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To improve the performance of modern unipolar power diodes and further break through the "Silicon limit", by increasing the junction depth of P+ region in traditional JBS diodes and introducing a super junction structure to reduce the chip thickness, the contradiction between on-state voltage drop and reverse blocking voltage of traditional unipolar devices is alleviated and the conduction current density of devices per unit area is improved. The effects of P-pillar concentration, N-pillar width and N-pillar concentration of super junction JBS diode on the forward conduction and reverse blocking characteristics are analyzed using a numerical method. The forward conduction and reverse blocking mechanism of super junction JBS diode is analyzed using the theory of electric field coupling effect, and a super junction JBS diode with 300 V is designed.

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为提升现代单极型功率二极管的性能,进一步突破“硅极限”,通过加大传统JBS 二极管中P+区结深,引入超级结结构以减薄芯片厚度,缓解传统单极型器件通态压降与反向阻断电压之间的矛盾,提高单位面积器件的导通电流密度。使用数值方法分析了超级结JBS二极管中P柱区浓度、N柱区宽度和N柱区浓度对正向导通特性以及反向阻断特性的影响,应用电场耦合效应理论分析了超级结 JBS 二极管的正向导通和反向阻断机理,设计了一款300V的超级结JBS二极管。

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刘勇(1995-),男,硕士。研究方向:功率器件。E-mail: 1904452259@qq.com。

关艳霞(1963-),女,通信作者,博士,副教授。研究方向:功率器件。E-mail:gdgyx@163.com。

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刘勇(1995-),男,硕士。研究方向:功率器件。E-mail: 1904452259@qq.com。

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label=Fig. 4, caption=Forward conduction characteristics of super junction JBS diode with different P-pillar concentrations, figureFileSmall=Mf/W06geVv4IAXWVoBgH/Q==, figureFileBig=1UAvbl1o9YzrNxfimK1vBg==, tableContent=null), ArticleFig(id=1154041035199078486, tenantId=1146029695717560320, journalId=1146031654075715584, articleId=1154040958824997149, language=CN, label=图4, caption=不同 $\mathrm{P}$ 柱区域浓度超级结 JBS 二极管正向导通特性, figureFileSmall=Mf/W06geVv4IAXWVoBgH/Q==, figureFileBig=1UAvbl1o9YzrNxfimK1vBg==, tableContent=null), ArticleFig(id=1154041035287158872, tenantId=1146029695717560320, journalId=1146031654075715584, articleId=1154040958824997149, language=EN, label=Fig. 5, caption=Forward conduction characteristics of super junction JBS