Article(id=1210201198104277391, tenantId=1146029695717560320, journalId=1149653034449285133, issueId=1210201193939333459, articleNumber=null, orderNo=null, doi=10.16790/j.cnki.1009-9239.im.2022.07.009, pmid=null, cstr=null, oa=null, hot=null, price=null, onlineType=0, articleFormat=0, articleType=null, articleTypeStr=research-article, receivedDate=1627660800000, receivedDateStr=2021-07-31, revisedDate=1633968000000, revisedDateStr=2021-10-12, acceptedDate=null, acceptedDateStr=null, onlineDate=1766464050078, onlineDateStr=2025-12-23, pubDate=1658246400000, pubDateStr=2022-07-20, doiRegisterDate=null, doiRegisterDateStr=null, onlineIssueDate=1766464050078, onlineIssueDateStr=2025-12-23, onlineJustAcceptDate=null, onlineJustAcceptDateStr=null, onlineFirstDate=null, onlineFirstDateStr=null, sourceXml=null, magXml=null, createTime=1766464050078, creator=13701087609, updateTime=1766464050078, updator=13701087609, issue=Issue{id=1210201193939333459, tenantId=1146029695717560320, journalId=1149653034449285133, year='2022', volume='55', issue='7', pageStart='1', pageEnd='114', issueExtLink='null', onlineDate='null', pubDate='null', beforeIssueId=null, nextIssueId=null, price=null, status=1, issueComplete=1, articleOrder=1, issueType=-1, specialIssue=null, createTime=1766464049085, creator=13701087609, updateTime=1766563116850, updator=13701087609, preIssue=null, nextIssue=null, ext={EN=IssueExt(id=1210616714308481463, tenantId=1146029695717560320, journalId=1149653034449285133, issueId=1210201193939333459, language=EN, specialIssueTitle=, coverIllustrator=null, specialIssueEditor=, specialIssueAbout=), CN=IssueExt(id=1210616714308481464, tenantId=1146029695717560320, journalId=1149653034449285133, issueId=1210201193939333459, language=CN, specialIssueTitle=, coverIllustrator=null, specialIssueEditor=, specialIssueAbout=)}, issueFiles=null}, startPage=56, endPage=63, ext={EN=ArticleExt(id=1210201198385295775, articleId=1210201198104277391, tenantId=1146029695717560320, journalId=1149653034449285133, language=EN, title=Numerical Simulation of Space Charge in Polyimide Films Based on Bipolar Charge Transport Model, columnId=1190369198472794288, journalTitle=Insulating Materials, columnName=Insulation Technology, runingTitle=null, highlight=null, articleAbstract=

The polyimide (PI) film is widely used in power apparatus due to its excellent electrical properties, but space charge will accumulate in PI film to result in the degradation of its insulating properties. In order to obtain the PI film with excellent insulating properties, it is necessary to further study the dynamic accumulation and migration process of space charge inside PI film and optimize its internal structure. On the basis of bipolar charge transport model, the space charge distribution of PI film under DC voltage was analyzed, and the effects of electric field intensity and temperature on the space charge distribution characteristics of PI film were discussed. The results show that the space charge accumulated in PI film increases with the extension of applied voltage time. After applying the voltage for 180 min, the anode and cathode accumulate 0.635 C/m3 and -0.712 C/m3 of charge, respectively. The existence of space charge causes serious distortion of potential inside the PI film. The increase of electric field strength and temperature make the charge obtain more energy to overcome the interface barrier and inject into the film, so that the film accumulates more space charge, and the electric field distortion is more serious. The distortion rate of electric field inside the film reaches 0.968% at 308 K. Because the migration rate of charges becomes faster with the increase of temperature and electric field strength, the distribution of space charge in the PI film is more complicated under strong electric field and high temperature field.

