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The dielectric constant (Dk) and dielectric loss factor (Df) of polyimide under high frequency can be reduced by changing the polarity of polymer and introducing pore structure in summary. In this paper, the research progress of the two modification methods at home and abroad in recent years was summarized. It is indicated that the properties of polyimide can be optimized by adding pore structure on the basis of introducing polar macromolecules. At the same time, the shortcomings of properties characterization in literature were pointed out, and the suggestions were proposed.

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本文从降低聚酰亚胺在高频下的介电常数(Dk)和介质损耗因数(Df)出发,将其改性方法归纳为改变聚合物极性和引入孔隙结构两方面,综述了近几年国内外相关的研究进展,发现在引入极性大分子的同时添加孔隙结构,可使得聚酰亚胺的介电性能达到最优,同时指出了文献中性能表征的不足并提出了建议。

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陈钰玮(1996-),女(汉族),江西赣州人,硕士生,研究方向为高分子合成应用。

闵永刚(1963-),男(汉族),湖北黄冈人,教授,研究方向为聚合材料与应用、高性能聚合物材料与加工、节能环保和PM2.5等。

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陈钰玮(1996-),女(汉族),江西赣州人,硕士生,研究方向为高分子合成应用。

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陈钰玮(1996-),女(汉族),江西赣州人,硕士生,研究方向为高分子合成应用。

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闵永刚(1963-),男(汉族),湖北黄冈人,教授,研究方向为聚合材料与应用、高性能聚合物材料与加工、节能环保和PM2.5等。

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闵永刚(1963-),男(汉族),湖北黄冈人,教授,研究方向为聚合材料与应用、高性能聚合物材料与加工、节能环保和PM2.5等。

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articleId=1241799382438318755, language=CN, orderNo=4, keyword=低介质损耗)], refs=[Reference(id=1245084037916767148, tenantId=1146029695717560320, journalId=1149653034449285133, articleId=1241799382438318755, doi=null, pmid=null, pmcid=null, year=2019, volume=52, issue=5, pageStart=35, pageEnd=39, url=null, language=null, rfNumber=[1], rfOrder=0, authorNames=李磊, 袁舜齐, 何志斌, journalName=绝缘材料, refType=null, unstructuredReference=李磊,袁舜齐,何志斌.低介电聚酰亚胺/分子筛复合薄膜的制备及性能研究[J].绝缘材料,2019,52(5):35-39., articleTitle=低介电聚酰亚胺/分子筛复合薄膜的制备及性能研究, refAbstract=null), Reference(id=1245084037975487409, tenantId=1146029695717560320, journalId=1149653034449285133, articleId=1241799382438318755, doi=null, pmid=null, pmcid=null, year=2019, volume=50, issue=2, pageStart=179, pageEnd=188, url=null, language=null, rfNumber=[2], rfOrder=1, authorNames=范振国, 陈文欣, 魏世洋, journalName=高分子学报, refType=null, unstructuredReference=范振国,陈文欣,魏世洋,.聚酰亚胺介电常数的定量构效关系研究及其低介电薄膜的分子结构设计[J].高分子学报,2019,50(2):179-188., 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聚酰亚胺介电性能改性的研究进展
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陈钰玮 1 , 简凌锋 1 , 翁梦蔓 1 , 余文涛 1 , 刘屹东 1, 2 , 张继升 3 , 闵永刚 1, 2
绝缘材料 | 综述 2021,54(9): 9-14
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绝缘材料 | 综述 2021, 54(9): 9-14
聚酰亚胺介电性能改性的研究进展
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陈钰玮1, 简凌锋1, 翁梦蔓1, 余文涛1, 刘屹东1, 2, 张继升3, 闵永刚1, 2
作者信息
  • 1广东工业大学 材料与能源学院,广东 广州 510006
  • 2东莞华南设计创新院, 广东 东莞 523808
  • 3慧迈材料科技(广东)有限公司,广东 佛山 528200
  • 陈钰玮(1996-),女(汉族),江西赣州人,硕士生,研究方向为高分子合成应用。