diode with different P-pillar widths, figureFileSmall=Eo3buf3ufxSdsIwhsMxVHg==, figureFileBig=73D0+FQZRXBMV2CSjPr96Q==, tableContent=null), ArticleFig(id=1154041035341684826, tenantId=1146029695717560320, journalId=1146031654075715584, 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journalId=1146031654075715584, articleId=1154040958824997149, language=EN, label=Fig. 7, caption=Breakdown voltage and transverse and longitudinal electric field intensity distribution of super junction JBS diode with different P-pillar widths, figureFileSmall=ASKR4FuA0/LbMWV2orEtYw==, figureFileBig=CBWL0U36M45P+FYxhBM+dw==, tableContent=null), ArticleFig(id=1154041035614314590, tenantId=1146029695717560320, journalId=1146031654075715584, articleId=1154040958824997149, language=CN, label=图7, caption=不同 $\mathrm{P}$ 柱区域宽度的超级结 JBS 二极管耐压及横、纵向电场强度分布, figureFileSmall=ASKR4FuA0/LbMWV2orEtYw==, figureFileBig=CBWL0U36M45P+FYxhBM+dw==, tableContent=null), ArticleFig(id=1154041035685617759, tenantId=1146029695717560320, journalId=1146031654075715584, articleId=1154040958824997149, language=EN, label=Fig. 8, caption=Comparison of forward conduction characteristics among devices with different structures, figureFileSmall=5unbdsLokY8SHfvo7CMgMA==, figureFileBig=f15/gwoS/J32ZkS6NO2xtQ==, 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journalId=1146031654075715584, articleId=1154040958824997149, language=EN, label=Tab. 1, caption=Results of optimization parameters, figureFileSmall=null, figureFileBig=null, tableContent=
参数 数值
$\mathrm{N}$ 柱区域浓度$/{\mathrm{{cm}}}^{-3}$ $8 \times {10}^{15}$
$\mathrm{P}$ 柱区域浓度$/{\mathrm{{cm}}}^{-3}$ $1 \times {10}^{16}$
P 柱区域宽度/μm 0.55~0.60
P 柱区域结深/μm 12
衬底厚度$/{\mu \mathrm{m}}$ 1
器件厚度/μm 14
器件宽度$/\mathrm{{\mu m}}$ 1.25
), ArticleFig(id=1154041035983413348, tenantId=1146029695717560320, journalId=1146031654075715584, articleId=1154040958824997149, language=CN, label=表1, caption=优化参数结果, figureFileSmall=null, figureFileBig=null, tableContent=
参数 数值
$\mathrm{N}$ 柱区域浓度$/{\mathrm{{cm}}}^{-3}$ $8 \times {10}^{15}$
$\mathrm{P}$ 柱区域浓度$/{\mathrm{{cm}}}^{-3}$ $1 \times {10}^{16}$
P 柱区域宽度/μm 0.55~0.60
P 柱区域结深/μm 12
衬底厚度$/{\mu \mathrm{m}}$ 1
器件厚度/μm 14
器件宽度$/\mathrm{{\mu m}}$ 1.25
