Article(id=1154038482780540987, tenantId=1146029695717560320, journalId=1146031654075715584, issueId=1154038481564197598, articleNumber=null, orderNo=null, doi=10.13234/j.issn.2095-2805.2024.2.386, pmid=null, cstr=null, oa=null, hot=null, price=null, onlineType=0, articleFormat=0, articleType=null, articleTypeStr=null, receivedDate=1648656000000, receivedDateStr=2022-03-31, revisedDate=1649865600000, revisedDateStr=2022-04-14, acceptedDate=1650556800000, acceptedDateStr=2022-04-22, onlineDate=1753073815293, onlineDateStr=2025-07-21, pubDate=1711728000000, pubDateStr=2024-03-30, doiRegisterDate=null, doiRegisterDateStr=null, onlineIssueDate=1753073815293, onlineIssueDateStr=2025-07-21, onlineJustAcceptDate=null, onlineJustAcceptDateStr=null, onlineFirstDate=null, onlineFirstDateStr=null, sourceXml=null, magXml=null, createTime=1753073815293, creator=13701087609, updateTime=1753073815293, updator=13701087609, issue=Issue{id=1154038481564197598, tenantId=1146029695717560320, journalId=1146031654075715584, year='2024', volume='22', issue='2', pageStart='1', pageEnd='455', issueExtLink='null', onlineDate='null', pubDate='null', beforeIssueId=null, nextIssueId=null, price=null, status=1, issueComplete=1, articleOrder=1, issueType=-1, specialIssue=0, createTime=1753073815003, creator=13701087609, updateTime=1753780998609, updator=13701087609, preIssue=null, nextIssue=null, ext={EN=IssueExt(id=1157004624629683026, tenantId=1146029695717560320, journalId=1146031654075715584, issueId=1154038481564197598, language=EN, specialIssueTitle=, coverIllustrator=, specialIssueEditor=, specialIssueAbout=), CN=IssueExt(id=1157004624629683027, tenantId=1146029695717560320, journalId=1146031654075715584, issueId=1154038481564197598, language=CN, specialIssueTitle=, coverIllustrator=, specialIssueEditor=, specialIssueAbout=)}, issueFiles=null}, startPage=386, endPage=395, ext={EN=ArticleExt(id=1154038483275468864, articleId=1154038482780540987, tenantId=1146029695717560320, journalId=1146031654075715584, language=EN, title=Evaluation Method for Maximum Current Conduction Capability of SIC MOSFET Device at High Temperature, columnId=1153024086025429058, journalTitle=Journal of Power Supply, columnName=Power Semiconductor Devices, runingTitle=null, highlight=null, articleAbstract=

The silicon carbide (SiC) device is considered as a semiconductor device with high temperature resistance, and a careful study on its loss and heat dissipation is required when it is applied to high-power-density and high-temperature scenarios. The maximum current conduction capability of SiC MOSFET power module at high temperature is studied, and the relationship between electrical performance and heat dissipation is taken into account. Based on an electro-thermal coupling model of SiC MOSFET device and a heat dissipation model of the cooling system, the mechanism of thermal runaway process is analyzed. A co-simulation is conducted to determine the current conduction capability of one SiC power module at high temperature, and the simulation error with respect to the experimental result is about 4%, which verifies the effectiveness of the proposed method.

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碳化硅 SiC(silicon carbide)器件被认为是一种良好的耐高溫半导体器件,高功率密度和高温应用需要更深入地研究损耗和散热问题。研究了 SiC MOSFET 功率模块在高溫下的最大电流导通能力,考虑了电气性能和散热的相互关系。在建立SiC MOSFET器件的热电耦合模型配合系统散热模型的基础上,分析了热失控过程的机理。通过热电联合仿真确定了一款 SiC 功率模块高溫下的电流容量,与实验结果相比误差约为4%,验证了所提方法的有效性。

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李华康(1997-),男,硕士研究生。研究方向:功率器件建模和模块热管理。E-mail: lihk@mail.iee.ac.cn。

宁圃奇(1982-),男,中国电源学会会员,通信作者,博士,研究员。研究方向:半导体器件特性建模及模块封装技术研究。E-mail: npq@mail.iee.ac.cn。

康玉慧(1993-),女,硕士,研实员。研究方向:半导体器件特性建模及模块封装技术研究。E-mail:kangyuhui@mail.iee.ac.cn。

曹瀚(1993-),男,博士研究生。研究方向:功率器件建模与结温监测技术。E-mail: Barrycao17@yeah.net。

郑丹(1982-),女,硕士,高级工程师。研究方向:高功率密度电力电子变流器驱动控制技术研究。E-mail:zhengdan@mails.ucas.ac.cn。

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李华康(1997-),男,硕士研究生。研究方向:功率器件建模和模块热管理。E-mail: lihk@mail.iee.ac.cn。

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李华康(1997-),男,硕士研究生。研究方向:功率器件建模和模块热管理。E-mail: lihk@mail.iee.ac.cn。

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宁圃奇(1982-),男,中国电源学会会员,通信作者,博士,研究员。研究方向:半导体器件特性建模及模块封装技术研究。E-mail: npq@mail.iee.ac.cn。

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宁圃奇(1982-),男,中国电源学会会员,通信作者,博士,研究员。研究方向:半导体器件特性建模及模块封装技术研究。E-mail: npq@mail.iee.ac.cn。

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康玉慧(1993-),女,硕士,研实员。研究方向:半导体器件特性建模及模块封装技术研究。E-mail:kangyuhui@mail.iee.ac.cn。

"}, bioImg=null, bioContent=

康玉慧(1993-),女,硕士,研实员。研究方向:半导体器件特性建模及模块封装技术研究。E-mail:kangyuhui@mail.iee.ac.cn。

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2 中国科学院大学 北京 100049, bio={"content":"

