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Article(id=1210601625224344534, tenantId=1146029695717560320, journalId=1149653034449285133, issueId=1210601623135581115, articleNumber=null, orderNo=null, doi=10.16790/j.cnki.1009-9239.im.2024.10.013, pmid=null, cstr=null, oa=null, hot=null, price=null, onlineType=0, articleFormat=0, articleType=null, articleTypeStr=research-article, receivedDate=1716825600000, receivedDateStr=2024-05-28, revisedDate=1720540800000, revisedDateStr=2024-07-10, acceptedDate=null, acceptedDateStr=null, onlineDate=1766559519344, onlineDateStr=2025-12-24, pubDate=1729353600000, pubDateStr=2024-10-20, doiRegisterDate=null, doiRegisterDateStr=null, onlineIssueDate=1766559519344, onlineIssueDateStr=2025-12-24, onlineJustAcceptDate=null, onlineJustAcceptDateStr=null, onlineFirstDate=null, onlineFirstDateStr=null, sourceXml=null, magXml=null, createTime=1766559519344, creator=13701087609, updateTime=1766559519344, updator=13701087609, issue=Issue{id=1210601623135581115, tenantId=1146029695717560320, journalId=1149653034449285133, year='2024', volume='57', issue='10', pageStart='1', pageEnd='141', issueExtLink='null', onlineDate='null', pubDate='null', beforeIssueId=null, nextIssueId=null, price=null, status=1, issueComplete=1, articleOrder=1, issueType=-1, specialIssue=null, createTime=1766559518846, creator=13701087609, updateTime=1766564021205, updator=13701087609, preIssue=null, nextIssue=null, ext={EN=IssueExt(id=1210620507448275814, tenantId=1146029695717560320, journalId=1149653034449285133, issueId=1210601623135581115, language=EN, specialIssueTitle=, coverIllustrator=null, specialIssueEditor=, specialIssueAbout=), CN=IssueExt(id=1210620507448275815, tenantId=1146029695717560320, journalId=1149653034449285133, issueId=1210601623135581115, language=CN, specialIssueTitle=, coverIllustrator=null, specialIssueEditor=, specialIssueAbout=)}, issueFiles=null}, startPage=98, endPage=105, ext={EN=ArticleExt(id=1210601625492780006, articleId=1210601625224344534, tenantId=1146029695717560320, journalId=1149653034449285133, language=EN, title=Technical analysis of photosensitive polyimide patents applied in China, columnId=1203281640207393262, journalTitle=Insulating Materials, columnName=Special Issue on High Performance Polyimide Materials, runingTitle=null, highlight=null, articleAbstract=

Photosensitive polyimide (PSPI) is a kind of high-performance polyimide with special structures, which is widely used in semiconductor packaging, integrated circuits, optical display, and other fields due to its excellent heat resistance, mechanical properties, insulating properties, and lithographic processability. In this paper, the PSPI patents applied in China were taken as object, the overall situation of these patents, including changes in the number of patent applications, applicants, and their source countries was analyzed systematically. Especially, the patent applicants inside and outside China and the patent subject distribution since 2011 were discussed. The difference of patent technology and protection priorities of enterprise applicants inside and outside China was compared in detail. The patent technology characteristics and development trends of PSPI were explored.

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光敏聚酰亚胺（PSPI）是一类具有特殊结构的高性能聚酰亚胺材料，以其优异的耐热、力学、绝缘及光刻加工性等特点，广泛应用于半导体封装、集成电路、光学显示等领域。本文以在中国申请的PSPI专利为研究对象，分析了相关专利的整体情况，包括专利的申请数量变化、申请人与来源国等；重点梳理了自2011年以来的国内外专利申请人及专利主题分布，详细对比了国内外主要企业申请人的专利技术构成与保护重点，探讨了PSPI材料领域的专利技术特点与发展趋势。

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翟磊（1985-），男（汉族），山东潍坊人，副研究员，主要从事高性能聚酰亚胺材料的基础与应用研究。
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杨斐（1982-），女（汉族），安徽安庆人，三级调研员，主要从事材料领域专利的复审无效审理工作；

郭彦（1980-），男（汉族），江西吉安人，二级调研员，主要从事材料领域专利的复审无效审理工作。

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杨斐（1982-），女（汉族），安徽安庆人，三级调研员，主要从事材料领域专利的复审无效审理工作；

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杨斐（1982-），女（汉族），安徽安庆人，三级调研员，主要从事材料领域专利的复审无效审理工作；

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郭彦（1980-），男（汉族），江西吉安人，二级调研员，主要从事材料领域专利的复审无效审理工作。

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郭彦（1980-），男（汉族），江西吉安人，二级调研员，主要从事材料领域专利的复审无效审理工作。

