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Integrated circuit (IC) chips play a more and more important role in everyday life and the national economy, and the capability of manufacturing chips is a key indicator of a nation’s technology status. Due to the Wassenaar Arrangement, China cannot import the extreme ultraviolet (EUV) lithography technique, and thus ArF immersion lithography with the multi-patterning process is essential to the development of ICs, which poses higher requirements for lithographic materials used in the multi-patterning process. In this paper, we summarize the paths of the multi-patterning process and lithographic materials involved upon the review of the development of lithography technology. Moreover, we analyze the technical development of and challenges faced by advanced lithographic materials such as ArF immersion photoresists, pattern shrink materials, and trilayer materials (spin-on glass and spin-on carbon). The review and outlook of the technical evolution indicate that the passive equipment-driven development mode of lithographic materials has transformed into the coordinated development mode of material innovation and equipment processes. In particular, with limited equipment, China should take the innovation of materials as the driver to develop an IC path with Chinese characteristics.
, correspAuthors=Cindy Xin CHEN, authorNote=null, correspAuthorsNote=
†
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集成电路芯片在社会生活及国民经济的发展中起着越来越重要的作用,同时芯片制造能力成为衡量一个国家科技水平的重要因素。受瓦森纳协定限制,中国无法引进极紫外（EUV）光刻技术,因此氟化氩（ArF）浸没式光刻与多重图形技术成为集成电路技术发展的关键,这也给多重图形技术中用的光刻材料提出了更高的要求。文章在回顾光刻技术发展的基础上,总结了多重图形技术的不同路线及其涉及的光刻材料,针对ArF浸没式光刻胶、图形收缩材料及三层工艺用旋涂碳材料、旋涂硅材料等先进光刻材料的技术发展与挑战进行分析。通过对技术发展的回顾与展望可以看出,光刻材料的开发已由原先设备推动的被动模式转变为材料创新与设备工艺协同发展的模式,特别是在中国设备受限的大环境下,更需要以材料的创新为驱动力,走出有中国特色的集成电路工艺路线。
, correspAuthors=陈昕, authorNote=null, correspAuthorsNote=
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 |
李冰,现任北京科华微电子材料有限公司首席专家。主要研究方向为集成电路制造用光刻胶及配套材料。带领团队开发出Lift-off工艺用负性光刻胶、高分辨I线光刻胶、KrF光刻胶、底部抗反射涂层及光刻胶剥离液等一系列产品,成功实现了国产替代并批量应用于国内8英寸及12英寸集成电路芯片制造领域。电子信箱： libing@kempur.com。 |
 |
陈昕（Chen Cindy Xin）,现任北京科华微电子材料有限公司董事长。1992年进入美国Shipley公司开始从事248 nm光刻胶的研发工作。1993年与另外两名股东共同创建美国MCC公司,并获美国2002—2003年有贡献的专业人士奖。2004年在中国创建北京科华微电子材料有限公司,专业从事高档光刻胶的研发和生产。2006年,完成193 nm光刻胶中试开发,取得核心树脂专利。2010年承担国家科技重大专项02专项。获北京市海外高层次人才、北京市特聘专家、北京市三八红旗奖章等荣誉。电子信箱： cindy@kempur.com。 |
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李冰,现任北京科华微电子材料有限公司首席专家。主要研究方向为集成电路制造用光刻胶及配套材料。带领团队开发出Lift-off工艺用负性光刻胶、高分辨I线光刻胶、KrF光刻胶、底部抗反射涂层及光刻胶剥离液等一系列产品,成功实现了国产替代并批量应用于国内8英寸及12英寸集成电路芯片制造领域。电子信箱： libing@kempur.com。
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李冰,现任北京科华微电子材料有限公司首席专家。主要研究方向为集成电路制造用光刻胶及配套材料。带领团队开发出Lift-off工艺用负性光刻胶、高分辨I线光刻胶、KrF光刻胶、底部抗反射涂层及光刻胶剥离液等一系列产品,成功实现了国产替代并批量应用于国内8英寸及12英寸集成电路芯片制造领域。电子信箱： libing@kempur.com。
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陈昕（Chen Cindy Xin）,现任北京科华微电子材料有限公司董事长。1992年进入美国Shipley公司开始从事248 nm光刻胶的研发工作。1993年与另外两名股东共同创建美国MCC公司,并获美国2002—2003年有贡献的专业人士奖。2004年在中国创建北京科华微电子材料有限公司,专业从事高档光刻胶的研发和生产。2006年,完成193 nm光刻胶中试开发,取得核心树脂专利。2010年承担国家科技重大专项02专项。获北京市海外高层次人才、北京市特聘专家、北京市三八红旗奖章等荣誉。电子信箱： cindy@kempur.com。
