Article(id=1241838626242364049, tenantId=1146029695717560320, journalId=1241755870837649424, issueId=1241838624241681037, articleNumber=null, orderNo=null, doi=10.19636/j.cnki.cjsm42-1250/o3.2024.037, pmid=null, cstr=null, oa=null, hot=null, price=null, onlineType=0, articleFormat=0, articleType=null, articleTypeStr=null, receivedDate=1723564800000, receivedDateStr=2024-08-14, revisedDate=null, revisedDateStr=null, acceptedDate=null, acceptedDateStr=null, onlineDate=1774007000742, onlineDateStr=2026-03-20, pubDate=1740672000000, pubDateStr=2025-02-28, doiRegisterDate=null, doiRegisterDateStr=null, onlineIssueDate=1774007000742, onlineIssueDateStr=2026-03-20, onlineJustAcceptDate=null, onlineJustAcceptDateStr=null, onlineFirstDate=null, onlineFirstDateStr=null, sourceXml=null, magXml=null, createTime=1774007000742, creator=13701087609, updateTime=1774007000742, updator=13701087609, issue=Issue{id=1241838624241681037, tenantId=1146029695717560320, journalId=1241755870837649424, year='2025', volume='46', issue='1', pageStart='1', pageEnd='148', issueExtLink='null', onlineDate='null', pubDate='null', beforeIssueId=null, nextIssueId=null, price=null, status=1, issueComplete=1, articleOrder=1, issueType=-1, specialIssue=null, createTime=1774007000265, creator=13701087609, updateTime=1774007104623, updator=13701087609, preIssue=null, nextIssue=null, ext={EN=IssueExt(id=1241839062017966445, tenantId=1146029695717560320, journalId=1241755870837649424, issueId=1241838624241681037, language=EN, specialIssueTitle=, coverIllustrator=null, specialIssueEditor=, specialIssueAbout=), CN=IssueExt(id=1241839062017966446, tenantId=1146029695717560320, journalId=1241755870837649424, issueId=1241838624241681037, language=CN, specialIssueTitle=, coverIllustrator=null, specialIssueEditor=, specialIssueAbout=)}, issueFiles=null}, startPage=15, endPage=26, ext={EN=ArticleExt(id=1241838626762457750, articleId=1241838626242364049, tenantId=1146029695717560320, journalId=1241755870837649424, language=EN, title=Research on Buckling Behavior in Thin-Film-and-Finite-Thickness Substrate Structures Considering Flexoelectric Effects, columnId=1241831201674171363, journalTitle=Chinese Journal of Solid Mechanics, columnName=Research Papers, runingTitle=null, highlight=null, articleAbstract=

Large-area and tunable strain gradients arise from inhomogeneous deformation in wrinkled thin films, making them promising for flexoelectric applications. Consequently, the structure and buckling modes of these films have garnered significant attention. In this paper, an electromechanical coupling model is developed to study the buckling behavior of thin-film-and-finite-thickness-substrate structures with flexoelectric effects. First, the influence of flexoelectric effects on the buckling evolution of thin-film-substrate structures is assessed using the minimum energy method. Two buckling modes, i.e., global buckling and local wrinkling, are distinguished by changing structural parameters and the flexoelectric coefficient. Results show that stronger flexoelectric effects lead to slenderer films and an increased likelihood of global buckling. Additionally, a stronger flexoelectric effect raises the critical strain required for buckling and significantly impacts local wrinkling mode. In local wrinkling, as the amplitude increases, the maximum strain in thin films decreases; sparser wrinkles with greater amplitude occur with a more pronounced flexoelectric effect. When the flexoelectric effect reaches a certain threshold, the buckling mode of the thin film shifts from local wrinkling to global buckling. The flexoelectric effect enhances structural stiffness and stretchability. Moreover, flexoelectric polarization can be continuously adjusted with compressive strain, highlighting its controllability in wrinkled thin films for generating and managing material polarity. These findings will aid in the design and application of micro and nanoscale electromechanical devices.

