Article(id=1148708266378588857, tenantId=1146029695717560320, journalId=1146032081894723586, issueId=1148708265585865399, articleNumber=null, orderNo=null, doi=10.3981/j.issn.2097-0781.2025.01.003, pmid=null, cstr=null, oa=null, hot=null, price=null, onlineType=0, articleFormat=0, articleType=null, articleTypeStr=research-article, receivedDate=1734883200000, receivedDateStr=2024-12-23, revisedDate=1739980800000, revisedDateStr=2025-02-20, acceptedDate=null, acceptedDateStr=null, onlineDate=1751802992654, onlineDateStr=2025-07-06, pubDate=1742400000000, pubDateStr=2025-03-20, doiRegisterDate=null, doiRegisterDateStr=null, onlineIssueDate=1743004800000, onlineIssueDateStr=2025-03-27, onlineJustAcceptDate=null, onlineJustAcceptDateStr=null, onlineFirstDate=null, onlineFirstDateStr=null, sourceXml=null, magXml=null, createTime=1751802992654, creator=13701087609, updateTime=1774072691023, updator=sys-migrate, issue=Issue{id=1148708265585865399, tenantId=1146029695717560320, journalId=1146032081894723586, year='2025', volume='4', issue='1', pageStart='100', pageEnd='167', issueExtLink='null', onlineDate='null', pubDate='null', beforeIssueId=null, nextIssueId=null, price=null, status=1, issueComplete=1, articleOrder=1, issueType=-1, specialIssue=1, createTime=1751802992481, creator=13701087609, updateTime=1776075019034, updator=13041195026, preIssue=null, nextIssue=null, ext={EN=IssueExt(id=1250512523708023313, tenantId=1146029695717560320, journalId=1146032081894723586, issueId=1148708265585865399, language=EN, specialIssueTitle=, coverIllustrator=, specialIssueEditor=, specialIssueAbout=), CN=IssueExt(id=1250512523708023314, tenantId=1146029695717560320, journalId=1146032081894723586, issueId=1148708265585865399, language=CN, specialIssueTitle=新材料前沿:技术创新与未来展望专刊, coverIllustrator=, specialIssueEditor=, specialIssueAbout=)}, issueFiles=null}, startPage=28, endPage=35, ext={EN=ArticleExt(id=1149664177104535725, articleId=1148708266378588857, tenantId=1146029695717560320, journalId=1146032081894723586, language=EN, title=Development Status and Prospects of Ultra-wide Bandgap Semiconductor Materials, columnId=1149656489310208610, journalTitle=Science and Technology Foresight, columnName=Review and Commentary, runingTitle=null, highlight=null, articleAbstract=

This paper analyzed the main characteristics and strategic requirements of ultra-wide bandgap semiconductor materials represented by diamond, gallium oxide, aluminum nitride, etc. and systematically reviewed the main technologies and industrial developments of ultra-wide bandgap semiconductor materials in China and abroad. It proposed key technical issues that need to be overcome and development suggestions and provided references for the future development of ultra-wide bandgap semiconductor materials in China.

, correspAuthors=null, authorNote=null, correspAuthorsNote=null, copyrightStatement=null, copyrightOwner=null, extLink=null, articleAbsUrl=null, sourceXml=null, magXml=null, pdfUrl=null, pdf=null, pdfFileSize=null, pdfExtLink=null, richHtmlUrl=null, mobilePdfUrl=null, reviewReport=null, pdfFirstPage=null, abstractGraph=null, abstractGraphContent=null, abstractVideo=null, citation=null, cebUrl=null, magXmlContent=null, mapNumber=null, authorCompany=null, fund=null, authors=null, authorsList=Lubing ZHAO, Ling WU), CN=ArticleExt(id=1148708268177945286, articleId=1148708266378588857, tenantId=1146029695717560320, journalId=1146032081894723586, language=CN, title=超宽禁带半导体材料发展现状与展望, columnId=1148708266483446458, journalTitle=前瞻科技, columnName=综述与述评, runingTitle=null, highlight=null, articleAbstract=

文章分析了以金刚石、氧化镓、氮化铝等为代表的超宽禁带半导体材料的主要特点及战略需求,系统梳理了国内外超宽禁带半导体材料的主要技术和产业进展,提出了当前待突破的关键技术问题和发展建议,以期为后续中国超宽禁带半导体材料的发展提供参考。

