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Article(id=1318977206370554254, tenantId=1146029695717560320, journalId=1263187385517883426, issueId=1318977205884014990, articleNumber=null, orderNo=null, doi=10.14062/j.issn.0454-5648.20230159, pmid=null, cstr=null, oa=null, hot=null, price=null, onlineType=0, articleFormat=0, articleType=null, articleTypeStr=null, receivedDate=1678809600000, receivedDateStr=2023-03-15, revisedDate=1683129600000, revisedDateStr=2023-05-04, acceptedDate=null, acceptedDateStr=null, onlineDate=1792398271409, onlineDateStr=2026-10-19, pubDate=1694361600000, pubDateStr=2023-09-11, doiRegisterDate=null, doiRegisterDateStr=null, onlineIssueDate=1792398271409, onlineIssueDateStr=2026-10-19, onlineJustAcceptDate=null, onlineJustAcceptDateStr=null, onlineFirstDate=null, onlineFirstDateStr=null, sourceXml=null, magXml=null, createTime=1792398271409, creator=13701087609, updateTime=1792398271409, updator=13701087609, issue=Issue{id=1318977205884014990, tenantId=1146029695717560320, journalId=1263187385517883426, year='2023', volume='51', issue='12', pageStart='3039', pageEnd='3250', issueExtLink='null', onlineDate='null', pubDate='1703001600000', pubDateStr='2023-12-20', beforeIssueId=null, nextIssueId=null, price=null, status=1, issueComplete=1, articleOrder=1, issueType=-1, specialIssue=null, createTime=1792398271294, creator='13701087609', updateTime=1792399409679, updator='13701087609', preIssue=null, nextIssue=null, articleTotal=null, ext={EN=IssueExt(id=1318981980671295626, tenantId=1146029695717560320, journalId=1263187385517883426, issueId=1318977205884014990, language=EN, specialIssueTitle=, coverIllustrator=null, specialIssueEditor=, specialIssueAbout=), CN=IssueExt(id=1318981980671295627, tenantId=1146029695717560320, journalId=1263187385517883426, issueId=1318977205884014990, language=CN, specialIssueTitle=, coverIllustrator=null, specialIssueEditor=, specialIssueAbout=)}, issueFiles=null, downloadFileDto=null}, startPage=3039, endPage=3045, ext={EN=ArticleExt(id=1318977206559297935, articleId=1318977206370554254, tenantId=1146029695717560320, journalId=1263187385517883426, language=EN, title=Ferroelectricity in Nd Doped HfO2 Films Grown by Molecular Beam Epitaxy, columnId=1263922769897599102, journalTitle=Journal of the Chinese Ceramic Society, columnName=Research Articles, runingTitle=null, highlight=null, articleAbstract=

The application of doped HfO2 ferroelectric thin films in nonvolatile memory devices becomes popular in condensed matter physics and materials science. Recent studies indicate that La doped HfO2 has excellent ferroelectric properties, and the ferroelectric remanent polarization is 45 μC/cm2 as the maximum value reported. Nd doping is expected to enhance the ferroelectric properties of HfO2 due to its similar chemical properties of Nd and La, but little research has been reported. In this paper, high quality Nd-doped HfO2 (i.e., Nd∶HfO2) thin films were grown on La0.67Sr0.33MnO3 (bottom electrode)/SrTiO3 (001) substrates by using oxide molecular beam epitaxy. According to the results by X-ray diffraction and high-resolution electron microscopy, Nd doping can induce the transition of HfO2 from a monoclinic phase to an orthorhombic phase. In addition, the results by high resolution electron microscopy also show that Nd∶HfO2 has a tetragonal phase structure near the interface, connecting (111) crystalline Nd∶HfO2 and (001) crystalline perovskite oxide substrates. The systematic studies on epitaxial growth and ferroelectric properties of Nd∶HfO2 films can expand the research of doped HfO2.

, authors=Yuwei LIU1, Peijie JIAO1, Wei MAO1, Jiangfeng YANG1, Ningchong ZHENG1, Peng WANG2, Di WU1, Yuefeng NIE1, authorsList=Yuwei LIU, Peijie JIAO, Wei MAO, Jiangfeng YANG, Ningchong ZHENG, Peng WANG, Di WU, Yuefeng NIE, authorCompany=null, correspAuthors=Peng WANG, Di WU, Yuefeng NIE, authorNote=

LIU Yuwei (1998-), male, Master candidate. E-mail:

, correspAuthorsNote=
WANG Peng (1978-), male, Ph.D., Professor; E-mail:
WU Di (1974-), male, Ph.D., Professor;
NIE Yuefeng (1978-), male, Ph.D., Professor.
, copyrightStatement=null, copyrightOwner=null, extLink=null, articleAbsUrl=null, sourceXml=null, magXml=null, pdfUrl=null, pdf=null, pdfFileSize=null, pdfExtLink=null, richHtmlUrl=null, mobilePdfUrl=null, reviewReport=null, pdfFirstPage=null, abstractGraph=null, abstractGraphContent=null, abstractVideo=null, citation=null, cebUrl=null, magXmlContent=null, mapNumber=null, fund=null), CN=ArticleExt(id=1318977206794178960, articleId=1318977206370554254, tenantId=1146029695717560320, journalId=1263187385517883426, language=CN, title=Nd掺杂HfO2薄膜的分子束外延制备及铁电性, columnId=1263922770220560512, journalTitle=硅酸盐学报, columnName=研究论文, runingTitle=null, highlight=null, articleAbstract=

掺杂HfO2铁电薄膜在非易失性存储器件中的重要应用前景使其成为当前凝聚态物理与材料科学领域的一个研究热点。近年来，结果表明：La掺杂HfO2拥有优异的铁电性能，铁电剩余极化强度为45μC/cm2，是目前HfO2基薄膜材料中报道的最高值。由于Nd与La的化学性质相近，Nd掺杂同样有望增强HfO2的铁电性，但相关研究工作却鲜有报道。使用氧化物分子束外延技术，在La0.67Sr0.33MnO3（底电极）/SrTiO3（001）衬底上外延生长高质量Nd掺杂HfO2（Nd∶HfO2）薄膜。X射线衍射以及高分辨电镜表征结果均显示Nd掺杂有助于诱导HfO2从单斜相向正交相的转变，压电力显微镜和铁电测试仪进一步证实正交相Nd∶HfO2具有良好的铁电性。此外，高分辨电子显微镜表征还发现Nd∶HfO2靠近界面处存在四方相结构，衔接（111）晶向的Nd∶HfO2和（001）晶向的钙钛矿氧化物衬底。Nd∶HfO2薄膜的外延生长和铁电性的系统研究，扩充了掺杂HfO2的研究体系。

, authors=刘育玮1, 矫佩杰1, 茆伟1, 杨江枫1, 郑宁冲1, 王鹏2, 吴迪1, 聂越峰1, authorsList=刘育玮, 矫佩杰, 茆伟, 杨江枫, 郑宁冲, 王鹏, 吴迪, 聂越峰, authorCompany=null, correspAuthors=王鹏, 吴迪, 聂越峰, authorNote=

刘育玮（1998—），男，硕士研究生。

, correspAuthorsNote=
王鹏（1978—），男，博士，教授；
吴迪（1974—），男，博士，教授；
聂越峰（1978—），男，博士，教授。
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LIU Yuwei (1998-), male, Master candidate. E-mail:

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LIU Yuwei (1998-), male, Master candidate. E-mail:

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刘育玮（1998—），男，硕士研究生。

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Nd掺杂HfO2薄膜的分子束外延制备及铁电性
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刘育玮 1 , 矫佩杰 1 , 茆伟 1 , 杨江枫 1 , 郑宁冲 1 , 王鹏 2 , 吴迪 1 , 聂越峰 1
硅酸盐学报 | 研究论文 2023,51(12): 3039-3045
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硅酸盐学报 |研究论文 2023 , 51 (12) : 3039 -3045
Nd掺杂HfO2薄膜的分子束外延制备及铁电性
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刘育玮1 , 矫佩杰1, 茆伟1, 杨江枫1, 郑宁冲1, 王鹏2 , 吴迪1 , 聂越峰1
作者信息
  • 1．南京大学现代工程与应用科学学院，固体微结构物理国家重点实验室，江苏省功能材料设计原理与应用技术重点实验室，南京 210093，中国
  • 2．华威大学物理系，考文垂 CV4 7AL，英国
通讯作者:
王鹏（1978—），男，博士，教授；
吴迪（1974—），男，博士，教授；
聂越峰（1978—），男，博士，教授。
作者简介:

刘育玮（1998—），男，硕士研究生。

Ferroelectricity in Nd Doped HfO2 Films Grown by Molecular Beam Epitaxy
Yuwei LIU1 , Peijie JIAO1, Wei MAO1, Jiangfeng YANG1, Ningchong ZHENG1, Peng WANG2 , Di WU1 , Yuefeng NIE1
Affiliations
  • 1.Jiangsu Key Laboratory of Artificial Functional Materials, National Laboratory of Solid State Microstructures, College of Engineering and Applied Sciences, Nanjing University, Nanjing 210093, China
  • 2.Department of Physics, Univesity of Warwick, Coventry CV4 7AL, UK
    • Corresponding Author:
    WANG Peng (1978-), male, Ph.D., Professor; E-mail:
    WU Di (1974-), male, Ph.D., Professor;
    NIE Yuefeng (1978-), male, Ph.D., Professor.

