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Cadmium zinc telluride (CdZnTe) thin films, characterized by a high atomic number, tunable optical bandgap, and excellent photoelectric conversion performance, hold significant potential in advanced applications such as thin-film photovoltaic cells, infrared imaging, and high-energy radiation detection. However, achieving low-cost fabrication and high-quality film formation remains a critical challenge for their industrial deployment. In this work, we systematically reviewed the vapor deposition techniques for CdZnTe thin films. While methods such as physical vapor transport, vacuum thermal evaporation, hot-wall epitaxy, magnetron sputtering, and close spaced sublimation offer advantages in simplicity and cost-effectiveness, they suffer from issues such as poor film uniformity and high lattice defect density. In contrast, molecular beam epitaxy and metal-organic chemical vapor deposition enable atomic-level precision and superior lattice integrity, but are constrained by high process costs and complex equipment, limiting their scalability. To enhance the quality of CdZnTe thin films, this work highlighted three key optimization strategies: (1) refining growth parameters for precise process control, (2) improving heteroepitaxial quality through interfacial buffer layer design, and (3) mitigating intrinsic defects via annealing treatments. Ultimately, we concluded that balancing film performance with production costs and overcoming the technical challenges of large-area uniform film deposition would be critical for the future advancement of CdZnTe thin films.

, authors=Mengshi YU^{1, 2}, Siqi HU², Yangyang HUAI², authorsList=Mengshi YU, Siqi HU, Yangyang HUAI, authorCompany=null, correspAuthors=Yangyang HUAI, authorNote=null, correspAuthorsNote=null, copyrightStatement=null, copyrightOwner=null, extLink=null, articleAbsUrl=null, sourceXml=null, magXml=null, pdfUrl=null, pdf=null, pdfFileSize=null, pdfExtLink=null, richHtmlUrl=null, mobilePdfUrl=null, reviewReport=null, pdfFirstPage=null, abstractGraph=null, abstractGraphContent=null, abstractVideo=null, citation=null, cebUrl=null, magXmlContent=null, mapNumber=null, fund=null), CN=ArticleExt(id=1304141636972339865, articleId=1304141636380942999, tenantId=1146029695717560320, journalId=1303687303576780880, language=CN, title=碲锌镉薄膜生长技术的研究进展, columnId=1304141569037198301, journalTitle=铜业工程, columnName=材料制备与加工工程, runingTitle=null, highlight=null, articleAbstract=

碲锌镉薄膜材料凭借其高原子序数特性、可调的光学带隙和卓越的光电转换性能，在薄膜光伏电池、红外探测成像及高能射线探测等前沿领域展现出巨大应用价值。为实现该材料的产业化应用，亟需攻克低成本规模化制备与高质量均匀成膜的关键技术。本文系统梳理了碲锌镉薄膜的气相沉积生长技术体系。物理气相传输、真空热蒸发、热壁外延、磁控溅射、近空间升华等技术，虽然具有设备结构简单、工艺成本较低等优势，但普遍存在薄膜均匀性欠佳、结晶质量较差等技术瓶颈； 而分子束外延、金属有机化学气相沉积等技术，虽能实现原子级精度的外延生长和优异的晶格完整性，却因其设备投入大、工艺复杂度高、生长速率慢等因素，严重制约了产业化应用前景。在此基础上，进一步提出提升碲锌镉薄膜质量的三条关键技术路径：一是通过精确调控生长参数实现工艺优化； 二是引入界面缓冲层以改善异质外延质量； 三是采用退火处理技术消除本征缺陷。最后指出，平衡薄膜性能与生产成本、突破大面积均匀成膜技术壁垒，将是碲锌镉薄膜未来发展的关键突破口。

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于梦诗（1997—），女，江西抚州人，博士，研究方向：半导体材料制备及器件应用，E-mail：yums-cnc@pku.edu.cn

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于梦诗（1997—），女，江西抚州人，博士，研究方向：半导体材料制备及器件应用，E-mail：yums-cnc@pku.edu.cn

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