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articleId=1210601625224344534, language=EN, orderNo=3, keyword=foreign applicant), Keyword(id=1218837315984737127, tenantId=1146029695717560320, journalId=1149653034449285133, articleId=1210601625224344534, language=EN, orderNo=4, keyword=technical topics), Keyword(id=1218837316051845993, tenantId=1146029695717560320, journalId=1149653034449285133, articleId=1210601625224344534, language=EN, orderNo=5, keyword=development trend), Keyword(id=1218837316114760554, tenantId=1146029695717560320, journalId=1149653034449285133, articleId=1210601625224344534, language=CN, orderNo=1, keyword=光敏聚酰亚胺), Keyword(id=1218837316198646636, tenantId=1146029695717560320, journalId=1149653034449285133, articleId=1210601625224344534, language=CN, orderNo=2, keyword=专利), Keyword(id=1218837316269949806, tenantId=1146029695717560320, journalId=1149653034449285133, articleId=1210601625224344534, language=CN, orderNo=3, keyword=国外申请人), Keyword(id=1218837316353835887, tenantId=1146029695717560320, journalId=1149653034449285133, articleId=1210601625224344534, language=CN, orderNo=4, keyword=技术主题), Keyword(id=1218837316412556144, tenantId=1146029695717560320, journalId=1149653034449285133, articleId=1210601625224344534, language=CN, orderNo=5, keyword=发展趋势)], refs=[Reference(id=1218837318128026518, tenantId=1146029695717560320, journalId=1149653034449285133, articleId=1210601625224344534, doi=null, pmid=null, pmcid=null, year=1996, volume=9, issue=2, pageStart=279, pageEnd=288, url=null, language=null, rfNumber=[1], rfOrder=0, authorNames=侯豪情, 李悦生, 丁孟贤, journalName=功能高分子学报, refType=null, unstructuredReference=侯豪情,李悦生,丁孟贤.光敏聚酰亚胺合成方法及应用的最新进展[J].功能高分子学报,1996,9(2):279-288., articleTitle=光敏聚酰亚胺合成方法及应用的最新进展, refAbstract=null), Reference(id=1218837318203523992, tenantId=1146029695717560320, journalId=1149653034449285133, articleId=1210601625224344534, doi=null, pmid=null, pmcid=null, year=1996, volume=9, issue=2, pageStart=279, pageEnd=288, url=null, language=null, rfNumber=[1], rfOrder=1, authorNames=HOUHaoqing, LIYuesheng, DINGMengxian, journalName=Journal of Functional Polymers, refType=null, unstructuredReference=HOUHaoqing, LIYuesheng, DINGMengxian. Recent developments of the synthetic method and application of photosensitive polyimides[J]. Journal of Functional Polymers,1996,9(2):279-288., articleTitle=Recent developments of the synthetic method and application of photosensitive polyimides, refAbstract=null), Reference(id=1218837318262244249, tenantId=1146029695717560320, journalId=1149653034449285133, articleId=1210601625224344534, doi=null, pmid=null, pmcid=null, year=1999, volume=12, issue=1, pageStart=1, pageEnd=5, url=null, language=null, rfNumber=[2], rfOrder=2, authorNames=侯豪情, 张春华, 苏洪利, journalName=功能高分子学报, refType=null, unstructuredReference=侯豪情,张春华,苏洪利,等.高灵敏度的酯型光敏聚酰亚胺[J].功能高分子学报,1999,12(1):1-5., articleTitle=高灵敏度的酯型光敏聚酰亚胺, refAbstract=null), Reference(id=1218837318333547419, tenantId=1146029695717560320, journalId=1149653034449285133, articleId=1210601625224344534, doi=null, pmid=null, pmcid=null, year=1999, volume=12, issue=1, pageStart=1, pageEnd=5, url=null, language=null, rfNumber=[2], rfOrder=3, authorNames=HOUHaoqing, ZHANGChunhua, SUHongli, journalName=Journal of Functional Polymers, refType=null, unstructuredReference=HOUHaoqing, ZHANGChunhua, SUHongli, et al. High sensitive ester-type photosensitive polyimide[J]. Journal of Functional Polymers,1999,12(1):1-5., articleTitle=High sensitive ester-type photosensitive polyimide, refAbstract=null), Reference(id=1218837318413239197, tenantId=1146029695717560320, journalId=1149653034449285133, articleId=1210601625224344534, doi=null, pmid=null, pmcid=null, year=1999, volume=17, issue=4, pageStart=334, pageEnd=337, url=null, language=null, rfNumber=[3], rfOrder=4, authorNames=李加深, 李佐邦, 朱普坤, journalName=感光科学与光化学, refType=null, unstructuredReference=李加深,李佐邦,朱普坤,等. 光敏聚酰亚胺抗蚀剂的研究[J].感光科学与光化学,1999,17(4):334-337., articleTitle=光敏聚酰亚胺抗蚀剂的研究, refAbstract=null), Reference(id=1218837318501319583, tenantId=1146029695717560320, journalId=1149653034449285133, articleId=1210601625224344534, doi=null, pmid=null, pmcid=null, year=1999, volume=17, issue=4, pageStart=334, pageEnd=337, url=null, language=null, rfNumber=[3], rfOrder=5, authorNames=LIJiashen, LIZuobang, ZHUPukun, journalName=Photographic Science and Photochemistry, refType=null, unstructuredReference=LIJiashen, LIZuobang, ZHUPukun, et al. Study on a kind of negative photoresist based on photosensitive polyimides[J]. Photographic Science and Photochemistry,1999,17(4):334-337., articleTitle=Study on a kind of negative photoresist based on photosensitive polyimides, refAbstract=null), Reference(id=1218837318610371489, tenantId=1146029695717560320, journalId=1149653034449285133, articleId=1210601625224344534, doi=null, pmid=null, pmcid=null, year=2008, volume=8, issue=12, pageStart=1, pageEnd=6, url=null, language=null, rfNumber=[4], rfOrder=6, authorNames=刘金刚, 袁向文, 尹志华, journalName=电子与封装, refType=null, unstructuredReference=刘金刚,袁向文,尹志华,等.正性光敏聚酰亚胺研究与应用进展(一)[J].电子与封装,2008,8(12):1-6., articleTitle=正性光敏聚酰亚胺研究与应用进展(一), refAbstract=null), Reference(id=1218837318685868963, tenantId=1146029695717560320, journalId=1149653034449285133, articleId=1210601625224344534, doi=null, pmid=null, pmcid=null, year=2008, volume=8, issue=12, pageStart=1, pageEnd=6, url=null, language=null, rfNumber=[4], rfOrder=7, authorNames=LIUJingang, YUANXiangwen, YINZhihua, journalName=Electronic & Packaging, refType=null, unstructuredReference=LIUJingang, YUANXiangwen, YINZhihua, et al. Research and development of positive-working photosensitive polyimides(1)[J]. Electronic & Packaging,2008,8(12):1-6., articleTitle=Research and development of positive-working photosensitive polyimides(1), refAbstract=null), Reference(id=1218837318757172133, tenantId=1146029695717560320, journalId=1149653034449285133, articleId=1210601625224344534, doi=null, pmid=null, pmcid=null, year=2009, volume=9, issue=1, pageStart=7, pageEnd=11, url=null, language=null, rfNumber=[5], rfOrder=8, authorNames=刘金刚, 袁向文, 尹志华, journalName=电子与封装, refType=null, unstructuredReference=刘金刚,袁向文,尹志华,等.正性光敏聚酰亚胺研究与应用进展(二)[J].电子与封装,2009,9(1):7-11., articleTitle=正性光敏聚酰亚胺研究与应用进展(二), refAbstract=null), Reference(id=1218837318832669607, tenantId=1146029695717560320, journalId=1149653034449285133, articleId=1210601625224344534, doi=null, pmid=null, pmcid=null, year=2009, volume=9, issue=1, pageStart=7, pageEnd=11, url=null, language=null, rfNumber=[5], rfOrder=9, authorNames=LIUJingang, YUANXiangwen, YINZhihua, journalName=Electronic & Packaging, refType=null, unstructuredReference=LIUJingang, YUANXiangwen, YINZhihua, et al. Research and development of positive-working photosensitive polyimides(2)[J]. Electronic & Packaging,2009,9(1):7-11., articleTitle=Research and development of positive-working photosensitive polyimides(2), refAbstract=null), Reference(id=1218837318912361384, tenantId=1146029695717560320, journalId=1149653034449285133, articleId=1210601625224344534, doi=null, pmid=null, pmcid=null, year=1971, volume=11, issue=5, pageStart=426, pageEnd=430, url=null, language=null, rfNumber=[6], rfOrder=10, authorNames=KERWINR E, GOLDRICKM R, journalName=Polymer Engineering and Science, refType=null, unstructuredReference=KERWINR E, GOLDRICKM R. Thermally stable photoresist polymer[J]. Polymer Engineering and Science,1971,11(5):426-430., articleTitle=Thermally stable photoresist polymer, refAbstract=null), Reference(id=1218837318975275945, tenantId=1146029695717560320, journalId=1149653034449285133, articleId=1210601625224344534, doi=null, pmid=null, pmcid=null, year=1979, volume=23, issue=5, pageStart=303, pageEnd=309, url=null, language=null, rfNumber=[7], rfOrder=11, authorNames=RUBNERR, AHNEH, KUHNE, journalName=Photographic Science and Engineering, refType=null, unstructuredReference=RUBNERR, AHNEH, KUHNE, et al. A photopolymer-the direct way to polyimide patterns[J]. Photographic Science and Engineering,1979,23(5):303-309., articleTitle=A photopolymer-the direct way to polyimide patterns, refAbstract=null), Reference(id=1218837319042384811, tenantId=1146029695717560320, journalId=1149653034449285133, articleId=1210601625224344534, doi=null, pmid=null, pmcid=null, year=1994, volume=32, issue=3, pageStart=503, pageEnd=511, url=null, language=null, rfNumber=[8], rfOrder=12, authorNames=JINQ, YAMASHITAT, HORIEK, journalName=Journal of Polymer Science Part A: Polymer Chemistry, refType=null, unstructuredReference=JINQ, YAMASHITAT, HORIEK. Polyimides with alicyclic diamines. II. Hydrogen abstraction and photocrosslinking reactions of benzophenone-type polyimides[J]. Journal of Polymer Science Part A: Polymer Chemistry,1994,32(3):503-511., articleTitle=Polyimides with alicyclic diamines. II. Hydrogen abstraction and photocrosslinking reactions of benzophenone-type polyimides, refAbstract=null), Reference(id=1218837319109493677, tenantId=1146029695717560320, journalId=1149653034449285133, articleId=1210601625224344534, doi=null, pmid=null, pmcid=null, year=2015, volume=28, issue=1, pageStart=73, pageEnd=77, url=null, language=null, rfNumber=[9], rfOrder=13, authorNames=TOMIKAWAM, OKUDAR, OHNISHIH, journalName=Journal of Photopolymer Science and Technology, refType=null, unstructuredReference=TOMIKAWAM, OKUDAR, OHNISHIH. Photosensitive polyimide for packaging applications[J]. Journal of Photopolymer Science and Technology,2015,28(1):73-77., articleTitle=Photosensitive polyimide for packaging applications, refAbstract=null), Reference(id=1218837319172408239, tenantId=1146029695717560320, journalId=1149653034449285133, articleId=1210601625224344534, doi=null, pmid=null, pmcid=null, year=2021, volume=34, issue=2, pageStart=195, pageEnd=199, url=null, language=null, rfNumber=[10], rfOrder=14, authorNames=SHOJIY, HASHIMOTOK, KOYAMAY, journalName=Journal of Photopolymer Science and Technology, refType=null, unstructuredReference=SHOJIY, HASHIMOTOK, KOYAMAY, et al. Low stress and low temperature curable photosensitive polyimide[J]. Journal of Photopolymer Science and Technology,2021,34(2):195-199., articleTitle=Low stress and low temperature curable photosensitive polyimide, refAbstract=null), Reference(id=1218837319239517105, tenantId=1146029695717560320, journalId=1149653034449285133, articleId=1210601625224344534, doi=null, pmid=null, pmcid=null, year=2021, volume=38, issue=9, pageStart=1119, pageEnd=1137, url=null, language=null, rfNumber=[11], rfOrder=15, authorNames=郭海泉, 杨正华, 高连勋, journalName=应用化学, refType=null, unstructuredReference=郭海泉,杨正华,高连勋.