曹瀚(1993-),男,博士研究生。研究方向:功率器件建模与结温监测技术。E-mail: Barrycao17@yeah.net。

"}, bioImg=null, bioContent=

曹瀚(1993-),男,博士研究生。研究方向:功率器件建模与结温监测技术。E-mail: Barrycao17@yeah.net。

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郑丹(1982-),女,硕士,高级工程师。研究方向:高功率密度电力电子变流器驱动控制技术研究。E-mail:zhengdan@mails.ucas.ac.cn。

"}, bioImg=null, bioContent=

郑丹(1982-),女,硕士,高级工程师。研究方向:高功率密度电力电子变流器驱动控制技术研究。E-mail:zhengdan@mails.ucas.ac.cn。

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Berichte der Bunsengesellschaft für Physikalische Chemie, 1984. 88(8): 739-742., articleTitle=Thermal, conductivity, density, viscosity, and Prandtl-numbers of ethylene glycol-water mixtures, refAbstract=null), Reference(id=1154038653258027354, tenantId=1146029695717560320, journalId=1146031654075715584, articleId=1154038482780540987, doi=null, pmid=null, pmcid=null, year=2017, volume=23, issue=9, pageStart=4001, pageEnd=4010, url=null, language=null, rfNumber=[32], rfOrder=32, authorNames=Takács G, Szabó PG, Bognár G, journalName=Microsystem Technologies, refType=null, unstructuredReference=Takács G, Szabó PG, Bognár G. Modelling of the flow-rate dependent partial thermal resistance of integrated microscale cooling structures[J]. Microsystem Technologies, 2017. 23(9): 4001-4010., articleTitle=Modelling of the flow-rate dependent partial thermal resistance of integrated microscale cooling structures, refAbstract=null), Reference(id=1154038653320941916, tenantId=1146029695717560320, journalId=1146031654075715584, articleId=1154038482780540987, doi=null, pmid=null, pmcid=null, year=2018, volume=78, issue=null, pageStart=32, pageEnd=37, url=null, language=null, rfNumber=[33], rfOrder=33, authorNames=Lelis A J, Green R, Habersat D B, journalName=Materials Science in Semiconductor Processing, refType=null, unstructuredReference=Lelis A J, Green R, Habersat D B. SiC MOSFET threshold-stability issues[J]. 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caption=长期正偏压温度应力下的阈值电压漂移 ${}^{\left\lbrack {33}\right\rbrack }$, figureFileSmall=Tb5m5U6gi0N1uFGOl1ZG0w==, figureFileBig=lQtWBZz5ZtuVu/O/aSVlww==, tableContent=null), ArticleFig(id=1154038649592205524, tenantId=1146029695717560320, journalId=1146031654075715584, articleId=1154038482780540987, language=EN, label=Fig. 16, caption=Influence of inconsistency of different chips, figureFileSmall=jyJIkNF6Ix4G1sAIk//NAg==, figureFileBig=EEY8MW++Klg8Q1OKsQN5eg==, tableContent=null), ArticleFig(id=1154038649671897302, tenantId=1146029695717560320, journalId=1146031654075715584, articleId=1154038482780540987, language=CN, label=图16, caption=不同芯片不一致的影响, figureFileSmall=jyJIkNF6Ix4G1sAIk//NAg==, figureFileBig=EEY8MW++Klg8Q1OKsQN5eg==, tableContent=null), ArticleFig(id=1154038649768366296, tenantId=1146029695717560320, journalId=1146031654075715584, articleId=1154038482780540987, language=EN, label=Tab. 1, caption=Thermal resistance under different values of thermal power, figureFileSmall=null, figureFileBig=null, tableContent=
发热功率/W ${T}_{\text{ave }}/\mathrm{K}$ ${R}_{\mathrm{{th}}}/\left({\mathrm{K}/\mathrm{W}}\right)$
60 311.94 0.1990
150 329.77 0.1984
240 347.48 0.1978
), ArticleFig(id=1154038649843863770, tenantId=1146029695717560320, journalId=1146031654075715584, articleId=1154038482780540987, language=CN, label=表1, caption=不同发热功率下的结-冷却液热阻, figureFileSmall=null, figureFileBig=null, tableContent=
发热功率/W ${T}_{\text{ave }}/\mathrm{K}$ ${R}_{\mathrm{{th}}}/\left({\mathrm{K}/\mathrm{W}}\right)$
60 311.94 0.1990
150 329.77 0.1984
240 347.48 0.1978
), ArticleFig(id=1154038649944527071, tenantId=1146029695717560320, journalId=1146031654075715584, articleId=1154038482780540987, language=EN, label=Tab. 2, caption=Thermal resistance at different coolant temperatures, figureFileSmall=null, figureFileBig=null, tableContent=
冷却液温度/K ${T}_{\text{ave }}/\mathrm{K}$ ${R}_{\mathrm{{th}}}/\left({\mathrm{K}/\mathrm{W}}\right)$
300 341.00 0.2050
325 366.41 0.2070
350 392.33 0.2117
375 418.28 0.2164
), ArticleFig(id=1154038650003247327, tenantId=1146029695717560320, journalId=1146031654075715584, articleId=1154038482780540987, language=CN, label=表2, caption=不同冷却液温度下的结-冷却液热阻, figureFileSmall=null, figureFileBig=null, tableContent=
冷却液温度/K ${T}_{\text{ave }}/\mathrm{K}$ ${R}_{\mathrm{{th}}}/\left({\mathrm{K}/\mathrm{W}}\right)$
300 341.00 0.2050
325 366.41 0.2070
350 392.33 0.2117
375 418.28 0.2164
), ArticleFig(id=1154038650074550499, tenantId=1146029695717560320, journalId=1146031654075715584, articleId=1154038482780540987, language=EN, label=Tab. 3, caption=Main experimental parameters, figureFileSmall=null, figureFileBig=null, tableContent=
项目 规格
功率模块 实验室封装
SiC 芯片 CPM2-1200-0025B×4
DC 直流源 WYG-15V500A
红外热成像仪 Fluke Ti55
加热浸没式循环器 Julabo CORIO CD
), ArticleFig(id=1154038650179408102, tenantId=1146029695717560320, journalId=1146031654075715584, articleId=1154038482780540987, language=CN, label=表3, caption=主要实验参数, figureFileSmall=null, figureFileBig=null, tableContent=
项目 规格
功率模块 实验室封装
SiC 芯片 CPM2-1200-0025B×4
DC 直流源 WYG-15V500A
红外热成像仪 Fluke Ti55
加热浸没式循环器 Julabo CORIO CD
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SiC MOSFET 器件高温下最大电流导通能力评估方法
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李华康 1, 2 , 宁圃奇 1, 2 , 康玉慧 1 , 曹瀚 1, 2 , 郑丹 1
电源学报 | 功率半导体器件 2024,22(2): 386-395
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电源学报 | 功率半导体器件 2024, 22(2): 386-395
SiC MOSFET 器件高温下最大电流导通能力评估方法
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李华康1, 2 , 宁圃奇1, 2 , 康玉慧1 , 曹瀚1, 2 , 郑丹1
作者信息
  • 1 中国科学院电工研究所 北京 100190
  • 2 中国科学院大学 北京 100049
  • 李华康(1997-),男,硕士研究生。研究方向:功率器件建模和模块热管理。E-mail: lihk@mail.iee.ac.cn。