, correspAuthors=Bo Wang, authorNote=null, correspAuthorsNote=null, copyrightStatement=null, copyrightOwner=null, extLink=null, articleAbsUrl=null, sourceXml=null, magXml=null, pdfUrl=null, pdf=null, pdfFileSize=null, pdfExtLink=null, richHtmlUrl=null, mobilePdfUrl=null, reviewReport=null, pdfFirstPage=null, abstractGraph=null, abstractGraphContent=null, abstractVideo=null, citation=null, cebUrl=null, magXmlContent=null, mapNumber=null, authorCompany=null, fund=null, authors=null, authorsList=Chenyu Wang, Bo Wang, Bohan Zhang, Yongan Huang, Huajiang Ouyang), CN=ArticleExt(id=1241838643875218370, articleId=1241838626242364049, tenantId=1146029695717560320, journalId=1241755870837649424, language=CN, title=具有挠曲电效应的薄膜-有限厚度基底结构的屈曲行为研究, columnId=1241831201896469478, journalTitle=固体力学学报, columnName=研究论文, runingTitle=null, highlight=null, articleAbstract=

本文建立了一个具有挠曲电效应薄膜-有限厚基底结构屈曲的理论模型,通过最小能量法对结构总能量进行分析,研究了挠曲电效应对薄膜-基底结构发生屈曲演化的影响,并对全局屈曲和局部起皱两种屈曲模式进行了区分. 目前研究表明薄膜中挠曲电效应越强,结构越细长,越倾向于发生全局屈曲. 同时,结构发生失稳所需的临界应变越大,且挠曲电效应对局部起皱失稳模式的影响更突出. 挠曲电效应的存在会增大结构的刚度,改善结构的可拉伸性. 褶皱薄膜中挠曲电效应的可控性对材料极性的产生与控制有着重要意义. 这些发现将有助于微纳尺度上机电设备的设计与应用.

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**E-mail:.
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(a), (b) and (c) are the relationship graphs of thin film with flexoelectric coefficient μ31=0 C/m, 0.5×10-5 C/m, 1.0×10-5 C/m respectively, (d) as a whole, the influence of the flexoelectricity on the critical strain of instability is reflected, figureFileSmall=XBNd/+Pp0A5bwqilMmS1jQ==, figureFileBig=HB0e6Z1bk2j9bumqBR5LRA==, tableContent=null), ArticleFig(id=1241838649281675405, tenantId=1146029695717560320, journalId=1241755870837649424, articleId=1241838626242364049, language=CN, label=图5, caption=不同挠曲电系数下基底/薄膜厚度比与失稳临界应变的关系.(a)、(b)、(c)分别为薄膜挠曲电系数μ31=0 C/m,0.5×10-5 C/m,1.0×10-5 C/m时的关系图,(d)从整体上反映了挠曲电效应强弱对失稳临界应变的影响, figureFileSmall=XBNd/+Pp0A5bwqilMmS1jQ==, figureFileBig=HB0e6Z1bk2j9bumqBR5LRA==, tableContent=null), ArticleFig(id=1241838649357172877, tenantId=1146029695717560320, journalId=1241755870837649424, articleId=1241838626242364049, language=EN, label=Fig.6, caption=The relationship between (a) local wrinkling amplitude and (b) maximum strain and prestrain under different flexoelectric coefficients. 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具有挠曲电效应的薄膜-有限厚度基底结构的屈曲行为研究
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王辰宇 1, 2 , 王博 1, 2, ** , 张博涵 1, 2 , 黄永安 3 , 欧阳华江 4
固体力学学报 | 研究论文 2025,46(1): 15-26
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固体力学学报 | 研究论文 2025, 46(1): 15-26
具有挠曲电效应的薄膜-有限厚度基底结构的屈曲行为研究
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王辰宇1, 2, 王博1, 2, ** , 张博涵1, 2, 黄永安3, 欧阳华江4
作者信息
  • 1西北工业大学工程力学系,西安,710072
  • 2西北工业大学深圳研究院,深圳,518063
  • 3华中科技大学智能制造装备与技术全国重点实验室,武汉,430074
  • 4西南交通大学机械工程学院,成都,610031

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**E-mail:.