, correspAuthors=null, authorNote=null, correspAuthorsNote=null, copyrightStatement=null, copyrightOwner=null, extLink=null, articleAbsUrl=null, sourceXml=hpet2SEay0yGifbsfB4A3g==, magXml=Jx1M064mW/uPRJp8dZI3lg==, pdfUrl=null, pdf=gVCqt0zu/HS8ng3A+M4eIA==, pdfFileSize=986060, pdfExtLink=null, richHtmlUrl=null, mobilePdfUrl=null, reviewReport=null, pdfFirstPage=null, abstractGraph=null, abstractGraphContent=null, abstractVideo=null, citation=null, cebUrl=null, magXmlContent=pZwbM5gjyXs2YDwCucFB8w==, mapNumber=null, authorCompany=null, fund=null, authors=

赵璐冰,副研究员。第三代半导体产业技术创新战略联盟副秘书长。主要从事第三代半导体产业技术、国家科技规划编制、新型研发机构组建、产学研协同创新、科技成果孵化转化等。电子信箱:

, authorsList=赵璐冰, 吴玲)}, authors=[Author(id=1242114159651918288, tenantId=1146029695717560320, journalId=1146032081894723586, articleId=1148708266378588857, orderNo=0, firstName=null, middleName=null, lastName=null, nameCn=null, orcid=null, stid=null, country=null, authorPic=null, dead=0, email=zhaolb@china-led.net, emailSecond=null, emailThird=null, correspondingAuthor=0, authorType=1, ext={EN=AuthorExt(id=1242114159723221458, tenantId=1146029695717560320, journalId=1146032081894723586, articleId=1148708266378588857, authorId=1242114159651918288, language=EN, stringName=Lubing ZHAO, firstName=Lubing, middleName=null, lastName=ZHAO, prefix=null, suffix=null, authorComment=null, nameInitials=null, affiliation=null, department=null, xref=null, address=China Advanced Semiconductor Industry Innovation Alliance, Beijing 100083, China, bio=null, bioImg=null, bioContent=null, aboutCorrespAuthor=null), CN=AuthorExt(id=1242114159786136019, tenantId=1146029695717560320, journalId=1146032081894723586, articleId=1148708266378588857, authorId=1242114159651918288, language=CN, stringName=赵璐冰, firstName=null, middleName=null, lastName=null, prefix=null, suffix=null, authorComment=null, nameInitials=null, affiliation=null, department=null, xref=null, address=第三代半导体产业技术创新战略联盟,北京 100083, bio={"img":"lp9bwu5Hy0ZORekuFEmWiQ==","content":"

赵璐冰,副研究员。第三代半导体产业技术创新战略联盟副秘书长。主要从事第三代半导体产业技术、国家科技规划编制、新型研发机构组建、产学研协同创新、科技成果孵化转化等。电子信箱:

"}, bioImg=lp9bwu5Hy0ZORekuFEmWiQ==, bioContent=

赵璐冰,副研究员。第三代半导体产业技术创新战略联盟副秘书长。主要从事第三代半导体产业技术、国家科技规划编制、新型研发机构组建、产学研协同创新、科技成果孵化转化等。电子信箱:

, aboutCorrespAuthor=null)}, companyList=[AuthorCompany(id=1242114159572226508, tenantId=1146029695717560320, journalId=1146032081894723586, articleId=1148708266378588857, xref=null, ext=[AuthorCompanyExt(id=1242114159580615117, tenantId=1146029695717560320, journalId=1146032081894723586, articleId=1148708266378588857, companyId=1242114159572226508, language=EN, country=null, province=null, city=null, postcode=null, companyName=null, departmentName=null, remark=China Advanced Semiconductor Industry Innovation Alliance, Beijing 100083, China), AuthorCompanyExt(id=1242114159589003726, tenantId=1146029695717560320, journalId=1146032081894723586, articleId=1148708266378588857, companyId=1242114159572226508, language=CN, country=null, province=null, city=null, postcode=null, companyName=null, departmentName=null, remark=第三代半导体产业技术创新战略联盟,北京 100083)])]), Author(id=1242114159886799317, tenantId=1146029695717560320, journalId=1146032081894723586, articleId=1148708266378588857, orderNo=1, firstName=null, middleName=null, lastName=null, nameCn=null, orcid=null, stid=null, country=null, authorPic=null, dead=0, email=null, emailSecond=null, emailThird=null, correspondingAuthor=0, authorType=1, ext={EN=AuthorExt(id=1242114159962296791, tenantId=1146029695717560320, journalId=1146032081894723586, articleId=1148708266378588857, authorId=1242114159886799317, language=EN, stringName=Ling WU, firstName=Ling, middleName=null, lastName=WU, prefix=null, suffix=null, authorComment=null, nameInitials=null, affiliation=null, department=null, xref=null, address=China Advanced Semiconductor Industry Innovation Alliance, Beijing 100083, China, bio=null, bioImg=null, bioContent=null, aboutCorrespAuthor=null), CN=AuthorExt(id=1242114160029405656, tenantId=1146029695717560320, journalId=1146032081894723586, articleId=1148708266378588857, authorId=1242114159886799317, language=CN, stringName=吴玲, firstName=null, middleName=null, lastName=null, prefix=null, suffix=null, authorComment=null, nameInitials=null, affiliation=null, department=null, xref=null, address=第三代半导体产业技术创新战略联盟,北京 100083, bio=null, bioImg=null, bioContent=null, aboutCorrespAuthor=null)}, companyList=[AuthorCompany(id=1242114159572226508, tenantId=1146029695717560320, journalId=1146032081894723586, articleId=1148708266378588857, xref=null, ext=[AuthorCompanyExt(id=1242114159580615117, tenantId=1146029695717560320, journalId=1146032081894723586, articleId=1148708266378588857, companyId=1242114159572226508, language=EN, country=null, province=null, city=null, postcode=null, companyName=null, departmentName=null, remark=China Advanced Semiconductor Industry Innovation Alliance, Beijing 100083, China), AuthorCompanyExt(id=1242114159589003726, tenantId=1146029695717560320, journalId=1146032081894723586, articleId=1148708266378588857, companyId=1242114159572226508, language=CN, country=null, province=null, city=null, postcode=null, companyName=null, departmentName=null, remark=第三代半导体产业技术创新战略联盟,北京 100083)])])], keywords=[Keyword(id=1242114160180400601, tenantId=1146029695717560320, journalId=1146032081894723586, articleId=1148708266378588857, language=EN, orderNo=1, keyword=diamond), Keyword(id=1242114160255898074, tenantId=1146029695717560320, journalId=1146032081894723586, articleId=1148708266378588857, language=EN, orderNo=2, keyword=gallium oxide), Keyword(id=1242114160318812635, tenantId=1146029695717560320, journalId=1146032081894723586, articleId=1148708266378588857, language=EN, orderNo=3, keyword=aluminum nitride), Keyword(id=1242114160385921500, tenantId=1146029695717560320, journalId=1146032081894723586, articleId=1148708266378588857, language=EN, orderNo=4, keyword=ultra-wide bandgap semiconductor), Keyword(id=1242114160457224669, tenantId=1146029695717560320, journalId=1146032081894723586, articleId=1148708266378588857, language=CN, orderNo=1, keyword=金刚石), Keyword(id=1242114160515944926, tenantId=1146029695717560320, journalId=1146032081894723586, articleId=1148708266378588857, language=CN, orderNo=2, keyword=氧化镓), Keyword(id=1242114160591442400, tenantId=1146029695717560320, journalId=1146032081894723586, articleId=1148708266378588857, language=CN, orderNo=3, keyword=氮化铝), Keyword(id=1242114162084614625, tenantId=1146029695717560320, journalId=1146032081894723586, articleId=1148708266378588857, language=CN, orderNo=4, keyword=超宽禁带半导体)], refs=[Reference(id=1242114162231415266, tenantId=1146029695717560320, journalId=1146032081894723586, articleId=1148708266378588857, doi=null, pmid=null, pmcid=null, year=2014, volume=104, issue=10, pageStart=102110, pageEnd=null, url=null, language=null, rfNumber=[1], rfOrder=0, authorNames=Yamada H, Chayahara A, Mokuno Y, journalName=Applied Physics Letters, refType=null, unstructuredReference=Yamada H, Chayahara A, Mokuno Y, et al. A 2-in. mosaic wafer made of a single-crystal diamond[J]. Applied Physics Letters, 2014, 104(10): 102110, doi:10.1063/1.4868720., articleTitle=A 2-in. mosaic wafer made of a single-crystal diamond, refAbstract=null), Reference(id=1242114162294329827, tenantId=1146029695717560320, journalId=1146032081894723586, articleId=1148708266378588857, doi=null, pmid=28294167, pmcid=null, year=2017, volume=7, issue=null, pageStart=44462, pageEnd=null, url=null, language=null, rfNumber=[2], rfOrder=1, authorNames=Schreck M, Gsell S, Brescia R, journalName=Scientific Reports, refType=null, unstructuredReference=Schreck M, Gsell S, Brescia R, et al. Ion bombardment induced buried lateral growth: The key mechanism for the synthesis of single crystal diamond wafers[J]. 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It is shown that a diamond single crystal with a diameter of -90 mm and a weight of 155 carat can be grown from such a carbon film which initially consisted of 2. 