    宁圃奇(1982-),男,中国电源学会会员,通信作者,博士,研究员。研究方向:半导体器件特性建模及模块封装技术研究。E-mail: npq@mail.iee.ac.cn。

    康玉慧(1993-),女,硕士,研实员。研究方向:半导体器件特性建模及模块封装技术研究。E-mail:kangyuhui@mail.iee.ac.cn。

    曹瀚(1993-),男,博士研究生。研究方向:功率器件建模与结温监测技术。E-mail: Barrycao17@yeah.net。

    郑丹(1982-),女,硕士,高级工程师。研究方向:高功率密度电力电子变流器驱动控制技术研究。E-mail:zhengdan@mails.ucas.ac.cn。

Evaluation Method for Maximum Current Conduction Capability of SIC MOSFET Device at High Temperature
Huakang LI1, 2 , Puqi NING1, 2 , Yuhui KANG1 , Han CAO1, 2 , Dan ZHENG1
Affiliations
  • 1 Institute of Electrical Engineering, Chinese Academy of Sciences Beijing 100190 China
  • 2 University of Chinese Academy of Sciences Beijing 100049 China
出版时间: 2024-03-30 doi: 10.13234/j.issn.2095-2805.2024.2.386
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碳化硅 SiC(silicon carbide)器件被认为是一种良好的耐高溫半导体器件,高功率密度和高温应用需要更深入地研究损耗和散热问题。研究了 SiC MOSFET 功率模块在高溫下的最大电流导通能力,考虑了电气性能和散热的相互关系。在建立SiC MOSFET器件的热电耦合模型配合系统散热模型的基础上,分析了热失控过程的机理。通过热电联合仿真确定了一款 SiC 功率模块高溫下的电流容量,与实验结果相比误差约为4%,验证了所提方法的有效性。

冷却  /  结温  /  封装  /  功率模块  /  碳化硅  /  热失控

The silicon carbide (SiC) device is considered as a semiconductor device with high temperature resistance, and a careful study on its loss and heat dissipation is required when it is applied to high-power-density and high-temperature scenarios. The maximum current conduction capability of SiC MOSFET power module at high temperature is studied, and the relationship between electrical performance and heat dissipation is taken into account. Based on an electro-thermal coupling model of SiC MOSFET device and a heat dissipation model of the cooling system, the mechanism of thermal runaway process is analyzed. A co-simulation is conducted to determine the current conduction capability of one SiC power module at high temperature, and the simulation error with respect to the experimental result is about 4%, which verifies the effectiveness of the proposed method.