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聚酰亚胺(PI)薄膜因其优异的电气性能广泛应用在电力设备中,但空间电荷会在PI薄膜内部积聚导致其电气绝缘性能劣化。为了获得绝缘性能优异的PI薄膜,需要进一步研究薄膜内部空间电荷动态积累和迁移过程,优化其内部结构。本研究基于双极性载流子输运模型,分析了PI薄膜在直流电压下空间电荷的分布,探讨了电场强度与温度对PI薄膜内部空间电荷分布特性的影响。结果表明:随着施压时间的延长,薄膜内积聚的空间电荷增多,施压180 min后,阳极和阴极分别积聚了0.635 C/m3和-0.712 C/m3的电荷,且空间电荷的存在使薄膜内部电势发生严重畸变。电场强度和温度的升高让电荷获得更多能量去克服界面势垒并注入到薄膜内部,使薄膜内部积聚的空间电荷增多,电场畸变更严重,在308 K温度下,薄膜电场畸变率高达0.968%。在强电场和温度场中,由于电荷迁移速率随温度和电场强度增高而变快,空间电荷在PI薄膜内部的分布更加复杂。

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刘道生(1976-),男(汉族),江西赣州人,副教授,博士,主要从事电介质设计与电气绝缘的研究。

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刘道生(1976-),男(汉族),江西赣州人,副教授,博士,主要从事电介质设计与电气绝缘的研究。

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刘道生(1976-),男(汉族),江西赣州人,副教授,博士,主要从事电介质设计与电气绝缘的研究。

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companyId=1210652023133958378, language=EN, country=null, province=null, city=null, postcode=null, companyName=null, departmentName=null, remark=School of Electrical Engineering and Automation, Jiangxi University of Science and Technology, Ganzhou 341000, China), AuthorCompanyExt(id=1210652023150735595, tenantId=1146029695717560320, journalId=1149653034449285133, articleId=1210201198104277391, companyId=1210652023133958378, language=CN, country=null, province=null, city=null, postcode=null, companyName=null, departmentName=null, remark=江西理工大学 电气工程与自动化学院,江西 赣州 341000)])], figs=[ArticleFig(id=1210652026325823777, tenantId=1146029695717560320, journalId=1149653034449285133, articleId=1210201198104277391, language=EN, label=Fig.1, caption=The bipolar charge transport model, figureFileSmall=JviX/tfS5Fypuh/h7y5y3g==, figureFileBig=7Pdaz483pv0mi4cAkZW4hA==, tableContent=null), ArticleFig(id=1210652026397126945, tenantId=1146029695717560320, journalId=1149653034449285133, 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ArticleFig(id=1210652027219210544, tenantId=1146029695717560320, journalId=1149653034449285133, articleId=1210201198104277391, language=CN, label=图6, caption=不同温度下PI薄膜内部空间电荷分布, figureFileSmall=G+3hpsCyBM4QLR+XAc0AJA==, figureFileBig=aBzSY7x80yx4B4MBESurhg==, tableContent=null), ArticleFig(id=1210652027273736498, tenantId=1146029695717560320, journalId=1149653034449285133, articleId=1210201198104277391, language=EN, label=Fig.7, caption=The electric field distribution inside the PI film under different temperatures, figureFileSmall=QQXGZq1iBztJSAEOcQVZGw==, figureFileBig=q9aAOX4+WBZYbQXxto52Ww==, tableContent=null), ArticleFig(id=1210652027324068148, tenantId=1146029695717560320, journalId=1149653034449285133, articleId=1210201198104277391, language=CN, label=图7, caption=不同温度下PI薄膜内部电场分布, figureFileSmall=QQXGZq1iBztJSAEOcQVZGw==, figureFileBig=q9aAOX4+WBZYbQXxto52Ww==, tableContent=null), ArticleFig(id=1210652027428925750, tenantId=1146029695717560320, journalId=1149653034449285133, articleId=1210201198104277391, language=EN, label=Table 1, caption=The simulation parameters of bipolar charge transport model, figureFileSmall=null, figureFileBig=null, tableContent=
参数数值含义
T/K293, 298, 303, 308施加温度
V/kV5, 8, 10施加电压
R0, R1, R2/(m3/(s·C))1×10-5复合系数
R3/(m3/(s·C))0复合系数
Ce, Ch0.8抽出系数
φe/eV1.27阴极注入势垒
φh/eV1.30阳极注入势垒
q0et/(C/m3)100电子陷阱密度
q0ht/(C/m3)100空穴陷阱密度
Be /(s-1)0.2电子脱陷系数
Bh /(s-1)0.1空穴脱陷系数
uh /(m2/(V·s))1×10-14自由空穴迁移速率
ue /(m2/(V·s))2×10-14自由电子迁移速率
εr3.4薄膜相对介电常数
