Article(id=1319222664653296111, tenantId=1146029695717560320, journalId=1263187385517883426, issueId=1319222618356559896, articleNumber=null, orderNo=null, doi=10.14062/j.issn.0454-5648.20220700, pmid=null, cstr=null, oa=null, hot=null, price=null, onlineType=0, articleFormat=0, articleType=null, articleTypeStr=null, receivedDate=1661616000000, receivedDateStr=2022-08-28, revisedDate=1663776000000, revisedDateStr=2022-09-22, acceptedDate=null, acceptedDateStr=null, onlineDate=1792456793224, onlineDateStr=2026-10-20, pubDate=1681920000000, pubDateStr=2023-04-20, doiRegisterDate=null, doiRegisterDateStr=null, onlineIssueDate=1792456793224, onlineIssueDateStr=2026-10-20, onlineJustAcceptDate=null, onlineJustAcceptDateStr=null, onlineFirstDate=null, onlineFirstDateStr=null, sourceXml=null, magXml=null, createTime=1792456793224, creator=13701087609, updateTime=1792456793224, updator=13701087609, issue=Issue{id=1319222618356559896, tenantId=1146029695717560320, journalId=1263187385517883426, year='2023', volume='51', issue='4', pageStart='831', pageEnd='1090', issueExtLink='null', onlineDate='null', pubDate='1681920000000', pubDateStr='2023-04-20', beforeIssueId=null, nextIssueId=null, price=null, status=1, issueComplete=1, articleOrder=1, issueType=-1, specialIssue=0, createTime=1792456782187, creator='13701087609', updateTime=1792456947953, updator='13701087609', preIssue=null, nextIssue=null, articleTotal=null, ext={EN=IssueExt(id=1319223313692472320, tenantId=1146029695717560320, journalId=1263187385517883426, issueId=1319222618356559896, language=EN, specialIssueTitle=, coverIllustrator=null, specialIssueEditor=, specialIssueAbout=), CN=IssueExt(id=1319223313692472321, tenantId=1146029695717560320, journalId=1263187385517883426, issueId=1319222618356559896, language=CN, specialIssueTitle=, coverIllustrator=null, specialIssueEditor=, specialIssueAbout=)}, issueFiles=null, downloadFileDto=null}, startPage=907, endPage=920, ext={EN=ArticleExt(id=1319222664854622704, articleId=1319222664653296111, tenantId=1146029695717560320, journalId=1263187385517883426, language=EN, title=Recent Development on Ultra-Low Firing Technologies of Microwave Dielectric Ceramics, columnId=1321891294297829430, journalTitle=Journal of the Chinese Ceramic Society, columnName=Special Issue on 5G/6G Materials—Review, runingTitle=null, highlight=null, articleAbstract=
Microwave dielectric ceramics prepared via a conventional method usually require a high sintering temperature (i.e., >1 000 ℃) and long sintering time, leading to a high energy consumption and a difficulty to realize the integration and co-firing of multiple material system. Continuous innovation and development of wireless communication technology put forward higher requirements for the miniaturization and integration of microwave devices, so that some technologies for preparing low-temperature co-fired ceramic (LTCC) and ultralow-temperature co-fired ceramic (ULTCC) are developed. Developing green sintering technologies with lower sintering temperatures and higher sintering efficiencies becomes one of the research hotspots. Novel sintering technologies (i.e., liquid-phase sintering, hot press sintering, microwave sintering, spark plasma sintering, and flash sintering) promote the development of microwave dielectric ceramics. A novel ultra-low temperature sintering technology called cold sintering process is proposed. The sintering temperature of cold sintering process is rather low (≤300 ℃), which can densify ceramics in a short time, and has some advantages in the phase stability, co-firing of multiple materials and grain boundary manipulation, thus providing an opportunity for the development of ultra-low temperature sintering technology and microwave dielectric material system.
, authors=Xiaomeng LI
1, Xian XUE
1, Hong WANG
1, 2, Jing GUO
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传统方法制备微波介质陶瓷通常需要1000 ℃以上高温,不仅工艺周期长、能量消耗高,而且难以实现多种材料体系的集成共烧。如今,无线通讯技术的不断革新和蓬勃发展对微波器件小型化、集成化提出了更高要求,低温共烧陶瓷/超低温共烧陶瓷技术被开发和广泛应用。研究烧结温度更低、烧结效率更高,且微波介电性能优异的节能环保型绿色制备工艺,已经成为全球范围内研究热点之一。液相烧结、热压烧结、微波烧结、放电等离子体烧结、闪烧等烧结工艺的提出促进了低温烧结微波介质陶瓷的发展。最近,又出现了一种新的超低温烧结工艺—冷烧结技术。冷烧结具有极低的烧结温度(一般≤300 ℃)、可在短时间内实现陶瓷高致密化,且在物相稳定性、复合共烧以及晶界控制等方面有着优势,为超低温烧结工艺以及微波介质材料体系的开发提供了新的契机。
, authors=李晓萌
1, 薛仙
1, 汪宏
1, 2, 郭靖
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郭靖(1986—),男,博士,副教授。
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