Cooling  /  junction temperature  /  packaging  /  power module  /  silicon carbide (SiC)  /  thermal runaway
李华康, 宁圃奇, 康玉慧, 曹瀚, 郑丹. SiC MOSFET 器件高温下最大电流导通能力评估方法. 电源学报, 2024 , 22 (2) : 386 -395 . DOI: 10.13234/j.issn.2095-2805.2024.2.386
Huakang LI, Puqi NING, Yuhui KANG, Han CAO, Dan ZHENG. Evaluation Method for Maximum Current Conduction Capability of SIC MOSFET Device at High Temperature[J]. Journal of Power Supply, 2024 , 22 (2) : 386 -395 . DOI: 10.13234/j.issn.2095-2805.2024.2.386
与硅 Si(silicon)材料相比,碳化硅 SiC(silicon carbide)具有更宽的带隙(${25}{}^{\circ }\mathrm{C}$ 时为${3.26}\mathrm{{eV}}$,而$\mathrm{{Si}}$${1.12}\mathrm{{eV}}$ )和更高的热导率[1-2]。宽带隙意味着即使在高温下, 价电子也很难被热能或其他能量激发到导带。宽带隙限制了固有的激发效应, 使器件可以在高温下安全运行。SiC 功率器件具有良好的耐温特性, 学者们正希望找到它们在高温下安全应用的边界条件[3]。当温度升高时,带隙通常会快速收缩, 需要探索温度升高与器件正常开关的关联关系。
SiC 功率器件已经在电动汽车、电动飞机和太空探索等电力电子领域展示了优秀的性能[4-5]。为了实现高温应用,研究人员做出了很多努力,例如改进栅极驱动[6-7] 、在宽温度范围内充分评估器件特性[8] 、改进封装及其材料[1,9,10] 等。$\mathrm{{SiC}}$ 器件可以在更高的结温下工作, 但该应用中直接简单地替换传统的$\mathrm{{Si}}$ 器件无法发挥其高温下的性能,必须对散热系统加以改进。
在实际应用中, 由于难以对器件结温做准确的测量或估计, 系统设计时往往会设置过大的冗余, 从而导致$\mathrm{{SiC}}$ 器件性能的浪费。过分追求功率密度而不考虑结温很容易导致器件失效,因此为了充分利用$\mathrm{{SiC}}$ 器件在高温方面的优势,实现电力电子系统在各种工控下的稳定可靠运行, 必须对热管理机制进行深入研究[11-12]
功率封装是半导体芯片和其他封装结构的组合,可以提供辅助电气、热和机械的功能[13-15]。由于功率芯片会散发大量热量,封装及散热系统对芯片结温的影响较大。为分析安全边界, 主需要研究 SiC MOSFET 的热电耦合模型、封装和散热系统的热分析以及电气和热学参数的耦合机制 3 个问题。
在此前的研究中, 很少有文章关注近限边界下的电气和散热评估, 缺乏高温稳定性的机理分析。 文献[16-18]对 SiC MOSFET 的电热模型进行了大量研究, 但这些模型都没有针对热测试环境进行优化, 比较复杂, 难以在系统仿真中使用。对于功率模块, 制造商通常只在数据手册中提供结壳热阻, 实际上, 散热系统的热阻也很关键, 特别是在高温应用中, 温度变化得非常快, 一些相关的电气参数也变得极为敏感[19-22]。然而,尽管有很多关于外部散热系统特性的研究[23-24],但很少有研究关注散热系统与器件电热模型的协同求解。热学参数与电学参数的耦合机制是探寻功率模块高温工作能力的关键, 电气产生的损耗会影响热分布, 进而结温也会决定器件的电气特性, 较低结温下这种耦合可近似为负反馈中的小波动, 近限状态下它向正反馈的迅速过渡是引起热失控的主要原因。本文提出一种评估 SiC 功率模块在高温下应用能力的方法, 来探索安全应用边界。
图1 为典型的功率模块结构及热电耦合示意。 本文选择 Wolfspeed 公司第 2 代 SiC MOSFET 功率芯片 CPM212000025B 作为研究对象, 该功率器件为垂直器件, 其晶胞单元结构及等效电路如图2 所示。垂直器件与普通横向器件的主要区别在于,垂直器件具有较大的$\mathrm{N}$ -漂移区,表现为电阻的特征。 因此,功率器件可以被建模为普通横向 MOSFET 与剩余电阻${R}_{\mathrm{s}}$
决定$\mathrm{{SiC}}$ 器件温度依赖性的关键参数是体电子迁移率${\mu }_{n,\text{bulk }}$,其与温度的关系[25] 可表示为
${\mu }_{n,\text{ bulk }}= {1140}{\left(\frac{{T}_{\mathrm{j}}}{300}\right)}^{-{2.7}}$
式中,${T}_{\mathrm{j}}$ 是结温。
然而,由于${\mathrm{{SiO}}}_{2}/\mathrm{{SiC}}$ 界面处的界面陷阱密度大, 沟道的电子效应迁移率要比体电子迁移率小得多, 因此其也依赖于栅极偏置电压${V}_{\mathrm{{gs}}}$ 的大小,同时呈现出正温度系数[26]。沟道电子的场效应迁移率${\mathbf{\mu }}_{n,\mathrm{{ch}}}$ 与温度之间的近似关系为
${\mu }_{n,\text{ch-fe }}\propto {T}^{\beta }$
式中,$\beta$ 为常数系数,正值。这个方程是一个简化方程, 主要说明界面陷阱处的库仑散射在影响沟道迁移率的因素中起主导作用[27]
另一个受温度影响的参数是带隙${E}_{\mathrm{g}}$,其与温度的关系[28] 可以表示为
${E}_{\mathrm{g}}\left({T}_{\mathrm{j}}\right)= {E}_{\mathrm{g},{300}}- {\alpha }_{\mathrm{g}}\left({{T}_{\mathrm{j}}- {300}}\right)$
式中:${E}_{\mathrm{g},{300}}$$\mathrm{{SiC}}$ 在常温下的禁带宽度,${E}_{\mathrm{g},{300}}=$ ${3.26}\mathrm{{eV}};{\alpha }_{\mathrm{g}}$ 为温度系数,${\alpha }_{\mathrm{g}}= {3.3}\times {10}^{-4}\mathrm{{eV}}/\mathrm{K}$
还有一个与温度相关的重要中间参数是本征载流子浓度${n}_{\mathrm{i}}$,其计算公式[27]为
