Article(id=1304141628441125425, tenantId=1146029695717560320, journalId=1303687303576780880, issueId=1304141619603726817, articleNumber=null, orderNo=null, doi=10.3969/j.issn.1009-3842.2026.01.002, pmid=null, cstr=null, oa=null, hot=null, price=null, onlineType=0, articleFormat=0, articleType=null, articleTypeStr=null, receivedDate=1748880000000, receivedDateStr=2025-06-03, revisedDate=1768233600000, revisedDateStr=2026-01-13, acceptedDate=null, acceptedDateStr=null, onlineDate=1788861194000, onlineDateStr=2026-09-08, pubDate=1772208000000, pubDateStr=2026-02-28, doiRegisterDate=null, doiRegisterDateStr=null, onlineIssueDate=1788861194000, onlineIssueDateStr=2026-09-08, onlineJustAcceptDate=null, onlineJustAcceptDateStr=null, onlineFirstDate=null, onlineFirstDateStr=null, sourceXml=null, magXml=null, createTime=1788861194000, creator=13701087609, updateTime=1788861194000, updator=13701087609, issue=Issue{id=1304141619603726817, tenantId=1146029695717560320, journalId=1303687303576780880, year='2026', volume='', issue='1', pageStart='1', pageEnd='154', issueExtLink='null', onlineDate='null', pubDate='1772208000000', pubDateStr='2026-02-28', beforeIssueId=null, nextIssueId=null, price=null, status=1, issueComplete=1, articleOrder=1, issueType=-1, specialIssue=null, createTime=1788861191893, creator='13701087609', updateTime=1788924965522, updator='13701087609', preIssue=null, nextIssue=null, articleTotal=null, ext={EN=IssueExt(id=1304409105645465969, tenantId=1146029695717560320, journalId=1303687303576780880, issueId=1304141619603726817, language=EN, specialIssueTitle=, coverIllustrator=null, specialIssueEditor=, specialIssueAbout=), CN=IssueExt(id=1304409105645465970, tenantId=1146029695717560320, journalId=1303687303576780880, issueId=1304141619603726817, language=CN, specialIssueTitle=, coverIllustrator=null, specialIssueEditor=, specialIssueAbout=)}, issueFiles=null, downloadFileDto=null}, startPage=19, endPage=29, ext={EN=ArticleExt(id=1304141628676006450, articleId=1304141628441125425, tenantId=1146029695717560320, journalId=1303687303576780880, language=EN, title=Defect Analysis of C19400 Copper Alloy Strip, columnId=1304141568877814747, journalTitle=Copper Engineering, columnName=Material Preparation and Process Engineering, runingTitle=null, highlight=null, articleAbstract=

Surface defects in C19400 copper-iron alloys significantly degrade both electrical conductivity and mechanical properties, posing a key limitation on their application in high-end semiconductor packaging and electronic components. In this paper, origins and microscopic morphology of compositional defects in C19400 copper strips were systematically investigated. Distribution behavior of elements in the copper matrix was first predicted using Miedema model for thermodynamic calculations of Cu-Fe-P system. Subsequently, the defective samples were characterized in terms of microstructure and composition through methods including spark discharge optical emission spectrometry, scanning electron microscopy, and energy-dispersive spectroscopy. Results revealed the presence of various inclusion defects and precipitation in C19400 copper strips. Specifically, oxide inclusions appeared as irregular flakes; carbides aggregated as dark fine particles in localized areas; phosphides were distributed inside pits; hard inclusions were embedded as irregular particles within the pits, and precipitates aligned in elongated forms along the rolling direction. Traceability analysis indicated that compositional defects introduced during the melting and casting stages remained through manufacturing process to strip stage. Subsequent rolling and annealing treatments further altered the size and distribution of these inclusions. This study clarified the evolution path and microstructural characteristics of these defects, providing a theoretical and experimental basis for optimizing processing of C19400 and enhancing reliability of this material in high-end electronic applications.