), ArticleFig(id=1210652027508617528, tenantId=1146029695717560320, journalId=1149653034449285133, articleId=1210201198104277391, language=CN, label=表1, caption=

双极性载流子输运模型仿真参数

, figureFileSmall=null, figureFileBig=null, tableContent=
参数数值含义
T/K293, 298, 303, 308施加温度
V/kV5, 8, 10施加电压
R0, R1, R2/(m3/(s·C))1×10-5复合系数
R3/(m3/(s·C))0复合系数
Ce, Ch0.8抽出系数
φe/eV1.27阴极注入势垒
φh/eV1.30阳极注入势垒
q0et/(C/m3)100电子陷阱密度
q0ht/(C/m3)100空穴陷阱密度
Be /(s-1)0.2电子脱陷系数
Bh /(s-1)0.1空穴脱陷系数
uh /(m2/(V·s))1×10-14自由空穴迁移速率
ue /(m2/(V·s))2×10-14自由电子迁移速率
εr3.4薄膜相对介电常数
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基于双极性载流子输运模型的聚酰亚胺薄膜空间电荷数值模拟
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刘道生 , 赵亚辉 , 王广康 , 陈星蓉
绝缘材料 | 绝缘技术 2022,55(7): 56-63
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绝缘材料 | 绝缘技术 2022, 55(7): 56-63
基于双极性载流子输运模型的聚酰亚胺薄膜空间电荷数值模拟
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刘道生, 赵亚辉, 王广康, 陈星蓉
作者信息
  • 江西理工大学 电气工程与自动化学院,江西 赣州 341000
  • 刘道生(1976-),男(汉族),江西赣州人,副教授,博士,主要从事电介质设计与电气绝缘的研究。

Numerical Simulation of Space Charge in Polyimide Films Based on Bipolar Charge Transport Model
Daosheng LIU, Yahui ZHAO, Guangkang WANG, Xingrong CHEN
Affiliations
  • School of Electrical Engineering and Automation, Jiangxi University of Science and Technology, Ganzhou 341000, China
出版时间: 2022-07-20 doi: 10.16790/j.cnki.1009-9239.im.2022.07.009
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聚酰亚胺(PI)薄膜因其优异的电气性能广泛应用在电力设备中,但空间电荷会在PI薄膜内部积聚导致其电气绝缘性能劣化。为了获得绝缘性能优异的PI薄膜,需要进一步研究薄膜内部空间电荷动态积累和迁移过程,优化其内部结构。本研究基于双极性载流子输运模型,分析了PI薄膜在直流电压下空间电荷的分布,探讨了电场强度与温度对PI薄膜内部空间电荷分布特性的影响。结果表明:随着施压时间的延长,薄膜内积聚的空间电荷增多,施压180 min后,阳极和阴极分别积聚了0.635 C/m3和-0.712 C/m3的电荷,且空间电荷的存在使薄膜内部电势发生严重畸变。电场强度和温度的升高让电荷获得更多能量去克服界面势垒并注入到薄膜内部,使薄膜内部积聚的空间电荷增多,电场畸变更严重,在308 K温度下,薄膜电场畸变率高达0.968%。在强电场和温度场中,由于电荷迁移速率随温度和电场强度增高而变快,空间电荷在PI薄膜内部的分布更加复杂。

空间电荷  /  双极性载流子输运模型  /  聚酰亚胺薄膜  /  电场强度  /  温度

The polyimide (PI) film is widely used in power apparatus due to its excellent electrical properties, but space charge will accumulate in PI film to result in the degradation of its insulating properties. In order to obtain the PI film with excellent insulating properties, it is necessary to further study the dynamic accumulation and migration process of space charge inside PI film and optimize its internal structure. On the basis of bipolar charge transport model, the space charge distribution of PI film under DC voltage was analyzed, and the effects of electric field intensity and temperature on the space charge distribution characteristics of PI film were discussed. The results show that the space charge accumulated in PI film increases with the extension of applied voltage time. After applying the voltage for 180 min, the anode and cathode accumulate 0.635 C/m3 and -0.712 C/m3 of charge, respectively. The existence of space charge causes serious distortion of potential inside the PI film. The increase of electric field strength and temperature make the charge obtain more energy to overcome the interface barrier and inject into the film, so that the film accumulates more space charge, and the electric field distortion is more serious. The distortion rate of electric field inside the film reaches 0.968% at 308 K. Because the migration rate of charges becomes faster with the increase of temperature and electric field strength, the distribution of space charge in the PI film is more complicated under strong electric field and high temperature field.