), ArticleFig(id=1154041036063105125, tenantId=1146029695717560320, journalId=1146031654075715584, articleId=1154040958824997149, language=EN, label=Tab. 2, caption=Comparison of structural parameters between super junction JBS diode and JBS diode, figureFileSmall=null, figureFileBig=null, tableContent=
参数 超级结 JBS JBS 通用超级结
二极管 二极管 二极管
$\mathrm{N}$ 柱区域浓度$/{\mathrm{{cm}}}^{-3}$ $8 \times {10}^{15}$ ${0.97}\times {10}^{15}$ $5 \times {10}^{15}$
$\mathrm{P}$ 柱区域浓度$/{\mathrm{{cm}}}^{-3}$ $1 \times {10}^{16}$ $1 \times {10}^{19}$ $6 \times {10}^{15}$
$\mathrm{P}$ 柱区域宽度$/\mathrm{{\mu m}}$ 0.55 0.55 0.55
P 柱区域结深/μm 12.0 0.5 14.0
衬底厚度$/{\mu \mathrm{m}}$ 1 1 1
器件厚度/μm 15.0 22.5 15.0
器件宽度/μm 1.25 1.25 1.25
), ArticleFig(id=1154041036121825384, tenantId=1146029695717560320, journalId=1146031654075715584, articleId=1154040958824997149, language=CN, label=表2, caption=超级结 JBS 二极管和 JBS 二极管的结构参数对比, figureFileSmall=null, figureFileBig=null, tableContent=
参数 超级结 JBS JBS 通用超级结
二极管 二极管 二极管
$\mathrm{N}$ 柱区域浓度$/{\mathrm{{cm}}}^{-3}$ $8 \times {10}^{15}$ ${0.97}\times {10}^{15}$ $5 \times {10}^{15}$
$\mathrm{P}$ 柱区域浓度$/{\mathrm{{cm}}}^{-3}$ $1 \times {10}^{16}$ $1 \times {10}^{19}$ $6 \times {10}^{15}$
$\mathrm{P}$ 柱区域宽度$/\mathrm{{\mu m}}$ 0.55 0.55 0.55
P 柱区域结深/μm 12.0 0.5 14.0
衬底厚度$/{\mu \mathrm{m}}$ 1 1 1
器件厚度/μm 15.0 22.5 15.0
器件宽度/μm 1.25 1.25 1.25
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基于电荷耦合效应的超级结 JBS 二极管的仿真分析
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刘勇 , 关艳霞
电源学报 | 功率半导体器件 2024,22(1): 163-170
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电源学报 | 功率半导体器件 2024, 22(1): 163-170
基于电荷耦合效应的超级结 JBS 二极管的仿真分析
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刘勇 , 关艳霞
作者信息
  • 沈阳工业大学 信息科学与工程学院 沈阳 110870
  • 刘勇(1995-),男,硕士。研究方向:功率器件。E-mail: 1904452259@qq.com。

    关艳霞(1963-),女,通信作者,博士,副教授。研究方向:功率器件。E-mail:gdgyx@163.com。

Simulation Analysis of Super Junction JBS Diode Based on Charge Coupled Effect
Yong LIU , Yanxia GUAN
Affiliations
  • School of Information Science and Engineering Shenyang University of Technology Shenyang 110870 China
出版时间: 2024-01-30 doi: 10.13234/j.issn.2095-2805.2024.1.163
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为提升现代单极型功率二极管的性能,进一步突破“硅极限”,通过加大传统JBS 二极管中P+区结深,引入超级结结构以减薄芯片厚度,缓解传统单极型器件通态压降与反向阻断电压之间的矛盾,提高单位面积器件的导通电流密度。使用数值方法分析了超级结JBS二极管中P柱区浓度、N柱区宽度和N柱区浓度对正向导通特性以及反向阻断特性的影响,应用电场耦合效应理论分析了超级结 JBS 二极管的正向导通和反向阻断机理,设计了一款300V的超级结JBS二极管。