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陈昕（Chen Cindy Xin）,现任北京科华微电子材料有限公司董事长。1992年进入美国Shipley公司开始从事248 nm光刻胶的研发工作。1993年与另外两名股东共同创建美国MCC公司,并获美国2002—2003年有贡献的专业人士奖。2004年在中国创建北京科华微电子材料有限公司,专业从事高档光刻胶的研发和生产。2006年,完成193 nm光刻胶中试开发,取得核心树脂专利。2010年承担国家科技重大专项02专项。获北京市海外高层次人才、北京市特聘专家、北京市三八红旗奖章等荣誉。电子信箱： cindy@kempur.com。
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光刻材料在不同技术节点的引入 BARC：Bottom Anti-Reflection Coating,底部抗反射涂层;CMP：Chemical Mechanical Polishing,化学机械抛光;TARC：Top Anti-Reflection Coating,顶部抗反射涂层;SOG：Spin on Glass,旋涂硅;SOC：Spin on Carbon,旋涂碳;NTD：Negative Tone Development,负显影。
, figureFileSmall=Qomj4Moyzr9hTRATY/TMVQ==, figureFileBig=NzwflTTKs1Z3gBIiXxYKrQ==, tableContent=null), ArticleFig(id=1241718834193822340, tenantId=1146029695717560320, journalId=1146032081894723586, articleId=1241718789486728127, language=EN, label=null, caption=null, figureFileSmall=Hek4W9waRAnNkA6wjdo45g==, figureFileBig=xekQv4Fxcp4L8gD6fRh6Eg==, tableContent=null), ArticleFig(id=1241718834260931206, tenantId=1146029695717560320, journalId=1146032081894723586, articleId=1241718789486728127, language=CN, label=图2, caption=
IRDS 2021关于线条图形的技术路线预测, figureFileSmall=Hek4W9waRAnNkA6wjdo45g==, figureFileBig=xekQv4Fxcp4L8gD6fRh6Eg==, tableContent=null), ArticleFig(id=1241718834332234376, tenantId=1146029695717560320, journalId=1146032081894723586, articleId=1241718789486728127, language=EN, label=null, caption=null, figureFileSmall=CuW5OYfsehQ/LkfwJIYftQ==, figureFileBig=lc3ME9SVeRiZEJ5c4SNm4Q==, tableContent=null), ArticleFig(id=1241718834403537546, tenantId=1146029695717560320, journalId=1146032081894723586, articleId=1241718789486728127, language=CN, label=图3, caption=
LELE工艺流程示意图, figureFileSmall=CuW5OYfsehQ/LkfwJIYftQ==, figureFileBig=lc3ME9SVeRiZEJ5c4SNm4Q==, tableContent=null), ArticleFig(id=1241718834474840716, tenantId=1146029695717560320, journalId=1146032081894723586, articleId=1241718789486728127, language=EN, label=null, caption=null, figureFileSmall=uOIM8VY8+RwT0AoQ2TTmKA==, figureFileBig=ns2s4p6z4+LEhDxeX0O/zQ==, tableContent=null), ArticleFig(id=1241718834537755278, tenantId=1146029695717560320, journalId=1146032081894723586, articleId=1241718789486728127, language=CN, label=图4, caption=
SADP工艺示意图, figureFileSmall=uOIM8VY8+RwT0AoQ2TTmKA==, figureFileBig=ns2s4p6z4+LEhDxeX0O/zQ==, tableContent=null), ArticleFig(id=1241718834600669838, tenantId=1146029695717560320, journalId=1146032081894723586, articleId=1241718789486728127, language=EN, label=null, caption=null, figureFileSmall=QIEU3vs7lTDWRHF0CnpIjg==, figureFileBig=1irUdUJCnpp7xIwTQ42SrA==, tableContent=null), ArticleFig(id=1241718834671973008, tenantId=1146029695717560320, journalId=1146032081894723586, articleId=1241718789486728127, language=CN, label=图5, caption=
第一代ArF光刻胶树脂（MAA/MMA/tBAMA）, figureFileSmall=QIEU3vs7lTDWRHF0CnpIjg==, figureFileBig=1irUdUJCnpp7xIwTQ42SrA==, tableContent=null), ArticleFig(id=1241718834726498962, tenantId=1146029695717560320, journalId=1146032081894723586, articleId=1241718789486728127, language=EN, label=null, caption=null, figureFileSmall=V9PKs6PlzOXMaNgU3Sg1Uw==, figureFileBig=U1kM/mkDSDIEZpgzOjAcuQ==, tableContent=null), ArticleFig(id=1241718834797802132, tenantId=1146029695717560320, journalId=1146032081894723586, articleId=1241718789486728127, language=CN, label=图6, caption=