space charge  /  bipolar charge transport model  /  polyimide film  /  electric field strength  /  temperature
刘道生, 赵亚辉, 王广康, 陈星蓉. 基于双极性载流子输运模型的聚酰亚胺薄膜空间电荷数值模拟. 绝缘材料, 2022 , 55 (7) : 56 -63 . DOI: 10.16790/j.cnki.1009-9239.im.2022.07.009
Daosheng LIU, Yahui ZHAO, Guangkang WANG, Xingrong CHEN. Numerical Simulation of Space Charge in Polyimide Films Based on Bipolar Charge Transport Model[J]. Insulating Materials, 2022 , 55 (7) : 56 -63 . DOI: 10.16790/j.cnki.1009-9239.im.2022.07.009
聚合物电介质具有价格低、介质损耗低、电气强度高的优点,是电气设备制造领域中常用的绝缘材料之一。聚合物材料在使用过程中因弯曲折叠、存在杂质、分子链断裂等因素影响,内部存在大量陷阱[1-2],这些陷阱会捕获在其内部迁移的电荷,并形成空间电荷电场[3]。空间电荷的存在会影响电场的分布并造成局部电场畸变,导致聚合物材料绝缘性能劣化甚至失效[4]。聚酰亚胺(PI)薄膜广泛应用于电力设备中[5],因此测量和分析PI薄膜内部空间电荷和电场的分布特性具有重要意义。目前空间电荷测量方法主要有热阶跃、压力波和电声脉冲3种非破坏测量方法[6]。相较于实验测量,空间电荷动力学数值模拟没有高性能仪器(皮秒脉冲发生装置)的限制,还具有能分析载流子迁移率、陷阱深度、带电粒子相互作用等实验测量难以控制的参数对空间电荷的影响优点。
空间电荷数值模拟主要以单极性电荷输运模型和双极性电荷输运模型为主[7]。单极性电荷输运模型将电荷在聚合物材料内部运动过程分为注入、迁移、入陷和脱陷4个过程[8]。双极性载流子输运模型在单极性电荷输运模型的基础上考虑异性电荷的复合,将运动过程分为注入、迁移、入陷、脱陷和复合5个过程,更加贴近电荷实际运动过程[9]。S L ROY等[10]利用双极性载流子输运模型模拟了聚乙烯材料内空间电荷的分布,并将仿真与实验结果做了对比,验证了模型的有效性。钟小燕等[11]利用双极性载流子输运模型对聚丙烯空间电荷分布的极性效应进行仿真,辨别了影响空间电荷与电场非对称分布的物理参数。李盛涛等[12-13]运用双极性载流子输运模型计算了低密度聚乙烯和聚丙烯纳米复合电介质的空间电荷,揭示聚合物陷阱能级在抑制空间电荷积聚的规律。WANG Yani等[14]基于双极性载流子输运模型,模拟了交联聚乙烯在不同温度和直流预压时间下的空间电荷特性,得到了交联聚乙烯内部空间电荷行为与温度和直流预压时间之间的变化规律。徐晓彬等[15]基于双极性载流子输运模型,仿真发现交联聚乙烯电树枝长度与空间电荷注入深度之间高度相关。李长云等[16-17]利用双极性载流子输运模型研究了油纸老化程度对空间电荷分布的影响。邹润豪等[18-19]基于双极性载流子输运模型开展了油纸复合绝缘系统的空间/界面电荷仿真计算,与实验结果相比,误差小于1%。
以上研究多以油浸纸板和电缆绝缘材料为研究对象。PI薄膜作为电气设备常用的电介质材料,对其应用在强直流电场中的空间电荷与电场分布方面的研究少有报道。运行温度和电场强度是导致聚合物材料劣化的重要因素,有必要研究其对PI薄膜内部空间电荷分布的影响。本文基于双极性载流子输运模型,采用有限元分析软件模拟PI薄膜在直流电压下的空间电荷与场强分布。在数值模拟的基础上,分析温度和施加电场强度对电极两侧注入电流密度、载流子迁移率和电场畸变的影响,以期为PI薄膜结构优化和空间电荷调控技术与方法提供理论依据。