    闵永刚(1963-),男(汉族),湖北黄冈人,教授,研究方向为聚合材料与应用、高性能聚合物材料与加工、节能环保和PM2.5等。

Research Progress on Dielectric Properties Modification of Polyimide
Yuwei CHEN1, Lingfeng JIAN1, Mengman WENG1, Wentao YU1, Yidong LIU1, 2, Jisheng ZHANG3, Yonggang MIN1, 2
Affiliations
  • 1School of Materials and Energy, Guangdong University of Technology, Guangzhou 510006, China
  • 2Dongguan South China Design Innovation Institute, Dongguan 523808, China
  • 3Huimai Material Technology (Guangdong) Co., Ltd., Foshan 528200, China
出版时间: 2021-09-20 doi: 10.16790/j.cnki.1009-9239.im.2021.09.002
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本文从降低聚酰亚胺在高频下的介电常数(Dk)和介质损耗因数(Df)出发,将其改性方法归纳为改变聚合物极性和引入孔隙结构两方面,综述了近几年国内外相关的研究进展,发现在引入极性大分子的同时添加孔隙结构,可使得聚酰亚胺的介电性能达到最优,同时指出了文献中性能表征的不足并提出了建议。

聚酰亚胺  /  高频波  /  低介电常数  /  低介质损耗

The dielectric constant (Dk) and dielectric loss factor (Df) of polyimide under high frequency can be reduced by changing the polarity of polymer and introducing pore structure in summary. In this paper, the research progress of the two modification methods at home and abroad in recent years was summarized. It is indicated that the properties of polyimide can be optimized by adding pore structure on the basis of introducing polar macromolecules. At the same time, the shortcomings of properties characterization in literature were pointed out, and the suggestions were proposed.

