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Article(id=1319236598068269901, tenantId=1146029695717560320, journalId=1263187385517883426, issueId=1319236561179366013, articleNumber=null, orderNo=null, doi=10.14062/j.issn.0454-5648.20220092, pmid=null, cstr=null, oa=null, hot=null, price=null, onlineType=0, articleFormat=0, articleType=null, articleTypeStr=null, receivedDate=1643472000000, receivedDateStr=2022-01-30, revisedDate=1647014400000, revisedDateStr=2022-03-12, acceptedDate=null, acceptedDateStr=null, onlineDate=1792460115209, onlineDateStr=2026-10-20, pubDate=1663603200000, pubDateStr=2022-09-20, doiRegisterDate=null, doiRegisterDateStr=null, onlineIssueDate=1792460115209, onlineIssueDateStr=2026-10-20, onlineJustAcceptDate=null, onlineJustAcceptDateStr=null, onlineFirstDate=null, onlineFirstDateStr=null, sourceXml=null, magXml=null, createTime=1792460115209, creator=13701087609, updateTime=1792460115209, updator=13701087609, issue=Issue{id=1319236561179366013, tenantId=1146029695717560320, journalId=1263187385517883426, year='2022', volume='50', issue='9', pageStart='2351', pageEnd='2578', issueExtLink='null', onlineDate='null', pubDate='1663603200000', pubDateStr='2022-09-20', beforeIssueId=null, nextIssueId=null, price=null, status=1, issueComplete=1, articleOrder=1, issueType=-1, specialIssue=null, createTime=1792460106415, creator='13701087609', updateTime=1792460650608, updator='13701087609', preIssue=null, nextIssue=null, articleTotal=null, ext={EN=IssueExt(id=1319238843744764843, tenantId=1146029695717560320, journalId=1263187385517883426, issueId=1319236561179366013, language=EN, specialIssueTitle=, coverIllustrator=null, specialIssueEditor=, specialIssueAbout=), CN=IssueExt(id=1319238843744764844, tenantId=1146029695717560320, journalId=1263187385517883426, issueId=1319236561179366013, language=CN, specialIssueTitle=, coverIllustrator=null, specialIssueEditor=, specialIssueAbout=)}, issueFiles=null, downloadFileDto=null}, startPage=2470, endPage=2476, ext={EN=ArticleExt(id=1319236598269596494, articleId=1319236598068269901, tenantId=1146029695717560320, journalId=1263187385517883426, language=EN, title=Effect of Chemical Action on Material Removal Behavior During AlN Crystal Lapping, columnId=1263922769897599102, journalTitle=Journal of the Chinese Ceramic Society, columnName=Research Articles, runingTitle=null, highlight=null, articleAbstract=

AlN crystal is a typical brittle and difficult-to-process material. To prepare AlN crystal substrates with a high efficiency and a high quality, slurries with different chemical compositions were designed to lap AlN crystals, and the mechanism of chemical action-assisted material removal was investigated by laser confocal microscopy and X-ray photoelectron spectroscopy. The results show that the alkaline slurry is beneficial to obtaining the optimum lapping results, the material removal rate is 23 μm/h, and the surface roughness (Ra) is 122 nm. The diamond abrasive particles in the slurry have a good dispersibility in alkaline environment. The alkaline solution can corrode the crystal surface, form a metamorphic layer containing basic aluminum salts, and cause some changes in the surface morphology. In the lapping interface, the metamorphic layer produced by chemical etching on the surface of AlN crystal is more conducive to the mechanical removal of abrasive particles, which can lay a foundation for improving the lapping efficiency and quality. The result obtained can provide a reference for optimizing the ultra-precision processing technology of AlN crystals.

, authors=Chuanjin HUANG1, Bin GU2, Hai ZHOU1, Wei FENG1, authorsList=Chuanjin HUANG, Bin GU, Hai ZHOU, Wei FENG, authorCompany=null, correspAuthors=Hai ZHOU, authorNote=

HUANG Chuanjin (1982-), male, Ph.D., Lecturer. E-mail:

, correspAuthorsNote=
ZHOU Hai (1965-), male, Ph.D., Professor. E-mail:
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AlN晶体是一种脆性难加工半导体材料。为了高效率高质量制备AlN晶体衬底，设计了不同化学成分的研磨液研磨AlN晶体，借助激光共聚焦显微镜和X射线光电子能谱仪研究了化学作用对晶体表面材料去除行为的影响。结果表明：碱性研磨液有利于获得最佳研磨结果，材料去除率为23 μm/h，表面粗糙度为Ra为122 nm。在碱性环境下研磨液中金刚石磨粒具有良好的分散性。碱性溶液能够腐蚀晶体表面，形成含碱式铝盐的变质层，并引起表面形貌产生显著改变。研磨界面内，化学作用导致AlN晶体表面产生变质层，便于材料的机械去除，从而有利于提升研磨效率和研磨质量。研究结果可为AlN晶体超精密加工工艺优化提供参考。

, authors=黄传锦1, 顾斌2, 周海1, 冯伟1, authorsList=黄传锦, 顾斌, 周海, 冯伟, authorCompany=null, correspAuthors=周海, authorNote=

黄传锦（1982—），男，博士，讲师。

, correspAuthorsNote=
周海（1965—），男，博士，教授。
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HUANG Chuanjin (1982-), male, Ph.D., Lecturer. E-mail:

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HUANG Chuanjin (1982-), male, Ph.D., Lecturer. E-mail:

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黄传锦（1982—），男，博士，讲师。

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黄传锦（1982—），男，博士，讲师。

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化学作用对AlN晶体研磨过程中材料去除行为的影响
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黄传锦 1 , 顾斌 2 , 周海 1 , 冯伟 1
硅酸盐学报 | 研究论文 2022,50(9): 2470-2476
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硅酸盐学报 |研究论文 2022 , 50 (9) : 2470 -2476
化学作用对AlN晶体研磨过程中材料去除行为的影响
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黄传锦1 , 顾斌2, 周海1 , 冯伟1
作者信息
  • 1．盐城工学院机械学院，江苏 盐城 224051
  • 2．常熟耐素生物材料科技有限公司，江苏 苏州 215500
通讯作者:
周海（1965—），男，博士，教授。
作者简介:

黄传锦（1982—），男，博士，讲师。

Effect of Chemical Action on Material Removal Behavior During AlN Crystal Lapping
Chuanjin HUANG1 , Bin GU2, Hai ZHOU1 , Wei FENG1
Affiliations
  • 1.College of Mechanical Engineering, Yancheng Institute of Technology, Yancheng 224051, Jiangsu, China
  • 2.Nasurfar Biomaterial Technology Co., Ltd, Changshu, 215500, Jiangsu, China
    • Corresponding Author:
    ZHOU Hai (1965-), male, Ph.D., Professor. E-mail:

    HUANG Chuanjin (1982-), male, Ph.D., Lecturer. E-mail:

出版时间: 2022-09-20 doi: 10.14062/j.issn.0454-5648.20220092
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摘要
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AlN晶体是一种脆性难加工半导体材料。为了高效率高质量制备AlN晶体衬底，设计了不同化学成分的研磨液研磨AlN晶体，借助激光共聚焦显微镜和X射线光电子能谱仪研究了化学作用对晶体表面材料去除行为的影响。结果表明：碱性研磨液有利于获得最佳研磨结果，材料去除率为23 μm/h，表面粗糙度为Ra为122 nm。在碱性环境下研磨液中金刚石磨粒具有良好的分散性。碱性溶液能够腐蚀晶体表面，形成含碱式铝盐的变质层，并引起表面形貌产生显著改变。研磨界面内，化学作用导致AlN晶体表面产生变质层，便于材料的机械去除，从而有利于提升研磨效率和研磨质量。研究结果可为AlN晶体超精密加工工艺优化提供参考。

氮化铝晶体  /  研磨  /  刻蚀  /  变质层

AlN crystal is a typical brittle and difficult-to-process material. To prepare AlN crystal substrates with a high efficiency and a high quality, slurries with different chemical compositions were designed to lap AlN crystals, and the mechanism of chemical action-assisted material removal was investigated by laser confocal microscopy and X-ray photoelectron spectroscopy. The results show that the alkaline slurry is beneficial to obtaining the optimum lapping results, the material removal rate is 23 μm/h, and the surface roughness (Ra) is 122 nm. The diamond abrasive particles in the slurry have a good dispersibility in alkaline environment. The alkaline solution can corrode the crystal surface, form a metamorphic layer containing basic aluminum salts, and cause some changes in the surface morphology. In the lapping interface, the metamorphic layer produced by chemical etching on the surface of AlN crystal is more conducive to the mechanical removal of abrasive particles, which can lay a foundation for improving the lapping efficiency and quality. The result obtained can provide a reference for optimizing the ultra-precision processing technology of AlN crystals.

aluminum nitride single crystal  /  lapping  /  etching  /  metamorphic layer
黄传锦, 顾斌, 周海, 冯伟. 化学作用对AlN晶体研磨过程中材料去除行为的影响. 硅酸盐学报, 2022 , 50 (9) : 2470 -2476 . DOI: 10.14062/j.issn.0454-5648.20220092
Chuanjin HUANG, Bin GU, Hai ZHOU, Wei FENG. Effect of Chemical Action on Material Removal Behavior During AlN Crystal Lapping[J]. Journal of the Chinese Ceramic Society, 2022 , 50 (9) : 2470 -2476 . DOI: 10.14062/j.issn.0454-5648.20220092
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  • 国家自然科学基金(51675457)
  • 江苏省产学研合作项目(BY2021432)
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doi: 10.14062/j.issn.0454-5648.20220092
  • 接收时间：2022-01-30
  • 首发时间：2026-10-20
  • 出版时间：2022-09-20
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  • 收稿日期：2022-01-30
  • 修回日期：2022-03-12
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国家自然科学基金(51675457)
江苏省产学研合作项目(BY2021432)
作者信息
    1．盐城工学院机械学院，江苏 盐城 224051
    2．常熟耐素生物材料科技有限公司，江苏 苏州 215500

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周海（1965—），男，博士，教授。
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2种不同金属材料的力学参数
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Family		 属数
Number of
genus		 种数
Number of
species		 占总种数比例
Percentage of
total species (%)		 属
Genus		 种数
Number of
species		 占总种数比例
Percentage of total
species (%)
鹅膏菌科Amanitaceae 2 11 5.26 鹅膏菌属 Amanita 10 4.78
小菇科 Mycenaceae 2 12 5.74 丝盖伞属 Inocybe 5 2.39
多孔菌科 Polyporaceae 8 14 6.70 蜡蘑属 Laccaria 5 2.39
红菇科 Russulaceae 3 23 11.00 小皮伞属 Marasmius 6 2.87
小菇属 Mycena 11 5.26
光柄菇属 Pluteus 5 2.39
红菇属 Russula 17 8.13
栓菌属 Trametes 5 2.39
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