${n}_{\mathrm{i}}= \sqrt{{N}_{\mathrm{C}}{N}_{\mathrm{V}}}{\mathrm{e}}^{-{E}_{\mathrm{g}}/{2kT}}$
式中:${N}_{\mathrm{C}}$ 为导带态密度,${N}_{\mathrm{C}}= 2{\left( 2\pi {m}_{\mathrm{n}}kT/{h}^{2}\right)}^{3/2};{N}_{\mathrm{V}}$ 为价带态密度,${N}_{\mathrm{V}}= 2{\left( 2\pi {m}_{\mathrm{p}}kT/{h}_{\mathrm{P}}^{2}\right)}^{32};k$ 为玻尔兹曼常数;${h}_{\mathrm{P}}$ 为普朗克常数;${m}_{\mathrm{n}}$${m}_{\mathrm{p}}$ 分别为电子和空穴的有效质量。
阈值电压是 MOSFET 器件的关键热敏感参数, 通常可以通过线性拟合方程来建模, 即
${V}_{\mathrm{{th}}}\left({T}_{\mathrm{j}}\right)= {V}_{\mathrm{{th}},{300}}- {k}_{\mathrm{{vth}}}\left({{T}_{\mathrm{j}}- {300}}\right)$
式中:${V}_{\mathrm{{th}},{300}}$ 是常温${300}\mathrm{\;K}$ 时的阈值电压;${k}_{\mathrm{{vth}}}$ 是阈值电压的温度系数。对于所研究的芯片, 实验提取的${V}_{\mathrm{{th}},{300}}= {2.78}\mathrm{\;V},{k}_{\mathrm{{vth}}}= {6.31}\mathrm{\;{mV}}$
功率 MOSFET 器件的导通电阻${R}_{\text{on }}$ 是指漏源电流${I}_{\mathrm{{ds}}}$ 流过的所有区域的电阻之和。${R}_{\mathrm{{on}}}$ 的大小决定了器件的通态损耗, 并可能影响 MOSFET 导通电流的能力。图2 中 SiC MOSFET 的导通电阻由 6 个部分组成:${R}_{\mathrm{N}+ }$ 为源极扩散电阻;${R}_{\mathrm{{CH}}}$ 为沟道电阻;${R}_{\mathrm{A}}$ 为累积电阻;${R}_{\mathrm{J}}$ 为两个体区之间区域的 JFET 元件电阻;${R}_{\mathrm{D}}$ 为漂移区域电阻;${R}_{\mathrm{{Sub}}}$ 为衬底电阻。高压功率 MOSFET 导通电阻的主要部分是沟道电阻、 JFET 电阻和漂移区电阻[25]。本文中总漏源电阻由沟道电阻${R}_{\mathrm{{CH}}}$ 和残余电阻${R}_{\mathrm{s}}$ 表示,其中${R}_{\mathrm{s}}$ 主要包括漂移电阻和 JFET 电阻。
图2 中节点$d$$s$ 之间部分的建模为
$\left\{\begin{array}{ll}{I}_{ds}= {k}_{\mathrm{{mos}}}\left({{V}_{\mathrm{{gs}}}- {V}_{\mathrm{{th}}}- \frac{1}{2}{V}_{ds}}\right){V}_{ds}& {V}_{ds}< {V}_{\mathrm{{gs}}}- {V}_{\text{th }}\\{I}_{ds}= \frac{{k}_{\text{mos }}}{2}{\left({V}_{\mathrm{{gs}}}- {V}_{\text{th }}\right)}^{2}\left({1 + m{V}_{ds}}\right)& {V}_{ds}\geq {V}_{\mathrm{{gs}}}- {V}_{\text{th }}\end{array}\right.$
式中:${I}_{ds}$ 为流过节点$d$$s$ 的电流;${V}_{ds}$$d$$s$ 两个节点之间的电压;${V}_{\mathrm{{gs}}}$ 为栅极偏置电压;${V}_{\mathrm{{th}}}$ 为阈值电压;$m$ 为沟道长度调制;${k}_{\mathrm{{mos}}}$ 为与制造相关的参数,${k}_{\mathrm{{mos}}}= {\mu }_{n,\mathrm{{ch}}- \mathrm{{fe}}}{C}_{\mathrm{{ox}}}W/L$,其中$W$ 为沟道宽度,$L$ 为沟道长度,${C}_{\mathrm{{ox}}}$ 为栅氧化层电容。${k}_{\mathrm{{mos}}}$${V}_{\mathrm{{th}}}$ 都与温度相关。当器件完全导通时,${V}_{ds}$ 非常小,因此${R}_{\mathrm{{CH}}}$ 可以写为
${R}_{\mathrm{{CH}}}= \frac{1}{{k}_{\mathrm{{mos}}}}\frac{1}{{V}_{\mathrm{{gs}}}- {V}_{\mathrm{{th}}}}$
结合${k}_{\mathrm{{mos}}}$ 的表达式和式(2)、式(5),${R}_{\mathrm{{CH}}}$ 建模为
${R}_{\mathrm{{CH}}}= {k}_{\mathrm{{rch}}}\frac{{\left({T}_{\mathrm{j}}/{300}\right)}^{-\beta }}{{V}_{\mathrm{{gs}}}- {V}_{\mathrm{{th}},{300}}+ {k}_{\mathrm{{vth}}}\left({{T}_{\mathrm{j}}- {300}}\right)} $
式中,${k}_{\text{rch }}$ 为常数系数。
因为${R}_{\mathrm{s}}$ 的主要部分是体区,故根据式 (1) 可以认为${R}_{\mathrm{s}}$ 随温度呈指数变化,即
${R}_{\mathrm{s}}= {k}_{\mathrm{{rs}}}{\left(\frac{{T}_{\mathrm{j}}}{300}\right)}^{\alpha }$
式中:${k}_{\mathrm{{rs}}}$ 为一个常数系数;$\alpha$ 应该接近式(1)中的 2.7。
本文通过实验测量了研究对象在不同栅极电压和温度下流过$\mathrm{{SiC}}$ 芯片的电流。图3${100}{}^{\circ }\mathrm{C}$ 时漏源电流与电压的关系, 其他温度下的关系趋势与之类似。
总的导通电阻${R}_{\text{on }}$ 可以写为