10(13) individual grains.), Reference(id=1242114162390798820, tenantId=1146029695717560320, journalId=1146032081894723586, articleId=1148708266378588857, doi=null, pmid=null, pmcid=null, year=null, volume=null, issue=null, pageStart=null, pageEnd=null, url=https://news.xjtu.edu.cn/info/1004/216193.htm, language=null, rfNumber=[3], rfOrder=2, authorNames=null, journalName=null, refType=null, unstructuredReference=西安交通大学科研团队成功实现(111)面异质外延单晶金刚石衬底的制备[EB/OL]. (2024-11-20). https://news.xjtu.edu.cn/info/1004/216193.htm., articleTitle=西安交通大学科研团队成功实现(111)面异质外延单晶金刚石衬底的制备, refAbstract=null), Reference(id=1242114162466296293, tenantId=1146029695717560320, journalId=1146032081894723586, articleId=1148708266378588857, doi=null, pmid=null, pmcid=null, year=null, volume=null, issue=null, pageStart=null, pageEnd=null, url=https://news.xjtu.edu.cn/info/1004/216193.htm, language=null, rfNumber=[3], rfOrder=3, authorNames=null, journalName=null, refType=null, unstructuredReference=A research team from Xi’an Jiaotong University has successfully prepared a (111) surface heteroepitaxial single crystal diamond substrate[EB/OL]. (2024-11-20). https://news.xjtu.edu.cn/info/1004/216193.htm. (in Chinese), articleTitle=A research team from Xi’an Jiaotong University has successfully prepared a (111) surface heteroepitaxial single crystal diamond substrate, refAbstract=null), Reference(id=1242114162566959590, tenantId=1146029695717560320, journalId=1146032081894723586, articleId=1148708266378588857, doi=null, pmid=null, pmcid=null, year=2024, volume=45, issue=9, pageStart=null, pageEnd=null, url=null, language=null, rfNumber=[4], rfOrder=4, authorNames=Qu P F, Jin P, Zhou G D, journalName=Journal of Semiconductors, refType=null, unstructuredReference=Qu P F, Jin P, Zhou G D, et al. Growth of two-inch free-standing heteroepitaxial diamond on Ir/YSZ/Si (001) substrates via laser-patterned templates[J]. Journal of Semiconductors, 2024, 45(9): 090501, doi: 10.1088/1674-4926/24060003., articleTitle=Growth of two-inch free-standing heteroepitaxial diamond on Ir/YSZ/Si (001) substrates via laser-patterned templates, refAbstract=null), Reference(id=1242114162629874151, tenantId=1146029695717560320, journalId=1146032081894723586, articleId=1148708266378588857, doi=null, pmid=null, pmcid=null, year=2024, volume=636, issue=8043, pageStart=627, pageEnd=634, url=null, language=null, rfNumber=[5], rfOrder=5, authorNames=Jing J X, Sun F Q, Wang Z Q, journalName=Nature, refType=null, unstructuredReference=Jing J X, Sun F Q, Wang Z Q, et al. Scalable production of ultraflat and ultraflexible diamond membrane[J]. Nature, 2024, 636(8043): 627-634., articleTitle=Scalable production of ultraflat and ultraflexible diamond membrane, refAbstract=null), Reference(id=1242114162696983016, tenantId=1146029695717560320, journalId=1146032081894723586, articleId=1148708266378588857, doi=null, pmid=null, pmcid=null, year=2021, volume=1, issue=6, pageStart=697, pageEnd=716, url=null, language=null, rfNumber=[6], rfOrder=6, authorNames=Yuan Y, Hao W B, Mu W X, journalName=Fundamental Research, refType=null, unstructuredReference=Yuan Y, Hao W B, Mu W X, et al. Toward emerging gallium oxide semiconductors: A roadmap[J]. Fundamental Research, 2021, 1(6): 697-716., articleTitle=Toward emerging gallium oxide semiconductors: A roadmap, refAbstract=null), Reference(id=1242114162768286185, tenantId=1146029695717560320, journalId=1146032081894723586, articleId=1148708266378588857, doi=null, pmid=null, pmcid=null, year=null, volume=null, issue=null, pageStart=null, pageEnd=null, url=http://silab.zju.edu.cn/2024/0716/c15276a2946325/page.htm, language=null, rfNumber=[7], rfOrder=7, authorNames=null, journalName=null, refType=null, unstructuredReference=镓仁半导体晶圆级(010)氧化镓单晶衬底直径突破3英寸[EB/OL]. (2024-07-16). http://silab.zju.edu.cn/2024/0716/c15276a2946325/page.htm., articleTitle=镓仁半导体晶圆级(010)氧化镓单晶衬底直径突破3英寸, refAbstract=null), Reference(id=1242114162847977962, tenantId=1146029695717560320, journalId=1146032081894723586, articleId=1148708266378588857, doi=null, pmid=null, pmcid=null, year=null, volume=null, issue=null, pageStart=null, pageEnd=null, url=http://silab.zju.edu.cn/2024/0716/c15276a2946325/page.htm, language=null, rfNumber=[7], rfOrder=8, authorNames=null, journalName=null, refType=null, unstructuredReference=(010) gallium oxide single crystal substrate diameter exceeds 3 inches[EB/OL]. (2024-07-16). http://silab.zju.edu.cn/2024/0716/c15276a2946325/page.htm. (in Chinese), articleTitle=(010) gallium oxide single crystal substrate diameter exceeds 3 inches, refAbstract=null), Reference(id=1242114162919281131, tenantId=1146029695717560320, journalId=1146032081894723586, articleId=1148708266378588857, doi=null, pmid=null, pmcid=null, year=null, volume=null, issue=null, pageStart=null, pageEnd=null, url=http://silab.zju.edu.cn/2024/1111/c15276a2986500/page.htm, language=null, rfNumber=[8], rfOrder=9, authorNames=null, journalName=null, refType=null, unstructuredReference=实验室孵化企业实现氧化镓晶体生长技术重大突破[EB/OL]. (2024-11-11). http://silab.zju.edu.cn/2024/1111/c15276a2986500/page.htm., articleTitle=实验室孵化企业实现氧化镓晶体生长技术重大突破, refAbstract=null), Reference(id=1242114163003167212, tenantId=1146029695717560320, journalId=1146032081894723586, articleId=1148708266378588857, doi=null, pmid=null, pmcid=null, year=null, volume=null, issue=null, pageStart=null, pageEnd=null, url=http://silab.zju.edu.cn/2024/1111/c15276a2986500/page.htm, language=null, rfNumber=[8], rfOrder=10, authorNames=null, journalName=null, refType=null, unstructuredReference=Laboratory incubated enterprises achieve significant breakthroughs in gallium oxide crystal growth technology[EB/OL]. (2024-11-11). http://silab.zju.edu.cn/2024/1111/c15276a2986500/page.htm. (in