双极性载流子输运模型可以用来表征聚合物材料在不同极化状态下电荷的动态行为,具体模型如图1所示。
整个模型中包括4种不同状态的电荷粒子,即自由电子qeu、陷阱电子qet、自由空穴qhu和陷阱空穴qht。电荷运动过程包含5部分:电荷注入、迁移、入陷、脱陷和复合。正、负电荷分别由阴极和阳极注入,在电场作用下,分别向极性相反的电极迁移。聚合物材料内部因物理或化学因素会形成陷阱,其中深陷阱能级较深,载流子脱陷过程较长,因此深陷阱是空间电荷积聚的主原因,模型中的陷阱能级主要以深陷阱能级为主。在电荷迁移过程中,正、负电荷被陷阱捕获后分别形成陷阱空穴和陷阱电子,陷阱空穴和陷阱电子获得能量后有一定概率逃脱陷阱束缚,重新形成可自由移动的带电粒子。模型中电荷复合类型包括自由电子与自由空穴、自由电子与陷阱空穴、自由空穴与陷阱电子、陷阱电子与陷阱空穴的复合。陷阱电荷复合后,将空出陷阱位置,使其重新获得捕获自由电荷的能力。
假设电极注入的电荷为双极性载流子输运模型中带电粒子的主要来源,电荷均匀穿过电极表面注入到PI薄膜内部。在不高于100 kV/mm的电场中,电荷注入方式主要为肖特基(Schottky)注入[20]。阴极和阳极注入电流密度方程如式(1)~(2)所示。
Je0,t=AT2exp -e φeKBTexp -eKBTeE0,t4πε0εr
Jhd,t=AT2exp -e φhKBTexp -eKBTeEd,t4πε0εr
式(1)~(2)中:A为Richardson常数;KB为玻尔兹曼常数;T为温度;e为元电荷;φe为电子注入势垒;φh为空穴注入势垒;E0,tt时刻阴极电场强度;Ed,tt时刻阳极电场强度;ε0是真空介电常数;εr是PI薄膜相对介电常数。
载流子由电极注入后,在电场作用下做迁移运动,最终在极性相反的电极处被抽出。通常条件下,载流子需要克服一定的势垒才能被抽出,用抽出系数CeCh表示界面对电子和空穴的阻挡[21]。电荷抽出方程如式(3)~(4)所示。
Jh0,t=Chμhqhu0,tE0,t
Jed,t=Ceμeqeud,tEd,t
式(3)~(4)中:CeCh分别是自由电子和自由空穴抽出系数;μhμe分别是空穴与电子迁移速率;qeud,tt时刻阳极自由电子密度;qhu0,tt时刻阴极自由空穴密度。
在双极性载流子输运模型中,使用对流-扩散方程来描述载流子的迁移运动,如式(5)所示;使用电流方程描述PI薄膜内部空间电荷的分布情况,如式(6)所示;使用泊松方程描述PI薄膜内部电场变化,如式(7)所示[9]
Jax,t=qax,tμaEx,t-Daqax,t
qax,tt+Jax,tt=Sax,t
Ex,tt=qvε0εr
式(5)~(7)中:Ja为单位体积内的电流密度,其中下标a代表电荷种类;x为PI薄膜内部位置;t为时间;q为单位体积内电荷量密度;D是扩散系数;S为各类电荷粒子源项;E为电场强度;qv为PI薄膜内部空间电荷密度。
在电荷迁移过程中,电荷会经历入陷、脱陷和复合过程,导致各类电荷密度发生变化。式(8)~(11)分别为自由电子源项Seu、自由空穴源项Shu、陷阱电子源项Set和陷阱空穴源项Sht的变化方程[20]
Seu=-R1qhtqeu-R3qhuqeu-Beqeu1-qetq0et+Γeqet
Shu=-R2qetqhu-R3qhuqeu-Bhqhu1-qhtq0ht+Γhqht
Set=-R2qhuqet-R0qhtqet+Beqeu1-qetq0et-Γeqet
Sht=-R1qhtqeu-R0qhtqet+Bhqhu1-qhtq0ht-Γhqht
式(8)~(11)中:R0为陷阱电子与陷阱空穴复合系数;R1为陷阱空穴与自由电子复合系数;R2为陷阱电子与自由空穴复合系数;R3为自由电子与自由空穴复合系数;BeBh分别为自由电子和自由空穴的入陷系数;ΓeΓh分别为陷阱电子和陷阱空穴的脱陷系数;q0etq0ht分别为电子和空穴陷阱密度。