Research on Buckling Behavior in Thin-Film-and-Finite-Thickness Substrate Structures Considering Flexoelectric Effects
Chenyu Wang1, 2, Bo Wang1, 2, ** , Bohan Zhang1, 2, Yongan Huang3, Huajiang Ouyang4
Affiliations
  • 1Department of Engineering Mechanics, Northwestern Polytechnical University, Xi'an, 710072
  • 2Research Development Institute of Northwestern Polytechnical University in Shenzhen, Shenzhen, 518063
  • 3State Key Laboratory of Digital Manufacturing Equipment and Technology, Huazhong University of Science and Technology, Wuhan, 430074
  • 4School of Mechanical Engineering, Southwest Jiaotong University, Chengdu, 610031
出版时间: 2025-02-28 doi: 10.19636/j.cnki.cjsm42-1250/o3.2024.037
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本文建立了一个具有挠曲电效应薄膜-有限厚基底结构屈曲的理论模型,通过最小能量法对结构总能量进行分析,研究了挠曲电效应对薄膜-基底结构发生屈曲演化的影响,并对全局屈曲和局部起皱两种屈曲模式进行了区分. 目前研究表明薄膜中挠曲电效应越强,结构越细长,越倾向于发生全局屈曲. 同时,结构发生失稳所需的临界应变越大,且挠曲电效应对局部起皱失稳模式的影响更突出. 挠曲电效应的存在会增大结构的刚度,改善结构的可拉伸性. 褶皱薄膜中挠曲电效应的可控性对材料极性的产生与控制有着重要意义. 这些发现将有助于微纳尺度上机电设备的设计与应用.

挠曲电效应  /  有限厚度基底  /  薄膜-基底结构  /  屈曲模式

Large-area and tunable strain gradients arise from inhomogeneous deformation in wrinkled thin films, making them promising for flexoelectric applications. Consequently, the structure and buckling modes of these films have garnered significant attention. In this paper, an electromechanical coupling model is developed to study the buckling behavior of thin-film-and-finite-thickness-substrate structures with flexoelectric effects. First, the influence of flexoelectric effects on the buckling evolution of thin-film-substrate structures is assessed using the minimum energy method. Two buckling modes, i.e., global buckling and local wrinkling, are distinguished by changing structural parameters and the flexoelectric coefficient. Results show that stronger flexoelectric effects lead to slenderer films and an increased likelihood of global buckling. Additionally, a stronger flexoelectric effect raises the critical strain required for buckling and significantly impacts local wrinkling mode. In local wrinkling, as the amplitude increases, the maximum strain in thin films decreases; sparser wrinkles with greater amplitude occur with a more pronounced flexoelectric effect. When the flexoelectric effect reaches a certain threshold, the buckling mode of the thin film shifts from local wrinkling to global buckling. The flexoelectric effect enhances structural stiffness and stretchability. Moreover, flexoelectric polarization can be continuously adjusted with compressive strain, highlighting its controllability in wrinkled thin films for generating and managing material polarity. These findings will aid in the design and application of micro and nanoscale electromechanical devices.

flexoelectric effect  /  finite-thickness substrate  /  film-substrate structure  /  buckling mode
王辰宇, 王博, 张博涵, 黄永安, 欧阳华江. 具有挠曲电效应的薄膜-有限厚度基底结构的屈曲行为研究. 固体力学学报, 2025 , 46 (1) : 15 -26 . DOI: 10.19636/j.cnki.cjsm42-1250/o3.2024.037
Chenyu Wang, Bo Wang, Bohan Zhang, Yongan Huang, Huajiang Ouyang. Research on Buckling Behavior in Thin-Film-and-Finite-Thickness Substrate Structures Considering Flexoelectric Effects[J]. Chinese Journal of Solid Mechanics, 2025 , 46 (1) : 15 -26 . DOI: 10.19636/j.cnki.cjsm42-1250/o3.2024.037
挠曲电效应(Elexoelectric effect),是指由非均匀变形或应变梯度诱导产生的电极化现象[1,2],已被证明在纳米尺度的电介质膜中极性结构的形成中起主导作用,挠曲电效应不受材料结构对称性和居里温度的限制,广泛存在于固体介电材料中[3,4]. 由于其独特的优势,挠曲电效应在柔性电子器件、微纳机电系统(M/NEMS)、应变梯度工程、生物医疗和电子/光电子学等领域具有广阔的应用前景[5-7]. 然而由于无机材料的固有脆性,需要进行特别的结构设计才能实现大的应变梯度[8,9]. 由于在无机纳米膜和纳米线中,应变梯度随着结构尺寸从体积减小到纳米尺度而增加,挠曲电效应变得显著[10,11],因此提出一种具有大面积且可调节应变梯度的结构设计方法成为了研究的重点问题.
