Article(id=1319726209496363470, tenantId=1146029695717560320, journalId=1263187385517883426, issueId=1319726164160139662, articleNumber=null, orderNo=null, doi=10.14062/j.issn.0454-5648.20250057, pmid=null, cstr=null, oa=null, hot=null, price=null, onlineType=0, articleFormat=0, articleType=null, articleTypeStr=null, receivedDate=1737388800000, receivedDateStr=2025-01-21, revisedDate=1738857600000, revisedDateStr=2025-02-07, acceptedDate=null, acceptedDateStr=null, onlineDate=1792576847670, onlineDateStr=2026-10-21, pubDate=1752940800000, pubDateStr=2025-07-20, doiRegisterDate=null, doiRegisterDateStr=null, onlineIssueDate=1792576847670, onlineIssueDateStr=2026-10-21, onlineJustAcceptDate=null, onlineJustAcceptDateStr=null, onlineFirstDate=null, onlineFirstDateStr=null, sourceXml=null, magXml=null, createTime=1792576847670, creator=13701087609, updateTime=1792576847670, updator=13701087609, issue=Issue{id=1319726164160139662, tenantId=1146029695717560320, journalId=1263187385517883426, year='2025', volume='53', issue='7', pageStart='1777', pageEnd='2078', issueExtLink='null', onlineDate='null', pubDate='1752940800000', pubDateStr='2025-07-20', beforeIssueId=null, nextIssueId=null, price=null, status=1, issueComplete=1, articleOrder=1, issueType=-1, specialIssue=null, createTime=1792576836862, creator='13701087609', updateTime=1792577335628, updator='13701087609', preIssue=null, nextIssue=null, articleTotal=null, ext={EN=IssueExt(id=1319728256174117458, tenantId=1146029695717560320, journalId=1263187385517883426, issueId=1319726164160139662, language=EN, specialIssueTitle=, coverIllustrator=null, specialIssueEditor=, specialIssueAbout=), CN=IssueExt(id=1319728256174117459, tenantId=1146029695717560320, journalId=1263187385517883426, issueId=1319726164160139662, language=CN, specialIssueTitle=, coverIllustrator=null, specialIssueEditor=, specialIssueAbout=)}, issueFiles=null, downloadFileDto=null}, startPage=1993, endPage=2000, ext={EN=ArticleExt(id=1319726209701884367, articleId=1319726209496363470, tenantId=1146029695717560320, journalId=1263187385517883426, language=EN, title=High-Quality Heavy Sn-Doped ZnGa
2O
4 Single Crystal, columnId=1319726165087077079, journalTitle=Journal of the Chinese Ceramic Society, columnName=Research Article, runingTitle=null, highlight=null, articleAbstract=
Introduction Ultra-wide bandgap (UWBG) semiconductor materials have attracted extensive attention in the fields of optoelectronics, sensing systems, and high-power devices due to their high critical electric field, high-temperature resistance, and excellent photoelectric properties. In this paper, high-quality Sn4+-doped ZnGa2O4 crystals with a volume of approximately 10 cm3 were successfully obtained by the VGF method. The crystal structure of the grown Sn4+∶ ZnGa2O4 crystals was detected by single crystal X-ray diffraction (XRD), and their crystal quality was studied by high-resolution X-ray diffraction (HRXRD). In addition, the optical and electrical properties of the grown Sn4+∶ ZnGa2O4 crystals were investigated by UV-Vis spectroscopy, XPS, and Hall measurements. The results show that the optical properties are affected by the Sn4+ concentration, and it is demonstrated for the first time that the electrical properties of ZnGa2O4 single crystals can be controlled by the concentration of doped Sn4+. The carrier concentration of the grown Sn4+-doped ZnGa2O4 single crystal at room temperature is higher than that of previously studied ZnGa2O4 single crystals (1.39 × 1019 cm-3) and Sn4+-doped β-Ga2O3 (3 × 1018 - 3 ×1019 cm-3). The improved photoelectric properties of ZnGa2O4 crystals after Sn4+ doping are expected to find applications in high-power devices and optoelectronic devices.
Methods ZnGa2O4 bulk single crystals doped with Sn4+ were grown by the VGF method. High-purity (99.999%) Ga2O3, ZnO and SnO2 powders were used as starting materials. The three powders were mixed for 80 h at a speed of 40 revolutions per minute, and then the mixed powders were cold-pressed into blocks at a pressure of 2000 bar and calcined in air at 600 ℃ in an alumina crucible for 16 h. Subsequently, ZnGa2O4 bulk single crystals doped with Sn4+ were grown in a crucible with an inner diameter of 60 mm and a height of 60 mm. The furnace was heated to 1900 ℃ at a rate of 250 ℃/h in an atmosphere of argon and 12% oxygen, and maintained at this temperature for about 2 h. Then the furnace was cooled slowly at a rate of 2-3 ℃ per minute. Sn4+ doped ZnGa2O4 bulk single crystals were obtained.