光敏聚酰亚胺光刻胶研究进展[J].应用化学,2021,38(9):1119-1137., articleTitle=光敏聚酰亚胺光刻胶研究进展, refAbstract=null), Reference(id=1218837319306625971, tenantId=1146029695717560320, journalId=1149653034449285133, articleId=1210601625224344534, doi=null, pmid=null, pmcid=null, year=2021, volume=38, issue=9, pageStart=1119, pageEnd=1137, url=null, language=null, rfNumber=[11], rfOrder=16, authorNames=GUOHaiquan, YANGZhenghua, GAOLianxun, journalName=Chinese Journal of Applied Chemistry, refType=null, unstructuredReference=GUOHaiquan, YANGZhenghua, GAOLianxun. Progress research on photosensitive polyimide[J]. Chinese Journal of Applied Chemistry,2021,38(9):1119-1137., articleTitle=Progress research on photosensitive polyimide, refAbstract=null), Reference(id=1218837319398900661, tenantId=1146029695717560320, journalId=1149653034449285133, articleId=1210601625224344534, doi=null, pmid=null, pmcid=null, year=2021, volume=49, issue=11, pageStart=158, pageEnd=162, url=null, language=null, rfNumber=[12], rfOrder=17, authorNames=韩兵, 李铭新, journalName=工程塑料应用, refType=null, unstructuredReference=韩兵,李铭新.负性光敏聚酰亚胺研究与应用进展[J].工程塑料应用,2021,49(11):158-162., articleTitle=负性光敏聚酰亚胺研究与应用进展, refAbstract=null), Reference(id=1218837319499563959, tenantId=1146029695717560320, journalId=1149653034449285133, articleId=1210601625224344534, doi=null, pmid=null, pmcid=null, year=2021, volume=49, issue=11, pageStart=158, pageEnd=162, url=null, language=null, rfNumber=[12], rfOrder=18, authorNames=HANBing, LIMingxin, journalName=Engineering Plastics Application, refType=null, unstructuredReference=HANBing, LIMingxin. Progress in research and application of negative photosensitive polyimides[J]. Engineering Plastics Application,2021,49(11):158-162., articleTitle=Progress in research and application of negative photosensitive polyimides, refAbstract=null), Reference(id=1218837319604421561, tenantId=1146029695717560320, journalId=1149653034449285133, articleId=1210601625224344534, doi=null, pmid=null, pmcid=null, year=2021, volume=49, issue=12, pageStart=157, pageEnd=161, url=null, language=null, rfNumber=[13], rfOrder=19, authorNames=李铭新, 韩兵, 王珂, journalName=工程塑料应用, refType=null, unstructuredReference=李铭新,韩兵,王珂.低温固化型光敏聚酰亚胺的研究与应用进展[J].工程塑料应用,2021,49(12):157-161., articleTitle=低温固化型光敏聚酰亚胺的研究与应用进展, refAbstract=null), Reference(id=1218837319684113339, tenantId=1146029695717560320, journalId=1149653034449285133, articleId=1210601625224344534, doi=null, pmid=null, pmcid=null, year=2021, volume=49, issue=12, pageStart=157, pageEnd=161, url=null, language=null, rfNumber=[13], rfOrder=20, authorNames=LIMingxin, HANBing, WANGKe, journalName=Engineering Plastics Application, refType=null, unstructuredReference=LIMingxin, HANBing, WANGKe. Progress in research and application of low-temperature curable photosensitive polyimides[J]. Engineering Plastics Application,2021,49(12):157-161., articleTitle=Progress in research and application of low-temperature curable photosensitive polyimides, refAbstract=null), Reference(id=1218837319767999421, tenantId=1146029695717560320, journalId=1149653034449285133, articleId=1210601625224344534, doi=null, pmid=null, pmcid=null, year=2023, volume=39, issue=10, pageStart=173, pageEnd=181, url=null, language=null, rfNumber=[14], rfOrder=21, authorNames=王思恩, 张嘉豪, 傅智楠, journalName=高分子材料科学与工程, refType=null, unstructuredReference=王思恩,张嘉豪,傅智楠,等.正性光敏型聚酰亚胺的研究和应用进展[J].高分子材料科学与工程,2023,39(10):173-181., articleTitle=正性光敏型聚酰亚胺的研究和应用进展, refAbstract=null), Reference(id=1218837319835108287, tenantId=1146029695717560320, journalId=1149653034449285133, articleId=1210601625224344534, doi=null, pmid=null, pmcid=null, year=2023, volume=39, issue=10, pageStart=173, pageEnd=181, url=null, language=null, rfNumber=[14], rfOrder=22, authorNames=WANGSien, ZHANGJiahao, FUZhinan, journalName=Polymer Materials Science and Engineering, refType=null, unstructuredReference=WANGSien, ZHANGJiahao, FUZhinan, et al. Progress in research and application of low-temperature curable photosensitive polyimides[J]. Polymer Materials Science and Engineering,2023,39(10):173-181., articleTitle=Progress in research and application of low-temperature curable photosensitive polyimides, refAbstract=null), Reference(id=1218837319893828545, tenantId=1146029695717560320, journalId=1149653034449285133, articleId=1210601625224344534, doi=null, pmid=null, pmcid=null, year=2017, volume=null, issue=null, pageStart=70, pageEnd=101, url=null, language=null, rfNumber=[15], rfOrder=23, authorNames=张茂于, journalName=产业专利分析报告(第57册)——特种工程塑料, refType=null, unstructuredReference=张茂于.产业专利分析报告(第57册)——特种工程塑料[M].北京:知识产权出版社,2017:70-101., articleTitle=null, refAbstract=null), Reference(id=1218837319960937411, tenantId=1146029695717560320, journalId=1149653034449285133, articleId=1210601625224344534, doi=null, pmid=null, pmcid=null, year=2017, volume=null, issue=null, pageStart=70, pageEnd=101, url=null, language=null, rfNumber=[15], rfOrder=24, authorNames=ZHANGMaoyu, journalName=Industrial patent analysis report (volume 57)-special engineering plastics, refType=null, unstructuredReference=ZHANGMaoyu. Industrial patent analysis report (volume 57)-special engineering plastics[M]. Beijing: Intellectual Property Publishing House,2017:70-101., articleTitle=null, refAbstract=null), Reference(id=1218837320028046277, tenantId=1146029695717560320, journalId=1149653034449285133, articleId=1210601625224344534, doi=null, pmid=null, pmcid=null, year=2017, volume=31, issue=12, pageStart=15, pageEnd=20, url=null, language=null, rfNumber=[16], rfOrder=25, authorNames=李燕芳, 郑凯, 凌辉, journalName=中国塑料, refType=null, unstructuredReference=李燕芳,郑凯,凌辉,等.透明聚酰亚胺薄膜的专利态势分析[J].中国塑料,2017,31(12):15-20., articleTitle=透明聚酰亚胺薄膜的专利态势分析, refAbstract=null), Reference(id=1218837320116126663, tenantId=1146029695717560320, journalId=1149653034449285133, articleId=1210601625224344534, doi=null, pmid=null, pmcid=null, year=2017, volume=31, issue=12, pageStart=15, pageEnd=20, url=null, language=null, rfNumber=[16], rfOrder=26, authorNames=LIYanfang, ZHENGKai, LINGHui, journalName=China Plastics, refType=null, unstructuredReference=LIYanfang, ZHENGKai, LINGHui, et al. Patent situation ana- lysis of transparent polyimide films[J]. China Plastics,2017,31(12):15-20., articleTitle=Patent situation ana- lysis of transparent polyimide films, refAbstract=null), Reference(id=1218837320212595658, tenantId=1146029695717560320, journalId=1149653034449285133, articleId=1210601625224344534, doi=null, pmid=null, pmcid=null, year=2019, volume=33, issue=4, pageStart=120, pageEnd=125, url=null, language=null, rfNumber=[17], rfOrder=27, authorNames=冯刚, 郑凯, 李燕芳, journalName=中国塑料, refType=null, unstructuredReference=冯刚,郑凯,李燕芳.无色透明聚酰亚胺薄膜专利技术热点[J].中国塑料,2019,33(4):120-125., articleTitle=无色透明聚酰亚胺薄膜专利技术热点, refAbstract=null), Reference(id=1218837320300676042, tenantId=1146029695717560320, journalId=1149653034449285133, articleId=1210601625224344534, doi=null, pmid=null, pmcid=null, year=2019, volume=33, issue=4, pageStart=120, pageEnd=125, url=null, language=null, rfNumber=[17], rfOrder=28, authorNames=FENGGang, ZHENGKai, LIYanfang, journalName=China Plastics, refType=null, unstructuredReference=FENGGang, ZHENGKai, LIYanfang. Review on key patent technologies of colorless and transparent polyimide films[J]. China Plastics,2019,33(4):120-125., articleTitle=Review on key patent technologies of colorless and transparent polyimide films, refAbstract=null), Reference(id=1218837320367784908, tenantId=1146029695717560320, journalId=1149653034449285133, articleId=1210601625224344534, doi=null, pmid=null, pmcid=null, year=2023, volume=56, issue=2, pageStart=26, pageEnd=31, url=null, language=null, rfNumber=[18], rfOrder=29, authorNames=赵锴, 温丽萍, 张凯, journalName=绝缘材料, refType=null, unstructuredReference=赵锴,温丽萍,张凯,等.KOLON和SKC公司的透明聚酰亚胺薄膜专利分析[J].绝缘材料,2023,56(2):26-31., articleTitle=KOLON和SKC公司的透明聚酰亚胺薄膜专利分析, refAbstract=null), Reference(id=1218837320439088078, tenantId=1146029695717560320, journalId=1149653034449285133, articleId=1210601625224344534, doi=null, pmid=null, pmcid=null, year=2023, volume=56, issue=2, pageStart=26, pageEnd=31, url=null, language=null, rfNumber=[18], rfOrder=30, authorNames=ZHAOKai, WENLiping, ZHANGKai, journalName=Insula- ting Materials, refType=null, unstructuredReference=ZHAOKai, WENLiping, ZHANGKai, et al. Patent analysis of transparent polyimide film from KOLON and SKC[J]. Insula- ting Materials,2023,56(2):26-31., articleTitle=Patent analysis of transparent polyimide film from KOLON and SKC, refAbstract=null), Reference(id=1218837320527168462, tenantId=1146029695717560320, journalId=1149653034449285133, articleId=1210601625224344534, doi=null, pmid=null, pmcid=null, year=2023, volume=51, issue=1, pageStart=1, pageEnd=5, url=null, language=null, rfNumber=[19], rfOrder=31, authorNames=付继光, 张凯, 温丽萍, journalName=塑料工业, refType=null, unstructuredReference=付继光,张凯,温丽萍,等.聚酰亚胺薄膜中国专利技术分析[J].塑料工业,2023,51(1):1-5., articleTitle=聚酰亚胺薄膜中国专利技术分析, refAbstract=null), Reference(id=1218837320606860240, tenantId=1146029695717560320, journalId=1149653034449285133, articleId=1210601625224344534, doi=null, pmid=null, pmcid=null, year=2023, volume=51, issue=1, pageStart=1, pageEnd=5, url=null, language=null, rfNumber=[19], rfOrder=32, authorNames=FUJiguang, ZHANGKai, WENLiping, journalName=China Plastics Industry, refType=null, unstructuredReference=FUJiguang, ZHANGKai, WENLiping, et al. Analysis of polyimide patents applied in China[J]. China Plastics Industry,2023,51(1):1-5., articleTitle=Analysis of polyimide patents applied in China, refAbstract=null), Reference(id=1218837320669774802, tenantId=1146029695717560320, journalId=1149653034449285133, articleId=1210601625224344534, doi=null, pmid=null, pmcid=null, year=1988, volume=17, issue=3, pageStart=68, pageEnd=75, url=null, language=null, rfNumber=[20], rfOrder=33, authorNames=李佐邦, 肖继君, 白宗武, journalName=河北工学院学报, refType=null, unstructuredReference=李佐邦,肖继君,白宗武.