polyimide  /  high frequency wave  /  low dielectric constant  /  low dielectric loss
陈钰玮, 简凌锋, 翁梦蔓, 余文涛, 刘屹东, 张继升, 闵永刚. 聚酰亚胺介电性能改性的研究进展. 绝缘材料, 2021 , 54 (9) : 9 -14 . DOI: 10.16790/j.cnki.1009-9239.im.2021.09.002
Yuwei CHEN, Lingfeng JIAN, Mengman WENG, Wentao YU, Yidong LIU, Jisheng ZHANG, Yonggang MIN. Research Progress on Dielectric Properties Modification of Polyimide[J]. Insulating Materials, 2021 , 54 (9) : 9 -14 . DOI: 10.16790/j.cnki.1009-9239.im.2021.09.002
5G的高效便捷极大地提升了各大领域的技术水平和工作效率,是各国各行业竞相争夺的高地。作为信号接收部件的天线组是5G电子设备的重要组成部分,而天线组中的软板为核心层。核心材料使用低介电绝缘材料可使天线组在接收信号波时降低损耗。美国苹果公司使用以液晶聚合物(liquid crystal polymer, LCP)为软板的天线组,LCP具有低吸湿性(吸水率<0.004%)和热塑性,且其介电常数为2.9~3.2(f <105 GHz)。但在毫米波范围内LCP天线因为配置原因必须外置,这使得天线的介质损耗非常大。另一种软板材料聚酰亚胺(polyimide, PI)由于其优异的耐热性和电学特性被广泛作为核心层材料使用,并且对比LCP具有明显的成本和加工优势,但达到5G的第1个频率范围(FR1)的Sub-6G波段时,目前市面上的PI材料介电常数和介质损耗都不能满足要求,而且PI材料的吸湿性也会显著提升其介电常数,阻碍其在5G中的应用。为促进PI在5G领域的应用,从降低PI介电常数和介质损耗角度出发改善PI性能迫在眉睫[1]
在对PI进行介电性能改性之前,必须先了解影响PI介电性能的因素,以及各因素的重要程度。范振国等[2]利用量子化学计算方法和基团贡献法采集了61种PI分子结构模型单元的12种量子化学结构参数,并通过通径分析法筛选出5种影响PI介电常数的主要因素。计算结果揭示了5种结构参数与PI介电常数之间的内在关系——含氟量的自然律 e-F%、偶极距μ、溶度参数δ与介电常数之间存在正相关关系,而最负原子净电荷q-、侧基长度L则与介电常数存在着负相关关系。
为了从已有实现工业化生产的PI合成所用单体原料中选择适用于改性的基础单体组合,李鸿韬等[3]将市面上较为常见的两种二酐(4,4′-联苯醚二酐(OPDA)和3,3′,4,4′-二苯甲酮四羧酸二酐(BTDA))与两种二胺(4,4′-二氨基二苯醚(ODA)和4,4′-二氨基-2,2′-双三氟甲基联苯(TFMB))进行反应,制得4种PI薄膜,这4种薄膜的重复单元互不相同。对4种PI薄膜的介电性能进行测试,结果发现由OPDA与TFMB合成的PI薄膜介电性能最好,在107 Hz下,介电常数为2.8,介质损耗因数为0.006。这个现象可以用范振国团队的理论模型解释[2]。TFMB的侧链为CF3,增大了PI分子的自由体积和含氟量,极大地降低了PI的极性,同时OPDA分子的柔性进一步对PI介电性能产生影响。
上述研究结果表明,要想改善PI的介电性能需要从降低其介电常数和介质损耗着手。影响PI介电性能的因素主要有内部因素和环境因素。内部因素为PI的结构,不同PI单体结构或聚合物结构,其介电性能会有较大差别;环境因素中湿度和温度对PI薄膜性能的影响较大,这主要是因为聚酰亚胺是极性高分子材料,其主链上具有大量的极性基团,在潮湿环境中极易吸收水分,从而增大其介电常数和介质损耗[4]
从改变PI结构角度来改善PI介电性能的方法主要分为两个方面:一是通过引入基团降低聚合物的整体极性;二是在结构中引入分子筛等中空结构或在结构中形成间隙,引入低介电组分,降低材料整体的介电常数。本文将从这两个方面综述近几年国内外改善PI介电性能的研究进展。
改变聚合物极性主要有两种路线,一是引入含氟基团等低极性基团,从而改变聚合物整体的极化率;二是引入大分子侧链以增大体系的自由体积,从而降低体系的极性。
一般选用氟元素。由于氟原子具有高电负性、低极性和疏水性,氟化PI具有显著的低吸湿性、拒油性、热稳定性和化学稳定性[5]。含氟基团的引入会降低聚合物单体的对称性或规整度,并且增大体系的自由体积,从而降低聚合物的介电常数。范振国等[2]研究结果表明,含氟量的增加有利于降低聚合物的介电常数,但当含氟量达到一定程度后,介电常数趋于稳定,当含氟量为34%时,聚合物的介电常数最低,为2.02。