本研究采用有限元仿真软件对双极性载流子输运模型进行求解分析。PI薄膜厚度为100 μm,为了保证计算的快速性和准确性,设置网格长度为0.5 μm。在0 μm(x=0)处设置接地,在100 μm(x=d)处施加直流电压。初始时刻升压速率为0.5 kV/s,以确保模型收敛。双极性载流子输运模型部分参数见表1[22-23]
采用表1中参数对双极性载流子输运模型进行赋值设置,在293 K温度下,在阳极施加5 kV直流电压,PI薄膜体内正、负电荷密度如图2所示。施加电场后,正、负电荷克服界面势垒,分别从阳极和阴极注入PI薄膜内部,空间电荷开始在薄膜内部聚集。
图2(a)可知,负电荷由阴极注入PI薄膜后,大部分负电荷积聚在阴极处并呈现幂指数变化规律。施压时间由0 min增至5、10、30、60、120、180 min时,PI薄膜阴极边界处积聚的自由电子密度由0分别增至-0.047 5、-0.090、-0.232、-0.391、-0.594、 -0.712 C/m3。由图2(b)可知,正电荷在介质内部的分布情况与负电荷有相似的变化趋势,在施压5、10、30、60、120、180 min后,阳极边界处聚集了0.028、0.053、0.147、0.270、0.473、0.635 C/m3的正电荷。表明随施压时间的延长,PI薄膜两端积聚的空间电荷密度逐渐增大。
在施压5 min后,PI薄膜厚度在大于11.83 µm或小于91.48 µm时,其内部的空间电荷密度为0,这是因为电荷在迁移过程中,电荷发生了入陷和脱陷,或者与异性电荷发生复合形成中性粒子。其次,由于PI薄膜内部存在温度梯度,靠近电极侧温度较高使其杂质电离加剧,导致PI薄膜两端陷阱数量多于中间部分。随电荷迁移距离的增加,薄膜中间部分陷阱数量减少,电荷复合占优势。施压时间由5 min增至10、30、60、120、180 min时,负电荷分别在15.72、23.28、30.08、40.26、48.65 µm处达到稳定状态,正电荷向介质内部迁移到87.95、81.81、77.40、71.71、67.44 µm处达到稳定状态。随着施压时间的延长,注入PI薄膜中的电荷数量增多,沿厚度方向迁移越深,在PI薄膜两端分布范围越广。
在阳极施加直流电压后,电势理论上沿样品厚度方向上均匀分布,但由于空间电荷积聚与迁移,电势实际上分布不均匀。样品在20 µm和80 µm处电势如图3所示,可以看出,在20 µm处,电势随着施压时间的增加逐渐从5 min的999.22 V降低为180 min的997.30 V。在80 µm处,变化趋势与20 µm处相反,由5 min的4 000.76 V逐渐上升为180 min的4 001 V。究其原因,电势的偏移是由极板注入空间电荷的极性效应引起。由图2可知,薄膜两端聚集了大量的同极性电荷,在20 µm处由于存在大量负电荷,造成实际电势值小于理论值1 000 V。随着施压时间的延长,20 µm处积聚的负电荷数量进一步增多,导致电势进一步降低。在80 µm处由于正电荷的积聚导致此处电势高于理论值4 000 V。随着聚集的正电荷增多,电势进一步提高。
在293 K温度下,分别施加50、80、100 kV/mm的电场,PI薄膜内部空间电荷分布如图4(a)(b)(c)所示。
薄膜施加50 kV/mm电场180 min后,阴极处空间电荷密度为-0.712 C/m3,阳极处空间电荷密度为0.635 C/m3,如图4(a)所示;薄膜施加80 kV/mm电场180 min后,阴极处聚集空间电荷密度为-2.13 C/m3,阳极处空间电荷密度为1.891 C/m3,如图4(b)所示;薄膜施加100 kV/mm电场在180 min后,阴极处电荷密度达到-4.071 C/m3,阳极处电荷密度达到3.509 C/m3,如图4(c)所示。随着电场强度的增加,同一时间内,PI薄膜内部积聚的空间电荷密度增大,但是未改变积聚在薄膜两端电荷的极性。此外,随着施加电场强度的增大,自由电子与自由空穴向样品更深处迁移,施加电场100 kV/mm时,自由电子最大迁移至样品内61.6 µm处。