耐热感光高分子的合成与应用[J].河北工学院学报,1988,17(3):68-75., articleTitle=耐热感光高分子的合成与应用, refAbstract=null), Reference(id=1218837320745272276, tenantId=1146029695717560320, journalId=1149653034449285133, articleId=1210601625224344534, doi=null, pmid=null, pmcid=null, year=1988, volume=17, issue=3, pageStart=68, pageEnd=75, url=null, language=null, rfNumber=[20], rfOrder=34, authorNames=LIZuobang, XIAOJijun, BAIZongwu, journalName=Journal of Hebei Institute of Technology, refType=null, unstructuredReference=LIZuobang, XIAOJijun, BAIZongwu. The synthesis and application of heat-resistant photosensitive high polymer[J]. Journal of Hebei Institute of Technology,1988,17(3):68-75., articleTitle=The synthesis and application of heat-resistant photosensitive high polymer, refAbstract=null), Reference(id=1218837320829158358, tenantId=1146029695717560320, journalId=1149653034449285133, articleId=1210601625224344534, doi=null, pmid=null, pmcid=null, year=1989, volume=18, issue=1, pageStart=40, pageEnd=48, url=null, language=null, rfNumber=[21], rfOrder=35, authorNames=李佐邦, 肖继君, 丁晓君, journalName=河北工学院学报, refType=null, unstructuredReference=李佐邦,肖继君,丁晓君.聚酰亚胺型耐热感光高分子的热分解动力学[J].河北工学院学报,1989,18(1):40-48., articleTitle=聚酰亚胺型耐热感光高分子的热分解动力学, refAbstract=null), Reference(id=1218837320921433048, tenantId=1146029695717560320, journalId=1149653034449285133, articleId=1210601625224344534, doi=null, pmid=null, pmcid=null, year=1989, volume=18, issue=1, pageStart=40, pageEnd=48, url=null, language=null, rfNumber=[21], rfOrder=36, authorNames=LIZuobang, XIAOJijun, JINGXiaojun, journalName=Journal of Hebei Institute of Technology, refType=null, unstructuredReference=LIZuobang, XIAOJijun, JINGXiaojun. A study on the thermal decomposition kinetics of polyimide-type photoresist polymer[J]. Journal of Hebei Institute of Technology,1989,18(1):40-48., articleTitle=A study on the thermal decomposition kinetics of polyimide-type photoresist polymer, refAbstract=null), Reference(id=1218837321009513434, tenantId=1146029695717560320, journalId=1149653034449285133, articleId=1210601625224344534, doi=null, pmid=null, pmcid=null, year=1991, volume=11, issue=3, pageStart=172, pageEnd=179, url=null, language=null, rfNumber=[22], rfOrder=37, authorNames=侯豪情, 徐卫东, 韩阶平, journalName=真空科学与技术, refType=null, unstructuredReference=侯豪情,徐卫东,韩阶平.耐热光敏聚酸亚胺的光刻工艺研究[J].真空科学与技术,1991,11(3):172-179., articleTitle=耐热光敏聚酸亚胺的光刻工艺研究, refAbstract=null), Reference(id=1218837321080816604, tenantId=1146029695717560320, journalId=1149653034449285133, articleId=1210601625224344534, doi=null, pmid=null, pmcid=null, year=1991, volume=11, issue=3, pageStart=172, pageEnd=179, url=null, language=null, rfNumber=[22], rfOrder=38, authorNames=HOUHaoqing, XUWeidong, HANJieping, journalName=Vacuum Science and Technology, refType=null, unstructuredReference=HOUHaoqing, XUWeidong, HANJieping. Study of the photolithography technique of thermally stable photosensitive polyimide[J]. Vacuum Science and Technology,1991,11(3):172-179., articleTitle=Study of the photolithography technique of thermally stable photosensitive polyimide, refAbstract=null), Reference(id=1218837321152119774, tenantId=1146029695717560320, journalId=1149653034449285133, articleId=1210601625224344534, doi=null, pmid=null, pmcid=null, year=1992, volume=13, issue=3, pageStart=186, pageEnd=192, url=null, language=null, rfNumber=[23], rfOrder=39, authorNames=韩阶平, 侯豪情, 徐卫东, journalName=半导体学报, refType=null, unstructuredReference=韩阶平,侯豪情,徐卫东.耐热光敏聚酰亚胺胶的研究[J].半导体学报,1992,13(3):186-192., articleTitle=耐热光敏聚酰亚胺胶的研究, refAbstract=null), Reference(id=1218837321206645728, tenantId=1146029695717560320, journalId=1149653034449285133, articleId=1210601625224344534, doi=null, pmid=null, pmcid=null, year=1992, volume=13, issue=3, pageStart=186, pageEnd=192, url=null, language=null, rfNumber=[23], rfOrder=40, authorNames=HANJieping, HOUHaoqing, XUWeidong, journalName=Chinese Journal of Semiconductors, refType=null, unstructuredReference=HANJieping, HOUHaoqing, XUWeidong. Study of thermally stable photosensitive polyimide[J]. Chinese Journal of Semiconductors,1992,13(3):186-192., articleTitle=Study of thermally stable photosensitive polyimide, refAbstract=null), Reference(id=1218837321282143202, tenantId=1146029695717560320, journalId=1149653034449285133, articleId=1210601625224344534, doi=null, pmid=null, pmcid=null, year=1990, volume=19, issue=2, pageStart=32, pageEnd=38, url=null, language=null, rfNumber=[24], rfOrder=41, authorNames=李佐邦, 肖继君, 白宗武, journalName=河北工学院学报, refType=null, unstructuredReference=李佐邦,肖继君,白宗武.PI-A型耐热感光高分子的单体及预聚体合成的研究[J].河北工学院学报,1990,19(2):32-38., articleTitle=PI-A型耐热感光高分子的单体及预聚体合成的研究, refAbstract=null), Reference(id=1218837321345057764, tenantId=1146029695717560320, journalId=1149653034449285133, articleId=1210601625224344534, doi=null, pmid=null, pmcid=null, year=1990, volume=19, issue=2, pageStart=32, pageEnd=38, url=null, language=null, rfNumber=[24], rfOrder=42, authorNames=LIZuobang, XIAOJijun, BAIZongwu, journalName=Journal of Hebei Institute of Technology, refType=null, unstructuredReference=LIZuobang, XIAOJijun, BAIZongwu. A study on the synthesis of monomer and prepolymer of heat-resistant PI-A photosensitive polymer[J]. Journal of Hebei Institute of Technology,1990,19(2):32-38., articleTitle=A study on the synthesis of monomer and prepolymer of heat-resistant PI-A photosensitive polymer, refAbstract=null), Reference(id=1218837321428943845, tenantId=1146029695717560320, journalId=1149653034449285133, articleId=1210601625224344534, doi=null, pmid=null, pmcid=null, year=1990, volume=19, issue=4, pageStart=20, pageEnd=28, url=null, language=null, rfNumber=[25], rfOrder=43, authorNames=李佐邦, 朱普坤, 王立新, journalName=河北工学院学报, refType=null, unstructuredReference=李佐邦,朱普坤,王立新.含肉桂基的光敏聚酸亚胺的研究:光敏树脂的合成[J].河北工学院学报,1990,19(4):20-28., articleTitle=含肉桂基的光敏聚酸亚胺的研究:光敏树脂的合成, refAbstract=null), Reference(id=1218837321479275494, tenantId=1146029695717560320, journalId=1149653034449285133, articleId=1210601625224344534, doi=null, pmid=null, pmcid=null, year=1990, volume=19, issue=4, pageStart=20, pageEnd=28, url=null, language=null, rfNumber=[25], rfOrder=44, authorNames=LIZuobang, ZHUPukun, WANGLixin, journalName=Journal of Hebei Institute of Technology, refType=null, unstructuredReference=LIZuobang, ZHUPukun, WANGLixin. A study on the photosentsitive polyimide containing cinnamyl group[J]. Journal of Hebei Institute of Technology,1990,19(4):20-28., articleTitle=A study on the photosentsitive polyimide containing cinnamyl group, refAbstract=null), Reference(id=1218837321542190055, tenantId=1146029695717560320, journalId=1149653034449285133, articleId=1210601625224344534, doi=null, pmid=null, pmcid=null, year=1991, volume=20, issue=3, pageStart=7, pageEnd=14, url=null, language=null, rfNumber=[26], rfOrder=45, authorNames=李佐邦, 王立新, 朱普坤, journalName=河北工学院学报, refType=null, unstructuredReference=李佐邦,王立新,朱普坤.含肉桂基的光敏聚酸亚胺光刻工艺的研究[J].河北工学院学报,1991,20(3):7-14., articleTitle=含肉桂基的光敏聚酸亚胺光刻工艺的研究, refAbstract=null), Reference(id=1218837321613493224, tenantId=1146029695717560320, journalId=1149653034449285133, articleId=1210601625224344534, doi=null, pmid=null, pmcid=null, year=1991, volume=20, issue=3, pageStart=7, pageEnd=14, url=null, language=null, rfNumber=[26], rfOrder=46, authorNames=LIZuobang, WANGLixin, ZHUPukun, journalName=Journal of Hebei Institute of Technology, refType=null, unstructuredReference=LIZuobang, WANGLixin, ZHUPukun. A study on the photolithographic process for the photoreactive polyimide-containing cinnamyl group[J]. Journal of Hebei Institute of Technology,1991,20(3):7-14., articleTitle=A study on the photolithographic process for the photoreactive polyimide-containing cinnamyl group, refAbstract=null)], funds=[Fund(id=1218837317951865748, tenantId=1146029695717560320, journalId=1149653034449285133, articleId=1210601625224344534, awardId=2022YFB3603105, language=CN, fundingSource=国家重点研发计划项目资助(2022YFB3603105), fundOrder=null, country=null)], companyList=[AuthorCompany(id=1218837313640121108, tenantId=1146029695717560320, journalId=1149653034449285133, articleId=1210601625224344534, xref=1, ext=[AuthorCompanyExt(id=1218837313648509718, tenantId=1146029695717560320, journalId=1149653034449285133, articleId=1210601625224344534, companyId=1218837313640121108, language=EN, country=null, province=null, city=null, postcode=null, companyName=null, departmentName=null, remark=1China National Intellectual Property Administration, Beijing 100081, China), AuthorCompanyExt(id=1218837313652704023, 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language=CN, label=图8, caption=2011—2024年代表性PSPI企业申请人的中国专利技术主题情况, figureFileSmall=HsOqK12Apk4d9aOugbaiLw==, figureFileBig=qfksGRBI2HoGh5isxDx4NA==, tableContent=null), ArticleFig(id=1218837317708596111, tenantId=1146029695717560320, journalId=1149653034449285133, articleId=1210601625224344534, language=EN, label=Table 1, caption=Representative corporate applicants of PSPI patents applied in China during 2011-2024, figureFileSmall=null, figureFileBig=null, tableContent=
排名申请人国别专利数量/项
1京东方科技集团中国138
2东丽株式会社日本94
3富士胶片株式会社日本58
4旭化成株式会社日本38
5明士（北京）新材料开发中国33
6华进半导体封装先导技术研发中心中国31
7三星显示韩国24
8昆山国显光电中国24
9第一毛织株式会社韩国24
10日立化成杜邦微系统日本22
11中芯国际集成电路制造(上海)中国22
12成都京东方光电科技中国20
13武汉华星光电半导体显示技术中国20
14信越化学工业株式会社日本19
15JSR株式会社日本19
16中芯长电半导体(江阴)中国18
17波米科技中国18
18珠海越亚半导体中国17
19三星电子株式会社韩国16
20LG化学株式会社韩国16
), ArticleFig(id=1218837317779899281, tenantId=1146029695717560320, journalId=1149653034449285133, articleId=1210601625224344534, language=CN, label=表1, caption=