, authors=Yinghui WEI1, 2, Huijie LIANG1, 2, Wei LIU1, 2, Shengli CHAI1, 2, Jundong LÜ1, 2, Jingzhao YANG1, 2, authorsList=Yinghui WEI, Huijie LIANG, Wei LIU, Shengli CHAI, Jundong LÜ, Jingzhao YANG, authorCompany=null, correspAuthors=Wei LIU, authorNote=null, correspAuthorsNote=null, copyrightStatement=null, copyrightOwner=null, extLink=null, articleAbsUrl=null, sourceXml=null, magXml=null, pdfUrl=null, pdf=null, pdfFileSize=null, pdfExtLink=null, richHtmlUrl=null, mobilePdfUrl=null, reviewReport=null, pdfFirstPage=null, abstractGraph=null, abstractGraphContent=null, abstractVideo=null, citation=null, cebUrl=null, magXmlContent=null, mapNumber=null, fund=null), CN=ArticleExt(id=1304141628998967859, articleId=1304141628441125425, tenantId=1146029695717560320, journalId=1303687303576780880, language=CN, title=C19400铜合金带材缺陷分析, columnId=1304141569037198301, journalTitle=铜业工程, columnName=材料制备与加工工程, runingTitle=null, highlight=null, articleAbstract=

C19400铜铁磷合金的表面缺陷会显著影响其导电率与力学性能,这已成为制约该材料在高端半导体封装及电子元器件中应用的关键因素。本研究系统分析了C19400铜带材中成分缺陷的成因与微观形貌。采用Miedema模型对Cu-Fe-P体系进行热力学计算,预测铜基体中元素的分布行为; 结合电火花直读光谱仪ARL8860、扫描电镜JSM-IT510及能谱仪(C-Nano)等分析手段,对缺陷试样进行微观组织与成分表征。结果表明,C19400铜合金带材存在多种夹杂物缺陷及析出相。具体表现为氧化物呈不规则薄片状分布,碳化物以深色小颗粒形态在局部区域聚集,磷化物分布于坑洞内部,硬质点则以不规则颗粒形式嵌于坑洞中,而析出相沿轧制方向呈长条状有序排列。追溯缺陷来源发现,熔铸工序中引入的成分缺陷随工艺流程传递至带材阶段,后续的轧制与退火工艺进一步改变了夹杂物的尺寸与分布形态。本研究明确了缺陷的演化路径与微观特征,为优化C19400制备工艺、提升其在高端电子领域应用的可靠性提供了理论依据与实验支持。

, authors=魏迎辉1, 2, 梁晖洁1, 2, 刘伟1, 2, 柴胜利1, 2, 吕俊栋1, 2, 杨景召1, 2, authorsList=魏迎辉, 梁晖洁, 刘伟, 柴胜利, 吕俊栋, 杨景召, authorCompany=null, correspAuthors=刘伟, authorNote=

魏迎辉(1973—),男,河北辛集人,硕士,正高级工程师,研究方向:铜及铜合金生产技术,E-mail:

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刘伟,工程师,E-mail:
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魏迎辉(1973—),男,河北辛集人,硕士,正高级工程师,研究方向:铜及铜合金生产技术,E-mail:

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C19400铜合金带材缺陷分析
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魏迎辉 1, 2 , 梁晖洁 1, 2 , 刘伟 1, 2 , 柴胜利 1, 2 , 吕俊栋 1, 2 , 杨景召 1, 2
铜业工程 | 材料制备与加工工程 2026,(1): 19-29
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铜业工程 |材料制备与加工工程 2026 , (1) : 19 -29
C19400铜合金带材缺陷分析
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魏迎辉(1973—),男,河北辛集人,硕士,正高级工程师,研究方向:铜及铜合金生产技术,E-mail:

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魏迎辉(1973—),男,河北辛集人,硕士,正高级工程师,研究方向:铜及铜合金生产技术,E-mail:

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魏迎辉1, 2 , 梁晖洁1, 2, 刘伟1, 2 , 柴胜利1, 2, 吕俊栋1, 2, 杨景召1, 2
作者信息
  • 1.铜基新材料山西省重点实验室,山西 运城 044000
  • 2.山西北铜新材料科技有限公司,山西 运城 044000
通讯作者:
刘伟,工程师,E-mail:
作者简介:

魏迎辉(1973—),男,河北辛集人,硕士,正高级工程师,研究方向:铜及铜合金生产技术,E-mail:

Defect Analysis of C19400 Copper Alloy Strip
Yinghui WEI1, 2 , Huijie LIANG1, 2, Wei LIU1, 2 , Shengli CHAI1, 2, Jundong LÜ1, 2, Jingzhao YANG1, 2
Affiliations
  • 1.Shanxi Key Laboratory of Copper-Based New Materials,Yuncheng 044000,China
  • 2.Shanxi North Copper New Material Technology Co.,Ltd.,Yuncheng 044000,China
出版时间: 2026-02-28 doi: 10.3969/j.issn.1009-3842.2026.01.002
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C19400铜铁磷合金的表面缺陷会显著影响其导电率与力学性能,这已成为制约该材料在高端半导体封装及电子元器件中应用的关键因素。本研究系统分析了C19400铜带材中成分缺陷的成因与微观形貌。采用Miedema模型对Cu-Fe-P体系进行热力学计算,预测铜基体中元素的分布行为; 结合电火花直读光谱仪ARL8860、扫描电镜JSM-IT510及能谱仪(C-Nano)等分析手段,对缺陷试样进行微观组织与成分表征。结果表明,C19400铜合金带材存在多种夹杂物缺陷及析出相。具体表现为氧化物呈不规则薄片状分布,碳化物以深色小颗粒形态在局部区域聚集,磷化物分布于坑洞内部,硬质点则以不规则颗粒形式嵌于坑洞中,而析出相沿轧制方向呈长条状有序排列。追溯缺陷来源发现,熔铸工序中引入的成分缺陷随工艺流程传递至带材阶段,后续的轧制与退火工艺进一步改变了夹杂物的尺寸与分布形态。本研究明确了缺陷的演化路径与微观特征,为优化C19400制备工艺、提升其在高端电子领域应用的可靠性提供了理论依据与实验支持。

C19400铜合金带材  /  成分缺陷  /  微观组织  /  夹杂物  /  性能分析

Surface defects in C19400 copper-iron alloys significantly degrade both electrical conductivity and mechanical properties, posing a key limitation on their application in high-end semiconductor packaging and electronic components. In this paper, origins and microscopic morphology of compositional defects in C19400 copper strips were systematically investigated. Distribution behavior of elements in the copper matrix was first predicted using Miedema model for thermodynamic calculations of Cu-Fe-P system. Subsequently, the defective samples were characterized in terms of microstructure and composition through methods including spark discharge optical emission spectrometry, scanning electron microscopy, and energy-dispersive spectroscopy. Results revealed the presence of various inclusion defects and precipitation in C19400 copper strips. Specifically, oxide inclusions appeared as irregular flakes; carbides aggregated as dark fine particles in localized areas; phosphides were distributed inside pits; hard inclusions were embedded as irregular particles within the pits, and precipitates aligned in elongated forms along the rolling direction. Traceability analysis indicated that compositional defects introduced during the melting and casting stages remained through manufacturing process to strip stage. Subsequent rolling and annealing treatments further altered the size and distribution of these inclusions. This study clarified the evolution path and microstructural characteristics of these defects, providing a theoretical and experimental basis for optimizing processing of C19400 and enhancing reliability of this material in high-end electronic applications.

C19400 copper strip  /  composition defect  /  microstructure  /  inclusion  /  performance analysis
魏迎辉, 梁晖洁, 刘伟, 柴胜利, 吕俊栋, 杨景召. C19400铜合金带材缺陷分析. 铜业工程, 2026 , (1) : 19 -29 . DOI: 10.3969/j.issn.1009-3842.2026.01.002
Yinghui WEI, Huijie LIANG, Wei LIU, Shengli CHAI, Jundong LÜ, Jingzhao YANG. Defect Analysis of C19400 Copper Alloy Strip[J]. Copper Engineering, 2026 , (1) : 19 -29 . DOI: 10.3969/j.issn.1009-3842.2026.01.002
  • 运城市2024年科技计划项目(YCKJ-2024014)
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doi: 10.3969/j.issn.1009-3842.2026.01.002
  • 接收时间:2025-06-03
  • 首发时间:2026-09-08
  • 出版时间:2026-02-28
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  • 收稿日期:2025-06-03
  • 修回日期:2026-01-13
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运城市2024年科技计划项目(YCKJ-2024014)
作者信息
    1.铜基新材料山西省重点实验室,山西 运城 044000
    2.山西北铜新材料科技有限公司,山西 运城 044000

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刘伟,工程师,E-mail:
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2种不同金属材料的力学参数

Family
属数
Number of
genus
种数
Number of
species
占总种数比例
Percentage of
total species (%)

Genus
种数
Number of
species
占总种数比例
Percentage of total
species (%)
鹅膏菌科Amanitaceae 2 11 5.26 鹅膏菌属 Amanita 10 4.78
小菇科 Mycenaceae 2 12 5.74 丝盖伞属 Inocybe 5 2.39
多孔菌科 Polyporaceae 8 14 6.70 蜡蘑属 Laccaria 5 2.39
红菇科 Russulaceae 3 23 11.00 小皮伞属 Marasmius 6 2.87
小菇属 Mycena 11 5.26
光柄菇属 Pluteus 5 2.39
红菇属 Russula 17 8.13
栓菌属 Trametes 5 2.39
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