${R}_{\mathrm{{on}}}= \frac{1}{{k}_{\mathrm{{mos}}}}\frac{1}{{V}_{\mathrm{g}}- {V}_{\mathrm{{th}}}}+ {R}_{\mathrm{s}}$
式(10)的第一部分是沟道电阻${R}_{\mathrm{{CH}}},{R}_{\mathrm{s}}$ 为残余电阻。当${\left({V}_{\mathrm{g}}- {V}_{\mathrm{{th}}}\right)}^{-1}$ 接近 0 时,${R}_{\mathrm{{on}}}\approx {R}_{\mathrm{s}}$,图4 为将特性曲线转化之后的结果,其横轴变量是${\left({V}_{\mathrm{g}}- {V}_{\mathrm{{th}}}\right)}^{-1}$, 纵轴变量为${R}_{\mathrm{{on}}\circ }$
从总通态电阻${R}_{\mathrm{{on}}}$ 中提取${R}_{\mathrm{s}},{R}_{\mathrm{s}}$${R}_{\mathrm{{CH}}}$ 随温度变化的趋势如图5 所示。可以看出,当温度升高时,${R}_{\mathrm{s}}$ 将越来越占主导地位,与式 (9) 预测的趋势一致,${R}_{\mathrm{s}}$ 随温度呈指数增长,提取的$\alpha ={3.24},{k}_{\mathrm{{rs}}}= {15.6}\mathrm{\;m}\Omega$, 与式 (1) 中的系数值 2.7 略有不同,可以解释为${R}_{\mathrm{s}}$ 计算误差以及其他部分电阻如 JFET 电阻、衬底电阻等的影响。
${R}_{\mathrm{s}}$ 不同,沟道电阻${R}_{\mathrm{{CH}}}$ 与温度呈负相关,提取的${k}_{\mathrm{{rch}}}= {0.281\Omega }\cdot \mathrm{V},\beta ={2.4}$。沟道电阻会稍微减缓功率损耗的增加速度, 但当温度升高时其减缓效果降低。也就是说, 在高温下, 温度与发热功率的正反馈会越来越严重,使得芯片更容易损坏。
功率模块散热主要有传导和对流两种方式, 而辐射传热不明显。热传导主要发生在功率模块封装的不同层之间;热对流主要发生在液冷或风冷散热系统的液固/气固界面。一般在基于产品手册的热评估中,只使用简单的热阻结-壳热阻${R}_{\mathrm{{th}},\mathrm{{jc}}}$ 或结-空气热阻${R}_{\mathrm{{th}},\mathrm{{ja}},}$ 但较高温度下的非线性因素会影响温度分布和散热性能,需要详细计算。
非线性主要可以由热扩散过程、热对流过程和材料特性的温度依赖性[29] 3 个部分引入。热扩散效应的含义是在芯片发热功率越大时, 功率芯片与冷却液之间的温差也越大,因此散热面积也越大,从而使得热对流更加有效,即热扩散效应带来的非线性。 热对流过程, 非线性由冷却液流动条件引入, 但在电动汽车等一些应用中,依然可以认为是线性的,因为它总是处于层流状态或层流和湍流之间过渡的早期阶段, 而在一些功率非常大的应用中, 需要采用相变散热等高效散热方式, 非线性会较为明显。在这些情况下, 可以使用变化的热阻或热网络模型。
为了研究这个问题, 本文建立了图6 所示的仿真模型,仿真在 COMSOL 软件中进行,其中${T}_{\mathrm{w}}$ 为冷却液温度。选择流体作为传热介质以反映热对流过程, 而通过改变热源功率来体现热扩散效应。在没有对材料施加温度依赖性的情况下, 结果如图7 所示。计算得到的稳态结-冷却液热阻见表1,其中,${T}_{\text{ave }}$ 为芯片平均结温。可以看出,随着热功率从${60}\mathrm{\;W}$ 增加到${240}\mathrm{\;W}$,由于热扩散导致热阻下降非常小,可以忽略不计。因此, 在不考虑温度依赖性的情况下, 可以认为传热系数与发热功率无关。
与前文讨论的其他两个因素相比,材料的温度依赖性对热阻的影响更大。热传导遵循傅立叶定律,热流密度$q$ 等于热导率$\lambda$ 和负温度梯度$-\frac{\partial t}{\partial n}$ 的乘积, 即
$ q =- \lambda \frac{\partial t}{\partial n}$
其中关键参数是$\lambda$,它是温度的函数,会引入非线性。模块中常用的材料热导率随温度的变化如图8 所示[29-31]
热对流的过程比热传导更复杂,因为它与液体流动密切相关。除了偏微分热方程外,由努塞尔数描述的经验公式通常被用于计算传热系数[32],即
$ h =\lambda \frac{\mathrm{{Nu}}}{L}$
式中:$h$ 为对流传热系数;$\lambda$ 为流体的热导率;$L$ 为特征长度;$\mathrm{{Nu}}$ 为努塞尔数。$\lambda$$\mathrm{{Nu}}$ 都是温度的函数。
表2 为不同液体温度下的结-冷却液热阻的计算结果,图9 为仿真的温度分布。
可以发现,当液体温度从${300}\mathrm{\;K}$ 增加到${375}\mathrm{\;K}$ 时,结与液体之间的热阻变化约为${0.01}\mathrm{\;K}/\mathrm{W}$。在$1\mathrm{\;{kW}}$ 的功率损耗下,结温误差可以估计为${10}\mathrm{\;K}$。 当液体温度变化很大时,温度依赖性不能忽略,例如电动汽车冷却液。
如上所述, 热阻几乎与功率损耗无关, 但对温度比较敏感。虽然散热功率的大小不会明显改变热阻,但会影响功率模块和散热系统内部的温度分布, 然后使总热阻发生变化。由于温度分布计算需要较长的时间,而模块中间层的温度并不需要特别关注,因此可以将结到参考点的热阻${R}_{\mathrm{{th}},\mathrm{{jr}}}$ 用二次函数拟合, 即
${R}_{\mathrm{{th}},\mathrm{{jr}}}= \left\lbrack \begin{array}{lll}{a}_{1}& {b}_{1}& {c}_{1}\end{array}\right\rbrack \left\lbrack \begin{matrix}{P}^{2}\\ P \\ 1 \end{matrix}\right\rbrack +\left\lbrack \begin{array}{lll}{a}_{2}& {b}_{2}& {c}_{2}\end{array}\right\rbrack \left\lbrack \begin{matrix}{T}_{\mathrm{r}}^{2}\\{T}_{\mathrm{r}}\\ 1 \end{matrix}\right\rbrack $