第二代ArF光刻胶树脂（降冰片烯类树脂）, figureFileSmall=V9PKs6PlzOXMaNgU3Sg1Uw==, figureFileBig=U1kM/mkDSDIEZpgzOjAcuQ==, tableContent=null), ArticleFig(id=1241718834856522389, tenantId=1146029695717560320, journalId=1146032081894723586, articleId=1241718789486728127, language=EN, label=null, caption=null, figureFileSmall=UbjJK5C6WMCurOM3DpVxqg==, figureFileBig=TWvh+gwcczBr2OF6s03uSQ==, tableContent=null), ArticleFig(id=1241718834915242646, tenantId=1146029695717560320, journalId=1146032081894723586, articleId=1241718789486728127, language=CN, label=图7, caption=
第三代ArF光刻胶树脂（混合类）, figureFileSmall=UbjJK5C6WMCurOM3DpVxqg==, figureFileBig=TWvh+gwcczBr2OF6s03uSQ==, tableContent=null), ArticleFig(id=1241718835024294552, tenantId=1146029695717560320, journalId=1146032081894723586, articleId=1241718789486728127, language=EN, label=null, caption=null, figureFileSmall=khcxLqmbm2n9KGxsga4OIQ==, figureFileBig=yRz8HckVaXmUjjTkSxO7cA==, tableContent=null), ArticleFig(id=1241718835083014810, tenantId=1146029695717560320, journalId=1146032081894723586, articleId=1241718789486728127, language=CN, label=图8, caption=
ArF浸没式光刻胶中含氟添加剂结构, figureFileSmall=khcxLqmbm2n9KGxsga4OIQ==, figureFileBig=yRz8HckVaXmUjjTkSxO7cA==, tableContent=null), ArticleFig(id=1241718835137540764, tenantId=1146029695717560320, journalId=1146032081894723586, articleId=1241718789486728127, language=EN, label=null, caption=null, figureFileSmall=Ph82l1q1uLHHqP/6tZp8Pg==, figureFileBig=QK7djgY1SnGXAoHE1kgQPQ==, tableContent=null), ArticleFig(id=1241718835192066718, tenantId=1146029695717560320, journalId=1146032081894723586, articleId=1241718789486728127, language=CN, label=图9, caption=
CARL反应机理, figureFileSmall=Ph82l1q1uLHHqP/6tZp8Pg==, figureFileBig=QK7djgY1SnGXAoHE1kgQPQ==, tableContent=null), ArticleFig(id=1241718835246592672, tenantId=1146029695717560320, journalId=1146032081894723586, articleId=1241718789486728127, language=EN, label=null, caption=null, figureFileSmall=L84aag9VMZhVNYGa7zFFLQ==, figureFileBig=xryJMV2k6ah9SH6Bkt4lTA==, tableContent=null), ArticleFig(id=1241718835309507234, tenantId=1146029695717560320, journalId=1146032081894723586, articleId=1241718789486728127, language=CN, label=图10, caption=
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CTO工艺示意图, figureFileSmall=a+V088ehp1K5ym9QMkp/UA==, figureFileBig=LLw4NyFXMQa3VVr9n/1XFw==, tableContent=null), ArticleFig(id=1241718835494056616, tenantId=1146029695717560320, journalId=1146032081894723586, articleId=1241718789486728127, language=EN, label=null, caption=null, figureFileSmall=2kflYbrd+GMrv3Jqj/qzkQ==, figureFileBig=1sciFdrBJ7K57U650qz9tw==, tableContent=null), ArticleFig(id=1241718835573748394, tenantId=1146029695717560320, journalId=1146032081894723586, articleId=1241718789486728127, language=CN, label=图12, caption=
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