超级结  /  JBS 二极管  /  正向导通特性  /  反向阻断特性  /  电场耦合效应

To improve the performance of modern unipolar power diodes and further break through the "Silicon limit", by increasing the junction depth of P+ region in traditional JBS diodes and introducing a super junction structure to reduce the chip thickness, the contradiction between on-state voltage drop and reverse blocking voltage of traditional unipolar devices is alleviated and the conduction current density of devices per unit area is improved. The effects of P-pillar concentration, N-pillar width and N-pillar concentration of super junction JBS diode on the forward conduction and reverse blocking characteristics are analyzed using a numerical method. The forward conduction and reverse blocking mechanism of super junction JBS diode is analyzed using the theory of electric field coupling effect, and a super junction JBS diode with 300 V is designed.

Super junction  /  JBS diode  /  forward conduction characteristic  /  reverse blocking characteristic  /  electric field coupling effect
刘勇, 关艳霞. 基于电荷耦合效应的超级结 JBS 二极管的仿真分析. 电源学报, 2024 , 22 (1) : 163 -170 . DOI: 10.13234/j.issn.2095-2805.2024.1.163
Yong LIU, Yanxia GUAN. Simulation Analysis of Super Junction JBS Diode Based on Charge Coupled Effect[J]. Journal of Power Supply, 2024 , 22 (1) : 163 -170 . DOI: 10.13234/j.issn.2095-2805.2024.1.163
随着新能源汽车、智能电网和轨道交通等领域的快速发展, 对功率器件的功率密度和频率的要求越来越高, 大量大功率高速开关器件如 MOSFET、 IGBT 和碳化硅 MOSFET 等不断被应用于相关领域, 这些功率开关器件的发展对匹配使用的二极管器件提出了更高要求:二极管需要在更小的体积下承受更大的电压, 具有更快速的开关特性和更高转换效率。现阶段的双极型器件由于电导调制效应存在, 开关速度低、功耗高; 单极型功率二极管由于 “硅极限”的存在难以达到较大的功率, 所以需要设计一种新型单极型二极管器件满足上述要求。
超级结结构又称复合缓冲层 CB(composite buffer) 结构是陈星弼院士 1993 年发明的一种由$\mathrm{P}$ 柱型区域和$\mathrm{N}$ 柱型区域交叠周期排列的耐压层结构[1]。与传统耐压层相比,超级结中由于内部横向 PN 结的存在,反向阻断状态下$\mathrm{N}$ 柱型区域发出的电场线大部分会汇入临近的$\mathrm{P}$ 柱型区域,形成二维电场分布[2],使器件的横向尺寸上也承担了一定的电压, 缓解了传统器件中正向导通电阻${R}_{\text{on }}$ 和反向阻断电压${V}_{\mathrm{b}}$ 的矛盾。因此超级结结构自发明之初就不仅仅停留在理论研究, 已被广泛应用于垂直沟道双扩散 MOSFET VDMOS(vertical double-diffused MOSFET)[1] 、IGBT[3] 和肖特基二极管[4] 等结构中,此外超级结在宽禁带材料中同样广泛使用[5-6],但是目前对于超级结与结型势垒控制肖特基 JBS(junction barrier Schottky)二极管结合的理论和应用研究却较少。JBS 二极管作为一种先进现代功率二极管[7],可利用$\mathrm{{PN}}$ 结的屏蔽效应改进肖特基二极管中的势垒降低效应, 优化肖特基势垒高度, 折衷导通功耗和反向阻断功耗[8],加深传统 JBS 的${\mathrm{P}}^{+ }$ 区深度。将超级结结构引入 JBS 二极管结构中, 能够进一步提高反向阻断特性, 减薄芯片厚度, 降低通态压降、突破 “硅极限”, 因此对于超级结 JBS 二极管的研究是有必要的。
