Article(id=1322612260967658289, tenantId=1146029695717560320, journalId=1263187385517883426, issueId=1322612228126265395, articleNumber=null, orderNo=null, doi=10.14062/j.issn.0454-5648.20190527, pmid=null, cstr=null, oa=null, hot=null, price=null, onlineType=0, articleFormat=0, articleType=null, articleTypeStr=null, receivedDate=1563811200000, receivedDateStr=2019-07-23, revisedDate=1572969600000, revisedDateStr=2019-11-06, acceptedDate=null, acceptedDateStr=null, onlineDate=1793264935961, onlineDateStr=2026-10-29, pubDate=1587312000000, pubDateStr=2020-04-20, doiRegisterDate=null, doiRegisterDateStr=null, onlineIssueDate=1793264935961, onlineIssueDateStr=2026-10-29, onlineJustAcceptDate=null, onlineJustAcceptDateStr=null, onlineFirstDate=null, onlineFirstDateStr=null, sourceXml=null, magXml=null, createTime=1793264935961, creator=13701087609, updateTime=1793264935961, updator=13701087609, issue=Issue{id=1322612228126265395, tenantId=1146029695717560320, journalId=1263187385517883426, year='2020', volume='48', issue='4', pageStart='463', pageEnd='614', issueExtLink='null', onlineDate='null', pubDate='1587312000000', pubDateStr='2020-04-20', beforeIssueId=null, nextIssueId=null, price=null, status=1, issueComplete=1, articleOrder=1, issueType=-1, specialIssue=null, createTime=1793264928132, creator='13701087609', updateTime=1793276729826, updator='13701087609', preIssue=null, nextIssue=null, articleTotal=null, ext={EN=IssueExt(id=1322661728073138752, tenantId=1146029695717560320, journalId=1263187385517883426, issueId=1322612228126265395, language=EN, specialIssueTitle=, coverIllustrator=null, specialIssueEditor=, specialIssueAbout=), CN=IssueExt(id=1322661728073138753, tenantId=1146029695717560320, journalId=1263187385517883426, issueId=1322612228126265395, language=CN, specialIssueTitle=, coverIllustrator=null, specialIssueEditor=, specialIssueAbout=)}, issueFiles=null, downloadFileDto=null}, startPage=491, endPage=498, ext={EN=ArticleExt(id=1322612261148013362, articleId=1322612260967658289, tenantId=1146029695717560320, journalId=1263187385517883426, language=EN, title=Effects of Thickness and Ultraviolet Irradiation on Structural, Optical and Electrical Properties of F-doped SnO₂ Films Prepared by Reactive Sputtering, columnId=null, journalTitle=Journal of the Chinese Ceramic Society, columnName=null, runingTitle=null, highlight=null, articleAbstract=

F-doped SnO₂ (FTO) thin films with the thickness of 20-400 nm were prepared via reactive magnetron sputtering at 150-300 ℃ using Sn+SnF₂ as a target, and the prepared FTO films were further treated by ultraviolet (UV) irradiation. The effects of film thickness and UV irradiation time on the structural, optical and electrical properties of FTO films were investigated. The results show that the crystallinity of FTO films improves and the preferred orientation remains (211) plane with the increase of film thickness or substrate temperature. Meanwhile, the compressive stress existed in the films increases and the conductive properties of films degrade. The transmittance of the films firstly decreases and then increases, and their energy gap (E_g) firstly increases and then becomes stable when the film thickness increases. Increasing substrate temperature can increase the transmittance and E_g of the films. UV irradiation can increase the carrier concentration of the films, thus enhancing the conductive properties of the film, but it has little effect on the transmittance of the film. In addition, the influence of film thickness on the structural, optical and electrical properties of FTO films was discussed, and the mechanism of improving the optical and electrical properties of FTO film by UV irradiation was analyzed. This study could provide a reference for the preparation of FTO thin films by magnetron sputtering technology and the improvement of their properties.

, authors=Bailin ZHU, Xiaoxiao SONG, Ye TAO, Changhong YI, Jun WU, authorsList=Bailin ZHU, Xiaoxiao SONG, Ye TAO, Changhong YI, Jun WU, authorCompany=null, correspAuthors=null, authorNote=, correspAuthorsNote=null, copyrightStatement=null, copyrightOwner=null, extLink=null, articleAbsUrl=null, sourceXml=null, magXml=null, pdfUrl=null, pdf=null, pdfFileSize=null, pdfExtLink=null, richHtmlUrl=null, mobilePdfUrl=null, reviewReport=null, pdfFirstPage=null, abstractGraph=null, abstractGraphContent=null, abstractVideo=null, citation=null, cebUrl=null, magXmlContent=null, mapNumber=null, fund=null), CN=ArticleExt(id=1322612261437420339, articleId=1322612260967658289, tenantId=1146029695717560320, journalId=1263187385517883426, language=CN, title=膜厚与紫外光辐照对反应溅射法制备的F掺杂SnO₂薄膜结构与光电性能的影响, columnId=null, journalTitle=硅酸盐学报, columnName=, runingTitle=null, highlight=null, articleAbstract=

以Sn+SnF₂为靶材，在衬底温度为150和300 ℃通过反应磁控溅射法制备了厚度为20~400 nm的F掺杂SnO₂（FTO）薄膜，并通过紫外光（UV）辐照对2种厚度（20和240 nm）的样品进行了后处理，研究了膜厚和UV辐照时间对薄膜结构与透明导电性能的影响。结果表明：随着膜厚或衬底温度的增加，FTO薄膜结晶度提高，但择优取向保持为（211）面；与此同时，薄膜中压应力增大，而导电性能下降。随着膜厚的增加，薄膜透光性先降低后增加，而其禁带宽度（E_g）先明显增加后趋于稳定。增大衬底温度可增大薄膜的透光性和E_g。UV辐照可明显提高薄膜的载流子浓度，从而增强薄膜的导电性能，但对薄膜的透光性无明显改变。另外，讨论了膜厚引起FTO薄膜结构及光电性能变化的相关机制，分析了UV辐照对FTO薄膜光电性能的改善机理。

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祝柏林（1977—），男，教授。

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