2011—2024年PSPI中国专利的企业申请人情况

, figureFileSmall=null, figureFileBig=null, tableContent=
排名申请人国别专利数量/项
1京东方科技集团中国138
2东丽株式会社日本94
3富士胶片株式会社日本58
4旭化成株式会社日本38
5明士（北京）新材料开发中国33
6华进半导体封装先导技术研发中心中国31
7三星显示韩国24
8昆山国显光电中国24
9第一毛织株式会社韩国24
10日立化成杜邦微系统日本22
11中芯国际集成电路制造(上海)中国22
12成都京东方光电科技中国20
13武汉华星光电半导体显示技术中国20
14信越化学工业株式会社日本19
15JSR株式会社日本19
16中芯长电半导体(江阴)中国18
17波米科技中国18
18珠海越亚半导体中国17
19三星电子株式会社韩国16
20LG化学株式会社韩国16
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光敏聚酰亚胺中国专利技术分析
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杨斐 1 , 郭彦 1 , 苑伟康 1 , 徐建锋 1 , 黄颖 1 , 赵锴 1 , 翟磊 2 , 范琳 2
绝缘材料 | 高性能聚酰亚胺材料专题 2024,57(10): 98-105
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绝缘材料 | 高性能聚酰亚胺材料专题 2024, 57(10): 98-105
光敏聚酰亚胺中国专利技术分析
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杨斐1, 郭彦1, 苑伟康1, 徐建锋1, 黄颖1, 赵锴1, 翟磊2, 范琳2
作者信息
  • 1国家知识产权局，北京 100081
  • 2中国科学院化学研究所，北京 100190

    • 杨斐（1982-），女（汉族），安徽安庆人，三级调研员，主要从事材料领域专利的复审无效审理工作；

    郭彦（1980-），男（汉族），江西吉安人，二级调研员，主要从事材料领域专利的复审无效审理工作。

通讯作者:

翟磊（1985-），男（汉族），山东潍坊人，副研究员，主要从事高性能聚酰亚胺材料的基础与应用研究。
Technical analysis of photosensitive polyimide patents applied in China
Fei YANG1, Yan GUO1, Weikang YUAN1, Jianfeng XU1, Ying HUANG1, Kai ZHAO1, Lei ZHAI2, Lin FAN2
Affiliations
  • 1China National Intellectual Property Administration, Beijing 100081, China
  • 2Institute of Chemistry, Chinese Academy of Sciences, Beijing 100190, China
出版时间: 2024-10-20 doi: 10.16790/j.cnki.1009-9239.im.2024.10.013
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摘要
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光敏聚酰亚胺（PSPI）是一类具有特殊结构的高性能聚酰亚胺材料，以其优异的耐热、力学、绝缘及光刻加工性等特点，广泛应用于半导体封装、集成电路、光学显示等领域。本文以在中国申请的PSPI专利为研究对象，分析了相关专利的整体情况，包括专利的申请数量变化、申请人与来源国等；重点梳理了自2011年以来的国内外专利申请人及专利主题分布，详细对比了国内外主要企业申请人的专利技术构成与保护重点，探讨了PSPI材料领域的专利技术特点与发展趋势。

光敏聚酰亚胺  /  专利  /  国外申请人  /  技术主题  /  发展趋势

Photosensitive polyimide (PSPI) is a kind of high-performance polyimide with special structures, which is widely used in semiconductor packaging, integrated circuits, optical display, and other fields due to its excellent heat resistance, mechanical properties, insulating properties, and lithographic processability. In this paper, the PSPI patents applied in China were taken as object, the overall situation of these patents, including changes in the number of patent applications, applicants, and their source countries was analyzed systematically. Especially, the patent applicants inside and outside China and the patent subject distribution since 2011 were discussed. The difference of patent technology and protection priorities of enterprise applicants inside and outside China was compared in detail. The patent technology characteristics and development trends of PSPI were explored.