普遍存在的褶皱现象作为一种表面不稳定性,已广泛应用于柔性电子产品、生物医疗和微结构制造等领域[12-14]. 基于屈曲失稳原理的褶皱薄膜中的非均质变形已被证明可以引入大范围且可调节的应变梯度[15,16],可以实现对薄膜中的挠曲电效应的充分利用. Wang等[17]建立了一个考虑挠曲电效应的机电耦合模型来研究自由薄膜的屈曲性质,发现更小尺寸的薄膜表现出更强的抗屈曲性能,证实了挠曲电效应在纳米尺度的屈曲薄膜中的关键作用. Shang等[15]提出了一种考虑表面失稳的薄膜-基底结构中挠曲电效应的理论模型,为机械改变介电材料极性提供一种无电压的策略. Shang等[18]进一步研究了一种通过褶皱薄膜中的挠曲电效应来机械调控极化结构的新途径,通过改变褶皱薄膜形态,实现了从非极性状态到极性状态的转变,为极化拓扑结构提供更广泛的结构选项. 这些发现证明了褶皱压电或铁电薄膜中挠曲电效应的存在和应用前景.
此外,Zhang等[19]和Patidar等[20]的研究表明,有限厚度基体上的无机薄膜在失稳时存在整体屈曲和局部起皱两种模式. 其中,较薄的基底更容易发生整体屈曲,较厚的基底更容易发生局部起皱[21,22]. 不同模式的失稳褶皱将引起不同的应变梯度,在整体和局部屈曲两种模式间切换有助于实现大范围且可调节的挠曲电效应. 而目前针对褶皱薄膜挠曲电效应的研究还没有考虑到无机薄膜中不同的失稳模式的影响.
本文研究挠曲电效应对薄膜-基底结构发生屈曲演化的影响. 在第1节中,给出了薄膜-基底结构的总能量推导过程,在第2节中,对两种屈曲模式出现的条件进行区分,讨论不同模式下的临界应变、褶皱形态与可拉伸性. 最后,第3节给出了本文主要结论.
图1显示了用于制备褶皱薄膜基底结构的预拉伸策略. 薄膜粘合到平坦的预应变软基底上(图1(a)). 然后释放预应变,基底收缩导致薄膜压缩,并出现两种不同的屈曲状态(图1(b)和(c)),该过程已被实验观测[21,23].
同时,薄膜中出现了不同的挠曲电极化现象. 平坦结构(图1(a))中,内在材料是中心对称的;全局屈曲模式(图1(b))中,对称性破坏产生挠曲电极化;局部起皱模式(图1(c))中,对称性破坏产生更复杂的挠曲电极化. 薄膜和基底的厚度分别用hH表示,结构的长度为L.
在这一节,我们首先推导考虑挠曲电效应的屈曲薄膜的能量,其能量密度可以表示为:
其中,σxxεxxτxxzεxxz分别为柯西应力、应变、高阶矩应力和应变梯度. Dz为电位移,Ez表示静电场.
根据文献[24-26],屈曲薄膜的力电耦合本构方程可以表示为:
其中,a33c11e31μ31分别为介电常数、弹性常数、压电常数和挠曲电常数. 将式(2)-(4)代入式(1)中,屈曲薄膜的能量密度Hb可改写为:
接下来,我们考虑屈曲薄膜的位移形式. 根据文献[27],薄膜的横向位移和轴向位移分别可以假设为:
其中,Ak是屈曲后的振幅和波数,γ1γ2是待定的弹性参数.
将薄膜建模为非线性Euler-Bernoulli梁,薄膜的位移应变关系可表示为:
其中,εpre为释放预拉伸基底产生的薄膜平面内压缩应变,εx为薄膜的轴向总应变.