本文利用仿真软件构造超级结 JBS 二极管的基本结构并进行静态特性模拟, 使用电荷耦合理论[9] 分析超级结 JBS 二极管中电场分布规律,分析在电荷耦合作用下超级结 JBS 二极管的正向导通特性, 研究不同参数下超级结 JBS 二极管的正向导通特性和反向阻断特性并提出一种超级结 JBS 二极管的设计方法,优化${300}\mathrm{\;V}$ 耐压超级结 JBS 二极管的参数。
超级结 JBS 二极管元胞结构如图1 所示, 其阳极由肖特基接触和其周围的$\mathrm{P}$ 柱区域组成,$\mathrm{P}$ 柱区域延伸至器件内部,$\mathrm{N}$ 柱区域在肖特基接触的下方,$\mathrm{N}$ 柱区域与$\mathrm{P}$ 柱区域共同形成复合耐压层,基于对工艺和成本等多方面考虑$\mathrm{P}$ 柱区域不与${\mathrm{N}}^{+ }$ 衬底连接[10],$\mathrm{N}$ 柱型区域与${\mathrm{N}}^{+ }$ 衬底连接,${\mathrm{N}}^{+ }$ 区域作为元胞衬底并由其引出器件的阴极。
传统$\mathrm{{JBS}}$ 二极管在反向阻断模式下,通过${\mathrm{P}}^{+ }$ 区域在器件表面的肖特基接触处形成势垒, 屏蔽肖特基接触, 降低肖特基接触处的电场, 这有利于减小肖特基接触处的势垒降低效应和热电场发射效应[11]。 超级结 JBS 二极管将 JBS 二极管的${\mathrm{P}}^{+ }$ 区域结深加深至器件内部,接近${\mathrm{N}}^{+ }$ 衬底的位置,如此大的${\mathrm{P}}^{+ }$ 区域结深有利于增加势垒的大小, 通过大结深大浓度的$\mathrm{P}$ 柱区域与$\mathrm{N}$ 柱区域共同构成超级结结构。引入电荷耦合效应, 电离施主的正电荷产生的电通量会被耦合出的$\mathrm{P}$ 柱区域中电离受主的负电荷吸收, 电力线产生横向流动[12],使纵向电场仅在很短的距离发生衰减, 纵向的电场会呈现近似于矩形的电场分布, 超级结 JBS 二极管内部电场分布优化为二维电场分布, 使器件的横向尺寸上也可以承担一定电压,所以电荷耦合效应使得相同厚度的超级结 JBS 二极管可以承担更高的反向阻断电压。
当超级结 JBS 二极管工作在正向导通状态时, 如果$\mathrm{P}$ 柱区的间距合理,在肖特基接触下方存在未耗尽的区域, 此区域可以进行单极传导。对于正向导通电阻低的器件,其通态压降小于 0.45 V,低于$\mathrm{{PN}}$ 结开启电压,那么二极管两端的压降不足以使 PN 结导通,从而可以使超级结 JBS 二极管器件依然保持肖特基二极管的正向特性。$\mathrm{P}$ 柱区的存在会牺牲一部分肖特基接触面积, 增加了器件的正向电流密度。
为便于描述及讨论,建立${300}\mathrm{\;V}$ 耐压超级 JBS 二极管初始模型,如图2 所示。设置$\mathrm{P}$ 柱区域掺杂浓度${N}_{\mathrm{p}}= 1 \times {10}^{16}{\mathrm{\;{cm}}}^{-3},\mathrm{\;N}$ 柱区域掺杂浓度${N}_{\mathrm{n}}= 8 \times$ ${10}^{15}{\mathrm{\;{cm}}}^{-3}$,器件总厚度${14\mu }\mathrm{m}$,$\mathrm{P}$ 柱区域结深${12\mu }\mathrm{m}$,$\mathrm{P}$ 柱区域宽度${0.55\mu }\mathrm{m},\mathrm{N}$ 柱区域宽度${0.70\mu }\mathrm{m}$。图中器件内部阴影部分为超级结 JBS 二极管的电荷耦合区域, 在电荷耦合区域中的二维电场分布较为复杂, 尽管已经存在一些超级结的二维电场解析理论[13-14],但是超级结 JBS 二极管的结构和功能区别于普通超级结器件的工作原理,一些最优的状态难以通过这些经典的解析模型给出, 只能通过数值方法分析, 所以利用 SILVACO 软件对器件进行分析和优化。
为分析超级结 JBS 二极管的静态特性, 在 SIL-VACO 软件中建立器件模型并对不同结构参数的超级结 JBS 二极管加载正向、反向电压, 模拟过程中使用的物理模型及模型参数包括:浓度依赖性迁移模型、横向电场相关的模型、Shockley-Read-Hall 复合模型、俄歇复合模型、带隙变窄模型和 Crowell-Sze 碰撞电离模型[15] 等。