Chinese), articleTitle=Laboratory incubated enterprises achieve significant breakthroughs in gallium oxide crystal growth technology, refAbstract=null), Reference(id=1242114163066081773, tenantId=1146029695717560320, journalId=1146032081894723586, articleId=1148708266378588857, doi=null, pmid=null, pmcid=null, year=2025, volume=25, issue=1, pageStart=537, pageEnd=544, url=null, language=null, rfNumber=[9], rfOrder=11, authorNames=Zhang J, Liu N, Chen L, journalName=Nano Letters, refType=null, unstructuredReference=Zhang J, Liu N, Chen L, et al. Ultrawide bandgap diamond/ε-Ga2O3 heterojunction pn diodes with breakdown voltages over 3 kV[J]. Nano Letters, 2025, 25(1): 537-544., articleTitle=Ultrawide bandgap diamond/ε-Ga2O3 heterojunction pn diodes with breakdown voltages over 3 kV, refAbstract=null), Reference(id=1242114163141579246, tenantId=1146029695717560320, journalId=1146032081894723586, articleId=1148708266378588857, doi=null, pmid=null, pmcid=null, year=null, volume=null, issue=null, pageStart=null, pageEnd=null, url=https://www.cisuvc.com/crystal-is-improves-100mm-substrate/, language=null, rfNumber=[10], rfOrder=12, authorNames=null, journalName=null, refType=null, unstructuredReference=Crystal IS and Asahi Kasei have achieved 99% usable area on 100 mm bulk aluminum nitride substrate[EB/OL]. (2024-06-12). https://www.cisuvc.com/crystal-is-improves-100mm-substrate/., articleTitle=Crystal IS and Asahi Kasei have achieved 99% usable area on 100 mm bulk aluminum nitride substrate, refAbstract=null)], funds=null, companyList=[AuthorCompany(id=1242114159572226508, tenantId=1146029695717560320, journalId=1146032081894723586, articleId=1148708266378588857, xref=null, ext=[AuthorCompanyExt(id=1242114159580615117, tenantId=1146029695717560320, journalId=1146032081894723586, articleId=1148708266378588857, companyId=1242114159572226508, language=EN, country=null, province=null, city=null, postcode=null, companyName=null, departmentName=null, remark=China Advanced Semiconductor Industry Innovation Alliance, Beijing 100083, China), AuthorCompanyExt(id=1242114159589003726, tenantId=1146029695717560320, journalId=1146032081894723586, articleId=1148708266378588857, companyId=1242114159572226508, language=CN, country=null, province=null, city=null, postcode=null, companyName=null, departmentName=null, remark=第三代半导体产业技术创新战略联盟,北京 100083)])], figs=null, attaches=null, journal=Journal(id=1129340393107079197, delFlag=0, nameCn=前瞻科技, nameEn=Science and Technology Foresight, nameHistory1=null, nameHistory2=null, issn=2097-0781, eissn=, cn=10-1786/N, coden=null, periodic=2, language=CN, oaType=null, ccby=null, superviseOffice=null, ownerOffice=null, pubOffice=null, editorOffice=null, officeType=null, aims=null, clcCode=null, officeProv=null, officeCity=null, officeAddr=null, officeZip=null, officeEmail=null, officePhone=null, editDirector=null, officeDirector=null, officeDirectorPhone=null, officeStaffNum=null, officeEmpNum=null, coverPicUrl=ti95jJIJzXaf02YNe1UF2A==, journalPrice=null, startedYear=null, abbrevIsoEn=Sci Technol Fore, journalRemark=null, publicationField=null, createdTime=null, updatedTime=1757931223825, createdBy=null, updatedBy=15831073675, firstLetterCn=S, firstLetterEn=S, subjectCode=Natural Sciences, subjectName=自然科学, subjectCodeEn=Natural Sciences, subjectNameEn=null, picCn=ti95jJIJzXaf02YNe1UF2A==, picEn=cuGsq8KPhoqtfsQROuZvoQ==, jcr=null, cjcr=null, exts=[JournalExt(id=1174411930946125939, language=CN, name=前瞻科技, nameHistory1=null, nameHistory2=null, managedBy=, sponsoredBy=, publishedBy=, editorOffice=, officeProv=null, officeCity=null, officeAddr=, officeZip=, editDirector=null, officeDirector=null, officePhone=null, coverPicUrl=null, journalRemark=, submitArticleUrl=null, websiteUrl=http://www.qianzhankeji.cn/CN/2097-0781/home.shtml, createdTime=1757931223856, updatedTime=1757931223856, createdBy=15831073675, updatedBy=15831073675, submissionGuidelinesUrl=http://www.qianzhankeji.cn/CN/column/column7.shtml, submissionAuthorUrl=https://qzkjauthor.cast.org.cn/webm/, submissionEditorUrl=https://qzkjeditor.cast.org.cn/webm/, submissionReviewUrl=https://qzkjauthor.cast.org.cn/webm/, submissionCeEditorUrl=https://qzkjeditor.cast.org.cn/webm/, submissionAeEditorUrl=https://qzkjeditor.cast.org.cn/webm/, option={"copyright":""}), JournalExt(id=1174411931076149364, language=EN, name=Science and Technology Foresight, nameHistory1=null, nameHistory2=null, managedBy=, sponsoredBy=, publishedBy=, editorOffice=, officeProv=null, officeCity=null, officeAddr=, officeZip=, editDirector=null, officeDirector=null, officePhone=null, coverPicUrl=null, journalRemark=, submitArticleUrl=null, websiteUrl=http://www.qianzhankeji.cn/EN/2097-0781/home.shtml, createdTime=1757931223887, updatedTime=1757931223887, createdBy=15831073675, updatedBy=15831073675, submissionGuidelinesUrl=http://www.qianzhankeji.cn/EN/column/column7.shtml, submissionAuthorUrl=https://qzkjauthor.manuscriptcloud.com/login, submissionEditorUrl=https://qzkjeditor.manuscriptcloud.com/login, submissionReviewUrl=https://qzkjauthor.manuscriptcloud.com/login, submissionCeEditorUrl=https://qzkjeditor.manuscriptcloud.com/login, submissionAeEditorUrl=https://qzkjeditor.manuscriptcloud.com/login, option={"copyright":""})], databaseList=null, tenantJournalId=1146032081894723586, websiteList=[Website(id=1148243202353652128, webName=null, webTitle=null, webDomain=null, webCopyrigh=null, webIpcNo=null, seoTitle=null, seoKeywords=null, seoDescription=null, tenantJournalId=null, journalId=1146032081894723586, journalNameCn=null, journalNameEn=null, grayFlag=null, tenantId=1146029695717560320, platformId=null, journalGroupId=null, journalGroupNameCn=null, journalGroupNameEn=null, type