双极性载流子输运模型电荷注入方式采用肖特基注入。在该注入方式下,电荷需要克服界面势垒才能由电极注入到样品内部,然后在样品内部聚集、迁移和扩散,其中阴极处注入的电荷密度和电场强度分别如图5(a)(b)所示。由图5(a)可知,当施加50 kV/mm电场强度10 min时,阴极注入电流密度为1.428×10-10 A/m2,施加80 kV/mm电场强度时阴极注入电流密度为6.57×10-10 A/m2,施加100 kV/mm时阴极注入电流密度为15.51×10-10 A/m2,注入电流密度随着电场强度的增大而增大。这是因为随着电场强度的增大,电荷获得更高的能量克服界面势垒注入到样品内部,相同时间内造成更多的空间电荷积聚在样品内部。同时,由对流扩散方程可知,自由空穴与自由电子往样品内部迁移的速率与电场强度相关,电场越强,自由电子与自由空穴迁移速率越快,向样品内部迁移得越深。
图5(a)还可知,当100 kV/mm电场强度施加10 min时,阴极注入电流密度为15.51×10-10 A/m2,120 min时为15.14×10-10 A/m2,180 min时为15.02×10-10 A/m2,阴极注入电流密度随施压时间增加呈现下降趋势。由图5(b)可知,随着施压时间的延长,阴极处聚集的同极性电荷密度逐渐增多,形成与原电场方向相反的电场,造成阴极边界处电场强度下降。由电荷注入方程可知,注入电荷密度与电场强度呈正相关关系,阴极边界处电场强度减弱会使注入电流密度减小,阳极亦如此。
本研究以293 K室温下的空间电荷积聚值为基准,选取293、298、303、308 K 4个温度,以5 K为一个梯度研究温度对空间电荷积聚和迁移特性的影响。PI薄膜施加5 kV的直流电压后,在293、298、303、308 K温度下的空间电荷分布特性如图6所示。由图6可知,PI薄膜在293、198、303、308 K温度下,在施压180 min后阴极边界处积聚的空间电荷密度分别为-0.712、-1.024、-1.278、-1.530 C/m3,表明温度的升高会导致PI薄膜内部空间电荷数量增多。同时,随温度的升高,空间电荷在薄膜内部分布范围越来越广,负极性空间电荷密度沿薄膜厚度迁移至0 C/m3的距离大于正极性空间电荷迁移距离,阴极处自由电子比阳极处自由空穴分布范围更广。
结合空间电荷在薄膜内的分布,求解泊松方程可以得到薄膜内的电场分布情况。图7(a)(d)是PI薄膜在293、298、303、308 K温度下的电场分布图。由图7可知,在293 K温度下,施压180 min后阴极处和阳极处电场强度分别为49.736 kV/mm和49.876 kV/mm,薄膜厚度50 µm处电场强度为50.043 kV/mm,薄膜内电场强度随厚度增加呈现先升高后降低的趋势;在298 K温度下,施压180 min阴极处电场强度为49.446 kV/mm,50 µm处电场强度为50.118 kV/mm;在303 K温度下,施加180 min后阴极处电场强度为48.933 kV/mm,50 µm处电场强度为50.295 kV/mm;在308 K温度下,施压180 min后阴极处电场强度为48.223 kV/mm,50 µm处电场强度为50.484 kV/mm。
为了更好地描述PI薄膜内部电场强度畸变与温度的关系,采用式(12)计算PI薄膜内部电场畸变程度。
η=EmaxEav
式(12)中:η为电场畸变率;Emax为PI薄膜内部最大电场强度;Eav为PI薄膜内部平均电场强度。
式(12)计算得出,PI薄膜施压180 min后,在293、298、303、308 K温度下50 µm处的电场畸变率分别为0.084%、0.236%、0.590%、0.968%。随着温度的升高,薄膜内部电场强度畸变愈严重。温度升高使薄膜内部电荷热运动加剧,自由电子与自由空穴的扩散速率增加,扩散运动加剧,空间电荷分布范围更广。自由电子迁移速率比自由空穴迁移速率大,因此自由电子在薄膜中分布范围比自由空穴广。温度在电荷注入方程中表示为T 2温度的升高使电荷更容易克服界面势垒注入到薄膜内部,在阴极侧和阳极侧积聚的同极性电荷数量增多。