JBS 二极管正向导通时,导通电流既可以从$\mathrm{P}$ 柱区域流过,也可以通过肖特基接触由$\mathrm{N}$ 柱区域流过。为研究超级结 JBS 二极管的正向导通工作原理, 建立一个超级结 JBS 二极管正向导通的模型, 该器件总厚度${14\mu }\mathrm{m}$,宽度为${1.25\mu }\mathrm{m}$。在此超级结 JBS 二极管两端加载不同大小的正向偏压以研究超级结 JBS 二极管的不同工作状态。当超级结 JBS 二极管工作在较小的正向偏置电压时 (仿真模拟中加载 0.4 V 正向偏置电压),由于器件中 PN 结的开启电压大于肖特基接触的开启电压,故此时器件仅通过$\mathrm{N}$ 柱区域导通电流,较小正向偏置电压下的超级结 JBS 二极管的电流分布如图3(a)所示。当超级结 JBS 二极管的正向偏压继续增加时(仿真模拟中加载$1\mathrm{\;V}$ 正向导通电压),此时超级结 JBS 二极管的 PN 结开启, P 柱区域和 N 柱区域之间的 PN 结注入到$\mathrm{N}$ 柱区域的少数载流子浓度增加,最终注入的少数载流子浓度会超过$\mathrm{N}$ 柱区域浓度,形成大注入,此时超级结 JBS 二极管成为另一种器件——超级结 MPS 二极管。当超级结 JBS 二极管正向偏置电压较大,器件已经变为超级结 MPS 二极管时, 超级结 MPS 二极管中的空穴电流分布如图3(b) 中所示,$\mathrm{P}$ 柱区域向$\mathrm{N}$ 柱区域大量注入空穴电流,已经形成大注入,高浓度的自由电子降低$\mathrm{N}$ 柱区域电阻,形成器件中的电导调制效应。
超级结 JBS 二极管的正向导通电流仅流过 N 柱区域,显然可以看出$\mathrm{N}$ 柱区域浓度和宽度越大越有利于正向电流的导通。然而$\mathrm{N}$ 柱区域宽度的增加会导致器件元胞宽度的增加, 元胞宽度的增加使器件中能够引入的电荷量减少, 增加器件的正向导通电阻${R}_{\mathrm{{on}}};\mathrm{N}$ 柱区域宽度过于小时不仅不利于正向电流导通,还使器件中增加了寄生 JFET 效应,使器件的正向导通电阻${R}_{\text{on }}$ 明显上升,甚至会改变器件的击穿机理[16],所以$\mathrm{N}$ 柱区域的浓度越大器件的导通电阻${R}_{\mathrm{{on}}}$ 越小,越利于正向导通电流的导通;$\mathrm{N}$ 柱区域宽度的减小会先使正向导通电阻${R}_{\mathrm{{on}}}$ 降低,随着寄生效应的增加又使正向导通电阻${R}_{\mathrm{{on}}}$ 开始快速增加。
通过分析超级结 JBS 二极管的正向导通过程可以看出, 由于超级结 JBS 二极管正向导通时, 电流主要的导通通道为$\mathrm{N}$ 柱区域,所以$\mathrm{N}$ 柱区域浓度越大越有利于电流的正向导通。当器件的宽度及厚度确定时,$\mathrm{P}$ 柱区域浓度和$\mathrm{P}$ 柱区域宽度对正向导通电流的影响不大,但$\mathrm{P}$ 柱区域浓度和$\mathrm{P}$ 柱区域宽度的优化不仅是影响超级结结构耐压的关键, 也是影响超级结 JBS 二极管导通电阻的关键, 所以将初始模型中超级结 JBS 二极管的$\mathrm{P}$ 柱区域浓度从${0.8}\times {10}^{16}{\mathrm{\;{cm}}}^{-3}$ 增加到${1.1}\times {10}^{16}{\mathrm{\;{cm}}}^{-3}$,图4 为 4 种不同$\mathrm{P}$ 柱区域浓度器件的正向导通特性仿真结果。
图4 可以看出, 当超级结 JBS 二极管工作在较低的正向偏置电压时,$\mathrm{P}$ 柱区域不影响超级结的正向导通特性; 从图4 的局部放大图中可以看出, 当器件开始进入大注入状态时,$\mathrm{P}$ 柱区域浓度越大,正向导通电流越大,即$\mathrm{P}$ 柱区域浓度仅影响器件进入大注入后的正向导通电流, 但是由于大注入状态不属于单极型器件范畴, 器件的工作原理已不同于超级结 JBS 二极管, 不做进一步的讨论。
$\mathrm{P}$ 柱区域宽度也是影响超级结 JBS 二极管正向导通电流的重要因素,对$\mathrm{P}$ 柱区域宽度分别为${0.50}\text{、}{0.55}\text{、}{0.60}$${0.65\mu }\mathrm{m}$ 的超级结 JBS 二极管进行正向导通特性仿真, 结果如图5 所示。在较小的正向偏置电压下$({0.7}\mathrm{\;V}$ 左右),$\mathrm{P}$ 柱区域宽度越大正向导通电流越小,这是由于$\mathrm{P}$ 柱区域占据正向电流导通沟道降低了此时器件中的正向导通电阻, 当超级结 JBS 二极管的正向偏压继续增大时 (1 V 左右), 通过$\mathrm{{PN}}$ 结注入的少数载流子浓度继续增加,直到超过$\mathrm{N}$ 柱区域浓度,此时$\mathrm{P}$ 柱区域也参与正向电流的导通,所以$\mathrm{P}$ 柱区域宽度越大,对器件整体正向导通电流的影响越大。同第 3.1.1 节中分析的一样, 当器件$\mathrm{P}$ 柱区域参与正向电流导通时,器件变为超级结 MPS二极管,所以超级结 JBS 二极管的$\mathrm{P}$ 柱区域宽度越大越不利于电流的导通。