photosensitive polyimide  /  patent  /  foreign applicant  /  technical topics  /  development trend
杨斐, 郭彦, 苑伟康, 徐建锋, 黄颖, 赵锴, 翟磊, 范琳. 光敏聚酰亚胺中国专利技术分析. 绝缘材料, 2024 , 57 (10) : 98 -105 . DOI: 10.16790/j.cnki.1009-9239.im.2024.10.013
Fei YANG, Yan GUO, Weikang YUAN, Jianfeng XU, Ying HUANG, Kai ZHAO, Lei ZHAI, Lin FAN. Technical analysis of photosensitive polyimide patents applied in China[J]. Insulating Materials, 2024 , 57 (10) : 98 -105 . DOI: 10.16790/j.cnki.1009-9239.im.2024.10.013
正文
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0 引言
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光敏聚酰亚胺（简称PSPI）是一类重要的高端光刻涂层胶和封装材料，分子结构中兼具酰亚胺与光敏功能基团，是集优异耐热、力学、感光等性能于一体的特殊结构聚酰亚胺[1-3]。PSPI不但拥有传统聚酰亚胺材料优良的综合性能，而且还具备常规光刻胶的光刻功能，无需额外配合光刻胶即可进行刻蚀实现图案化，大幅简化了器件的加工工艺，广泛用于半导体封装、集成电路、光学显示等领域[4-5]。
根据光化学反应机理，PSPI材料可分为正性和负性两大系列。早在1971年，R E KERWIN等[6]报道了一种基于重铬酸钾与聚酰胺酸溶液的负性光敏抗蚀剂体系。在紫外光照射下，重铬酸盐与聚酰胺酸发生光化学交联反应，形成不溶性的聚合物网络结构，曝光后进一步通过显影液去除未曝光部分，从而形成清晰的抗蚀剂图案。由于重铬酸盐的稳定性与安全性问题，该方法制备的光致刻蚀剂难以长期保存，实际应用价值受到极大限制，研究人员指出后续工作的重点在于开发稳定的有机光敏交联基团以替代重铬酸盐。1973年，德国西门子公司的R RUBNER等[7]申请了第一件关于负性PSPI材料的专利（DE 2308830A），将可光照或辐照快速交联的烯丙基酯基团引入到聚酰胺酸结构中，解决了重铬酸盐策略的弊端以及聚酰胺酸溶液储存稳定性差的问题，并围绕该类新型PSPI体系开展了系统研究。随后在1975年，美国GAF公司申请了首件关于正性PSPI的专利（US4093461A），报道了一种具有良好热稳定性能的正性光刻胶，主组分为感光的邻醌类或萘醌类二叠氮化合物，以及由芳香二酐和芳香二胺缩聚而成的聚酰胺酸，曝光后采用碱性溶液显影，该光刻胶层耐热温度达到500℃，可满足等离子体、溅射蚀刻及离子注入等要求。
此后，国外企业或科研结构针对PSPI材料开展了大规模的商品化开发，涌现出一大批PSPI材料生产企业，例如日本东丽、旭化成、富士胶片、日立杜邦等[8-10]。国内针对PSPI材料的研究相比国外稍晚，前期很长一段时间主要以中国科学院和高校等科研机构开展的基础研究为主。近年来，随着光电技术的飞速发展，国家陆续出台政策大力推动半导体、新型显示等电子器件关键材料的发展，并由此带动国内企业加大对PSPI等高端光刻胶材料产业化的投入力度。国内企业和科研机构先后针对显示级封装与晶圆级封装两大应用需求开展布局，在PSPI材料领域的专利申请数量稳步快速增长，高温固化产品的开发取得重要进展，并且在集成电路、显示领域的应用推进速度较快[11-14]。
由于PSPI的技术复杂度高、应用性强，国外公司一直非常重视有关PSPI结构与配方的专利技术保护，通过对国外申请布局的专利内容进行分析解读将有助于了解其技术特点与发展趋势，对国内科研机构、生产和应用企业有着重要指导意义。国内已有针对聚酰亚胺材料，特别是透明聚酰亚胺薄膜的专利技术分析报道，通过对国内外专利信息的深入挖掘与技术梳理，保证了国内研究人员对该领域技术动态与专利布局的准确掌握[15-19]。当前，国内在高端PSPI材料的研发方面仍存在诸多技术挑战，与国外产品的性能差距依旧明显。为此，本文以在中国申请的PSPI相关专利为研究对象，重点分析自2011年以来国内外专利数量及申请人变化情况，梳理对比国内外主要企业的专利保护重点与技术主题分布情况，深入探讨PSPI材料领域的专利技术发展趋势与市场应用状况，以期为国内从事PSPI材料研发与生产应用的科研机构和企业提供有益参考。
1 PSPI中国专利的整体申请状况
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本文专利样本来源于国家知识产权局专利检索系统和incoPat专利数据库，检索时间范围为1985年1月1日至2024年3月31日，检索日截至2024年4月6日，即在4月6日之前已公开并录入数据库的专利申请。分别以光敏（性）聚酰亚胺、感光（性）聚酰亚胺、聚酰亚胺光刻胶等为关键词，通过国际专利分类号、申请人等为入口进行检索。
1.1 专利申请数量变化
对检索结果进行同族合并，每个同族计为一项，检索得到国内外申请人在中国申请的PSPI专利数量共计4 849项。对历年专利申请量按照年度分布、申请人国籍进行分类统计，得到专利的年度申请数量变化趋势如图1所示。
从图1可以看出，PSPI中国专利的申请数量变化情况可分为3个阶段：
第一阶段（1986—2000年）为起步期。与PSPI有关的中国专利申请最早出现在1986年，意大利格特电信公司、日本的旭化成工业株式会社几乎同时提出专利申请，前者是关于聚酰亚胺光致抗蚀剂的应用，而后者是关于可光固化或热固化的光敏聚酰亚胺组合物。该阶段每年专利申请数量近20项，且以国外申请人在华申请为主，以日本旭化成、美国杜邦公司等为代表的日美企业率先在中国进行专利布局，远早于国内申请人。正是在该阶段，国内河北工业大学、中国科学院长春应用化学研究所、中国科学院微电子中心等高校与科研机构先后开始了PSPI材料的研究工作[20-23]。例如，李佐邦等[24]以均苯四酸二酐、丙烯酸羟乙酯、二氯亚砜及二氨基二苯醚为主要原料，成功合成了一种聚酰亚胺型感光预聚体；在国内首次报道了含肉桂基的负性光敏聚酰亚胺树脂，并详细研究了该类光敏聚酰亚胺型光刻胶的配制及其光刻工艺[25-26]。然而，直到20世纪90年代中后期，国内申请人才开始在PSPI领域进行专利布局，专利申请数量不足10项，仅占第一阶段申请总量的约10%，反映出国内PSPI材料领域起步较晚，早期关注度不足。
第二阶段（2001—2010年）为平稳发展期。自2001年开始，随着PSPI技术的不断发展与成熟，国内外申请人对该领域的研发热情开始增长，年度专利申请数量逐年增加。仅2001年，日本的日产化学工业株式会社、住友电木株式会社、东丽株式会社等就提交了多项有关正性PSPI树脂组合物的专利申请。之后，信越化学工业股份有限公司、钟渊化学工业株式会社、捷时雅（JSR）株式会社、旭化成电子材料元件株式会社、日立化成杜邦微系统股份有限公司，以及韩国LG化学株式会社、第一毛织株式会社等先后申请了大量有关PSPI前体、树脂及组合物的专利。国内的中国科学院化学研究所于2002年申请了有关本征型PSPI树脂以及PSPI合成用特种单体的专利；中国科学院长春应用化学研究所申请了由含光敏封端剂的聚酰亚胺制备液晶取向膜的方法，并报道了系列水基显影光敏聚酰亚胺材料及其制备方法；上海交通大学、电子科技大学等也申请了有关PSPI材料及单体制备方法的专利；长兴化学工业股份有限公司提交了关于可感光聚合的聚酰亚胺/氧化硅复合材料及制备方法的专利；北京波米科技有限公司申请了负性PSPI树脂及组合物的专利。该阶段仍以国外申请人为主，但国内申请数量已逐渐追赶上国外，并在2010年实现反超，反映出国内申请人日益重视该技术领域的技术研发与知识产权保护。
第三阶段（2011—2024年）为高速发展期。这一阶段的总体申请量迅速递增，PSPI的研发逐渐进入活跃时期。国外申请人在此技术领域的申请量保持平稳发展的态势，年度申请量基本保持在45～80项；相比之下，国内申请人的申请数量呈爆发式增长，年度申请量达到国外申请人的3～6倍。这主要得益于在此阶段国家政策的支持与引导、先进光电领域对光刻胶及封装材料的旺盛需求等，国内企业愈发重视PSPI材料的研发投入，以期在该领域取得关键技术突破，在与国外商品化产品的激烈竞争中发挥出本土优势。关于此阶段的国内外申请人情况、代表性企业申请人及专利内容分析将在后文重点分析介绍。值得说明的是，图1中2023、2024年度专利申请量并未反映出当年的真实申请情况，主要是因专利申请公布（包含PCT国际申请的国家公布和部分发明公布）以及公布数据录入数据库均存在时间滞后性，导致部分专利申请尚未正式公开。
1.2 专利申请人与来源国
图2给出了PSPI中国专利的申请人来源国分布情况。从图2可以看出，PSPI中国专利的申请态势呈现出明显的区域集中特点，97.97%的专利申请都来自于申请量前五位的国家，即中国、日本、韩国、美国和德国。
基于本土优势，来源于国内的专利申请量占比高达71.83%，国外申请人的专利数量占比为28.17%。其中，日本的申请量占比相对较高，达到16.50%，反映出日本企业在该领域的技术优势以及对中国市场的重视程度，代表性企业包括东丽、富士胶片、旭化成、JSR、日产化学、日立杜邦等。韩国也在中国申请了相当数量的PSPI专利，占比达到5.14%，以三星、LG为代表的韩国企业逐步加大了在中国的专利布局。美国和德国在中国的PSPI专利申请量占比远低于日本，分别为3.32%和1.18%。上述申请人来源国别的分布情况与本领域实际商品化PSPI产品及市场应用规模呈正相关，并与日本占据技术主导地位的阶段发展现状相吻合，图2中申请量前5位的国家的PSPI中国专利也主要集中在行业领先的头部企业中。
2 PSPI中国专利自2011年以来申请状况
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2011年，PSPI中国专利的年度申请量首次超过150项，之后随着集成电路、新型显示等领域的需求爆发式增长，国家陆续出台政策大力扶持半导体产业集群建设，PSPI的研发机构、生产和应用企业逐渐增多，并由此带来了大量PSPI相关的专利申请，下面着重针对2011年以来的专利申请状况进行分析。
2.1 专利的申请数量变化
2011—2024年，PSPI中国专利的申请数量变化趋势如图3所示，其中2023年与2024年存在部分专利尚未公开。该时间段涉及PSPI的中国专利申请数量共计3 856项，占全部专利申请总量（不限年份）的近80%。其中，国内申请人的专利申请量达到3111项，占2011—2024年专利申请总量的80.68%；国外申请人的专利申请量为745项，占2011—2024年专利申请总量的19.32%。国外申请量排名前三的国家分别是日本、韩国和美国，在国外来华专利申请中的占比分别为58.94%、19.85%和9.2%，反映出日韩美企业对知识产权保护的重视。
从图3可进一步看出，该阶段PSPI中国专利的整体申请情况与国内申请人的专利申请变化趋势基本一致，表明国内的PSPI企业或机构为该领域的创新活动主体，为PSPI相关专利申请量的快速增长提供了主要份额。相比之下，国外申请人的专利申请量自2011年以后保持相对稳定，反映出其技术迭代进入平稳期。
2.2 专利的法律状态变化
针对2011—2024年PSPI中国专利的法律状态进行了分析，结果如图4所示，专利的法律状态包括授权有效、审中和失效3种状态，其中失效状态又分为驳回、撤回、未缴年费、期限届满和放弃4种情形。从图4可以看出，处于“授权有效”状态的专利申请量占比为45.75%，处于“审中”状态的占比达到30.99%。一方面，是由于近三年新申请的专利数量较多，尚未完成审查流程；另一方面，本领域的专利申请因其技术复杂程度和答复难度，会导致审查时长较其他领域要长，同时也预示着该领域的专利密度会进一步增大。处于“失效”状态的专利申请量占比为23.26%，而在失效的专利中“驳回”的专利占比为10.76%，远低于中国专利局关于发明专利申请的平均驳回率。