式中:$P$ 为器件的发热功率;${T}_{\mathrm{r}}$ 为参考点的温度;${a}_{1}$${b}_{1}$${c}_{1}$${a}_{2}$${b}_{2}$${c}_{2}$ 为拟合系数。$P$${T}_{\mathrm{r}}$ 可以被认为是相互独立的。
在常温或高温条件下的应用中, 器件的功率损耗与结温之间始终存在正反馈。温度升高, 功率损耗就会增加, 而增加的功率损耗又会反过来使结温升高。很明显,当导通电流或结温升高到一定程度时, 结温将对导通电流或功率损耗的增加极为敏感。如果温度或电流继续增加,就会发生热失控。
SiC MOSFET 自发热产生的热量可以表示为
${P}_{\text{cond }}= {I}_{\mathrm{d}}^{2}{R}_{\text{on }}$
式中:${P}_{\text{cond }}$ 为导通功率损耗;${I}_{\mathrm{d}}$ 为漏极电流。
为了简单地解释机理,${R}_{\text{on }}$ 由功率 MOSFET 导通电阻的主要部分漂移电阻定义
${R}_{\mathrm{{on}}}= {R}_{\mathrm{{on}},{300}}{\left(\frac{{T}_{\mathrm{j}}}{300}\right)}^{\alpha }$
式中,${R}_{\mathrm{{on}},{300}}$ 是常温${300}\mathrm{\;K}$ 下的导通电阻,导通损耗的完整公式为
${P}_{\text{cond }}= {I}_{\mathrm{d}}^{2}{R}_{\mathrm{{on}},{300}}{\left(\frac{{T}_{\mathrm{j}}}{300}\right)}^{\alpha }$
另外,热阻${R}_{\mathrm{{th}}}$ 也可以简单地表示为散热功率与温度差的关系, 即
${P}_{\text{diss }}= \frac{{T}_{\mathrm{j}}- {T}_{\mathrm{a}}}{{R}_{\mathrm{{th}}}}$
式中:${P}_{\text{diss }}$ 为发热功率;${T}_{\mathrm{a}}$ 为环境温度;${R}_{\text{th }}$ 为结和环境之间的热阻。在这种情况下,${R}_{\mathrm{{th}}}$ 是一个独立于${T}_{\mathrm{j}}$${I}_{\mathrm{d}}$ 的常数。
图10 为热失控的原理。当${P}_{\text{cond }}> {P}_{\text{diss }}$ 时,发热功率大于散热功率, 结温将升高到新的平衡点或发生热失控; 当${P}_{\text{cond }}< {P}_{\text{diss }}$ 时,散热功率大于发热功率, 结温将降到较低的热平衡点; 当处于稳定点时,${P}_{\text{cond }}= {P}_{\text{diss }}$,系统达到热平衡,负反馈可以拉回小的偏移量。但是如果在不稳定点实现热平衡,一个小的扰动就可以使系统很快达到热失控。
图11 为不同工作电流下的导通损耗功率和散热功率的仿真结果。在该仿真中,温度为${300}\mathrm{\;K}$ 时的导通电阻被设置为${25}\mathrm{m}\Omega$,式 (16) 中的系数为 2.4,结与环境之间的热阻为$1\mathrm{\;K}/\mathrm{W}$。虚线为在不同导通电流下功率器件的发热功率与结温的关系, 实线为散热系统的散热功率与结温的关系。
很明显,实线 (散热功率) 和虚线 (发热功率) 之间会有两个交点, 只有在第一个交叉点处才能达到热平衡。通过标记所有第一个交点, 可以获得在不同导通电流下的稳态工作点。同时当线性散热功率曲线与指数发热功率线相切时, 可以算出最大工作条件是导通电流为${48.5}\mathrm{\;A}$,结温为${514}\mathrm{\;K}\left({{241}^{\circ }\mathrm{C}}\right)$
模块地最大工作点可表示为
$\left\{\begin{array}{l}{P}_{\text{cond }}= {P}_{\text{diss }}\\\frac{\partial {P}_{\text{cond }}}{\partial {T}_{\mathrm{i}}}= \frac{\partial {P}_{\text{diss }}}{\partial {T}_{\mathrm{i}}}\end{array}\right.$
其中, 第一个方程表示热平衡, 第二个方程表示最大工作点。将式(14)和(17)代入式(18),可以推导出该仿真情况下的热失控条件为
$\left\{\begin{array}{l}{T}_{\mathrm{j},\max }= \frac{\alpha }{\alpha - 1}{T}_{\mathrm{a}}\\{P}_{\max }= \frac{1}{\alpha - 1}\frac{{T}_{\mathrm{a}}}{{R}_{\mathrm{{th}},\mathrm{{ja}}}}\\{I}_{\max }= \sqrt{\frac{{T}_{\mathrm{a}}{\left(\frac{300}{\alpha -\frac{1}{\alpha - 1}{T}_{\mathrm{a}}}\right)}^{\alpha }}{{I}_{\max }- {I}_{\max }{P}_{\max }}}\end{array}\right.$
图12 为不同环境温度和热阻下的热失控过程。随着电流的增加, 结温以加速的方式增加。可以发现,接近最大值的工作点是极其 “不稳定” 的, 此时${0.5}\mathrm{\;A}$ 的电流差可以在${300}\mathrm{\;K}$ 的环境温度和$1\mathrm{\;K}/\mathrm{W}$ 的热阻下引起${50}^{\circ }\mathrm{C}$ 的结温差,因此,在实际应用中必须留下较大的安全裕度。热阻和环境温度对模块能导通的最大电流影响较大,为了充分利用$\mathrm{{SiC}}$ 器件的良好性能,应仔细设计散热系统以避免热失控。
本文搭建了一个测试平台来验证所提出的模型并评估高温稳定性。如图13 所示, 功率模块封装被打开, SiC 裸片表面经过喷漆处理, 可通过红外热成像仪获取准确温度。测试装置的参数见表3,其中直流电流源用于加热功率模块,红外热像仪测量稳态结温,恒温冷却循环器用于散热。
实验过程如下:①施加恒定电流对$\mathrm{{SiC}}$ 器件进行加热;②等待达到稳定状态,用红外热像仪测量结温;③记录漏源电压和电流用于热阻计算。