从上述分析可以看出, 超级结 JBS 二极管依旧保持传统 JBS 二极管的正向导通特性, 开启电压较小,$\mathrm{N}$ 柱区域浓度和宽度的增加有利于超级结 JBS 二极管正向电流的导通,但是$\mathrm{N}$ 柱区域宽度过大或过小均会使器件的正向导通电阻${R}_{\mathrm{{on}}}$ 增加,$\mathrm{P}$ 柱区域浓度对超级结 JBS 二极管正向导通特性的影响极为有限。由于器件中超级结结构的加入改变了高压JBS 二极管设计中漂移区域必须轻掺杂的惯例, 大大提升了器件的正向电流密度。
通过对超级结 JBS 二极管正向导通特性的分析可以看出,正向导通特性主要受到$\mathrm{N}$ 柱区域浓度和宽度的影响, 通过理想的正向导通电阻和导通电流密度就可以确定合适的$\mathrm{N}$ 柱区域浓度和宽度,所以在反向阻断特性仿真中不需要讨论$\mathrm{N}$ 柱区域属性对超级结 JBS 二极管反向阻断特性的影响。
虽然已经通过第 3.1 节对超级结 JBS 二极管正向导通电流的影响进行分析, 但是一种二极管的设计还需要使其满足更大的电压耐量, 当超级结 JBS 二极管的$\mathrm{N}$ 柱区域浓度及$\mathrm{P}$ 柱区域宽度固定时,$\mathrm{P}$ 柱区域浓度会通过影响器件中电场电荷的分布来影响超级结 JBS 二极管的耐压水平。图6(a)为 P 柱区域浓度从${0.8}\times {10}^{16}{\mathrm{\;{cm}}}^{-3}$ 增加到${1.1}\times {10}^{16}{\mathrm{\;{cm}}}^{-3}$ 时, 超级结 JBS 二极管的耐压变化, 在图6(b)和(c) 分别提取 4 种不同参数器件的纵向和横向电场强度分布。
超级结 JBS 二极管的$\mathrm{P}$ 柱区域中正电荷与$\mathrm{N}$ 柱区域中负电荷互相耦合作用,横向电场从$\mathrm{P}$ 柱区域与$\mathrm{N}$ 柱区域交接处向两侧水平展开,由图6(c) 可知,$\mathrm{P}$ 柱区域浓度增加会增强量区域的耦合作用从而增加器件中的横向电场强度。随着$\mathrm{P}$ 柱区域浓度增加,器件中未耦合的负电荷逐渐减少,超级结 JBS 二极管的耦合区逐渐趋近于一块本征半导体, 纵向的电场分布逐渐趋近于矩形,而进一步增加$\mathrm{P}$ 柱区域浓度时,器件中$\mathrm{N}$ 柱区域的负电荷与正电荷不匹配,纵向电场又开始发生偏压,如图6(b)中所示,随着$\mathrm{P}$ 柱区域浓度增减,纵向电场的分布呈现先趋于矩形再发生倾斜的现象, 所以电场线围成的面积先增加后减小,反映出图6(a)$\mathrm{P}$ 柱区域浓度为$1 \times {10}^{16}{\mathrm{\;{cm}}}^{-3}$ 时,器件耐压最大的结果。
通过改变超级结 JBS 二极管的$\mathrm{P}$ 柱区域宽度, 讨论器件$\mathrm{P}$ 柱区域宽度对超级$\mathrm{{JBS}}$ 二极管的影响, 如图7 所示。$\mathrm{P}$ 柱区域宽度不仅影响器件中电荷耦合区域横向电场分布的展开位置,还通过改变$\mathrm{P}$ 柱区域内空穴数目及$\mathrm{N}$ 柱区域电子数目的比例提高了超级结 JBS 二极管反向阻断状态下的横向电场分布,如图7(c) 所示,横向电场的最高值点随 P 柱区域宽度的增加向器件右侧偏移, 横向电场随之减小。
图7(b) 为不同$\mathrm{P}$ 柱区域宽度时超级结 JBS 二极管内部纵向电场分布,由图可以看出,$\mathrm{P}$ 柱区域宽度的增加可增加器件中空穴比例,器件内部阳极侧纵向电场强度逐渐增加, 阴极侧的电场强度逐渐减小。由图7(a) 可以看出,当固定$\mathrm{P}$ 柱区域和$\mathrm{N}$ 柱区域浓度后,随着$\mathrm{P}$ 柱区域宽度增加,器件的反向击穿电压先上升后下降,对于器件一定存在最优的范围,实际具有一定的工艺宽容度。
通过分析不同器件参数对超级结 JBS 二极管反向阻断特性的影响不难发现, 超级结 JBS 二极管的$\mathrm{P}$ 柱区域浓度、$\mathrm{P}$ 柱区域宽度及$\mathrm{N}$ 柱区域浓度的变化均对器件的反向阻断特性产生较大影响, 任一参数的过度增加或减小均会导致电荷耦合区域内电荷的不平衡, 而且不平衡电荷会大量堆积在器件的两端柱型区域, 大大减小器件的反向耐压, 所以超级结 JBS 二极管的各个参数一定具有一个最优范围。
结合上述仿真特性分析可以得出, 在设计固定宽度、厚度及$\mathrm{N}$ 柱区域浓度的超级结 JBS 二极管时,虽然$\mathrm{P}$ 柱区域浓度和宽度均能影响器件的正向导通特性, 但是还需综合考虑反向阻断特性使器件具有较高的导通电阻和耐压比值, 因此在设计时可以先由器件要求的正向导通参数确定$\mathrm{N}$ 柱区域浓度和宽度,再依据耐压值依次确定$\mathrm{P}$ 柱区域浓度及宽度。可以确定${300}\mathrm{\;V}$ 耐压超级结 JBS 二极管的$\mathrm{P}$ 柱区域的最佳浓度为$1 \times {10}^{16}{\mathrm{\;{cm}}}^{-3},\mathrm{P}$ 柱区域的最佳宽度${0.5}\sim {0.6\mu }\mathrm{m}$,优化后的最终参数见表1