接下来,我们推导电场的表达式. 在没有自由电荷的情况下,要求电位移满足高斯定理.
z方向上电场强度为:
利用电学边界条件φh/2)=Vφ(-h/2)=0,并将式(4)代入(9)、(10)求解得到在不考虑电场梯度逆效应的情况下,电势、电场及其梯度的表达式:
屈曲薄膜的总能量可以写为:
其中,表示薄膜的等效弹性模量,Efνf分别为薄膜的弹性模量和泊松比. χ为挠曲电参数引起的项,其值为.
薄膜-基底界面处法向应力p与剪应力τx可以表示为:
为了准确地捕捉薄膜基底结构的屈曲行为,本文采用完整的薄膜轴向位移形式(包括sin(kx)和sin(2kx)). 因此,作用在界面上的法向应力和剪应力的表达式为:
为了求解基底的平面应变问题,采用Airy应力函数方法,基底的平衡方程为:
其中,σx=∂2E/∂z2σz=∂2E/∂x2τxz=-∂2E/∂xzE=Exz)的应力,E=Exz)需满足:
其中,为梯度算子. 由于薄膜的横向位移形式为wf=Acos(kx),同时根据薄膜基底结构的位移连续性条件,基底的Airy应力函数可以被假设为:
其中,为待确定的系数.
根据薄膜和基底之间完整的剪切力表达式,基底边界条件可以定义为:
将应力函数(21)带入边界条件(23)中,求解该方程可得到. 进而可以得到基底上表面法向应力σz|z=0和剪应力us|z=0的表达式为:
其中的系数为:
薄膜中性轴处的轴向位移为uf=us|z=0-(hfwf/∂x)/2,根据薄膜和基底之间界面处的平衡条件,求解得到待定系数τ1τ2
因此,薄膜中性轴处的轴向位移可重新写为:
其中,. 根据式(23)以及(24)(25),可以得到基底能量表达式为:
薄膜-基底结构总能量可以写为:
其中:
从总能量方程(30)可以看出:当fεpre时,总能量在振幅A=0时最小,这意味着柔性膜基结构不会屈曲. 另一方面,当f<εpre时,结构会发生屈曲失稳,由于g≪1[22,27],故可将其忽略,令∂Utotal/∂A=0可以得到该结构起皱失稳时的振幅为:
将式(33)回代到总能量表达式(30)中,可以将总能量可以写为关于波数k的函数:
根据公式(34)可以得到,总能量Utotal依赖于fkh),且是f的二次函数. 显然,当f<εpre时,公式(34)中的总能量Utotal是关于波数k的最小化,它决定了薄膜-基底结构的屈曲状态. 在下面数值仿真中使用到的参数为:νf=0.33,νs=0.48,Ef=210 GPa,Es=2.5 MPa.
为了区分薄膜-基底结构的屈曲区域,并评估挠曲电效应强弱对屈曲区域的影响,绘制了图2.
图2的数值结果可以发现:在基底与薄膜厚度比H/h=104时,当薄膜挠曲电系数μ31=1×10-5 C/m时,函数f图2(a)中蓝色三角曲线)是关于kh单调递增函数,这意味着当k=1和λ=L时,f最小. 即,此时结构仅会出现全局屈曲一种失稳模式. 然而,当薄膜挠曲电系数μ31=0 C/m和0.5×10-5 C/m时,函数f图2(a)中红色圆圈曲线)不是关于kh单调递增函数,存在局部极小值点. 此时,随结构长度L的不同可能出现整体屈曲或起皱失稳两种失稳模式,而且这两种屈曲状态可以通过比较与它们对应的f函数值来确定. 如图2(b)所示,函数f关于kh有一个极小值点,该点对应于的屈曲状态为起皱失稳,但是,当kh<2πh/Lc时,结构的屈曲状态为整体屈曲. 为了更清楚地区分这两种屈曲模式,给出了临界长度Lc. 当L<Lc时(即图中橙色部分),结构发生起皱失稳;否则,结构只会发生整体屈曲(即图中蓝色部分). 因此,可以得到薄膜挠曲电系数越小,结构越容易发生局部起皱. 挠曲电效应的存在会增大结构的刚度,改善结构的可拉伸性.