C D SIMONEA等[6]制备了一系列含不同C-F键的高氟PI,含氟量最高的聚合物单体含8个氟原子。实验结果表明,在1 kHz下该系列高氟PI的介电常数为2.6~2.7。
WU T T等[7]在BPDA/ODA的主链中引入了一种多功能的二胺2,2′-双(三氟甲基)-4,4′-二氨基联苯(TFMB)来修饰传统PI气凝胶以改善其综合性能。研究发现,当ODA和TFMB的摩尔比为5∶5时,材料表现出最低的收缩率、密度和最高的孔隙率。相对介电常数在10 MHz时为1.27~1.35,在1 GHz时为1.29~1.33,而介质损耗因数为0.001~0.004。且TFMB摩尔分数越大,材料的介电常数和介质损耗因数越低。
虽然PI凝胶的介电常数达到令人惊讶的数值1.30,介质损耗也满足材料要求,但是气凝胶的力学性能和热学性能却不理想,应用在天线组上不现实,然而其制备工艺和选材是值得借鉴的,可以在此基础上,将PI的成型形式由气凝胶转换为薄膜。
XU X L等[8]采用水溶液共混法制备了聚四氟乙烯(PTFE)/聚酰亚胺(PI)杂化膜,将合成的水溶性聚(聚酰胺酸)铵盐与聚四氟乙烯水乳状液共混,然后进行旋涂和热亚胺化(见图1)。在200 kHz下,PTFE/PI杂化膜(PTFE的质量分数为40%)的介电常数达到最低,为2.25,但此时的介质损耗因数却上升到0.15。同时,PTFE/PI杂化膜的5%失重温度(T5%)高于520℃、玻璃化转变温度(Tg)高于285℃,热稳定性良好。
在引入氟元素的基础上,研究人员还引入了其他有利于降低PI介电常数的无机填料。白瑞等[9]分别采用液相剥离法和两步法制备氟化石墨烯溶液和聚酰胺酸前驱体溶液,再通过溶液共混法制备得到PI/氟化石墨烯复合薄膜。结果发现掺杂氟化石墨烯后复合薄膜的介电常数由3.63下降到2.52(200 kHz),在1 kHz~100 MHz内,随频率的增大介电常数有稍微降低的趋势,但幅度不大。
引入大分子侧链可破坏分子的规整度,发生极化时,由于侧链密度过大,极化难度增大,从而降低极化率。BEI R X等[10]通过两步法制备了一系列含二苯吡啶核结构,但侧链不同、苯环数不同的新型PI(PPy6F、mBPPy6F和mTPPy6F),在104~105 Hz下测得三者的介电常数分别为2.81、2.61和2.44。当频率升高到106 Hz时,介电常数有所上升,但上升幅度均小于0.05。Tg均在340~400℃,热稳定性较好。
王铭钧等[11]将四甲基-双(γ-氨丙基)-二甲基硅氧烷(APDS)和4,4′-二氨基二苯醚(ODA)混合,然后分别与均苯四甲酸酐(PMDA)、3,3′,4,4′-二苯酮四甲酸酐(BTDA)和3,3′,4,4′-二苯醚四甲酸酐(ODPA)进行无规共聚,合成了3种含二甲基硅氧烷的共聚PI(POA、BOA和ODOA)。研究结果表明,POA、BOA和ODOA 3类共聚PI在105 Hz下的介电常数为2.2~2.4,介质损耗因数在10-3水平。他们还研究了温度对3种PI介电性能的影响,结果表明,介电常数和介质损耗因数均随温度上升而升高,在300℃时,ODOA的介电常数升高至2.6,介质损耗因数也升高至0.02,这意味着温度对PI介电性能的影响不可忽视。
LI X T等[12]将一种反应性的含碳稀释剂混合到PI低聚物中,发现其介电常数从3.4大幅降低到2.5,并在-150~250℃内比较稳定。通过研究发现,当频率为108 Hz,含碳稀释剂添加量为10%~40%时,介电常数为2.40~2.85,并随着频率的增大有升高的趋势。
在引入大分子的同时,利用聚合物本身的某些性质,可进一步提升PI的介电性能。QIAN C等[13]通过充分考虑聚合物链的二次弛豫行为,设计和合成了一种新的无定形无氟聚合物(TmBPPA)(见图2),在104 Hz下测定其介电常数为2.23,介质损耗因数低于3.94×10-3。这是由于对于聚合物体系,当环境温度低于Tg时,链段间运动被冻结,然而侧基仍可旋转,即二次放松或β弛豫,可以极大地影响分子内在的自由体积。
WANG C Y等[14]选用八氨基苯基倍半硅氧烷(OAPS)与氟化PI复合,制备了一种氟化PI/OAPS杂化聚合物。当OAPS质量分数低于7%时,复合材料的热分解温度均高于500℃,在1 MHz测试频率下介电常数为2.2,具有良好的力学性能、疏水性和溶解性。
由以上分析可以看出,引入的大分子侧链大多是芳香族脂肪环,因其弱极性和低密度,对降低PI的介电常数和介质损耗是不错的选择,而且由于多键的存在降低了主键断裂的概率,使得制备的PI材料仍保持较好的热学性能和力学性能。
