Recently, Prof. Wei-Min He’s group at University of South China developed the double redox-mediated intrinsic semiconductor photocatalysis (DRISP) systems [
3-
7], making an important breakthrough in semiconductor photocatalysis
Scheme 1. This strategy empolys a catalytic amount of low-cost and abundant redox reagent (iodide salt, ferrocene, tetramethylpiperidine
N-oxide,
etc.) as h
+ acceptors, and ambient air as the e
− acceptor, to prevent recombination. In the DRISP process, a heterogeneous single electron transfer (He-SET) process first occurs between the ground-state redox catalyst and h
+, yielding the oxidation-state redox catalyst. This catalyst then undergoes a homogeneous SET (Ho-SET) process with the radical precursor to generate the reactive radical (or radical ion) intermediate and re-produces the ground-state redox catalyst. The radical intermediate subsequently triggers a bond-forming reaction to produce the reaction intermediate. Simultaneously, e
− reduces ground-state O
2 (from air) to yield the higher active excited O
2˙− via a He-SET process, which promotes the conversion of reaction intermediate into the target product and the re-generation of the ground-state O
2 via a Ho-SET process. In addition, redox catalysts are useful in mitigating intrinsic semiconductor passivation caused by the formation of polymer films on the semiconductor surface. Furthermore, the kinetic inhibition which is typically associated with the electron transfer from semiconductor to the reactant, can be eliminated. Uisng this strategy, He and colleagues accomplished the sustainable synthesis of a series of high value-added chemicals, including 3-arylquinoxaline-2(1
H)-ones [
3], benzoimidazoxathiazine 5,5-dioxides [
4], imidazo[1,5-
a]quinoxalinones [
5], 5-amino-1,2,4-thiadiazoles [
6],
α-amino phosphine oxides [
7],
etc.