为验证超级结 JBS 二极管中超级结结构引入对 JBS 二极管结构改进的有效性,建立了${300}\mathrm{\;V}$ 耐压 JBS 二极管及以超级结结构作为 PIN 二极管基区的通用超级结二极管的模型, 并进行正向导通特性和反向阻断特性的仿真对比验证。其中 JBS 二极管和超级结 JBS 二极管的参数对比如表2 所示。
表2 可以看出, 超级结结构的引入使超级结 JBS 二极管的$\mathrm{N}$ 区域浓度比 JBS 二极管增加了 7 倍;器件的纵向尺寸上, 超级结 JBS 二极管比 JBS 二极管的纵向尺寸节约了 1/3 的厚度;超级结 JBS 二极管的$\mathrm{N}$ 柱区域和$\mathrm{P}$ 柱区域浓度也比通用超级结二极管的相应区域浓度有一定增加。
在 3 种${300}\mathrm{\;V}$ 耐压等级的二极管器件阳极加载正向电压, 对 3 种器件的正向导通特性进行分析, 如图8 所示。
图8 可以看出, 超级结 JBS 二极管保持了单极型器件低开启电压的特性, 正向开启电压小于通用超级结二极管, 而且由于超级结结构的引入, 正向导通电流密度远优于普通 JBS 二极管。
$5\mathrm{\;V}$ 为步长,在 3 种不同结构的${300}\mathrm{\;V}$ 耐压器件上加载反向电压,电压由${270}\mathrm{\;V}$ 增加至${315}\mathrm{\;V}$, 不同反向电压下的漏电流情况对比如图9 所示。
图9 可以看出, 由于超级结 JBS 二极管大结深、高浓度的$\mathrm{P}$ 柱区域的存在,有效保护了超级结 JBS 二极管的肖特基接触部分, 使其反向漏电流远小于普通 JBS 二极管, 维持在通用超级结二极管的反向漏电流水平, 非常适用于对反向漏电流大小要求极高的应用场景。
通过上述性能对比分析可以看出, 超级结的引入使超级结 JBS 二极管在保持单极型器件的优势下, 更有利于正向导通电流的流通, 并且大大缓解了单极型器件中漏电流较大的问题, 所以超级结 JBS 二极管中超级结结构的引入发挥了至关重要的作用, 极大的增加了单极型器件的应用范围。
本文从超级结 JBS 二极管的工作原理出发, 使用一种先根据需求的电流密度确定$\mathrm{N}$ 柱区域浓度再匹配其他参数的设计方法,设计了一种${300}\mathrm{\;V}$ 耐压的超级结 JBS 二极管。对超级结 JBS 二极管进行了仿真分析,结果表明: 超级结 JBS 二极管$\mathrm{N}$ 柱区域浓度和宽度的增加均有利于器件的导通特性; 为了兼顾阻断特性, 首先根据器件实际正向导通电流密度要求或理想的电流密度和器件正向导通电阻${R}_{\mathrm{{on}}}$ 确定$\mathrm{N}$ 柱区域的浓度和宽度,在此基础上优化$\mathrm{P}$ 柱区域浓度和宽度参数在最佳的电荷耦合范围;超级结结构的引入改善了普通 JBS 二极管的二维电场分布,减小了器件尺寸;当超级结 JBS 二极管加大正向偏置电压时,会导致$\mathrm{{PN}}$ 结注入,产生电导调制效应, 进一步降低器件的导通电阻, 形成另一种复合型二极管——超级结 MPS 二极管。
通过超级结 JBS 二极管与普通 JBS 二极管、 通用超级结二极管的仿真对比可以发现: 在相同${300}\mathrm{\;V}$ 耐压条件下,超级结 JBS 二极管的$\mathrm{N}$ 柱区域浓度、器件纵向尺寸等相较于普通 JBS 二极管均有较大提升;超级结 JBS 二极管的正向导通特性和反向阻断特性均远优于普通 JBS 二极管, 反向漏电流甚至与通用超级结二极管这种双极型器件处于同一水平。所以, 超级结结构的引入不仅大幅优化了超级结 JBS 二极管的器件参数, 还大幅提升了器件性能, 为进一步挖掘硅材料极限, 增加功率器件功率密度, 提升功率器件转换效率提供了一种新的设计思路。
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doi: 10.13234/j.issn.2095-2805.2024.1.163
  • 接收时间:2021-03-15
  • 首发时间:2025-07-21
  • 出版时间:2024-01-30
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  • 收稿日期:2021-03-15
  • 修回日期:2021-04-21
  • 录用日期:2021-05-08
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    沈阳工业大学 信息科学与工程学院 沈阳 110870
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鹅膏菌科Amanitaceae 2 11 5.26 鹅膏菌属 Amanita 10 4.78
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