Results and discussion XRD analysis indicates that the Sn4+-doped ZnGa2O4 crystal maintains a pure spinel phase without any impurity phases, and the lattice constant slightly increases due to the introduction of Sn4+. The high-resolution X-ray diffraction (HRXRD) results show that the full width at half maximum (FWHM) of the rocking curve of the crystal is only 82 arcsec, indicating excellent crystal quality. X-ray photoelectron spectroscopy (XPS) analysis confirms that Sn4+ mainly enters the octahedral sites of the lattice by replacing Ga3+. X-ray fluorescence spectroscopy (XRF) analysis indicates that Sn4+ is successfully doped into the crystal, but the actual doping concentration is lower than the theoretical value due to the volatility of SnO2. Optical performance tests show that Sn4+ doping slightly reduces the optical band gap of ZnGa2O4 crystals and increases the absorption in the near-infrared band, which is related to the increase in carrier concentration. Hall measurement results show that Sn4+ doping significantly increases the carrier concentration of the crystal (up to 3.32×1019 cm-3) and reduces the resistivity (0.006 Ω·cm), outperforming undoped ZnGa2O4 and Sn4+-doped β-Ga2O3 crystals.
Conclusions In this study, high-quality Sn4+-doped ZnGa2O4 single crystals with a volume of 10 cm3 were successfully grown by the vertical gradient freezing (VGF) method. The obtained Sn4+-doped ZnGa2O4 crystals showed no significant shift in diffraction peaks and a full width at half maximum (FWHM) of the rocking curve as low as 82 arc seconds, confirming the extremely high quality of the single crystals. X-ray fluorescence spectroscopy (XRF) and X-ray photoelectron spectroscopy (XPS) analyses respectively confirmed the contents of Zn, Ga, O, and Sn elements, as well as the fact that Sn4+ were mainly incorporated into the ZnGa2O4 crystal by replacing Ga3+ at octahedral sites in the spinel structure. With the increase of Sn4+ doping concentration, the optical band gap of ZnGa2O4 crystals decreased to 4.58 eV and 4.56 eV, respectively. The introduction of Sn4+ did not cause significant changes in the cutoff absorption edge at about 275 nm, but increased absorption in the near-infrared wavelength range, which was related to the increase in carrier concentration. Hall measurements verified the effect of Sn4+ doping on the electrical properties of ZnGa2O4 single crystals. The results indicated that the introduction of Sn4+ significantly increased the carrier concentration of ZnGa2O4 crystals (2.65×1019-3.32×1019 cm-3) and decreased the resistivity (0.006-0.008 Ω·cm). These properties were superior to undoped ZnGa2O4 single crystals and Sn4+-doped β-Ga2O3 single crystals. Overall, the Sn4+-doped ZnGa2O4 crystals grown in this study demonstrated significant application potential in power devices and solar-blind detection, and are expected to play a key role in the development of future high-power and high-frequency electronic and optoelectronic devices.
, authors=Zhengyuan LI, Huihui LI, Kun ZHANG, Qiang YIN, Pei WANG, Jin ZHANG, Zhitai JIA, Wenxiang MU, authorsList=Zhengyuan LI, Huihui LI, Kun ZHANG, Qiang YIN, Pei WANG, Jin ZHANG, Zhitai JIA, Wenxiang MU, authorCompany=null, correspAuthors=Zhitai JIA, Wenxiang MU, authorNote=
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2O
4单晶, columnId=1263922770220560512, journalTitle=硅酸盐学报, columnName=研究论文, runingTitle=null, highlight=null, articleAbstract=
超宽禁带(UWBG)半导体材料具有高临界电场、耐高温、光电特性优异,因可在高功率器件、电力电子、光电子应用等领域发挥重要作用而备受关注。采用垂直梯度凝固(VGF)法成功生长出体积约10 cm3的高质量Sn4+掺杂ZnGa2O4单晶。通过X射线衍射(XRD)、X射线光电子能谱、霍尔测试和紫外-可见光谱对晶体结构、电学性能和光学性能进行了系统研究。XRD结果表明,Sn4+掺杂ZnGa2O4晶体为纯尖晶石相无杂质相,摇摆曲线半高宽(FWHM)仅为82″。所获得的不同Sn4+掺杂浓度的ZnGa2O4单晶的光学带隙分别为4.58 eV和4.56 eV,均在约275 nm处有明显的吸收截止边。霍尔测试的结果显示,随着Sn4+掺杂浓度的升高,晶体的电导率增加,最高载流子浓度可达3.32×1019 cm-3,电子迁移率为30 cm2·V-1·s-1,电阻率为0.006 Ω·cm。载流子浓度明显高于之前研究的未掺杂的ZnGa2O4单晶。本工作为ZnGa2O4材料的掺杂改性提供了重要的理论和实验依据。锡掺杂到ZnGa2O4晶体中后,光电性能改善,有望在高功率器件和光电器件领域获得应用。
, authors=李政沅, 李慧慧, 张坤, 尹强, 王佩, 张晋, 贾志泰, 穆文祥, authorsList=李政沅, 李慧慧, 张坤, 尹强, 王佩, 张晋, 贾志泰, 穆文祥, authorCompany=null, correspAuthors=贾志泰, 穆文祥, authorNote=
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贾志泰(1981—),男,博士,教授;
穆文祥(1989—),男,博士,副教授。
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