Article(id=1242139915371229501, tenantId=1146029695717560320, journalId=1146031591421210625, issueId=1242139906391221144, articleNumber=null, orderNo=6, doi=10.3981/j.issn.1000-7857.2022.11.004, pmid=null, cstr=null, oa=null, hot=null, price=null, onlineType=0, articleFormat=0, articleType=null, articleTypeStr=null, receivedDate=1653148800000, receivedDateStr=2022-05-22, revisedDate=1654790400000, revisedDateStr=2022-06-10, acceptedDate=null, acceptedDateStr=null, onlineDate=1659694315847, onlineDateStr=2022-08-05, pubDate=1655049600000, pubDateStr=2022-06-13, doiRegisterDate=null, doiRegisterDateStr=null, onlineIssueDate=1659694315847, onlineIssueDateStr=2022-08-05, onlineJustAcceptDate=null, onlineJustAcceptDateStr=null, onlineFirstDate=null, onlineFirstDateStr=null, sourceXml=null, magXml=null, createTime=1774078833664, creator=sys-migrate, updateTime=1774078833664, updator=sys-migrate, issue=Issue{id=1242139906391221144, tenantId=1146029695717560320, journalId=1146031591421210625, year='2022', volume='40', issue='11', pageStart='0', pageEnd='116', issueExtLink='null', onlineDate='null', pubDate='1655049600000', pubDateStr='2022-06-13', beforeIssueId=null, nextIssueId=null, price=null, status=1, issueComplete=1, articleOrder=3, issueType=-1, specialIssue=null, createTime=1774078831524, creator='sys-migrate', updateTime=1774078831524, updator='sys-migrate', preIssue=null, nextIssue=null, articleTotal=null, ext=null, issueFiles=null, downloadFileDto=null}, startPage=33, endPage=44, ext={EN=ArticleExt(id=1242139918646977487, articleId=1242139915371229501, tenantId=1146029695717560320, journalId=1146031591421210625, language=EN, title=Electron beam lithography system: Progress and outlook, columnId=1242139913156633517, journalTitle=Science & Technology Review, columnName=Scientific and Technological Innovation Build a New Development Paradigm, runingTitle=null, highlight=null, articleAbstract=Electron beam lithography plays an irreplaceable role in applications such as high precision mask manufacturing, prototype device research and development, small volume production and fundamental scientific research. So breakthrough in advanced domestic electron beam lithography system is an urgent task in the context of foreign embargo. In this review, we introduce the development process of electron beam lithography systems, list the main manufacturers and latest system parameters of three most popular kinds of system in scientific research and industry, and summarize the progress of electron beam lithography system in China. In comparison with the technical parameters of foreign electron beam lithography systems, the key issues that need to be solved in domestic development are summarized. Among them, the challenges of realizing advanced domestic Gaussian electron beam lithography system are emphatically described, including thermal field emission electron gun, high acceleration voltage, high frequency pattern generator, high precision laser interferometer detection technology, and high precision electron beam deflection compensation technology. This review may provide a technical route reference for advanced domestic electron beam lithography system., authors=LIANG Huikang¹, DUAN Huigao^1,2, authorsList=LIANG Huikang, DUAN Huigao, authorCompany=1. College of Mechanical and Vehicle Engineering, Hunan University, Changsha 410082, China;
2. Guangdong-Hong Kong-Macao Greater Bay Area Innovation Research Institute, Hunan University, Guangzhou 511300, China, correspAuthors=null, authorNote=null, correspAuthorsNote=null, copyrightStatement=null, copyrightOwner=null, extLink=null, articleAbsUrl=null, sourceXml=null, magXml=null, pdfUrl=null, pdf=GgqdR7RavIOfpqXYYYzMtQ==, pdfFileSize=3441808, pdfExtLink=null, richHtmlUrl=null, mobilePdfUrl=null, reviewReport=null, pdfFirstPage=null, abstractGraph=null, abstractGraphContent=null, abstractVideo=null, citation=null, cebUrl=null, magXmlContent=null, mapNumber=null, fund=null), CN=ArticleExt(id=1242139917388686270, articleId=1242139915371229501, tenantId=1146029695717560320, journalId=1146031591421210625, language=CN, title=电子束光刻设备发展现状及展望, columnId=1242139910979793202, journalTitle=科技导报, columnName=科技创新构建新发展格局, runingTitle=null, highlight=null, articleAbstract=电子束光刻设备在高精度掩模制备、原型器件开发、小批量生产以及基础研究中有着不可替代的作用。在国外高端电子束光刻设备禁运的条件下，中国迫切需要实现高端国产化设备的突破。介绍了电子束光刻设备发展历程，列举了当前活跃在科研和产业界的3种设备（高斯束、变形束、多束）的主要厂商及其最新设备性能，并概括了国产化电子束光刻设备发展现状。通过国内外电子束光刻设备性能的对比，总结了国产化研发需要解决的关键性难题。其中，着重介绍了高端高斯电子束光刻设备国产化需要面临的技术挑战：热场发射电子枪、高加速电压、高频图形发生器、极高精度的激光干涉仪检测技术及高精度电子束偏转补偿技术。, authors=梁惠康¹, 段辉高^1,2, authorsList=梁惠康, 段辉高, authorCompany=1. 湖南大学机械与运载工程学院, 长沙 410082;
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