=1, domain=https://castjournals.cast.org.cn/joweb/qzkj/CN, language=CN, createTime=1751692112768, createBy=18614031015, updateTime=1753516254852, updateBy=18614031015, name=《前瞻科技》中文站点, tplId=1146099689490845704, title=前瞻科技, delFlag=0, indexPage=/home, props=[WebsiteProps(id=1148618977242275853, tenantId=1146029695717560320, journalId=null, journalGroupId=null, siteId=1148243202353652128, code=articleTextType, value=kx, createTime=1751781704483, updateTime=1751781704483, creator=18614031015, updator=18614031015), WebsiteProps(id=1148618977217110026, tenantId=1146029695717560320, journalId=null, journalGroupId=null, siteId=1148243202353652128, code=banner, value=null, createTime=1751781704477, updateTime=1751781704477, creator=18614031015, updator=18614031015), WebsiteProps(id=1148618977204527113, tenantId=1146029695717560320, journalId=null, journalGroupId=null, siteId=1148243202353652128, code=logo, value=https://castjournals.cast.org.cn/joweb/kjdb/CN/file/pic?fileId=skpCN5mVIzgEJbdUXu8/8A==, createTime=1751781704474, updateTime=1751781704474, creator=18614031015, updator=18614031015), WebsiteProps(id=1148618977233887244, tenantId=1146029695717560320, journalId=null, journalGroupId=null, siteId=1148243202353652128, code=picServerUrl, value=https://castjournals.cast.org.cn/joweb/kjdb/CN/file/pic, createTime=1751781704481, updateTime=1751781704481, creator=18614031015, updator=18614031015), WebsiteProps(id=1148618977225498635, tenantId=1146029695717560320, journalId=null, journalGroupId=null, siteId=1148243202353652128, code=staticResourcePath, value=https://castjournals.cast.org.cn/joweb/cast_kjdb_cn_619/, createTime=1751781704479, updateTime=1751781704479, creator=18614031015, updator=18614031015)]), Website(id=1155894377965830154, webName=null, webTitle=null, webDomain=null, webCopyrigh=null, webIpcNo=null, seoTitle=null, seoKeywords=null, seoDescription=null, tenantJournalId=null, journalId=1146032081894723586, journalNameCn=null, journalNameEn=null, grayFlag=null, tenantId=1146029695717560320, platformId=null, journalGroupId=null, journalGroupNameCn=null, journalGroupNameEn=null, type=1, domain=https://castjournals.cast.org.cn/joweb/qzkj/EN, language=EN, createTime=1753516295187, createBy=18614031015, updateTime=1753516295187, updateBy=18614031015, name=《前瞻科技》英文站点, tplId=1146101810881728533, title=Science and Technology Foresight, delFlag=0, indexPage=/home, props=[WebsiteProps(id=1155894740970233959, tenantId=1146029695717560320, journalId=null, journalGroupId=null, siteId=1155894377965830154, code=articleTextType, value=kx, createTime=1753516381733, updateTime=1753516381733, creator=18614031015, updator=18614031015), WebsiteProps(id=1155894740953456740, tenantId=1146029695717560320, journalId=null, journalGroupId=null, siteId=1155894377965830154, code=banner, value=null, createTime=1753516381729, updateTime=1753516381729, creator=18614031015, updator=18614031015), WebsiteProps(id=1155894740945068131, tenantId=1146029695717560320, journalId=null, journalGroupId=null, siteId=1155894377965830154, code=logo, value=https://castjournals.cast.org.cn/joweb/kjdb/CN/file/pic?fileId=skpCN5mVIzgEJbdUXu8/8A==, createTime=1753516381727, updateTime=1753516381727, creator=18614031015, updator=18614031015), WebsiteProps(id=1155894740966039654, tenantId=1146029695717560320, journalId=null, journalGroupId=null, siteId=1155894377965830154, code=picServerUrl, value=https://castjournals.cast.org.cn/joweb/kjdb/CN/file/pic, createTime=1753516381732, updateTime=1753516381732, creator=18614031015, updator=18614031015), WebsiteProps(id=1155894740961845349, tenantId=1146029695717560320, journalId=null, journalGroupId=null, siteId=1155894377965830154, code=staticResourcePath, value=https://castjournals.cast.org.cn/joweb/cast_kjdb_cn_619/, createTime=1753516381731, updateTime=1753516381731, creator=18614031015, updator=18614031015)])], journalTitle=前瞻科技, weixinUrl=null, journalUrl=null, iacademicId=null, status=0, seqNo=null, journalTitleEn=Science and Technology Foresight, journalPhotoCn=ti95jJIJzXaf02YNe1UF2A==, journalPhotoEn=cuGsq8KPhoqtfsQROuZvoQ==, journalFirstLetter=S, journalRecommend=null, journalNew=null, journalCollection=null, jcrJf=null, cjcrJf=null, jcrJfStr=null, cjcrJfStr=null, submissionFirstDecision=null, sciSubjectClassification=null, casSubjectClassification=null, citeScore=null, totalCitationFrequency=null, icpCode=null, psCode=null, advertisingLicenseCode=null, copyrightInformation=null, country=null, option=, provinceCode=null, provinceName=null, collectFlag=false), detailUrlCn=https://castjournals.cast.org.cn/joweb/qzkj/CN/10.3981/j.issn.2097-0781.2025.01.003, detailUrlEn=https://castjournals.cast.org.cn/joweb/qzkj/EN/10.3981/j.issn.2097-0781.2025.01.003, pdfUrlCn=https://castjournals.cast.org.cn/joweb/qzkj/CN/PDF/10.3981/j.issn.2097-0781.2025.01.003, pdfUrlEn=https://castjournals.cast.org.cn/joweb/qzkj/EN/PDF/10.3981/j.issn.2097-0781.2025.01.003, aliStartDate=null, aliEndDate=null, collectionFlag=false, citedCount=null, citedUrl=null, reference=null)
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Development Status and Prospects of Ultra-wide Bandgap Semiconductor Materials
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Lubing ZHAO , Ling WU
Science and Technology Foresight | Review and Commentary 2025,4(1): 28-35
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Science and Technology Foresight | Review and Commentary 2025, 4(1): 28-35
Development Status and Prospects of Ultra-wide Bandgap Semiconductor Materials
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Lubing ZHAO , Ling WU
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  • China Advanced Semiconductor Industry Innovation Alliance, Beijing 100083, China