    LIU Yuwei (1998-), male, Master candidate. E-mail:

出版时间: 2023-09-11 doi: 10.14062/j.issn.0454-5648.20230159
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掺杂HfO2铁电薄膜在非易失性存储器件中的重要应用前景使其成为当前凝聚态物理与材料科学领域的一个研究热点。近年来，结果表明：La掺杂HfO2拥有优异的铁电性能，铁电剩余极化强度为45μC/cm2，是目前HfO2基薄膜材料中报道的最高值。由于Nd与La的化学性质相近，Nd掺杂同样有望增强HfO2的铁电性，但相关研究工作却鲜有报道。使用氧化物分子束外延技术，在La0.67Sr0.33MnO3（底电极）/SrTiO3（001）衬底上外延生长高质量Nd掺杂HfO2（Nd∶HfO2）薄膜。X射线衍射以及高分辨电镜表征结果均显示Nd掺杂有助于诱导HfO2从单斜相向正交相的转变，压电力显微镜和铁电测试仪进一步证实正交相Nd∶HfO2具有良好的铁电性。此外，高分辨电子显微镜表征还发现Nd∶HfO2靠近界面处存在四方相结构，衔接（111）晶向的Nd∶HfO2和（001）晶向的钙钛矿氧化物衬底。Nd∶HfO2薄膜的外延生长和铁电性的系统研究，扩充了掺杂HfO2的研究体系。

氧化铪  /  铁电  /  分子束外延  /  掺杂

The application of doped HfO2 ferroelectric thin films in nonvolatile memory devices becomes popular in condensed matter physics and materials science. Recent studies indicate that La doped HfO2 has excellent ferroelectric properties, and the ferroelectric remanent polarization is 45 μC/cm2 as the maximum value reported. Nd doping is expected to enhance the ferroelectric properties of HfO2 due to its similar chemical properties of Nd and La, but little research has been reported. In this paper, high quality Nd-doped HfO2 (i.e., Nd∶HfO2) thin films were grown on La0.67Sr0.33MnO3 (bottom electrode)/SrTiO3 (001) substrates by using oxide molecular beam epitaxy. According to the results by X-ray diffraction and high-resolution electron microscopy, Nd doping can induce the transition of HfO2 from a monoclinic phase to an orthorhombic phase. In addition, the results by high resolution electron microscopy also show that Nd∶HfO2 has a tetragonal phase structure near the interface, connecting (111) crystalline Nd∶HfO2 and (001) crystalline perovskite oxide substrates. The systematic studies on epitaxial growth and ferroelectric properties of Nd∶HfO2 films can expand the research of doped HfO2.

hafnium oxide  /  ferroelectric  /  molecular beam epitaxy  /  doping
刘育玮, 矫佩杰, 茆伟, 杨江枫, 郑宁冲, 王鹏, 吴迪, 聂越峰. Nd掺杂HfO2薄膜的分子束外延制备及铁电性. 硅酸盐学报, 2023 , 51 (12) : 3039 -3045 . DOI: 10.14062/j.issn.0454-5648.20230159
Yuwei LIU, Peijie JIAO, Wei MAO, Jiangfeng YANG, Ningchong ZHENG, Peng WANG, Di WU, Yuefeng NIE. Ferroelectricity in Nd Doped HfO2 Films Grown by Molecular Beam Epitaxy[J]. Journal of the Chinese Ceramic Society, 2023 , 51 (12) : 3039 -3045 . DOI: 10.14062/j.issn.0454-5648.20230159
基金
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  • 国家重点研发计划(2022YFA1402502; 2021YFA1400400)
  • 国家自然科学基金(52232001)
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doi: 10.14062/j.issn.0454-5648.20230159
  • 接收时间：2023-03-15
  • 首发时间：2026-10-19
  • 出版时间：2023-09-11
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  • 收稿日期：2023-03-15
  • 修回日期：2023-05-04
基金
国家重点研发计划(2022YFA1402502; 2021YFA1400400)
国家自然科学基金(52232001)
作者信息
    1．南京大学现代工程与应用科学学院，固体微结构物理国家重点实验室，江苏省功能材料设计原理与应用技术重点实验室，南京 210093，中国
    2．华威大学物理系，考文垂 CV4 7AL，英国

通讯作者:

王鹏（1978—），男，博士，教授；
吴迪（1974—），男，博士，教授；
聂越峰（1978—），男，博士，教授。
参考文献
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https://castjournals.cast.org.cn/joweb/gsyxb/CN/10.14062/j.issn.0454-5648.20230159
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鹅膏菌科Amanitaceae 2 11 5.26 鹅膏菌属 Amanita 10 4.78
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