Article(id=1323704720338059837, tenantId=1146029695717560320, journalId=1255847867265597444, issueId=1323704676520177870, articleNumber=null, orderNo=null, doi=null, pmid=null, cstr=null, oa=null, hot=null, price=null, onlineType=0, articleFormat=0, articleType=null, articleTypeStr=null, receivedDate=1161792000000, receivedDateStr=2006-10-26, revisedDate=1168790400000, revisedDateStr=2007-01-15, acceptedDate=null, acceptedDateStr=null, onlineDate=1793525398572, onlineDateStr=2026-11-01, pubDate=1188921600000, pubDateStr=2007-09-05, doiRegisterDate=null, doiRegisterDateStr=null, onlineIssueDate=1793525398572, onlineIssueDateStr=2026-11-01, onlineJustAcceptDate=null, onlineJustAcceptDateStr=null, onlineFirstDate=null, onlineFirstDateStr=null, sourceXml=null, magXml=null, createTime=1793525398572, creator=13701087609, updateTime=1793525398572, updator=13701087609, issue=Issue{id=1323704676520177870, tenantId=1146029695717560320, journalId=1255847867265597444, year='2007', volume='21', issue='3', pageStart='225', pageEnd='336', issueExtLink='null', onlineDate='null', pubDate='1188921600000', pubDateStr='2007-09-05', beforeIssueId=null, nextIssueId=null, price=null, status=1, issueComplete=1, articleOrder=1, issueType=-1, specialIssue=null, createTime=1793525388126, creator='13701087609', updateTime=1793525388126, updator='13701087609', preIssue=null, nextIssue=null, articleTotal=null, ext=null, issueFiles=null, downloadFileDto=null}, startPage=316, endPage=321, ext={EN=ArticleExt(id=1323704720539386430, articleId=1323704720338059837, tenantId=1146029695717560320, journalId=1255847867265597444, language=EN, title=Effect of Diamond Films Thickness on Thermal Residual Stress, columnId=null, journalTitle=Chinese Journal of High Pressure Physics, columnName=null, runingTitle=null, highlight=null, articleAbstract=

Each component of thermal residual stress in diamond films deposited onto Mo substrate was simulated and analyzed comprehensively by using the finite element method, and the different thickness (20~1 000 μm) of the films was used during the simulation. The contour plots of these components distribution were obtained. In addition, the effect of the films thickness on the maximum tensile principal stress in films and on the maximum of every stress component at interface between films and substrate was investigated. The results show that the location of maximum tensile principal stress in the films is at the upward face or side face of the films or the interface, and the magnitude of it increases when the films become thicker. Also, the maximum axial stress at the interface increases when the films become thicker whereas the maximum compressive radial stress, maximum compressive circular stress and maximum shear stress at the interface are in reverse, and the reduction extent of the maximum shear stress is small. The increase or reduction rate of each stress mentioned above is slower when the films thickness becomes larger. These conclusions are useful to choose rationally films thickness and to control effectively the stresses during preparation of diamond films.

, authors=Da-Pei TANG1, Qing GAO1, Lan-Ying WU2, authorsList=Da-Pei TANG, Qing GAO, Lan-Ying WU, authorCompany=null, correspAuthors=null, authorNote=null, correspAuthorsNote=null, copyrightStatement=null, copyrightOwner=null, extLink=null, articleAbsUrl=null, sourceXml=null, magXml=null, pdfUrl=null, pdf=null, pdfFileSize=null, pdfExtLink=null, richHtmlUrl=null, mobilePdfUrl=null, reviewReport=null, pdfFirstPage=null, abstractGraph=null, abstractGraphContent=null, abstractVideo=null, citation=null, cebUrl=null, magXmlContent=null, mapNumber=null, fund=null), CN=ArticleExt(id=1323704720824599103, articleId=1323704720338059837, tenantId=1146029695717560320, journalId=1255847867265597444, language=CN, title=金刚石膜厚度尺寸对热残余应力的影响, columnId=0, journalTitle=高压物理学报, columnName=, runingTitle=null, highlight=null, articleAbstract=

采用有限元方法对钼基体上不同厚度(20~1 000 μm)金刚石膜的热残余应力进行了全面的模拟与分析,得出了它们在膜内分布的等值线图,研究了金刚石膜厚度尺寸对整个膜内的最大主拉应力和界面处每个应力分量最大值的影响。结果表明:在整个膜内,最大主拉应力的位置出现在膜的表面、界面或侧面,其值随膜厚度的增加而增大;在界面处,最大轴向应力随膜厚度的增加而增大,而最大径向压应力、最大周向压应力和最大剪应力则随膜厚度的增加而减小,其中最大剪应力减幅较小;膜厚度越大时,以上各量随厚度增(减)的速度越慢。其结论对于在金刚石膜的制备中合理地选择厚度、有效地进行应力控制有一定的参考价值。

, authors=唐达培1, 高庆1, 吴兰鹰2, authorsList=唐达培, 高庆, 吴兰鹰, authorCompany=null, correspAuthors=null, authorNote=