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Development Status and Prospects of Ultra-wide Bandgap Semiconductor Materials
Lubing ZHAO , Ling WU
Affiliations
  • China Advanced Semiconductor Industry Innovation Alliance, Beijing 100083, China
Published: 2025-03-20 doi: 10.3981/j.issn.2097-0781.2025.01.003
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This paper analyzed the main characteristics and strategic requirements of ultra-wide bandgap semiconductor materials represented by diamond, gallium oxide, aluminum nitride, etc. and systematically reviewed the main technologies and industrial developments of ultra-wide bandgap semiconductor materials in China and abroad. It proposed key technical issues that need to be overcome and development suggestions and provided references for the future development of ultra-wide bandgap semiconductor materials in China.

diamond  /  gallium oxide  /  aluminum nitride  /  ultra-wide bandgap semiconductor

This paper analyzed the main characteristics and strategic requirements of ultra-wide bandgap semiconductor materials represented by diamond, gallium oxide, aluminum nitride, etc. and systematically reviewed the main technologies and industrial developments of ultra-wide bandgap semiconductor materials in China and abroad. It proposed key technical issues that need to be overcome and development suggestions and provided references for the future development of ultra-wide bandgap semiconductor materials in China.

diamond  /  gallium oxide  /  aluminum nitride  /  ultra-wide bandgap semiconductor
赵璐冰, 吴玲. 超宽禁带半导体材料发展现状与展望[J]. 前瞻科技, 2025 , 4 (1) : 100 -167 . DOI: 10.3981/j.issn.2097-0781.2025.01.003
Lubing ZHAO, Ling WU. Development Status and Prospects of Ultra-wide Bandgap Semiconductor Materials[J]. Science and Technology Foresight, 2025 , 4 (1) : 100 -167 . DOI: 10.3981/j.issn.2097-0781.2025.01.003
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doi: 10.3981/j.issn.2097-0781.2025.01.003
  • Received:2024-12-23
  • Published:2025-03-20
  • Release:2025-03-27
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  • 收稿日期:2024-12-23
  • 修回日期:2025-02-20
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    China Advanced Semiconductor Industry Innovation Alliance, Beijing 100083, China