图5进一步给出了国外申请人自2011—2024年在中国申请PSPI相关专利的法律状态。从图5可以看出，处于“授权有效”和“实质审查”状态的专利申请量占比分别为45.23%和34.90%；处于“失效”状态的专利申请占比为19.87%，在失效的专利中“撤回”的专利申请有67项，占国外在华申请总量的8.99%，而“驳回”的专利申请有22项，占比仅为2.95%。
由此可知，国外申请人在中国的专利申请驳回率既远低于中国专利局关于发明专利申请的平均驳回率，也明显低于图4显示的该领域中国专利的平均驳回率。该领域显著低于其他领域的低驳回率，也在一定程度上反映出该领域的技术先进性，同时国内外申请人在专利布局上具有更高的前瞻性，且专利撰写的质量相对更高。
2.3 专利的技术主题变化
针对光敏聚酰亚胺中国专利的技术主题的分布情况进行了分类统计，以国际专利分类IPC分类号（根据发明和实用新型专利涉及的技术领域进行分类）为技术主题主要归类依据，以关键词作为补充，对比分析了2011年以前和2011—2024年涵盖专利数量较多的几个主要技术分支的专利情况。需要说明的是，同一项专利通常会涉及覆盖多个技术主题，例如一项专利主要涉及PSPI结构配方的改进，但同时也会涉及在半导体器件、显示装置中的应用，因此可能会在3个技术主题下被重复统计。
2011年以前PSPI中国专利的技术主题分布情况见图6。从图6可以看出，早期阶段PSPI申请量较大的技术主题主要包括PSPI结构设计及制备（PSPI树脂、聚合物及其组合物等）、集成电路、半导体器件、半导体封装、显示装置、光学元件等。国外申请人在PSPI结构设计及制备、半导体器件、集成电路、半导体封装、显示装置、手机等电子电器中的应用、光学元件等主要技术分支中均占绝对主导，专利申请数量远超国内。国内申请人的研发重点与国外基本一致，均对PSPI材料结构设计、半导体器件及集成电路方面的专利申请尤为重视，不过数量相对较少。
进一步对2011—2024年PSPI中国专利的技术主题分布进行了统计，结果如图7所示。从图7可以看出，对比早期阶段，2011年以后国外申请人在PSPI结构设计及制备方面的专利申请量最多，表明此主题下的专利布局量增加；在半导体器件、集成电路、半导体封装等领域的专利申请数量小幅度增长，在显示和光学元件领域则有所回落。相比之下，国内申请人表现出了持续增强的创新活力，除手机相机等电子电器领域外，国内申请人的专利数量在PSPI结构配方设计、半导体器件、集成电路、半导体封装、显示装置等各领域均反超国外申请人。
3 PSPI中国专利的代表性企业申请人
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为进一步通过PSPI专利申请来了解相关产业领域的发展态势，对国内外主要企业申请人的专利数量、技术构成进行分析，对比其技术侧重点差异。重点对国内外企业申请人自2011年以来，专利申请数量排名前20名的情况进行统计，相关企业申请人、专利数量汇总于表1中。
3.1 企业申请人的国别与专利数量
2011—2024年，京东方科技集团所申请的PSPI专利数量为138项，大幅领先国内外其他企业申请人；第二名和第三名依次为日本东丽株式会社、富士胶片株式会社，专利数量分别为94和58项；其余企业申请人在专利申请数量上并没有明显的差异，数量范围基本在16～38项。
在排名前20的企业申请人中，国内企业占了10席，分别为第1位的京东方科技集团股份有限公司、第5位的明士（北京）新材料开发有限公司、第6位的华进半导体封装先导技术研发中心有限公司、第8位的昆山国显光电有限公司、第11位的中芯国际集成电路制造(上海)有限公司、第12位的成都京东方光电科技有限公司、第13位的武汉华星光电半导体显示技术有限公司、第16位的中芯长电半导体（江阴）有限公司、第17位的波米科技有限公司和第18位的珠海越亚半导体股份有限公司。除京东方科技集团股份有限公司的专利数量超过100项之外，其余国内企业申请人的PSPI专利申请量均在33项及以下。
前二十榜单中日本企业占6席，分别是第2位的东丽株式会社、第3位的富士胶片株式会社、第4位的旭化成株式会社、第10位的日立杜邦、第14位的信越化学工业株式会社和第15位的JSR株式会社，专利申请量分别为94、58、38、22、19和19项。上述日本企业的申请总量占国外在华PSPI专利申请量的1/3左右，充分显示了其在该领域的绝对技术优势。此外，前二十的企业申请人中，韩国企业占4席，分别为第7位的三星显示有限公司、第9位的第一毛织株式会社（该公司于2014年与三星SDI合并）、第19位的三星电子株式会社和第20位的LG化学株式会社，专利申请量分别为24、24、16和16项。
3.2 企业申请人的专利类型与技术主题
针对2011年以来PSPI中国专利数量排名前20的企业申请人，根据其主要从事的行业属性并结合专利技术内容，对企业申请专利涉及的领域类型进行了分类统计，大致分为PSPI材料合成、PSPI显示应用、PSPI半导体应用3类。国内的企业申请人有4家公司的专利属于PSPI显示应用类型，另有4家公司的专利属于PSPI半导体应用类型，仅有两家公司的专利属于PSPI材料合成类型，分别为明士（北京）新材料开发有限公司和波米科技有限公司。相比之下，日本6家企业申请人均为PSPI产品生产企业，所申请的专利基本全部属于PSPI材料配方及合成类型；韩国4家企业申请人的专利则主要涉及PSPI材料合成、PSPI显示应用两大类型。
进一步对企业申请人按国别进行分类，统计其所申请PSPI专利的技术主题情况，结果如图8所示。同一项专利通常会涉及多个技术主题，因此会存在重复统计现象。如图8所示，日本企业在PSPI结构配方设计方面的相关专利数量大幅领先，涉及半导体器件、光学元件、集成电路、显示装置、手机相机等领域的专利数量也相对较多。韩国企业所申请专利的技术主题主要集中在PSPI结构配方设计和显示装置领域。相比之下，中国企业在半导体封装和显示装置领域等方面优势明显，并积极在半导体器件、集成电路、手机等电子电器应用领域进行布局，在PSPI结构设计方面的专利申请虽有一定数量，但相较于申请总量而言其占比仍较低。
上述分析表明，日本企业在PSPI材料的结构设计和制备方面拥有明显优势，而国内企业主要在半导体、显示领域的PSPI应用方面取得了较大发展，但在更为核心的材料配方、结构设计与合成等新技术开发方面仍存在不小挑战。
4 结论
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（1）PSPI中国专利的申请数量变化经历了起步期、平稳发展期和高速发展期3个阶段。自2011年以来，PSPI中国专利的申请量迅速上升，其中国内申请人的专利申请数量呈爆发式增长，年度申请量为国外申请人的3~6倍，这得益于该阶段国内企业不断加大PSPI材料研发与应用投入，推动了相关技术的发展与专利申请。
（2）国外申请人的专利布局以日本、韩国、美国为主，专利申请量相对保持稳定。在早期很长一段时间，国外申请人在PSPI结构设计及制备、半导体器件、集成电路、半导体封装及显示装置应用等主要技术分支中占绝对主导，数量远超于国内申请人；自2011年起，国内申请人的PSPI专利申请数量在上述各技术分支均反超国外申请人，表现出了持续增强的创新活力。
（3）国内企业申请人针对PSPI材料的专利保护特点主要体现在半导体封装和显示装置领域的应用优势，在材料配方、结构设计与合成等技术创新的专利申请虽在近些年取得较大进展，但相较于申请总量而言其占比仍有待进一步提高。
随着全球半导体和显示面板产业向国内转移，未来高端PSPI材料的应用需求预计将持续增长。考虑国外企业已在PSPI材料的结构与制备等关键技术领域提前布局了大量发明专利，国内企业与研究机构在PSPI材料应用领域之外需进一步注重专利导航作用，加强新兴应用领域对新型结构及更高性能PSPI材料的前瞻性和战略性专利布局。
基金
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  • 国家重点研发计划项目资助(2022YFB3603105)
文献
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参考文献 引证文献
排序方式：
[1]
侯豪情,李悦生,丁孟贤.光敏聚酰亚胺合成方法及应用的最新进展[J].功能高分子学报,1996,9(2):279-288.
HOUHaoqing, LIYuesheng, DINGMengxian. Recent developments of the synthetic method and application of photosensitive polyimides[J]. Journal of Functional Polymers,1996,9(2):279-288.
[2]
侯豪情,张春华,苏洪利,等.高灵敏度的酯型光敏聚酰亚胺[J].功能高分子学报,1999,12(1):1-5.
HOUHaoqing, ZHANGChunhua, SUHongli, et al. High sensitive ester-type photosensitive polyimide[J]. Journal of Functional Polymers,1999,12(1):1-5.
[3]
李加深,李佐邦,朱普坤,等. 光敏聚酰亚胺抗蚀剂的研究[J].感光科学与光化学,1999,17(4):334-337.
LIJiashen, LIZuobang, ZHUPukun, et al. Study on a kind of negative photoresist based on photosensitive polyimides[J]. Photographic Science and Photochemistry,1999,17(4):334-337.
[4]
刘金刚,袁向文,尹志华,等.正性光敏聚酰亚胺研究与应用进展(一)[J].电子与封装,2008,8(12):1-6.
LIUJingang, YUANXiangwen, YINZhihua, et al. Research and development of positive-working photosensitive polyimides(1)[J]. Electronic & Packaging,2008,8(12):1-6.
[5]
刘金刚,袁向文,尹志华,等.正性光敏聚酰亚胺研究与应用进展(二)[J].电子与封装,2009,9(1):7-11.
LIUJingang, YUANXiangwen, YINZhihua, et al. Research and development of positive-working photosensitive polyimides(2)[J]. Electronic & Packaging,2009,9(1):7-11.
[6]
KERWINR E, GOLDRICKM R. Thermally stable photoresist polymer[J]. Polymer Engineering and Science,1971,11(5):426-430.
[7]
RUBNERR, AHNEH, KUHNE, et al. A photopolymer-the direct way to polyimide patterns[J]. Photographic Science and Engineering,1979,23(5):303-309.
[8]
JINQ, YAMASHITAT, HORIEK. Polyimides with alicyclic diamines. II. Hydrogen abstraction and photocrosslinking reactions of benzophenone-type polyimides[J]. Journal of Polymer Science Part A: Polymer Chemistry,1994,32(3):503-511.