施压后,薄膜两端积聚了大量的同极性电荷,积聚的同极性电荷会产生一个电场,该电场方向与施加电场方向相反,从而削减了电极附近的电场强度。在薄膜中间部分,由于样品两端空间电荷的积聚,在薄膜中间产生了一个与施加电场相同的电场,两个电场相互叠加,造成薄膜内部电场强度高于施加的电场强度。随着温度的升高,薄膜内积聚的空间电荷数量增加,电场强度畸变也愈严重。
本研究基于双极性载流子输运模型,研究了PI薄膜空间电荷与电场畸变机理,讨论了温度和电场强度对空间电荷分布和电场畸变的影响,主要得出如下结论:
(1)随施压时间的延长,PI薄膜内部的空间电荷累积数量增多,空间电荷的存在导致PI薄膜内部电场畸变。
(2)电场强度的增加会引起电极注入电流密度升高,导致PI薄膜内部空间电荷密度增大;随施压时间的延长,电极边界处的电场强度和注入电流密度减小。
(3)环境温度的升高导致PI薄膜内部积聚的空间电荷更多,积聚在PI薄膜内部的同极性空间电荷削弱了PI薄膜两端的电场强度,增强了薄膜中间的电场强度。
  • 国家自然科学基金资助项目(51767008)
  • 江西省自然科学基金资助项目(20192ACBL20016)
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2022年第55卷第7期
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doi: 10.16790/j.cnki.1009-9239.im.2022.07.009
  • 接收时间:2021-07-31
  • 首发时间:2025-12-23
  • 出版时间:2022-07-20
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  • 收稿日期:2021-07-31
  • 修回日期:2021-10-12
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国家自然科学基金资助项目(51767008)
江西省自然科学基金资助项目(20192ACBL20016)
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    江西理工大学 电气工程与自动化学院,江西 赣州 341000
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2种不同金属材料的力学参数

Family
属数
Number of
genus
种数
Number of
species
占总种数比例
Percentage of
total species (%)

Genus
种数
Number of
species
占总种数比例
Percentage of total
species (%)
鹅膏菌科Amanitaceae 2 11 5.26 鹅膏菌属 Amanita 10 4.78
小菇科 Mycenaceae 2 12 5.74 丝盖伞属 Inocybe 5 2.39
多孔菌科 Polyporaceae 8 14 6.70 蜡蘑属 Laccaria 5 2.39
红菇科 Russulaceae 3 23 11.00 小皮伞属 Marasmius 6 2.87
小菇属 Mycena 11 5.26
光柄菇属 Pluteus 5 2.39
红菇属 Russula 17 8.13
栓菌属 Trametes 5 2.39
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