为了区分薄膜-基底结构的屈曲区域,并评估薄膜和基底的厚度对屈曲区域的影响,绘制了图3. 由图3的数值结果可以发现:在薄膜挠曲电系数μ31=1×10-5 C/m时,当基底与薄膜厚度比H/h≤104时,函数f是关于kh的单调递增函数,此时不论结构长度L如何变化,结构仅会出现全局屈曲一种失稳模式. 然而,当基底与薄膜的厚度比H/h> 104时,随结构长度L的不同可能出现整体屈曲或起皱失稳两种失稳模式. 因此,可以得到结构基底厚度越大,结构越容易发生局部起皱. 在进行结构设计时需要根据不同的目标考虑薄膜材料的挠曲电参数、厚度、基底的厚度与结构的长度来诱导结构产生相应的屈曲模式.
图2图3的分析中可以得到,薄膜挠曲电系数、结构长度与基底/薄膜厚度比都会影响薄膜/基底结构的屈曲失稳模式,为了进一步明确整体屈曲和局部起皱,并深入理解临界长度Lc与薄膜挠曲电系数μ31和基底/薄膜厚度比H/h之间的关系,在图4中给出了整体屈曲和局部起皱之间的转换关系.
图4(a)中,薄膜挠曲电系数μ31=0 C/m,从这个图中可以清楚地观察到,当基底/薄膜厚度比H/h <71(数值计算得到)时,结构的屈曲状态是整体屈曲. 当这个比值大于71时(即增加了基底的厚度),结构的屈曲状态由结构的长度L决定,当L>Lc时(即在图中蓝色方框曲线上方蓝色区域),结构屈曲状态是整体屈曲;当L<Lc时(即在图中黄色区域),结构屈曲状态是局部起皱. 如图4(a)所示,基底越厚,临界长度Lc的值越大,这意味着要形成整体屈曲状态,结构应该越长. 在图4(b)和图4(c)中,薄膜挠曲电系数μ31分别为0.5×10-5 C/m和1.0×10-5 C/m,随薄膜挠曲电系数增大,产生两种失稳模式的临界厚度比增大,临界长度变化趋势与图4(a)相同. 从图4(d)中可以直观地看到,随着薄膜挠曲电效应增强与基底厚度减小,临界长度Lc的值越小,结构越容易发生全局屈曲.
图5(a)中,薄膜挠曲电系数μ31=0 C/m、结构长度L/h=1000,从图中可以清楚地观察到,当基底、薄膜厚度比H/h<71时与,结构的屈曲模式是整体屈曲,失稳的临界应变随厚度比增大而增大. 当这个比值大于71时,结构的屈曲模式是局部起皱,失稳的临界应变随厚度比增大而减小. 在图5(b)和图5(c)中,薄膜挠曲电系数μ31分别为0.5×10-5 C/m和1.0×10-5 C/m,随薄膜挠曲电系数增大,两种失稳模式的临界厚度比增大,临界应变变化趋势与图5(a)相同. 从图5(d)中可以直观地看到,随薄膜挠曲电效应增强,结构发生失稳的临界应变增大,且对局部起皱阶段的影响更突出.
上述研究表明,挠曲电效应的存在可以提高结构的拉伸性能. 为了理解这种拉伸性的基本机制,我们研究了当受到不同的压缩应变时的振幅和最大应变. 起皱膜中的最大应变可以表示为[15]
为了进一步研究挠曲电效应对局部起皱失稳模式的影响,图6描绘了不同挠曲电系数条件下,预应变与局部起皱振幅与最大应变之间的关系,以直观地说明薄膜/基底结构可拉伸性的改善. 从图6(a)可以看出,薄膜挠曲电效应越弱,结构发生局部起皱的临界应变就越小. 同时,振幅随预应变的增大而增大. 然而当薄膜挠曲电效应较强时,结构在预应变小的时候振幅较小,预应变大的时候振幅较大. 从图6(b)可以看出,薄膜中挠曲电效应越强时,薄膜中最大应变越小,再次说明了挠曲电效应的存在可以提高结构的拉伸性能.
