Article(id=1322636185621610770, tenantId=1146029695717560320, journalId=1263187385517883426, issueId=1322636152813768892, articleNumber=null, orderNo=null, doi=10.14062/j.issn.0454-5648.20190674, pmid=null, cstr=null, oa=null, hot=null, price=null, onlineType=0, articleFormat=0, articleType=null, articleTypeStr=null, receivedDate=1570723200000, receivedDateStr=2019-10-11, revisedDate=1583078400000, revisedDateStr=2020-03-02, acceptedDate=null, acceptedDateStr=null, onlineDate=1793270640044, onlineDateStr=2026-10-29, pubDate=1597852800000, pubDateStr=2020-08-20, doiRegisterDate=null, doiRegisterDateStr=null, onlineIssueDate=1793270640044, onlineIssueDateStr=2026-10-29, onlineJustAcceptDate=null, onlineJustAcceptDateStr=null, onlineFirstDate=null, onlineFirstDateStr=null, sourceXml=null, magXml=null, createTime=1793270640044, creator=13701087609, updateTime=1793270640044, updator=13701087609, issue=Issue{id=1322636152813768892, tenantId=1146029695717560320, journalId=1263187385517883426, year='2020', volume='48', issue='8', pageStart='1145', pageEnd='1352', issueExtLink='null', onlineDate='null', pubDate='1597852800000', pubDateStr='2020-08-20', beforeIssueId=null, nextIssueId=null, price=null, status=1, issueComplete=1, articleOrder=1, issueType=-1, specialIssue=null, createTime=1793270632222, creator='13701087609', updateTime=1793277122165, updator='13701087609', preIssue=null, nextIssue=null, articleTotal=null, ext={EN=IssueExt(id=1322663373687337109, tenantId=1146029695717560320, journalId=1263187385517883426, issueId=1322636152813768892, language=EN, specialIssueTitle=, coverIllustrator=null, specialIssueEditor=, specialIssueAbout=), CN=IssueExt(id=1322663373687337110, tenantId=1146029695717560320, journalId=1263187385517883426, issueId=1322636152813768892, language=CN, specialIssueTitle=, coverIllustrator=null, specialIssueEditor=, specialIssueAbout=)}, issueFiles=null, downloadFileDto=null}, startPage=1333, endPage=1340, ext={EN=ArticleExt(id=1322636185848103187, articleId=1322636185621610770, tenantId=1146029695717560320, journalId=1263187385517883426, language=EN, title=Morphological Control and Polishing Behavior of Mesoporous Silica Particles, columnId=1263922769897599102, journalTitle=Journal of the Chinese Ceramic Society, columnName=Research Articles, runingTitle=null, highlight=null, articleAbstract=

Hexagonal mesoporous silica (H-mSiO₂) particles were prepared via an alcohol/water mixed reaction system using cetyltrimethyl ammonium bromide as a template. The resultant products were characterized by scanning electron microscopy, transmission electron microscopy, X-ray diffraction, Fourier transform spectroscopy, thermogravimetric analysis-differential scanning calorimetry, and nitrogen adsorption/desorption measurements. As an alcohol/water volume ratio decreases slowly, the morphologies of samples change from spherical/ellipsoidal to spherical and then to necked or peanut-like. Based on the polishing tests over oxide films (about 208 nm), the developed H-mSiO₂ abrasives contribute to the reductions of surface roughness and topographical variation, compared to non-porous sphere SiO₂ (sSiO₂) particles. The root-mean-square roughness of oxidized silicon wafers reduces from (1.27±0.15) nm to (0.25±0.01) nm after polishing with H-mSiO₂ containing spherical and ellipsoidal particles. The maximum asperity height in sectional profiles decreases from 3.59 nm to 0.72 nm, and the maximum valley depth also reduces from 3.16 nm to 0.69 nm. Moreover, H-mSiO₂ abrasives with uniform spherical shapes achieve a removal rate of (223±17) nm/min.

, authors=Wenjie CAI, Hailiang MU, Zhaoyu MU, Yang CHEN, authorsList=Wenjie CAI, Hailiang MU, Zhaoyu MU, Yang CHEN, authorCompany=null, correspAuthors=Yang CHEN, authorNote=, correspAuthorsNote=, copyrightStatement=null, copyrightOwner=null, extLink=null, articleAbsUrl=null, sourceXml=null, magXml=null, pdfUrl=null, pdf=null, pdfFileSize=null, pdfExtLink=null, richHtmlUrl=null, mobilePdfUrl=null, reviewReport=null, pdfFirstPage=null, abstractGraph=null, abstractGraphContent=null, abstractVideo=null, citation=null, cebUrl=null, magXmlContent=null, mapNumber=null, fund=null), CN=ArticleExt(id=1322636186183647508, articleId=1322636185621610770, tenantId=1146029695717560320, journalId=1263187385517883426, language=CN, title=介孔氧化硅颗粒的形貌调控和抛光性能, columnId=1263922770220560512, journalTitle=硅酸盐学报, columnName=研究论文, runingTitle=null, highlight=null, articleAbstract=

以十六烷基三甲基溴化铵为模板剂，通过醇/水体系反应制备了具有六边形孔道的介孔氧化硅（H-mSiO₂）颗粒。用扫描电子显微镜、透射电子显微镜、X射线衍射、Fourier变换红外光谱仪、热重分析-差示扫描量热法和氮气吸脱附等手段对产物进行结构表征。结果表明：随醇/水体积比的缓慢降低，产物由混合形貌（球形+椭球）演变成单一规则球形，继而球形颗粒间又出现颈部相连现象。氧化物介电薄膜的抛光试验结果显示：与常规无孔球形SiO₂（sSiO₂）磨料（约208 nm）相比，尺寸相当的H-mSiO₂磨料可有效降低加工表面粗糙度和轮廓波动范围；具有混合形貌（球形+椭球形）的H-mSiO₂磨料使得工件表面粗糙度均方根值由（1.27±0.15） nm降至（0.25±0.01） nm，截面轮廓最大波峰高度和最低波谷深度分别由3.59 nm和3.16 nm降至0.72 nm和0.69 nm；规则球形H-mSiO₂磨料则获得了（223±17）nm/min的抛光效率。

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CAI Wenjie (1993-), male, Master candidate. E-mail: 1132826171@qq.com

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CAI Wenjie (1993-), male, Master candidate. E-mail: 1132826171@qq.com

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蔡文杰（1993—），男，硕士研究生。

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蔡文杰（1993—），男，硕士研究生。

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