应用第 1、2 节给出的模型,进行电热联合仿真,图14 为仿真与实验结果的对比。功率模块实测最大导通电流能力为${180}\mathrm{\;A}$,仿真结果为${188}\mathrm{\;A}$,结果吻合得比较好,误差约 4%。但是,在接近极限运行条件时, 在相对较高的电流和温度下, 实测的温度比仿真结果的上升速度要快得多,这是一个突出的现象, 意味着更多的因素可能会影响功率模块在高温下的热稳定性。本节将讨论在仿真中没有考虑到的一些因素。
阈值电压稳定性主要受绝缘栅氧层近界面区域中的有源电荷陷阱的影响。目前为止,$\mathrm{{SiC}}$ 功率 MOSFET 的$\mathrm{{SiC}}/{\mathrm{{SiO}}}_{2}$ 界面质量相对较差,其可靠性一直是业界关注的焦点, 而其主要问题是阈值电压的漂移。通常在高温下,阈值电压在正栅极偏压下会有正漂移, 在负栅极偏压下会有负漂移, 且栅极偏置时间越长,阈值电压漂移越大,如图15 所示。
本文中,如果在${400}\mathrm{\;K}$ 时阈值电压增加$1\mathrm{\;V}$,则通态电阻将增加$1\mathrm{m}\Omega$。如果施加${160}\mathrm{\;A}$ 电流和${0.25}\mathrm{\;K}/\mathrm{W}$ 热阻,将发生${6.4}\mathrm{\;K}$ 温度升高。
由于并联芯片的个体差异,不同的芯片导通电阻不同,将会导致温度不相等。通常情况下,导通电阻的温度系数为正, 当器件温度升高时, 其电阻也会增加, 这时, 通过它的电流减小, 温度下降。这种负反馈机制会降低不同的芯片之间温度的不平衡性。但是, 在高温下, 通态电阻随着温度越来越快地增加, 当反馈的速度不能及时缓解温度不平衡时, 热失控就会发生。
通过仿真来解释这种现象, 仍然以本文研究的芯片为例。分为 3 个对照组, 每个对照组为 4 个并联的芯片,冷却条件相同。对照组 1 为 4 个芯片导通电阻保持原值;对照组 2 其中 2 个芯片导通电阻保持原值 (对照组 2-1), 另外 2 个芯片导通电阻对比原值增加 10%(对照组 2-2),对照组 2 结温差为对照组 2-1 与对照组 2-2 的结温差;对照组 3 为 4 个导通电阻相同的芯片并联,其总并联阻值与对照组 2 相同。 仿真结果如图16 所示。可以发现:当离热失控状态很远时, 电阻较大的那一组温度稍高, 但两组几乎保持相同的温度;当接近热失控状态时,电阻较小的组反而具有更高的温度。作为对比, 原始数据使用了图14 中的仿真结果, 即所有芯片阻值都相同的情况, 拟合数据为所有芯片都相同但是其总阻值与第 2 组相同时的情况。无论与哪种情况对比, 特性不平衡的芯片都会带来更不稳定的高温特性, 从而减小模块导通电流的最大导通能力。在本仿真中,不平衡情况下的极限工作电流只有${182}\mathrm{\;A}$
在未来的分析中考虑这两个非理想因素, 所预测出的功率模块的极限电流导通能力将更接近实际值。
本文介绍了一种评估功率模块高温下最大电流导通能力的方法, 建立了温度相关的 SiC MOSFET 电气模型和功率模块与散热系统的热模型。对于 SiC MOSFET 模型, 首先研究了与温度相关的物理参数, 然后通过实验提取不同温度下的通态电阻,通态电阻分为两部分,${R}_{\mathrm{{CH}}}$${R}_{\mathrm{s}}$,分别对两者的温度相关性进行建模,发现${R}_{\mathrm{s}}$ 随温度呈指数增长, 而${R}_{\mathrm{{CH}}}$ 随温度有所下降; 对于热模型,不是简单地应用恒定热阻,通过有限元仿真对热模型的非线性进行了分析, 在本文中, 热阻被认为几乎与发热功率无关, 但对温度较为敏感。
本文阐述了热失控过程的机理,分别讨论了保持热稳定状态和达到热失控状态的条件, 结合 SiC 热电耦合模型和外部散热系统的热模型进行联合仿真, 获取了功率模块的最大导通电流的能力。设计实验测试来验证所提出的模型, 实验结果与仿真估计误差在$4\%$ 左右。最后讨论了${V}_{\mathrm{{th}}}$ 漂移以及多芯片电阻和温度分布不平衡两个非理想因素的影响, 估计误差可以进一步降低。
  • 中国科学院青年创新促进会资助项目(2022135)
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2024年第22卷第2期
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doi: 10.13234/j.issn.2095-2805.2024.2.386
  • 接收时间:2022-03-31
  • 首发时间:2025-07-21
  • 出版时间:2024-03-30
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  • 收稿日期:2022-03-31
  • 修回日期:2022-04-14
  • 录用日期:2022-04-22
基金
Youth Innovation Promotion Association of Chinese Academy of Sciences(2022135)
中国科学院青年创新促进会资助项目(2022135)
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    1 中国科学院电工研究所 北京 100190
    2 中国科学院大学 北京 100049
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2种不同金属材料的力学参数

Family
属数
Number of
genus
种数
Number of
species
占总种数比例
Percentage of
total species (%)

Genus
种数
Number of
species
占总种数比例
Percentage of total
species (%)
鹅膏菌科Amanitaceae 2 11 5.26 鹅膏菌属 Amanita 10 4.78
小菇科 Mycenaceae 2 12 5.74 丝盖伞属 Inocybe 5 2.39
多孔菌科 Polyporaceae 8 14 6.70 蜡蘑属 Laccaria 5 2.39
红菇科 Russulaceae 3 23 11.00 小皮伞属 Marasmius 6 2.87
小菇属 Mycena 11 5.26
光柄菇属 Pluteus 5 2.39
红菇属 Russula 17 8.13
栓菌属 Trametes 5 2.39
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