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赵璐冰, 吴玲. 超宽禁带半导体材料发展现状与展望[J]. 前瞻科技, 2025 , 4 (1) : 100 -167 . DOI: 10.3981/j.issn.2097-0781.2025.01.003
Lubing ZHAO, Ling WU. Development Status and Prospects of Ultra-wide Bandgap Semiconductor Materials[J]. Science and Technology Foresight, 2025 , 4 (1) : 100 -167 . DOI: 10.3981/j.issn.2097-0781.2025.01.003
表12种不同金属材料的力学参数

Family
属数
Number of
genus
种数
Number of
species
占总种数比例
Percentage of
total species (%)

Genus
种数
Number of
species
占总种数比例
Percentage of total
species (%)
鹅膏菌科Amanitaceae 2 11 5.26 鹅膏菌属 Amanita 10 4.78
小菇科 Mycenaceae 2 12 5.74 丝盖伞属 Inocybe 5 2.39
多孔菌科 Polyporaceae 8 14 6.70 蜡蘑属 Laccaria 5 2.39
红菇科 Russulaceae 3 23 11.00 小皮伞属 Marasmius 6 2.87
小菇属 Mycena 11 5.26
光柄菇属 Pluteus 5 2.39
红菇属 Russula 17 8.13
栓菌属 Trametes 5 2.39
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