辐射是一种有效改变PI性能的手段。对PI进行辐照处理,可以通过交联、固化、接枝和降解[15-17]4个步骤,改变PI的结构,从而改变PI的介电性能[18-20]
LI H X等[21]采用1 MeV电子、3 MeV质子、10 MeV质子、25 MeV碳离子等不同辐射源照射PI薄膜,然后用介电谱分析原始PI薄膜和辐照PI薄膜的介电特性。结果表明,经4种辐照源辐照后PI薄膜的介电常数随辐照通量的增大而降低。不同辐照通量下PI薄膜的介质损耗因数变化不明显,但当频率高于104 Hz时,介质损耗因数随频率的提高而显著升高,同时介电常数达到最低值(2.7)。这是由于辐照后PI中的聚四氯酸酐基团降解,极性基团如C-N键和C=O键含量减少,非极性基团如C-C键含量增加。但辐射后PI薄膜暴露在空气中会产生化合物,使其力学性能有所降低。
引入孔隙结构是为了引入空气,由于空气的介电常数约为1,可提高系统的孔隙率,降低材料的密度,使单位体积内极化分子的数量减少,从而降低材料的介电常数[22]
笼型倍半硅氧烷(polyhedral oligomeric silsesquioxane,POSS)作为一种新型纳米填料近年来成为国内外的研究热点。由于其内部具有无机组分的核并且中空,外部连接有不同有机基团的特性,能够向聚合物中引入纳米孔,使复合物同时具备传统有机组分和无机组分的优良性能[23]
LUO K J等[24]通过马来酰亚胺功能化POSS(mPOSS)和具有呋喃基团的芳香族聚酰胺(POF)合成了一种可逆交联复合材料。研究发现,随着mPOSS含量的增加,在106 Hz测试条件下,复合材料的介电常数明显降低(从纯POF的4.25降低到POF-0.20的2.25),介质损耗因数也从纯POF的0.029降低到POF-0.20的0.018。
R K REVATHI等[25]成功合成了一种新型咪唑核非对称二胺单体(4,4-(4,5-二苯基-咪唑-1,2-二基)二苯胺),并以此为前驱体制备了PI。此外,还通过不同质量分数的八氨基苯基硅倍半硅氧烷(NH2-POSS)对PI进行增强改性,得到POSS-PI纳米复合材料。结果表明,随着NH2-POSS增强物质量分数的提高,复合材料的介电常数降低,在室温1 MHz下,10%POSS-PI纳米复合材料的介电常数最低(2.1),且抗菌性能较好。
有研究团队在POSS的基础上,进一步引入一些其他的基团对PI进行改性。R REVATHI等[26]研制了以磷腈核为基的聚酰亚胺(PZI)和POSS增强的磷腈聚酰亚胺纳米复合材料。研究结果发现,在1 MHz下,10%POSS/PZI复合材料的介电常数最低(2.1),并且具有较高的Tg、较好的紫外线屏蔽性能、较好的阻燃性、良好的抗菌活性、较高的热稳定性和较高的炭化率。但是这种材料的透明度很低,颜色很深。
汪修权[23]以4,4′-二氨基二苯醚(ODA)、均苯四甲酸二酐(PMDA)为原料,与POSS和氧化石墨烯(GO)复合,制备了氧化石墨烯/笼型倍半硅氧烷/聚酰亚胺(ODA-GO/POSS/PI)纳米复合薄膜(见图3)。当ODA-GO与POSS的质量分数分别为0.5%和2.0%时,复合薄膜在1 MHz下的介电常数低至2.5,较纯PI薄膜降低了26.4 %。
许多常见的无机材料如分子筛、空心玻璃微球等都具有孔隙结构,对其进行修饰后引入PI中,可降低PI的介电常数[27]
周德洋等[28]以功能性PI为基体,空心玻璃微球为填料,采用原位聚合法合成聚酰胺酸溶液,流延成膜,制备了不同含量的空心玻璃微球/PI复合薄膜。结果表明,复合薄膜的介电常数随着空心玻璃微球掺杂量的增大而降低,当空心玻璃微球质量分数达到9%时,复合薄膜的介电常数降低70%左右,在106 Hz下,介电常数低于2.4,同时介质损耗因数在0.05以下,表现出较为优异的低介电性能。
HUANG Z X等[29]将含不同质量分数纯硅分子筛(A-PSZN)的氨基衍生物与氟化聚酰胺酸(FPAA)共混形成FPAA/A-PSZN前驱体溶液,通过纺丝包覆和热亚胺化法制备了氟化聚酰亚胺(FPI)/A-PSZN杂化膜(见图4)。结果表明,FPI/7%A-PSZN杂化膜在1 MHz下的介电常数从原始FPI的3.11下降至2.65,并且随频率的增大而降低。
陈植耿[30]采用改性氟化石墨烯(GFO)作为纳米改性填料,以聚乙二醇(PEG)作为GFO的插层剂,并将PEG在酰亚胺化过程中分解气化,类似于“爆炸法”促进GFO在PI中的分散,同时由于 PEG的分解气化,在PI中留下了孔洞结构,从而制得一种多孔PI(pPI),并进一步制备成复合PI材料(GFO-pPI)。研究发现,当GFO的质量分数仅为0.3%时,在1~10 MHz下GFO/pPI的介电常数降低至2.29,并随着频率升高而降低,介质损耗却随之升高,从0.009升高至0.015。然而当GFO的质量分数增加至1.0%时,复合材料的介电常数又回升到2.88。
