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This paper analyzed the main characteristics and strategic requirements of ultra-wide bandgap semiconductor materials represented by diamond, gallium oxide, aluminum nitride, etc. and systematically reviewed the main technologies and industrial developments of ultra-wide bandgap semiconductor materials in China and abroad. It proposed key technical issues that need to be overcome and development suggestions and provided references for the future development of ultra-wide bandgap semiconductor materials in China.
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文章分析了以金刚石、氧化镓、氮化铝等为代表的超宽禁带半导体材料的主要特点及战略需求,系统梳理了国内外超宽禁带半导体材料的主要技术和产业进展,提出了当前待突破的关键技术问题和发展建议,以期为后续中国超宽禁带半导体材料的发展提供参考。
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赵璐冰,副研究员。第三代半导体产业技术创新战略联盟副秘书长。主要从事第三代半导体产业技术、国家科技规划编制、新型研发机构组建、产学研协同创新、科技成果孵化转化等。电子信箱:zhaolb@china-led.net。 |
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赵璐冰,副研究员。第三代半导体产业技术创新战略联盟副秘书长。主要从事第三代半导体产业技术、国家科技规划编制、新型研发机构组建、产学研协同创新、科技成果孵化转化等。电子信箱:zhaolb@china-led.net。
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赵璐冰,副研究员。第三代半导体产业技术创新战略联盟副秘书长。主要从事第三代半导体产业技术、国家科技规划编制、新型研发机构组建、产学研协同创新、科技成果孵化转化等。电子信箱:zhaolb@china-led.net。
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3 heterojunction pn diodes with breakdown voltages over 3 kV, refAbstract=null), Reference(id=1242114163141579246, tenantId=1146029695717560320, journalId=1146032081894723586, articleId=1148708266378588857, doi=null, pmid=null, pmcid=null, year=null, volume=null, issue=null, pageStart=null, pageEnd=null, url=https://www.cisuvc.com/crystal-is-improves-100mm-substrate/, language=null, rfNumber=[10], rfOrder=12, authorNames=null, journalName=null, refType=null, unstructuredReference=Crystal IS and Asahi Kasei have achieved 99% usable area on 100 mm bulk aluminum nitride substrate[EB/OL]. (2024-06-12). https://www.cisuvc.com/crystal-is-improves-100mm-substrate/., articleTitle=Crystal IS and Asahi Kasei have achieved 99% usable area on 100 mm bulk aluminum nitride substrate, refAbstract=null)], funds=null, companyList=[AuthorCompany(id=1242114159572226508, tenantId=1146029695717560320, journalId=1146032081894723586, articleId=1148708266378588857, xref=null, ext=[AuthorCompanyExt(id=1242114159580615117, tenantId=1146029695717560320, journalId=1146032081894723586, articleId=1148708266378588857, companyId=1242114159572226508, language=EN, country=null, province=null, city=null, postcode=null, companyName=null, departmentName=null, remark=China Advanced Semiconductor Industry Innovation Alliance, Beijing 100083, China), AuthorCompanyExt(id=1242114159589003726, tenantId=1146029695717560320, journalId=1146032081894723586, articleId=1148708266378588857, companyId=1242114159572226508, language=CN, country=null, province=null, city=null, postcode=null, companyName=null, 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