唐达培(1966—),男,副教授,博士研究生,主要从事薄膜涂层复合材料的力学问题研究. E-mail:

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唐达培(1966—),男,副教授,博士研究生,主要从事薄膜涂层复合材料的力学问题研究. E-mail:

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金刚石膜厚度尺寸对热残余应力的影响
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唐达培 1 , 高庆 1 , 吴兰鹰 2
高压物理学报 | 2007,21(3): 316-321
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高压物理学报 | 2007 , 21 (3) : 316 -321
金刚石膜厚度尺寸对热残余应力的影响
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唐达培(1966—),男,副教授,博士研究生,主要从事薄膜涂层复合材料的力学问题研究. E-mail:

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唐达培1 , 高庆1, 吴兰鹰2
作者信息
  • 1.西南交通大学应用力学与工程系,四川 成都 610031
  • 2.北京科技大学应用学院,北京 100083
作者简介:

唐达培(1966—),男,副教授,博士研究生,主要从事薄膜涂层复合材料的力学问题研究. E-mail:

Effect of Diamond Films Thickness on Thermal Residual Stress
Da-Pei TANG1 , Qing GAO1, Lan-Ying WU2
Affiliations
  • 1.Department of Applied Mechanics and Engineering, Southwest Jiaotong University, Chengdu 610031 China
  • 2.School of Applied Science, Beijing University of Science and Technology, Beijing 100083, China
出版时间: 2007-09-05
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采用有限元方法对钼基体上不同厚度(20~1 000 μm)金刚石膜的热残余应力进行了全面的模拟与分析,得出了它们在膜内分布的等值线图,研究了金刚石膜厚度尺寸对整个膜内的最大主拉应力和界面处每个应力分量最大值的影响。结果表明:在整个膜内,最大主拉应力的位置出现在膜的表面、界面或侧面,其值随膜厚度的增加而增大;在界面处,最大轴向应力随膜厚度的增加而增大,而最大径向压应力、最大周向压应力和最大剪应力则随膜厚度的增加而减小,其中最大剪应力减幅较小;膜厚度越大时,以上各量随厚度增(减)的速度越慢。其结论对于在金刚石膜的制备中合理地选择厚度、有效地进行应力控制有一定的参考价值。

金刚石膜  /  厚度  /  残余应力  /  有限元  /  主应力  /  界面

Each component of thermal residual stress in diamond films deposited onto Mo substrate was simulated and analyzed comprehensively by using the finite element method, and the different thickness (20~1 000 μm) of the films was used during the simulation. The contour plots of these components distribution were obtained. In addition, the effect of the films thickness on the maximum tensile principal stress in films and on the maximum of every stress component at interface between films and substrate was investigated. The results show that the location of maximum tensile principal stress in the films is at the upward face or side face of the films or the interface, and the magnitude of it increases when the films become thicker. Also, the maximum axial stress at the interface increases when the films become thicker whereas the maximum compressive radial stress, maximum compressive circular stress and maximum shear stress at the interface are in reverse, and the reduction extent of the maximum shear stress is small. The increase or reduction rate of each stress mentioned above is slower when the films thickness becomes larger. These conclusions are useful to choose rationally films thickness and to control effectively the stresses during preparation of diamond films.

diamond films  /  thickness  /  residual stresses  /  finite element  /  principal stress  /  interface
唐达培, 高庆, 吴兰鹰. 金刚石膜厚度尺寸对热残余应力的影响. 高压物理学报, 2007 , 21 (3) : 316 -321 .
Da-Pei TANG, Qing GAO, Lan-Ying WU. Effect of Diamond Films Thickness on Thermal Residual Stress[J]. Chinese Journal of High Pressure Physics, 2007 , 21 (3) : 316 -321 .
  • 总装备部总装预研基金
  • 西南交通大学基础科学研究基金
  • 博士生创新基金
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2007年第21卷第3期
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  • 接收时间:2006-10-26
  • 首发时间:2026-11-01
  • 出版时间:2007-09-05
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  • 收稿日期:2006-10-26
  • 修回日期:2007-01-15
基金
总装备部总装预研基金
西南交通大学基础科学研究基金
博士生创新基金
作者信息
    1.西南交通大学应用力学与工程系,四川 成都 610031
    2.北京科技大学应用学院,北京 100083
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2种不同金属材料的力学参数
科
Family
属数
Number of
genus
种数
Number of
species
占总种数比例
Percentage of
total species (%)
属
Genus
种数
Number of
species
占总种数比例
Percentage of total
species (%)
鹅膏菌科Amanitaceae 2 11 5.26 鹅膏菌属 Amanita 10 4.78
小菇科 Mycenaceae 2 12 5.74 丝盖伞属 Inocybe 5 2.39
多孔菌科 Polyporaceae 8 14 6.70 蜡蘑属 Laccaria 5 2.39
红菇科 Russulaceae 3 23 11.00 小皮伞属 Marasmius 6 2.87
小菇属 Mycena 11 5.26
光柄菇属 Pluteus 5 2.39
红菇属 Russula 17 8.13
栓菌属 Trametes 5 2.39
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