QIU G R等[31]使用邻苯二酐(PMDA)为酸酐单体,2,2-双(4-(4-氨基苯氧基))丙烷为胺单体,采用乳液非水聚合法制备了PI微球,该微球直径为31~33 μm。然后用ODA与PMDA制得PI薄膜,并作为基底,掺杂PI微球制得复合薄膜。通过对不同含量PI微球的PI复合材料介电性能进行对比,发现当微球质量分数为10%~50%时,复合材料的介电常数在2.26~2.48(1 MHz),介质损耗因数为0.006 63~0.008 57(1 MHz),对比原有PI的介电性能有了很大的提升。
用物理方法将一种PI制成微球,不仅将微球结构引入复合材料,还将相应单体的基团引入,从物理和化学双层面提升了复合材料的介电性能。而且两种PI的相容性很好,不需要复杂的工艺和额外试剂便可制得复合材料,制备方法简单又经济。
学者们通过各种改进手段,在保证良好力学性能、热学性能和吸湿性能的前提下,将PI的介电常数能降低至2.4水平,介质损耗因数降低至10-3水平,促进了高性能PI的发展。在严格控制POSS添加量和分子结构的条件下,引入POSS甚至能将POSS/PI的介电常数降低至2.0。这意味着将POSS等具有孔隙的大分子与氟结合,将会是低介电常数PI发展方向之一。但通过对已有文献关于PI材料介电性能的测试频率进行整理,发现能达到GHz的研究非常少。这主要是因为目前电学检测设备赶不上材料更新的速度,测试频率还停留在4G水平,对于一些能够提供GHz以上高频波的设备却不配备介电检测软件。另一个问题是,PI的介电性能与温度的关系密切,在高频波环境中,天线组很容易在工作时发热,温度升高,此时PI材料的介电性能又将发生进一步的变化,这是一个PI材料应用过程中不可忽视的因素,但已有的文献却鲜有提及。
目前改善PI介电性能的各种方法均无法实现工业化大生产,还处在初步理论实践阶段。如何使复合材料的合成工艺更简便高效,合成率更高,更适合工业化生产,是亟需攻克的难题。而且随着5G的更新换代,在不久的将来,会提出6G甚至更高的通讯水平,对材料也将会有更高的要求,因此必须将PI与时代要求紧密结合,才能使PI材料应用范围更为广阔。
  • 广东工业大学“百人计划”项目(220418095)
  • 广东省“珠江人才计划”项目(501170009)
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2021年第54卷第9期
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doi: 10.16790/j.cnki.1009-9239.im.2021.09.002
  • 接收时间:2020-08-26
  • 首发时间:2026-03-20
  • 出版时间:2021-09-20
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  • 收稿日期:2020-08-26
  • 修回日期:2020-09-27
基金
广东工业大学“百人计划”项目(220418095)
广东省“珠江人才计划”项目(501170009)
作者信息
    1广东工业大学 材料与能源学院,广东 广州 510006
    2东莞华南设计创新院, 广东 东莞 523808
    3慧迈材料科技(广东)有限公司,广东 佛山 528200
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2种不同金属材料的力学参数

Family
属数
Number of
genus
种数
Number of
species
占总种数比例
Percentage of
total species (%)

Genus
种数
Number of
species
占总种数比例
Percentage of total
species (%)
鹅膏菌科Amanitaceae 2 11 5.26 鹅膏菌属 Amanita 10 4.78
小菇科 Mycenaceae 2 12 5.74 丝盖伞属 Inocybe 5 2.39
多孔菌科 Polyporaceae 8 14 6.70 蜡蘑属 Laccaria 5 2.39
红菇科 Russulaceae 3 23 11.00 小皮伞属 Marasmius 6 2.87
小菇属 Mycena 11 5.26
光柄菇属 Pluteus 5 2.39
红菇属 Russula 17 8.13
栓菌属 Trametes 5 2.39
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