.0 eV), C—C (284.8 eV) in aromatic rings, epoxy C (C—O, 286.0 eV), carbonyl C (C=O, 288.0 eV), and carboxyl C (COOH, 290.0 eV), respectively [
40]. For the PrGOFs/Si and TrGOFs/Si samples, the intensity of peaks assigned to oxygen-containing functional groups decreased significantly after reduction, indicating a considerable deoxygenation of GO. In XPS investigation, the change of C/O atomic ratio of rGO suggests the reduction degree, and the C=C ratio is usually related to the conductivity of the materials. As indicated in Table S2 (Supporting information), the C/O atomic ratio of these samples increased from 2.55 to 7.55 and 7.73, respectively, while the C=C ratio increased from 9.59% to 61.16% and 71.12% after thermal reduction and plasma-enhanced reduction, respectively. The significant increased C/O atomic ratio and the proportion of C=C bonds signified an effective reduction of the GO, which not only mitigated the consumption of the electrolyte but also effectively elevated the conductivity of the sample through the restoration of the sp
2 conductive network. The XPS results of GOFs samples under thermal and plasma-enhanced reduction show the same phenomenon as the PrGOFs/Si, TrGOFs/Si and GOFs/Si samples above (Fig. S7 in Supporting information). The XPS spectra of Si 2p are split into two parts (
Figs. 4g-
i): The peak at about 99.0 eV is attributed to the monatomic Si, while the other peak at about 103.0 eV is attributed to the SiO
x (
x ≤ 2), resulting from the unavoidable exposure to oxidation in the air [
24,
43]. Fig. S8 (Supporting information) depicts the FESEM image and corresponding EDS mappings of the cross-section view of PrGOFs/Si and TrGOFs/Si. The plasma-enhanced reduction is capable of more effectively reducing the oxygen content of the composite material (Fig. S8 and Table S3 in Supporting information). Additionally, to better demonstrate the enhanced electrical conductivity of the electrode material after plasma-enhanced treatment, the electrical conductivity test was conducted on the samples (Table S5 in Supporting information). The PrGOFs/Si sample shows an average electrical conductivity of 0.89 S/cm, superior to the TrGOFs/Si sample (0.20 S/cm). To achieve a more comprehensive comprehension of the mechanism underlying the plasma-induced elimination of oxygen functional groups, optical emission spectroscopy (OES) was utilized for analysis. As depicted in Fig. S9 (Supporting information), it can be observed that there are three distinct peaks of H
2 plasma, corresponding to the peak of atomic hydrogen H
α at 656.3 nm and the H
β at 486.1 nm. The enrichment peak at around 603.0 nm corresponds to an un-ionized H
2 molecule. During the process, excited reactive radicals and energetic particles diffused along the induction coil and are effectively treated on the surface of the samples. Physical bombardment and chemical reactions coexist, which promotes the removal of oxygen functional groups on GO surfaces. Specifically, the glow plasma discharge generates a variety of reactive species, with H
+, H
2 and hydrogen radicals playing a primary role in reduction.