Benefiting from good photochromic characteristics of WS-SSP, the assembly (
E)-WS-SSP/CB[7] also possessed excellent photoisomerization properties. As shown in Fig. S13 (Supporting information), when it was irradiated by 311 nm light, the absorbance maximum at 267 nm, 334 nm and 350 nm gradually declined and meanwhile, the absorption band between 360 nm and 450 nm was apparently enhanced. Encapsulation of CB[7] on (
E)-WS-SSP induced the absorbance of the guest at 267 nm, 334 nm and 350 nm to increase, as shown in
Fig. 2c. If CB[7] disassembled with the guest, only the absorbance of (
E)-WS-SSP would be decreased but the absorption band between 360 nm and 450 nm did not increase. Therefore, irradiation of the assembly at 311 nm light should lead to photoisomerization of (
E)-WS-SSP/CB[7] to its (
Z)-form and alteration of binding pattern of the assembly, as illuminated in
Scheme 1. Subsequently, irradiation of the resultant sample at 385 nm light enabled the absorption to be recovered to some extent. Importantly, the above process could be repeated for three cycles without any major recession. Although the photoisomerization speed of the assembly from (
E)-configuration to (
Z)-configuration was inferior to that of the only guest due to the influence of CB[7], reversible photoisomerization of WS-SSP/CB[7] between (
E)-form and (
Z)-form could still occur. The intervention of CB[7] affect effectually photochromic properties of the guest such as
ΦE→Z and
ΦZ→E. Photoisomerization quantum yied from (
E)-form to (
Z)-form (
ΦE→Z) of WS-SSP/CB[7] was determined to be 6.14% ± 0.07%, which was less than that of the only guest (12.38% ± 0.04%), while
ΦZ→E of the assembly (7.20% ± 0.10%) was superior to that of WS-SSP (3.46% ± 0.05%). Furthermore, photoisomerization speed of WS-SSP/CB[7] from (
E)-isomer to (
Z)-isomer was slower than that of the free guest, because photoisomerized process of (
E)-WS-SSP in the assembly need to overcome the obstacles of macrocyclic host, resulting in the assembly having a smaller quantum yield (
E→
Z) than the guest alone. The assembly pattern of (
Z)-WS-SSP and CB[7] was characterized by their
1H NMR titration and contrast (Figs. S14 and S15 in Supporting information) and indicated the moieties of quaternary ammonium salt and the benzene ring attached to it were encapsulated in the cavity of CB[7], as was illuminated in
Scheme 1. The complex stability constant (
Ks) was calculated as 8.5 × 10
4 L/mol (
KS1), 7.5 × 10
4 L/mol (
KS2) at 25 ℃ using a nonlinear least-squares curve-fitting method by analyzing the continuous changes in the absorbance of (
Z)-WS-SSP at 225 nm in the presence of varying concentrations of CB[7] (Fig. S18 in Supporting information) [
37]. As similar as its (
E)-isomer, (
Z)-WS-SSP displayed apparent fluorescence enhancement upon sequential addition of CB[7] (Fig. S19 in Supporting information). Furthermore, great differences in fluorescence intensity exist in the different isomers (Fig. S7b). These significant discoveries inspired us to investigate photo-induced fluorescence switching behaviors of the water-soluble supramolecular complex. Just as we expected, we employed 311 nm and 385 nm light as stimulating factors to conduct light experiments. As discerned in
Fig. 4a, photoluminescence intensity of (
E)-WS-SSP/CB[7] at emission maximum (440 nm) was quenched by 70% upon irradiation at 311 nm light for 120 s. Subsequent 385 nm light irradiation of the irradiated sample for 32 s achieved restoration of 59% initial fluorescence intensity (
Fig. 4b). Afterwards, three cycles were carried out at least and fluorescence photograph was alternately lighted on and off in above process (
Figs. 4c and
d), manifesting good fluorescence photoswitching repeatability. Besides, the only guest WS-SSP also possessed good fluorescence photoswitching performance (Fig. S16 in Supporting information). In consequence, the supramolecular assembly developed by us might regard as a novel photoresponsive intelligent photoluminescence material.