[9]
TOMIKAWAM, OKUDAR, OHNISHIH. Photosensitive polyimide for packaging applications[J]. Journal of Photopolymer Science and Technology,2015,28(1):73-77.
[10]
SHOJIY, HASHIMOTOK, KOYAMAY, et al. Low stress and low temperature curable photosensitive polyimide[J]. Journal of Photopolymer Science and Technology,2021,34(2):195-199.
[11]
郭海泉,杨正华,高连勋.光敏聚酰亚胺光刻胶研究进展[J].应用化学,2021,38(9):1119-1137.
GUOHaiquan, YANGZhenghua, GAOLianxun. Progress research on photosensitive polyimide[J]. Chinese Journal of Applied Chemistry,2021,38(9):1119-1137.
[12]
韩兵,李铭新.负性光敏聚酰亚胺研究与应用进展[J].工程塑料应用,2021,49(11):158-162.
HANBing, LIMingxin. Progress in research and application of negative photosensitive polyimides[J]. Engineering Plastics Application,2021,49(11):158-162.
[13]
李铭新,韩兵,王珂.低温固化型光敏聚酰亚胺的研究与应用进展[J].工程塑料应用,2021,49(12):157-161.
LIMingxin, HANBing, WANGKe. Progress in research and application of low-temperature curable photosensitive polyimides[J]. Engineering Plastics Application,2021,49(12):157-161.
[14]
王思恩,张嘉豪,傅智楠,等.正性光敏型聚酰亚胺的研究和应用进展[J].高分子材料科学与工程,2023,39(10):173-181.
WANGSien, ZHANGJiahao, FUZhinan, et al. Progress in research and application of low-temperature curable photosensitive polyimides[J]. Polymer Materials Science and Engineering,2023,39(10):173-181.
[15]
张茂于.产业专利分析报告(第57册)——特种工程塑料[M].北京:知识产权出版社,2017:70-101.
ZHANGMaoyu. Industrial patent analysis report (volume 57)-special engineering plastics[M]. Beijing: Intellectual Property Publishing House,2017:70-101.
[16]
李燕芳,郑凯,凌辉,等.透明聚酰亚胺薄膜的专利态势分析[J].中国塑料,2017,31(12):15-20.
LIYanfang, ZHENGKai, LINGHui, et al. Patent situation ana- lysis of transparent polyimide films[J]. China Plastics,2017,31(12):15-20.
[17]
冯刚,郑凯,李燕芳.无色透明聚酰亚胺薄膜专利技术热点[J].中国塑料,2019,33(4):120-125.
FENGGang, ZHENGKai, LIYanfang. Review on key patent technologies of colorless and transparent polyimide films[J]. China Plastics,2019,33(4):120-125.
[18]
赵锴,温丽萍,张凯,等.KOLON和SKC公司的透明聚酰亚胺薄膜专利分析[J].绝缘材料,2023,56(2):26-31.
ZHAOKai, WENLiping, ZHANGKai, et al. Patent analysis of transparent polyimide film from KOLON and SKC[J]. Insula- ting Materials,2023,56(2):26-31.
[19]
付继光,张凯,温丽萍,等.聚酰亚胺薄膜中国专利技术分析[J].塑料工业,2023,51(1):1-5.
FUJiguang, ZHANGKai, WENLiping, et al. Analysis of polyimide patents applied in China[J]. China Plastics Industry,2023,51(1):1-5.
[20]
李佐邦,肖继君,白宗武.耐热感光高分子的合成与应用[J].河北工学院学报,1988,17(3):68-75.
LIZuobang, XIAOJijun, BAIZongwu. The synthesis and application of heat-resistant photosensitive high polymer[J]. Journal of Hebei Institute of Technology,1988,17(3):68-75.
[21]
李佐邦,肖继君,丁晓君.聚酰亚胺型耐热感光高分子的热分解动力学[J].河北工学院学报,1989,18(1):40-48.
LIZuobang, XIAOJijun, JINGXiaojun. A study on the thermal decomposition kinetics of polyimide-type photoresist polymer[J]. Journal of Hebei Institute of Technology,1989,18(1):40-48.
[22]
侯豪情,徐卫东,韩阶平.耐热光敏聚酸亚胺的光刻工艺研究[J].真空科学与技术,1991,11(3):172-179.
HOUHaoqing, XUWeidong, HANJieping. Study of the photolithography technique of thermally stable photosensitive polyimide[J]. Vacuum Science and Technology,1991,11(3):172-179.
[23]
韩阶平,侯豪情,徐卫东.耐热光敏聚酰亚胺胶的研究[J].半导体学报,1992,13(3):186-192.
HANJieping, HOUHaoqing, XUWeidong. Study of thermally stable photosensitive polyimide[J]. Chinese Journal of Semiconductors,1992,13(3):186-192.
[24]
李佐邦,肖继君,白宗武.PI-A型耐热感光高分子的单体及预聚体合成的研究[J].河北工学院学报,1990,19(2):32-38.
LIZuobang, XIAOJijun, BAIZongwu. A study on the synthesis of monomer and prepolymer of heat-resistant PI-A photosensitive polymer[J]. Journal of Hebei Institute of Technology,1990,19(2):32-38.
[25]
李佐邦,朱普坤,王立新.含肉桂基的光敏聚酸亚胺的研究:光敏树脂的合成[J].河北工学院学报,1990,19(4):20-28.
LIZuobang, ZHUPukun, WANGLixin. A study on the photosentsitive polyimide containing cinnamyl group[J]. Journal of Hebei Institute of Technology,1990,19(4):20-28.
[26]
李佐邦,王立新,朱普坤.含肉桂基的光敏聚酸亚胺光刻工艺的研究[J].河北工学院学报,1991,20(3):7-14.
LIZuobang, WANGLixin, ZHUPukun. A study on the photolithographic process for the photoreactive polyimide-containing cinnamyl group[J]. Journal of Hebei Institute of Technology,1991,20(3):7-14.
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doi: 10.16790/j.cnki.1009-9239.im.2024.10.013
  • 接收时间：2024-05-28
  • 首发时间：2025-12-24
  • 出版时间：2024-10-20
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  • 收稿日期：2024-05-28
  • 修回日期：2024-07-10
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国家重点研发计划项目资助(2022YFB3603105)
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    1国家知识产权局，北京 100081
    2中国科学院化学研究所，北京 100190

通讯作者:

翟磊（1985-），男（汉族），山东潍坊人，副研究员，主要从事高性能聚酰亚胺材料的基础与应用研究。
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2种不同金属材料的力学参数
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Family		 属数
Number of
genus		 种数
Number of
species		 占总种数比例
Percentage of
total species (%)		 属
Genus		 种数
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species		 占总种数比例
Percentage of total
species (%)
鹅膏菌科Amanitaceae 2 11 5.26 鹅膏菌属 Amanita 10 4.78
小菇科 Mycenaceae 2 12 5.74 丝盖伞属 Inocybe 5 2.39
多孔菌科 Polyporaceae 8 14 6.70 蜡蘑属 Laccaria 5 2.39
红菇科 Russulaceae 3 23 11.00 小皮伞属 Marasmius 6 2.87
小菇属 Mycena 11 5.26
光柄菇属 Pluteus 5 2.39
红菇属 Russula 17 8.13
栓菌属 Trametes 5 2.39
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