图7给出了在结构长度L/h=1000、基底/薄膜厚度比H/h=110和结构预应变εpre=0.03%时不同挠曲电系数薄膜的褶皱轮廓图. 从图中可以看到,对于局部起皱失稳模式,薄膜挠曲电效应较强时,褶皱更稀疏,同时褶皱振幅更大,与图6(a)结论相符. 当薄膜挠曲电效应增强到一定程度时,结构失稳模式从局部起皱转变为全局屈曲,此时,结构振幅是局部失稳模式的两倍多. 在基于褶皱的微电子机械设计过程中需要注意采用合适的参数来避免结构发生不合适的失稳模式.
为了评估屈曲薄膜中挠曲电效应的大小,首先推导得到屈曲薄膜应变梯度为:
由应变梯度引起的挠曲电极化表达式为:
图8展示了由失稳褶皱诱导的挠曲电极化在不同位置的分布情况,给出了挠曲电极化强度的验证对比图. 计算采用文献[15]中的参数,设置薄膜厚度h=100 μm,厚度比H/h=500,预压缩应变εpre=6%以及挠曲电系数μ31=4.5×10-5 C/m,可以看到本文局部起皱模式下理论预测结果与Shang等人的半无限大基底模型结果基本一致,且本文结果与有限元分析获得的结果具有更好的一致性. 挠曲电极化可以通过压缩应变连续调节,褶皱薄膜中挠曲电效应的可控性对材料极性的产生与控制有着重要意义.
总之,我们提出了一个理论模型来研究具有挠曲电效应的褶皱薄膜-自由支撑有限厚基底结构屈曲的理论模型. 通过对结构总能量的分析,研究了挠曲电效应对薄膜-基底结构发生屈曲演化的影响,并对全局屈曲和局部起皱两种屈曲模式进行了区分. 此外,我们还讨论了不同模式下的临界应变、褶皱形态与可拉伸性,得到了以下一些结论:
(1)薄膜中挠曲电效应越强,结构越细长,越容易发生全局屈曲. 挠曲电效应的存在会增大结构的刚度,改善结构的可拉伸性.
(2)薄膜中挠曲电效应越强,结构发生失稳所需的临界应变越大,且对局部起皱失稳模式的影响更突出.
(3)薄膜中挠曲电效应越强时,局部失稳模式的振幅越大,薄膜中最大应变越小,再次说明了挠曲电效应的存在可以提高结构的拉伸性能.
(4)对于局部起皱失稳模式,薄膜挠曲电效应较强时,褶皱更稀疏,同时褶皱振幅更大. 当薄膜挠曲电效应增强到一定程度时,结构失稳模式将从局部起皱转变为全局屈曲.
(5)挠曲电极化可以通过压缩应变连续调节,褶皱薄膜中挠曲电效应的可控性对材料极性的产生与控制有着重要意义.
我们期待对考虑挠曲电效应褶皱薄膜的屈曲模式进行讨论将有助于在微纳尺度上设计多功能的基于褶皱的设备,如传感器、能量采集器和柔性电子设备.
  • 国家自然科学基金(12172282)
  • 广东省基金(2024A1515010767)
  • 中央高校基本科研业务费专项资金
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doi: 10.19636/j.cnki.cjsm42-1250/o3.2024.037
  • 接收时间:2024-08-14
  • 首发时间:2026-03-20
  • 出版时间:2025-02-28
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  • 收稿日期:2024-08-14
基金
国家自然科学基金(12172282)
广东省基金(2024A1515010767)
中央高校基本科研业务费专项资金
作者信息
    1西北工业大学工程力学系,西安,710072
    2西北工业大学深圳研究院,深圳,518063
    3华中科技大学智能制造装备与技术全国重点实验室,武汉,430074
    4西南交通大学机械工程学院,成都,610031

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2种不同金属材料的力学参数

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鹅膏菌科Amanitaceae 2 11 5.26 鹅膏菌属 Amanita 10 4.78
小菇科 Mycenaceae 2 12 5.74 丝盖伞属 Inocybe 5 2.39
多孔菌科 Polyporaceae 8 14 6.70 蜡蘑属 Laccaria 5 2.39
红菇科 Russulaceae 3 23 11.00 小皮伞属 Marasmius 6 2.87
小菇属 Mycena 11 5.26
光柄菇属 Pluteus 5 2.39
红菇属 Russula 17 8.13
栓菌属 Trametes 5 2.39
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